Patents by Inventor Yeong Choi

Yeong Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7702162
    Abstract: A mixed code, and a method and apparatus for encoding the same are provided. The mixed code includes a first code image region storing a first code image obtained by encoding first information using color, shading, or a combination thereof, and a second code image region storing a second code image obtained by encoding second information using color, shading, or a combination thereof. The first code image and/or the second code image includes the results of encoding interpretation information, construction information, error control information, and code direction information. The mixed code is made by adjusting the difference in color and brightness between the first and second code images to a predetermined level and combining these images.
    Type: Grant
    Filed: November 3, 2005
    Date of Patent: April 20, 2010
    Assignee: Colorzip Media, Inc.
    Inventors: Cheol Ho Cheong, Tack Don Han, Jong Young Kim, Eui Jae Kim, Seong Hun Jeong, Jae Yun Kim, Han Yeong Choi
  • Publication number: 20050163127
    Abstract: In a buffer switch and scheduling method thereof, conflict sensing and random selection logic configuration are not required. The buffer switch comprises: input buffer units for converting serial data inputted from respective input ports to parallel data; shift and comparison units for comparing currently stored data to parallel data aligned by the input buffer units, for determining paths to output the data depending on data validity, and for calculating a gating time needed to forward the data; output buffer units for outputting the data received via the input ports at the same speed as the speed at reception; a switching unit for gating paths between the shift and comparison units and the output buffer units; and a control unit for establishing the paths by enabling the input buffer units and the output buffer units for the gating time of relevant buffers depending on the establishment paths and the gating time from the shift and comparison unit.
    Type: Application
    Filed: December 29, 2004
    Publication date: July 28, 2005
    Inventors: Yeong Choi, Byung-Gu Choe, Sun-Gi Kim
  • Publication number: 20050065248
    Abstract: Disclosed is a preparation method of an exfoliated nitropolymer/silicate nanocomposite by emulsion polymerization of monomers forming the polymer in an aqueous dispersion of non-modified, layered silicate in the presence of a reactive emulsifier having both a radical-polymerizable vinyl group and a functional group with affinity for silicate. In the process of the polymerization, silicate is fully exfoliated and uniformly dispersed in the polymer. Therefore, only a small amount of silicate is sufficient to improve thermal and mechanical properties of the polymer. Further, the method is advantageous in terms of a simple preparation process due to no use of organo-modified silicate, thus achieving an economic benefit.
    Type: Application
    Filed: January 16, 2003
    Publication date: March 24, 2005
    Applicants: SAMSUNG GENERAL CHEMICALS CO., LTD., LG CHEMICAL LTD., KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Yeong Choi, In Chung, Sung Kim
  • Patent number: 6582879
    Abstract: The present invention relates to a reactive photo acid-generating agent and a heat-resistant photoresist composition comprising the same. In particularly, the present invention relates to the heat-resistant photoresist composition comprising the photo acid-generating agent expressed by the following formula (1), which can increase the degree of polymerization, and polyamide oligomers having acetal or its cyclized derivatives, which have an ability of that light-exposed area is dissolved in the developer and light-unexposed area is convertible to a heat-resistant polymer in the latter heating process and thus, it can be used for passivation layer, buffer coat or layer-insulating film of the multilayer printed circuit board, wherein and R are the same as defined in the detailed description of the Invention.
    Type: Grant
    Filed: March 27, 2001
    Date of Patent: June 24, 2003
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Kil-Yeong Choi, Moon Young Jin, Jong Chan Won, Sang Yeol Choi
  • Publication number: 20030064315
    Abstract: The present invention relates to a reactive photo acid-generating agent and a heat-resistant photoresist composition comprising the same.
    Type: Application
    Filed: March 27, 2001
    Publication date: April 3, 2003
    Applicant: Korea Research Institute of Chemical Technology
    Inventors: Kil-Yeong Choi, Moon Young Jin, Jong Chan Won, Sang Yeol Choi
  • Patent number: 6525109
    Abstract: The present invention relates to a process of preparing polycarbonate, more specifically to a process of preparing polycarbonates by solid state polymerization using microwave radiation, which comprises steps of preparing polycarbonate prepolymer having a certain range of viscosity average molecular weight; converting said polycarbonate prepolymer into crystalline particles having a certain degree of crystallinity; and producing polycarbonates by solid state polymerization of said crystalline particles by applying microwave radiation, thus resulting in production of high quality polycarbonates with high molecular weight within short time.
    Type: Grant
    Filed: July 13, 2001
    Date of Patent: February 25, 2003
    Assignees: Korea Research Institute of Chemical Technology, S-Oil Corporation
    Inventors: Kil-Yeong Choi, Jae Heung Lee, Young Chan Ko, Il Seok Choi, Cheol-Hyun Kim, Kwang Soo Yoon, Kyong Soon Lee
  • Patent number: 6433184
    Abstract: The present invention relates to polyamide-imides having head-to-tail backbone and more particularly, to polyamide-imimdes having head-to-tail ragularity to provide excellent heat and chemical resistance, physical and mechanical properties, processability, and gas permeability and selectivity.
    Type: Grant
    Filed: June 28, 2000
    Date of Patent: August 13, 2002
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Kil-Yeong Choi, Jae Heung Lee, Young-Taik Hong, Moon Young Jin, Kyoung-Su Choi, Ho-Jin Park
  • Patent number: 6423812
    Abstract: The present invention relates to a process of preparing polycarbonates and more particularly, to the process of preparing polycarbonates through a melt polymerization reaction of dihydroxyaryl compounds with diarylcarbonate, wherein said melt polymerization is performed in the presence of a mixed catalyst composed of an oxygen (O) or sulfur (S) containing compound having lone-pair electrons and an alkali metal or alkaline earth metal salt in an appropriate ratio at a reduced temperature by accelerating a reaction rate to obtain high quality polycarbonates with higher than 15,000 g/mole of a viscosity average molecular weight and improved color.
    Type: Grant
    Filed: July 11, 2001
    Date of Patent: July 23, 2002
    Assignees: Korea Research Institute of Chemical Technology, S-Oil Corporation
    Inventors: Young Chan Ko, Il Seok Choi, Cheol-Hyun Kim, Kwang Soo Yoon, Seung-Joo Kim, Kil-Yeong Choi, Jae Heung Lee, Kyong Soon Lee
  • Publication number: 20020022675
    Abstract: The present invention relates to a process of preparing polycarbonates, more specifically to a process of preparing polycarbonates by solid state polymerization using microwave radiation, which comprises steps of preparing polycarbonate prepolymer having a certain range of viscosity average molecular weight; converting said polycarbonate prepolymer into crystalline particles having a certain degree of crystallinity; and producing polycarbonates by solid state polymerization of said crystalline particles by applying microwave radiation, thus resulting in production of high quality polycarbonates with high molecular weight within short time.
    Type: Application
    Filed: July 13, 2001
    Publication date: February 21, 2002
    Applicant: Korea Research Institute of Chemical Technology and S-Oil Corporation
    Inventors: Kil-Yeong Choi, Jae Heung Lee, Young Chan Ko, II Seok Choi, Cheol-Hyun Kim, Kwang Soo Yoon, Kyong Soon Lee
  • Publication number: 20020022711
    Abstract: The present invention relates to a process of preparing polycarbonates and more particularly, to the process of preparing polycarbonates through a melt polymerization reaction of dihydroxyaryl compounds with diarylcarbonate, wherein said melt polymerization is performed in the presence of a mixed catalyst composed of an oxygen (O) or sulfur (S) containing compound having lone-pair electrons and an alkali metal or alkaline earth metal salt in an appropriate ratio at a reduced temperature by accelerating a reaction rate to obtain high quality polycarbonates with higher than 15,000 g/mole of a viscosity average molecular weight and improved color.
    Type: Application
    Filed: July 11, 2001
    Publication date: February 21, 2002
    Applicant: Korea Research Institute of Chemical Technology
    Inventors: Young Chan Ko, Il Seok Choi, Cheol-Hyun Kim, Kwang Soo Yoon, Seung-Joo Kim, Kil-Yeong Choi, Jae Heung Lee, Kyong Soon Lee
  • Patent number: 6232432
    Abstract: The present invention relates to a process for the preparation of polycarbonates, more specifically to a process for the preparation of polycarbonates by a solid polymerization of prepolymers obtained by the polymerization between aromatic dihydroxides and diarylcarbonates, which comprises: a) preparing said prepolymer having a viscosity average molecular weight of 4,000-18,000 g/mole; b) preparing a microporous foam by injecting high-pressure inert gas; and c) preparing polycarbonates by a solid polymerization, which facilitates the removal of phenol, a by-product, and enhances molecular weight of polycarbonates without using any catalyst due to the relatively high polymerization rate.
    Type: Grant
    Filed: June 29, 2000
    Date of Patent: May 15, 2001
    Assignee: Korea Research Institute of Chemical Technology and S-Oil Corporation
    Inventors: Kil-Yeong Choi, Jae Heung Lee, Sung-Goo Lee, Sang Hyun Park, Young Chan Ko, Il Seok Choi, Kwang Soo Yoon
  • Patent number: 6172127
    Abstract: The invention herein relates to a process of preparing a novel polyimide foam having superior heat-resistance, flame retardancy, homogeneous size and distribution of cells, and low density, wherein a polyimide precursor in a granular form is prepared by means of using heterocyclic amine as catalyst and then foaming. According to the present invention, the preparing process of a polyimide foam comprises reacting aromatic carboxylic acid or the anhydrides thereof with an excess of aliphatic univalent alcohol to yield an aromatic ester solution. To the aromatic ester solution, divalent amines or the mixture thereof were added in the equivalent amount of said carboxylic acid or the anhydrides thereof in addition to a catalyst and surfactant to yield a polyimide. Then, the precursor in a granular form mixture was imidized while foaming by means of pre-heating and then heating in a microwave oven, after which was cured at a high temperature.
    Type: Grant
    Filed: September 11, 1998
    Date of Patent: January 9, 2001
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Kil Yeong Choi, Jae Heung Lee, Sung Goo Lee, Mi Hie Yi, Seung Su Kim
  • Patent number: 6162893
    Abstract: The invention herein relates to a soluble polyimide resin having a dialkyl substituent for a liquid alignment layer, wherein aliphatic tetracarboxylic dianhydride and aromatic diamine having a dialkyl substituent are used to yield said soluble polyimide resin which has superior heat-resistance, solubility, transparency, and liquid crystal alignment capacity. According to the present invention, the soluble polyimide polymer having a dialkyl substituent, for a liquid crystal alignment layer, comprising the following a repetitive unit of formula 1: ##STR1## Consequently, the polyimide resin under the present invention not only has superior heat-resistance but also excellent solubility and transparency, which could be applicable as a liquid crystal alignment layer for the TFT-LCD requiring a low temperature processing.
    Type: Grant
    Filed: August 24, 1998
    Date of Patent: December 19, 2000
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Kil-Yeong Choi, Mi-Hie Yi, Moon-Young Jin, Jin-Tae Jung, Jae-Geun Park, Dae-Woo Ihm
  • Patent number: 6054554
    Abstract: The invention herein relates to a novel soluble polyimide resin comprising polyalicyclic structures and the process of preparation of the same, wherein aromatic tetracarboxylic dianhydride and novel aromatic diamine having an polyalicyclic group with various structures are used to yield a novel form of a polyimide resin, which has superior heat-resistance, solubility, and transparency.More specifically, the invention herein relates to a novel polyimide resin having excellent heat-resistance and solubility, which is prepared by means of reacting diamine monomers having a novel chemical structure with various types of aromatic carboxilic dianhydrides, in stead of aromatic diamine used for the preparation of the conventional polyimide resin. As a result, the polymers so obtained had the glass transition temperature of 260.degree. C..about.410.degree. C. and showed a increase in solubility in proportion to the increase in a number of the aromatic rings between two phenyl groups.
    Type: Grant
    Filed: May 7, 1999
    Date of Patent: April 25, 2000
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Kil Yeong Choi, Mi Hie Yi, Wenxi Huang
  • Patent number: 6046303
    Abstract: The invention herein relates to a soluble polyimide resin for a liquid crystal alignment layer and the manufacturing method thereof, wherein a mixture of aliphatic tetracarboxylic acid dianhydrides and aromatic diamine having aliphatic side chains are used to yield a soluble polyimide resin which has superior heat-resistance, solubility, surface hardness, transparency and liquid crystal alignment capacity.The soluble polyimide resin having alkoxy substituents, for a liquid crystal layer, according to the present invention, is manufactured by adding a mixture of dioxotetrahydrofuran 3-methylcyclohexene-1,2-dicarboxylic dianhydride, which is an aliphatic tetracarboxylic acid dianhydride and aromatic tetracarboxylic acid dianhydride to a mixture of aromatic diamine, and said dioxotetrahydrofuran 3-methylcyclohexene- 1,2-dicarboxylic dianhydride is used in the amount of 50 to 99 mol % to the total amount of anhydrides.
    Type: Grant
    Filed: September 11, 1998
    Date of Patent: April 4, 2000
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Kil-Yeong Choi, Mi-Hie Yi, Moon-Young Jin, Jin-Tae Jung, Jeong-Ghi Koo, Jae-Eun Cho
  • Patent number: 6031067
    Abstract: The invention herein relates to a soluble polyimide resin and the process of preparation of the same, wherein aromatic tetracarboxylic dianhydride and aromatic diamine having an alicyclic group with various structures of substituted alkyl groups are used to yield a novel form of a polyimide resin, which has superior heat-resistance, solubility and transparency.More specifically, the invention herein relates to a novel polyimide resin having excellent heat-resistance and solubility, which is prepared by means of reacting aromatic diamine monomers having a novel chemical structure with various types of aromatic tetracarboxilic acid dianhydrides, in stead of aromatic diamine used for the preparation of the conventional polyimide resin. As a result, the polymers so obtained had the glass transition temperature of 250.degree. C..about.400.degree. C. and showed a increase in solubility in proportion to the increase in volume of the alkyl group.
    Type: Grant
    Filed: May 29, 1998
    Date of Patent: February 29, 2000
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Kil-Yeong Choi, Mi-Hie Yi, Wenxi Huang
  • Patent number: 6018055
    Abstract: A polyarylether of the formula (VIII) ##STR1## wherein wherein Z' is 1-3 optionally substituted rings selected from the group consisting of an aromatic ring, a hetero aromatic ring or an aliphatic ring.A is --R.sub.1 --Z--Y in which R.sub.1 is H, C.sub.1 -C.sub.30 -alkyl or -aralkyl or phenyl, Z is a direct bond or CH.sub.2, S, O or NH, Y is CH.sub.3, OR.sub.3, SR.sub.3, NHR.sub.3, N(R.sub.3).sub.2, COOR.sub.3, COOM, SO.sub.3 R.sub.3 or SO.sub.3 M in which R.sub.3 is C.sub.1 -C.sub.30 alkyl and M is alkali metal,produced from 3,6-dihalogen- or -dintro-1,2,4,5-diimide having an N,N-substituent and which is suitable for use as a monomer for high temperature structural and functional polymers, and a process for producing the same are disclosed.
    Type: Grant
    Filed: July 15, 1997
    Date of Patent: January 25, 2000
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Kil-Yeong Choi, Dong-Hack Suh, Young-Taik Hong, Eun-Young Chung
  • Patent number: 6013760
    Abstract: The invention herein relates to a soluble polyimide resin for a liquid crystal alignment layer and the process of preparation of the same, wherein aliphatic tetracarboxylic dianhydride and aromatic diamine having the amide group are used to yield a novel form of a polyimide resin having superior heat-resistance, solubility, transparency, and liquid crystal alignment capacity.More specifically, the invention herein relates to a novel polyimide resin having excellent heat-resistance, solubility, liquid crystal alignment property, and high pretilt angle, which is prepared by means of jointly using the aromatic diamine, used for the preparation of the conventional polyimide resin, and the aromatic diamine having a long alkyl chain with a substituted amide group, and reacting the same with various types of carboxylic dianhydride.
    Type: Grant
    Filed: May 29, 1998
    Date of Patent: January 11, 2000
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Kil-Yeong Choi, Mi-Hie Yi, Moon-Young Jin, Dae-Woo Ihm, Jae-Min Oh
  • Patent number: 5955568
    Abstract: The disclosure describes a process for preparing a polyamideimide resin having high molecular weight in a simple manner wherein major problems of the prior processes such as low heat resistance and low melt flowability are improved. The process comprises condensation of an aromatic tricarboxylic acid anhydride and an aromatic diamine in a polar solvent, subjecting the resulting diimidedicarboxylic acid to acyl halogenating agent treatment to give an intermediate having good reactivity at low temperature, and then subjecting the latter to direct polymerization by using diamine as a nucleophilic agent to give a polyamideimide resin having high molecular weight. The polyamideimide resin prepared by the present invention can be used as major heat resistant structural material in advanced industries and as paint, sheet, adhesives, sliding material, fiber and film having heat resistance.
    Type: Grant
    Filed: October 23, 1997
    Date of Patent: September 21, 1999
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Kil-Yeong Choi, Dong-Hack Suh, Mi-Hie Yi, Young-Taik Hong, Moon-Young Jin
  • Patent number: 5919942
    Abstract: The disclosure describes a cyclohexane-1,2,4,5-diimide derivative which can be used for the production of colorless transparent polymer and novel engineering plastics having good processability and solubility with an excellent physical property, and a process for preparing the same which comprises reacting a bicyclooctene-1,2,4,5-tetracarboxylic anhydride with alkylamine and aniline derivative and then oxidizing the resulting product with ozone, potassium permanganate, ruthenium chloride hydroxide and aqeous hydrogen peroxide under non-basic condition to convert double bond to dicarboxylic acid or dialdehyde without destroying the imide group.
    Type: Grant
    Filed: June 20, 1997
    Date of Patent: July 6, 1999
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Kil-Yeong Choi, Dong-Hack Suh, Young-Taik Hong, Sang-Hyun Park