Patents by Inventor Yi Chang

Yi Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240136463
    Abstract: This disclosure discloses an optical sensing device. The device includes a carrier body; a first light-emitting device disposed on the carrier body; and a light-receiving device including a group III-V semiconductor material disposed on the carrier body, including a light-receiving surface having an area, wherein the light-receiving device is capable of receiving a first received wavelength having a largest external quantum efficiency so the ratio of the largest external quantum efficiency to the area is ?13.
    Type: Application
    Filed: December 20, 2023
    Publication date: April 25, 2024
    Applicant: EPISTAR CORPORATION
    Inventors: Yi-Chieh LIN, Shiuan-Leh LIN, Yung-Fu CHANG, Shih-Chang LEE, Chia-Liang HSU, Yi HSIAO, Wen-Luh LIAO, Hong-Chi SHIH, Mei-Chun LIU
  • Publication number: 20240137061
    Abstract: A radio frequency receiving circuit includes a first amplification circuit, an oscillation circuit, a frequency mixing and amplification circuit and a dividing circuit. The first amplification circuit is configured to amplify an input signal so as to generate an amplified input signal. The oscillation circuit is configured to provide a local oscillation signal. The frequency mixing and amplification circuit is configured to mix and amplify the amplified input signal according to the local oscillation signal. The dividing circuit is configured to form a dividing loop at a preset frequency for the amplified input signal according to the local oscillation signal when the dividing circuit is driven. A chip including the radio frequency receiving circuit and a main circuit is also provided. The main circuit is configured to drive the dividing circuit when the second input signal is determined to include a signal of the preset frequency.
    Type: Application
    Filed: October 17, 2023
    Publication date: April 25, 2024
    Applicant: REALTEK SEMICONDUCTOR CORP.
    Inventors: Ruo-Hsuan GAO, Chia-Yi LEE, Chia-Jun CHANG
  • Publication number: 20240136422
    Abstract: A high electron mobility transistor and a method for fabricating the same is disclosed. Firstly, a lattice matching layer, a channel layer, and an AlGaN layer are sequentially formed on a growth substrate. The AlGaN layer includes a first area, a second area, and a third area, wherein the second area is located between the first area and the third area. Then, an insulation block is formed on the second area of the AlGaN layer and two GaN blocks are respectively formed on the first area and the third area of the AlGaN layer. Two InAlGaN blocks are respectively formed on the GaN blocks and the insulation block is removed. Finally, a gate is formed to interfere the second area of the AlGaN layer and a source and a drain are respectively formed on the InAlGaN blocks.
    Type: Application
    Filed: January 13, 2023
    Publication date: April 25, 2024
    Applicants: National Yang Ming Chiao Tung University, National Chung-Shan Institute of Science and Technology
    Inventors: Edward Yi CHANG, You-Chen WENG, Min-Lu Kao
  • Publication number: 20240136191
    Abstract: A method of forming a semiconductor device includes forming source/drain regions on opposing sides of a gate structure, where the gate structure is over a fin and surrounded by a first dielectric layer; forming openings in the first dielectric layer to expose the source/drain regions; selectively forming silicide regions in the openings on the source/drain regions using a plasma-enhanced chemical vapor deposition (PECVD) process; and filling the openings with an electrically conductive material.
    Type: Application
    Filed: January 2, 2024
    Publication date: April 25, 2024
    Inventors: Min-Hsiu Hung, Chien Chang, Yi-Hsiang Chao, Hung-Yi Huang, Chih-Wei Chang
  • Publication number: 20240133857
    Abstract: A device for on-site detection of soil organic matter, including a pre-processing module, a centrifugal system, a microfluidic chip, and a photoelectric detection module. The pre-processing module is configured to process a soil sample into a soil solution. The centrifugal system is configured to generate a centrifugal force. The microfluidic chip is configured to allow mixing of the soil solution and an extraction solvent for extraction under the centrifugal force to obtain an extract. The photoelectric detection module is configured to detect the extract to determine organic matter content in the soil solution. An on-site detection method and a microfluidic chip are also provided. The microfluidic chip includes a channel layer, a cover layer arranged above the channel layer, and a base plate layer arranged below the channel layer.
    Type: Application
    Filed: December 26, 2023
    Publication date: April 25, 2024
    Inventors: Rujing WANG, Jiangning CHEN, Xiangyu CHEN, Yongjia CHANG, Qinwen LU, Yang LIU, Yi LIU, Qiao CAO, Xiaoyu ZHANG
  • Publication number: 20240136432
    Abstract: A high electron mobility transistor includes a growth substrate, a lattice matching layer, an back-barrier layer, an electron blocking layer, a channel layer, an active layer, a source, a gate, and a drain. The lattice matching layer and the back-barrier layer are formed on the growth substrate. The back-barrier layer includes GaN doped with C. The electron blocking layer is formed on the back-barrier layer. The electron blocking layer includes AlGaN, wherein the doping percent of Al atoms of the AlGaN is 3˜5% and the doping percent of Ga atoms of the AlGaN is 95˜97%. The electron blocking layer has a thickness of 2˜5 nm. The channel layer and the active layer are formed on the electron blocking layer. The source, the gate, and the drain are formed on the active layer.
    Type: Application
    Filed: January 13, 2023
    Publication date: April 25, 2024
    Applicants: National Yang Ming Chiao Tung University, National Chung-Shan Institute of Science and Technology
    Inventors: Edward Yi CHANG, You-Chen WENG, Min-Lu KAO
  • Publication number: 20240131538
    Abstract: An annular airflow regulating apparatus includes a cup-shaped element and an adjustment element. The cup-shaped element has a bowl and a bottom, integrated to form a first chamber. The bottom has a tapered channel parallel to an axis and penetrating through the bottom. A ring-shaped groove is disposed between the tapered channel and the bottom. The ring-shaped groove has an annular plane perpendicular to the axis. The adjustment element, having a tapered portion and second holes, is movably disposed in the cup-shaped element. The tapered portion protrudes into the tapered channel A tapered annular gap is formed between the tapered portion and the tapered channel. When the adjustment element is moved with respect to the cup-shaped element, a width of the tapered annular gap is varied, and thereupon a flow rate and velocity of the process gas would be varied accordingly.
    Type: Application
    Filed: December 8, 2022
    Publication date: April 25, 2024
    Inventors: CHEN-CHUNG DU, Ming-Jyh Chang, Chang-Yi Chen, Ming-Hau Tsai, Ko-Chieh chao, Yi-Wei Lin
  • Publication number: 20240136227
    Abstract: A method includes etching a dielectric layer of a substrate to form an opening in the dielectric layer, forming a metal layer extending into the opening, performing an anneal process, so that a bottom portion of the metal layer reacts with a semiconductor region underlying the metal layer to form a source/drain region, performing a plasma treatment process on the substrate using a process gas including hydrogen gas and a nitrogen-containing gas to form a silicon-and-nitrogen-containing layer, and depositing a metallic material on the silicon-and-nitrogen-containing layer.
    Type: Application
    Filed: January 3, 2024
    Publication date: April 25, 2024
    Inventors: Ching-Yi Chen, Sheng-Hsuan Lin, Wei-Yip Loh, Hung-Hsu Chen, Chih-Wei Chang
  • Patent number: 11967784
    Abstract: A tamper resistant electrical receptacle comprises a housing including a cover having at least one plug outlet formed therethrough, the plug outlet configured to receive both line and neutral blades of an electrical plug. The electrical receptacle further comprises electrical contacts positioned within the housing below the at least one plug outlet, the electrical contacts being configured to be connect to AC power. A shutter disposed within the housing between the cover and the electrical contacts is slidable between a closed position blocking access to the electrical contacts through the plug outlet and an open position allowing access to the electrical contacts through the plug outlet, the shutter being biased toward the closed position. The shutter is configured to slide from the closed position to the open position only upon simultaneous insertion of both the line and neutral blades of the electrical plug in the plug outlet.
    Type: Grant
    Filed: August 25, 2022
    Date of Patent: April 23, 2024
    Assignee: THE WIREMOLD COMPANY
    Inventors: Yi Quan, Xinguo Chang
  • Patent number: 11967591
    Abstract: A method of forming a semiconductor device includes forming a first interconnect structure over a carrier; forming a thermal dissipation block over the carrier; forming metal posts over the first interconnect structure; attaching a first integrated circuit die over the first interconnect structure and the thermal dissipation block; removing the carrier; attaching a semiconductor package to the first interconnect structure and the thermal dissipation block using first electrical connectors and thermal dissipation connectors; and forming external electrical connectors, the external electrical connectors being configured to transmit each external electrical connection into the semiconductor device, the thermal dissipation block being electrically isolated from each external electrical connection.
    Type: Grant
    Filed: August 6, 2021
    Date of Patent: April 23, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yu-Hao Chen, Fong-Yuan Chang, Po-Hsiang Huang, Ching-Yi Lin, Jyh Chwen Frank Lee
  • Patent number: 11965069
    Abstract: A heat-shrinkable polyester film made of a polyester-forming resin composition includes a recycled material, and has an exothermic crystallization peak and an endothermic melting peak which are determined via differential scanning calorimetry, and which satisfy relationships of T2?T1?68° C. and T3?T2?78° C., where T1 represents an onset point of the exothermic crystallization peak, T2 represents an end point of the exothermic crystallization peak and an onset point of the endothermic melting peak, and T3 represents an end point of the endothermic melting peak. A method for manufacturing the heat-shrinkable polyester film is also disclosed.
    Type: Grant
    Filed: February 5, 2021
    Date of Patent: April 23, 2024
    Assignee: FAR EASTERN NEW CENTURY CORPORATION
    Inventors: Li-Ling Chang, Yow-An Leu, Ting-Yu Lin, Ching-Chun Tsai, Wen-Yi Chang
  • Patent number: 11966530
    Abstract: A touchpad module includes a base plate, a touch member and at least one pressure sensing module. The touch member is located over the base plate. The touch member includes a touch plate and a touch sensitive circuit board. The pressure sensing module is arranged between the base plate and the touch member. The pressure sensing module includes a pressure sensor and a miniature supporting plate. The pressure sensor is installed on the miniature supporting plate. The pressure sensor is electrically connected with the touch sensitive circuit board through the miniature supporting plate. While the touch member is pressed in response to an external pressing force, the pressing force exerted on the touch member is sensed by the at least one pressure sensing module, and the pressure sensing module generates a pressure sensing signal.
    Type: Grant
    Filed: April 24, 2023
    Date of Patent: April 23, 2024
    Assignee: PRIMAX ELECTRONICS LTD.
    Inventors: Wei-Chiang Huang, Chao-Wei Lee, Hsueh-Chao Chang, Sian-Yi Chiu
  • Publication number: 20240124689
    Abstract: A resin composition includes resin and inorganic filler. The resin includes liquid rubber resin, polyphenylene ether resin, and a crosslinking agent. Compared to a total of 100 parts by mass of the resin, the usage amount of the inorganic filler is at least greater than or equal to 40 parts by mass.
    Type: Application
    Filed: November 14, 2022
    Publication date: April 18, 2024
    Applicant: NAN YA PLASTICS CORPORATION
    Inventors: Te-Chao Liao, Hung-Yi Chang, Chia-Lin Liu
  • Publication number: 20240128375
    Abstract: A method includes forming first and second semiconductor fins and a gate structure over a substrate; forming a first and second source/drain epitaxy structures over the first and second semiconductor fins; forming an interlayer dielectric (ILD) layer over the first and second source/drain epitaxy structures; etching the gate structure and the ILD layer to form a trench; performing a first surface treatment to modify surfaces of a top portion and a bottom portion of the trench to NH-terminated; performing a second surface treatment to modify the surfaces of the top portion of the trench to N-terminated, while leaving the surfaces of the bottom portion of the trench being NH-terminated; and depositing a first dielectric layer in the trench, wherein the first dielectric layer has a higher deposition rate on the surfaces of the bottom portion of the trench than on the surfaces of the bottom portion of the trench.
    Type: Application
    Filed: March 16, 2023
    Publication date: April 18, 2024
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chun-Yi CHANG, Yu Ying CHEN, Zhen-Cheng WU, Chi On CHUI
  • Publication number: 20240123462
    Abstract: An atomization module includes a base, an auxiliary fixing member, an atomization member, a piezoelectric element, a conductive member, and a waterproof member. The base includes a support portion and an outer annular portion. The support portion has a first opening, the outer annular portion surrounds the support portion, and the support portion protrudes relative to the outer annular portion. The auxiliary fixing member is disposed on the support portion, and has a second opening. The second opening is opposite to the first opening. The atomization member is disposed between the support portion and the auxiliary fixing member. The piezoelectric element is disposed on the outer annular portion, and the piezoelectric element and the atomization member are disposed on a same side of the base. The conductive member is electrically connected to the piezoelectric element. The waterproof member at least partially covers the piezoelectric element.
    Type: Application
    Filed: October 13, 2023
    Publication date: April 18, 2024
    Inventors: CHIA-CHIEN CHANG, HSIN-YI PAI, CHUN-CHIA JUAN
  • Publication number: 20240128381
    Abstract: A power diode device includes a substrate. The substrate includes a core layer of a first conductive type, a first diffusion layer of the first conductive type, a second diffusion layer of a second conductive type, and a heavily doped region of the second conductive type. The core layer is located between the first diffusion layer and the second diffusion layer. A thickness of the core layer is greater than that of the second diffusion layer. The heavily doped region is located in the second diffusion layer and extends toward the core layer to form a PN junction between the heavily doped region and the core layer. A method for manufacturing the power diode device is also provided.
    Type: Application
    Filed: June 2, 2023
    Publication date: April 18, 2024
    Inventors: Ching Chiu TSENG, Tzu Yuan LO, Chao Yi CHANG
  • Patent number: 11961892
    Abstract: A semiconductor device and methods of forming the same are disclosed. The semiconductor device includes a substrate, first and second source/drain (S/D) regions, a channel between the first and second S/D regions, a gate engaging the channel, and a contact feature connecting to the first S/D region. The contact feature includes first and second contact layers. The first contact layer has a conformal cross-sectional profile and is in contact with the first S/D region on at least two sides thereof. In embodiments, the first contact layer is in direct contact with three or four sides of the first S/D region so as to increase the contact area. The first contact layer includes one of a semiconductor-metal alloy, an III-V semiconductor, and germanium.
    Type: Grant
    Filed: June 10, 2022
    Date of Patent: April 16, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Carlos H. Diaz, Chung-Cheng Wu, Chia-Hao Chang, Chih-Hao Wang, Jean-Pierre Colinge, Chun-Hsiung Lin, Wai-Yi Lien, Ying-Keung Leung
  • Publication number: 20240120410
    Abstract: A semiconductor structure includes a semiconductor epitaxial layer, a first semiconductor well, a second semiconductor well, a source doped region, a gate structure and a drain structure. The semiconductor epitaxial layer includes a first side and a second side opposite to the first side. The first semiconductor well is located on the first side of the semiconductor epitaxial layer. The second semiconductor well is located on the second side of the semiconductor epitaxial layer. The source doped region is located in the first semiconductor well. The gate structure overlaps the first semiconductor well and the source doped region on the first side of the semiconductor epitaxial layer. The drain structure includes a semiconductor substrate. The second side of the semiconductor epitaxial layer outside the second semiconductor well includes a connecting surface. The connecting surface of the semiconductor epitaxial layer is connected to the semiconductor substrate.
    Type: Application
    Filed: February 16, 2023
    Publication date: April 11, 2024
    Inventors: Yu-Tsu LEE, Yan-Ru CHEN, Chao-Yi CHANG, Kuang-Hao CHIANG
  • Patent number: 11956541
    Abstract: A control method of a driving mechanism is provided, including: the driving mechanism provides a first electrical signal from a control assembly to the driving mechanism to move the movable portion into an initial position relative to the fixed portion, wherein the control assembly includes a control unit and a position sensing unit; the status signal of an inertia sensing unit is read; the control unit sends the status signal to the control unit to calculate a target position; the control unit provides a second electrical signal to the driving assembly according to the target position for driving the driving assembly; a position signal is sent from the position sensing unit to the control unit; the control unit provides a third electric signal to the driving assembly to drive the driving assembly according the position signal.
    Type: Grant
    Filed: January 26, 2023
    Date of Patent: April 9, 2024
    Assignee: TDK TAIWAN CORP.
    Inventors: Chao-Chang Hu, Chen-Hsien Fan, Sung-Mao Tsai, Yueh-Lin Lee, Yu-Chiao Lo, Mao-Kuo Hsu, Ching-Chieh Huan, Yi-Chun Cheng
  • Patent number: 11954527
    Abstract: A resource allocation method comprises using resources with a used resource quantity of a machine learning system to execute a first experiment which has a first minimum resource demand, receiving an experiment request associated with a target dataset, deciding a second experiment according to the target dataset, deciding a second minimum resource demand of the second experiment, allocating resources with a quantity equal to the second minimum resource demand for an execution of the second experiment when a total resource quantity of the machine learning system meets a sum of the first minimum resource demand and the second minimum resource demand and a difference between the total resource quantity and the used resource quantity meets the second minimum resource demand, determining that the machine learning system has an idle resource, and selectively allocating said the idle resource for at least one of the first experiment and the second experiment.
    Type: Grant
    Filed: March 30, 2021
    Date of Patent: April 9, 2024
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Shih-Chang Chen, Yi-Chin Chu, Yi-Fang Lu