Abstract: A method for improving a photolithographic patterning process to avoid undeveloped photoresist contamination in a semiconductor manufacturing process including providing a first semiconductor feature having an anisotropically etched opening including sidewalls. The first semiconductor feature further provide an overlying photoresist layer photolithographically patterned for anisotropically etching a second semiconductor feature opening overlying and encompassing the first semiconductor feature; blanket depositing a polymeric passivation layer over the overlying photoresist layer including covering at least a portion of the sidewalls including polymeric containing residues; and, removing the polymeric passivation layer including a substantial portion of the polymeric containing residues from at least a portion of the sidewalls prior to anisotropically etching the second semiconductor feature.

Abstract: A wet chemical process tank, or a wet etch tank, that has improved fluid circulation and improved uniformity in the fluid concentration in the tank is disclosed. In a preferred embodiment, a tank body is provided which has a liquid dispenser positioned therein with a plurality of liquid outlets in a vertical surface of the dispenser each having a different diameter opening for compensating the different fluid pressure in the dispenser. A more uniform liquid concentration is thus achieved in the tank cavity to perform a more uniform chemical process on the plurality of wafers. The tank body is further provided with a second endwall which has a second distance from the plurality of wafers that is at least twice the first distance between a first endwall and the plurality of wafers. When the second endwall is at least 0.

Abstract: A new method is provided for the creation of an opening over which the second electrode of a MIM capacitor is to be deposited. The first electrode of the MIM is created in a first layer of Fluorine doped Silicon dioxide (SiO2) Glass (FSG) . A layer of insulation comprising silicon nitride is deposited over the surface of the first electrode. A second layer of Fluorine doped Silicon dioxide (SiO2) Glass (FSG) is deposited over the surface of the layer of silicon nitride, an etch stop layer of silicon nitride is deposited over the surface of the second layer of FSG. The layers of etch stop and the second layer of FSG are patterned and etched using a dry etch, stopping on the layer-of insulation and exposing the surface of the layer of insulation. Next-and of critical importance to the invention is a step of photoresist ashing and oxidation of the surface of the layer of silicon nitride.

Abstract: A connecting device for a sofa bed includes a first connecting member with opposite first and second end portions, and a second connecting member with a rear end portion that is pivoted to the second end portion and that is provided with a spring-loaded pawl unit. A fixed mounting plate is disposed below the first and second connecting members. A pivotable linking plate unit has an upper end pivoted to the first end portion, and a lower end pivoted to the mounting plate such that the first connecting member is movable forward and rearward relative to the mounting plate. The second connecting member is pivotable relative to the first connecting member in a first direction so as to enable the pawl unit to engage one of the ratchet teeth in order to retain the second connecting member at a certain angularposition relative to the first connecting member.

Abstract: A wet chemical process tank, or a wet etch tank, that has improved fluid circulation and improved uniformity in the fluid concentration in the tank is disclosed. In a preferred embodiment, a tank body is provided which has a liquid dispenser positioned therein with a plurality of liquid outlets in a vertical surface of the dispenser each having a different diameter opening for compensating the different fluid pressure in the dispenser. A more uniform liquid concentration is thus achieved in the tank cavity to perform a more uniform chemical process on the plurality of wafers. The tank body is further provided with a second endwall which has a second distance from the plurality of wafers that is at least twice the first distance between a first endwall and the plurality of wafers. When the second endwall is at least 0.

Abstract: A multiple-stage positioner includes a stationary first part, a second part connected pivotally to the stationary first part, a holding pin projecting from the first part, a positioning piece having a lower edge formed with a plurality of first grooves, a spring urging the positioning piece against the holding pin, and a guiding piece having a bottom edge substantially flush with the lower edge of the positioning piece. The bottom edge has a plurality of second grooves and groove-free parts between adjacent ones of the second grooves. The guiding piece is slidable between a first position, in which the second grooves are aligned respectively with the first grooves to receive the holding pin, and a second position, in which the groove-free parts are aligned respectively with the first grooves to prevent the holding pin from entering into the first grooves.

Abstract: A hot plug-and-play (PnP) converter of a universal serial bus (USB) interface that converts a non-PnP interface into a hot PnP USB interface. The converter sends the information related to the converter itself to the connected computer system, and sends the information related to the connected peripheral as well as to the presence of the peripheral to the computer system. Users can handle the connection status of disclosed is a connected peripheral more directly. The converter further instructs the computer system to detect the connection status of a peripheral automatically by changing the connection of the pull-up resistor of the transferring wire on the USB interface.

Abstract: A piece of furniture includes an upright post, a horizontal rail, and a fastening unit. The upright post is provided with a coupling base having a parallel pair of side walls and a connecting wall that interconnects the side walls and that inclines inwardly and downwardly such that side walls and the connecting wall cooperatively confine a vertical engaging groove which tapers downwardly. The horizontal rail includes an upper rail member and a lower rail member mounted on a bottom side of the upper rail member. The upper rail member is provided with a tongue unit which extends downwardly into the vertical engaging groove. The tongue unit has a parallel pair of flanges confined between the side walls and an inclining wall that interconnects the flanges and that is superimposed on the connecting wall. The lower rail member is provided with a support unit which includes a parallel pair of abutment walls and a vertical wall which interconnects the abutment walls.