Patents by Inventor Yi-Feng Chang

Yi-Feng Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11282830
    Abstract: A device comprises a high voltage n well and a high voltage p well over a buried layer, a first low voltage n well over the high voltage n well, wherein a bottom portion of the first low voltage n well is surrounded by the high voltage n well, an N+ region over the first low voltage n well, a second low voltage n well and a low voltage p well over the high voltage p well, a first P+ region over the second low voltage n well and a second P+ region over the low voltage p well.
    Type: Grant
    Filed: December 20, 2018
    Date of Patent: March 22, 2022
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yi-Feng Chang, Jam-Wem Lee
  • Patent number: 11222893
    Abstract: A method includes the following operations: disconnecting at least one of drain regions that are formed on a first active area, of first transistors, from a first voltage; and disconnecting at least one of drain regions that are formed on a second active area, of second transistors coupled to the first transistors from a second voltage. The at least one of drain regions of the second transistors corresponds to the at least one of drain regions of the first transistors.
    Type: Grant
    Filed: July 29, 2019
    Date of Patent: January 11, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yi-Feng Chang, Po-Lin Peng, Jam-Wem Lee
  • Patent number: 11127546
    Abstract: A keyboard includes an elastic element disposed above a bottom case, a light emitter, a light receiver, a pressing element, and a keycap. When a force toward the bottom case is applied to a top surface of the elastic element, a relationship between a force to move the top surface and a distance from the top surface to the bottom case is in a negative correlation in a path of the top surface from a first position to a second position, and a relationship between a force to move the top surface and a distance from the top surface to the bottom case is in a positive correlation in a path of the top surface from the second position to a third position. The light emitter, the light receiver, and the pressing element are disposed above the elastic element. The keycap is disposed above the pressing element.
    Type: Grant
    Filed: October 28, 2019
    Date of Patent: September 21, 2021
    Assignee: Chicony Electronics Co., Ltd.
    Inventors: Tao-Kuan Chen, Tzu-Chuan Liang, Yi-Feng Chang
  • Patent number: 10930640
    Abstract: The present disclosure describes exemplary configurations and arrangements for various intelligent diodes. The intelligent diodes of the present disclosure can be implemented as part of electrostatic discharge protection circuitry to protect other electronic circuitry from the flow of electricity caused by electrostatic discharge events. The electrostatic discharge protection circuitry dissipates one or more unwanted transient signals which result from the electrostatic discharge event. In some situations, some carrier electrons and/or carrier holes can flow from intelligent diodes of the present disclosure into a semiconductor substrate. The exemplary configurations and arrangements described herein include various regions designed collect these carrier electrons and/or carrier holes to reduce the likelihood these carrier electrons and/or carrier holes cause latch-up of the other electronic circuitry.
    Type: Grant
    Filed: April 29, 2020
    Date of Patent: February 23, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yi-Feng Chang, Jam-Wem Lee, Li-Wei Chu, Po-Lin Peng
  • Patent number: 10867987
    Abstract: An integrated circuit device with ESD protection includes a substrate with a well having a first conductivity type formed on the substrate. A drain region has at least one drain diffusion with a second conductivity type implanted in the well and at least one drain conductive insertion on the well. The drain conductive insertion is electrically connected to the drain diffusion and an I/O pad. A source region includes a plurality of source diffusions having the second conductivity type implanted in the well, and the source diffusions are electrically connected to a voltage terminal.
    Type: Grant
    Filed: September 29, 2017
    Date of Patent: December 15, 2020
    Inventors: Po-Lin Peng, Li-Wei Chu, Yi-Feng Chang, Jam-Wem Lee
  • Publication number: 20200373255
    Abstract: A semiconductor device includes a substrate and a metallization layer. The substrate has an active region that includes opposite first and second edges. The metallization layer is disposed above the substrate, and includes a pair of metal lines and a metal plate. The metal lines extend from an outer periphery of the active region into the active region and toward the second edge of the active region. The metal plate interconnects the metal lines and at least a portion of which is disposed at the outer periphery of the active region.
    Type: Application
    Filed: August 5, 2020
    Publication date: November 26, 2020
    Inventor: Yi-Feng Chang
  • Publication number: 20200365531
    Abstract: A semiconductor device includes a substrate and a metallization layer. The substrate has an active region that includes opposite first and second edges. The metallization layer is disposed above the substrate, and includes a pair of metal lines and a metal plate. The metal lines extend from an outer periphery of the active region into the active region and toward the second edge of the active region. The metal plate interconnects the metal lines and at least a portion of which is disposed at the outer periphery of the active region.
    Type: Application
    Filed: August 5, 2020
    Publication date: November 19, 2020
    Inventor: Yi-Feng Chang
  • Publication number: 20200365349
    Abstract: A keyboard includes an elastic element disposed above a bottom case, a light emitter, a light receiver, a pressing element, and a keycap. When a force toward the bottom case is applied to a top surface of the elastic element, a relationship between a force to move the top surface and a distance from the top surface to the bottom case is in a negative correlation in a path of the top surface from a first position to a second position, and a relationship between a force to move the top surface and a distance from the top surface to the bottom case is in a positive correlation in a path of the top surface from the second position to a third position. The light emitter, the light receiver, and the pressing element are disposed above the elastic element. The keycap is disposed above the pressing element.
    Type: Application
    Filed: October 28, 2019
    Publication date: November 19, 2020
    Inventors: Tao-Kuan CHEN, Tzu-Chuan LIANG, Yi-Feng CHANG
  • Publication number: 20200365529
    Abstract: A semiconductor device includes a substrate and a metallization layer. The substrate has an active region that includes opposite first and second edges. The metallization layer is disposed above the substrate, and includes a pair of metal lines and a metal plate. The metal lines extend from an outer periphery of the active region into the active region and toward the second edge of the active region. The metal plate interconnects the metal lines and at least a portion of which is disposed at the outer periphery of the active region.
    Type: Application
    Filed: August 3, 2020
    Publication date: November 19, 2020
    Inventor: Yi-Feng Chang
  • Publication number: 20200258878
    Abstract: The present disclosure describes exemplary configurations and arrangements for various intelligent diodes. The intelligent diodes of the present disclosure can be implemented as part of electrostatic discharge protection circuitry to protect other electronic circuitry from the flow of electricity caused by electrostatic discharge events. The electrostatic discharge protection circuitry dissipates one or more unwanted transient signals which result from the electrostatic discharge event. In some situations, some carrier electrons and/or carrier holes can flow from intelligent diodes of the present disclosure into a semiconductor substrate. The exemplary configurations and arrangements described herein include various regions designed collect these carrier electrons and/or carrier holes to reduce the likelihood these carrier electrons and/or carrier holes cause latch-up of the other electronic circuitry.
    Type: Application
    Filed: April 29, 2020
    Publication date: August 13, 2020
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yi-Feng CHANG, Jam-Wem LEE, Li-Wei CHU, Po-Lin PENG
  • Patent number: 10734330
    Abstract: A semiconductor device includes a substrate and a metallization layer. The substrate has an active region that includes opposite first and second edges. The metallization layer is disposed above the substrate, and includes a pair of metal lines and a metal plate. The metal lines extend from an outer periphery of the active region into the active region and toward the second edge of the active region. The metal plate interconnects the metal lines and at least a portion of which is disposed at the outer periphery of the active region.
    Type: Grant
    Filed: January 30, 2015
    Date of Patent: August 4, 2020
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventor: Yi-Feng Chang
  • Patent number: 10643988
    Abstract: The present disclosure describes exemplary configurations and arrangements for various intelligent diodes. The intelligent diodes of the present disclosure can be implemented as part of electrostatic discharge protection circuitry to protect other electronic circuitry from the flow of electricity caused by electrostatic discharge events. The electrostatic discharge protection circuitry dissipates one or more unwanted transient signals which result from the electrostatic discharge event. In some situations, some carrier electrons and/or carrier holes can flow from intelligent diodes of the present disclosure into a semiconductor substrate. The exemplary configurations and arrangements described herein include various regions designed collect these carrier electrons and/or carrier holes to reduce the likelihood these carrier electrons and/or carrier holes cause latch-up of the other electronic circuitry.
    Type: Grant
    Filed: August 23, 2019
    Date of Patent: May 5, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yi-Feng Chang, Jam-Wem Lee, Li-Wei Chu, Po-Lin Peng
  • Publication number: 20190378832
    Abstract: The present disclosure describes exemplary configurations and arrangements for various intelligent diodes. The intelligent diodes of the present disclosure can be implemented as part of electrostatic discharge protection circuitry to protect other electronic circuitry from the flow of electricity caused by electrostatic discharge events. The electrostatic discharge protection circuitry dissipates one or more unwanted transient signals which result from the electrostatic discharge event. In some situations, some carrier electrons and/or carrier holes can flow from intelligent diodes of the present disclosure into a semiconductor substrate. The exemplary configurations and arrangements described herein include various regions designed collect these carrier electrons and/or carrier holes to reduce the likelihood these carrier electrons and/or carrier holes cause latch-up of the other electronic circuitry.
    Type: Application
    Filed: August 23, 2019
    Publication date: December 12, 2019
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yi-Feng CHANG, Jam-Wem LEE, Li-Wei CHU, Po-Lin PENG
  • Publication number: 20190348416
    Abstract: A method includes the following operations: disconnecting at least one of drain regions that are formed on a first active area, of first transistors, from a first voltage; and disconnecting at least one of drain regions that are formed on a second active area, of second transistors coupled to the first transistors from a second voltage. The at least one of drain regions of the second transistors corresponds to the at least one of drain regions of the first transistors.
    Type: Application
    Filed: July 29, 2019
    Publication date: November 14, 2019
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yi-Feng CHANG, Po-Lin PENG, Jam-Wem LEE
  • Patent number: 10411005
    Abstract: The present disclosure describes exemplary configurations and arrangements for various intelligent diodes. The intelligent diodes of the present disclosure can be implemented as part of electrostatic discharge protection circuitry to protect other electronic circuitry from the flow of electricity caused by electrostatic discharge events. The electrostatic discharge protection circuitry dissipates one or more unwanted transient signals which result from the electrostatic discharge event. In some situations, some carrier electrons and/or carrier holes can flow from intelligent diodes of the present disclosure into a semiconductor substrate. The exemplary configurations and arrangements described herein include various regions designed collect these carrier electrons and/or carrier holes to reduce the likelihood these carrier electrons and/or carrier holes cause latch-up of the other electronic circuitry.
    Type: Grant
    Filed: March 28, 2018
    Date of Patent: September 10, 2019
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yi-Feng Chang, Jam-Wem Lee, Li-Wei Chu, Po-Lin Peng
  • Patent number: 10396021
    Abstract: A fabrication method of a layer structure for mounting a semiconductor device is provided, which includes the steps of: providing a base material, wherein the base material has a conductive layer having a first surface having a plurality of first conductive elements and an opposite second surface having a plurality of second conductive elements, and a first encapsulant formed on the first surface of the conductive layer for encapsulating the first conductive elements; partially removing the conductive layer to form a circuit layer that electrically connects the first conductive elements and the second conductive elements; and forming a second encapsulant on a bottom surface of the first encapsulant for encapsulating the circuit layer and the second conductive elements, thus reducing the fabrication difficulty and increasing the product yield.
    Type: Grant
    Filed: April 11, 2018
    Date of Patent: August 27, 2019
    Assignee: Siliconware Precision Industries Co., Ltd.
    Inventors: Fang-Lin Tsai, Yi-Feng Chang, Cheng-Jen Liu, Yi-Min Fu, Hung-Chi Chen
  • Patent number: 10366992
    Abstract: A semiconductor device includes a first active area of a first type, a second active area of a second type, and a plurality of gates. The gates are arranged above and across the first active area and the second active area. At a first side of a first gate of the plurality of gates, a first region of the first active area is configured to receive a first voltage and a first region of the second active area is configured to receive a second voltage. At a second side of the first gate, a second region of the first active area is disconnected from the first voltage and a second region of the second active area is disconnected from the second voltage.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: July 30, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yi-Feng Chang, Po-Lin Peng, Jam-Wem Lee
  • Publication number: 20190148355
    Abstract: The present disclosure describes exemplary configurations and arrangements for various intelligent diodes. The intelligent diodes of the present disclosure can be implemented as part of electrostatic discharge protection circuitry to protect other electronic circuitry from the flow of electricity caused by electrostatic discharge events. The electrostatic discharge protection circuitry dissipates one or more unwanted transient signals which result from the electrostatic discharge event. In some situations, some carrier electrons and or carrier holes can flow from intelligent diodes of the present disclosure into a semiconductor substrate. The exemplary configurations and arrangements described herein include various regions designed collect these carrier electrons and/or carrier holes to reduce the likelihood these carrier electrons and/or carrier holes cause latch-up of the other electronic circuitry.
    Type: Application
    Filed: March 28, 2018
    Publication date: May 16, 2019
    Applicant: Taiwan Semiconductor Manufactruring Co., Ltd.
    Inventors: Yi-Feng CHANG, Jam-Wem Lee, Li-Wei Chu, Po-Lin Peng
  • Publication number: 20190123038
    Abstract: A device comprises a high voltage n well and a high voltage p well over a buried layer, a first low voltage n well over the high voltage n well, wherein a bottom portion of the first low voltage n well is surrounded by the high voltage n well, an N+ region over the first low voltage n well, a second low voltage n well and a low voltage p well over the high voltage p well, a first P+ region over the second low voltage n well and a second P+ region over the low voltage p well.
    Type: Application
    Filed: December 20, 2018
    Publication date: April 25, 2019
    Inventors: Yi-Feng Chang, Jam-Wem Lee
  • Publication number: 20190103395
    Abstract: An integrated circuit device with ESD protection includes a substrate with a well having a first conductivity type formed on the substrate. A drain region has at least one drain diffusion with a second conductivity type implanted in the well and at least one drain conductive insertion on the well. The drain conductive insertion is electrically connected to the drain diffusion and an I/O pad. A source region includes a plurality of source diffusions having the second conductivity type implanted in the well, and the source diffusions are electrically connected to a voltage terminal.
    Type: Application
    Filed: September 29, 2017
    Publication date: April 4, 2019
    Inventors: Po-Lin Peng, Li-Wei Chu, Yi-Feng Chang, Jam-Wem Lee