Patents by Inventor Yi-Feng Chang
Yi-Feng Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11282830Abstract: A device comprises a high voltage n well and a high voltage p well over a buried layer, a first low voltage n well over the high voltage n well, wherein a bottom portion of the first low voltage n well is surrounded by the high voltage n well, an N+ region over the first low voltage n well, a second low voltage n well and a low voltage p well over the high voltage p well, a first P+ region over the second low voltage n well and a second P+ region over the low voltage p well.Type: GrantFiled: December 20, 2018Date of Patent: March 22, 2022Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yi-Feng Chang, Jam-Wem Lee
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Patent number: 11222893Abstract: A method includes the following operations: disconnecting at least one of drain regions that are formed on a first active area, of first transistors, from a first voltage; and disconnecting at least one of drain regions that are formed on a second active area, of second transistors coupled to the first transistors from a second voltage. The at least one of drain regions of the second transistors corresponds to the at least one of drain regions of the first transistors.Type: GrantFiled: July 29, 2019Date of Patent: January 11, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yi-Feng Chang, Po-Lin Peng, Jam-Wem Lee
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Patent number: 11127546Abstract: A keyboard includes an elastic element disposed above a bottom case, a light emitter, a light receiver, a pressing element, and a keycap. When a force toward the bottom case is applied to a top surface of the elastic element, a relationship between a force to move the top surface and a distance from the top surface to the bottom case is in a negative correlation in a path of the top surface from a first position to a second position, and a relationship between a force to move the top surface and a distance from the top surface to the bottom case is in a positive correlation in a path of the top surface from the second position to a third position. The light emitter, the light receiver, and the pressing element are disposed above the elastic element. The keycap is disposed above the pressing element.Type: GrantFiled: October 28, 2019Date of Patent: September 21, 2021Assignee: Chicony Electronics Co., Ltd.Inventors: Tao-Kuan Chen, Tzu-Chuan Liang, Yi-Feng Chang
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Patent number: 10930640Abstract: The present disclosure describes exemplary configurations and arrangements for various intelligent diodes. The intelligent diodes of the present disclosure can be implemented as part of electrostatic discharge protection circuitry to protect other electronic circuitry from the flow of electricity caused by electrostatic discharge events. The electrostatic discharge protection circuitry dissipates one or more unwanted transient signals which result from the electrostatic discharge event. In some situations, some carrier electrons and/or carrier holes can flow from intelligent diodes of the present disclosure into a semiconductor substrate. The exemplary configurations and arrangements described herein include various regions designed collect these carrier electrons and/or carrier holes to reduce the likelihood these carrier electrons and/or carrier holes cause latch-up of the other electronic circuitry.Type: GrantFiled: April 29, 2020Date of Patent: February 23, 2021Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yi-Feng Chang, Jam-Wem Lee, Li-Wei Chu, Po-Lin Peng
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Patent number: 10867987Abstract: An integrated circuit device with ESD protection includes a substrate with a well having a first conductivity type formed on the substrate. A drain region has at least one drain diffusion with a second conductivity type implanted in the well and at least one drain conductive insertion on the well. The drain conductive insertion is electrically connected to the drain diffusion and an I/O pad. A source region includes a plurality of source diffusions having the second conductivity type implanted in the well, and the source diffusions are electrically connected to a voltage terminal.Type: GrantFiled: September 29, 2017Date of Patent: December 15, 2020Inventors: Po-Lin Peng, Li-Wei Chu, Yi-Feng Chang, Jam-Wem Lee
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Publication number: 20200373255Abstract: A semiconductor device includes a substrate and a metallization layer. The substrate has an active region that includes opposite first and second edges. The metallization layer is disposed above the substrate, and includes a pair of metal lines and a metal plate. The metal lines extend from an outer periphery of the active region into the active region and toward the second edge of the active region. The metal plate interconnects the metal lines and at least a portion of which is disposed at the outer periphery of the active region.Type: ApplicationFiled: August 5, 2020Publication date: November 26, 2020Inventor: Yi-Feng Chang
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Publication number: 20200365531Abstract: A semiconductor device includes a substrate and a metallization layer. The substrate has an active region that includes opposite first and second edges. The metallization layer is disposed above the substrate, and includes a pair of metal lines and a metal plate. The metal lines extend from an outer periphery of the active region into the active region and toward the second edge of the active region. The metal plate interconnects the metal lines and at least a portion of which is disposed at the outer periphery of the active region.Type: ApplicationFiled: August 5, 2020Publication date: November 19, 2020Inventor: Yi-Feng Chang
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Publication number: 20200365349Abstract: A keyboard includes an elastic element disposed above a bottom case, a light emitter, a light receiver, a pressing element, and a keycap. When a force toward the bottom case is applied to a top surface of the elastic element, a relationship between a force to move the top surface and a distance from the top surface to the bottom case is in a negative correlation in a path of the top surface from a first position to a second position, and a relationship between a force to move the top surface and a distance from the top surface to the bottom case is in a positive correlation in a path of the top surface from the second position to a third position. The light emitter, the light receiver, and the pressing element are disposed above the elastic element. The keycap is disposed above the pressing element.Type: ApplicationFiled: October 28, 2019Publication date: November 19, 2020Inventors: Tao-Kuan CHEN, Tzu-Chuan LIANG, Yi-Feng CHANG
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Publication number: 20200365529Abstract: A semiconductor device includes a substrate and a metallization layer. The substrate has an active region that includes opposite first and second edges. The metallization layer is disposed above the substrate, and includes a pair of metal lines and a metal plate. The metal lines extend from an outer periphery of the active region into the active region and toward the second edge of the active region. The metal plate interconnects the metal lines and at least a portion of which is disposed at the outer periphery of the active region.Type: ApplicationFiled: August 3, 2020Publication date: November 19, 2020Inventor: Yi-Feng Chang
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Publication number: 20200258878Abstract: The present disclosure describes exemplary configurations and arrangements for various intelligent diodes. The intelligent diodes of the present disclosure can be implemented as part of electrostatic discharge protection circuitry to protect other electronic circuitry from the flow of electricity caused by electrostatic discharge events. The electrostatic discharge protection circuitry dissipates one or more unwanted transient signals which result from the electrostatic discharge event. In some situations, some carrier electrons and/or carrier holes can flow from intelligent diodes of the present disclosure into a semiconductor substrate. The exemplary configurations and arrangements described herein include various regions designed collect these carrier electrons and/or carrier holes to reduce the likelihood these carrier electrons and/or carrier holes cause latch-up of the other electronic circuitry.Type: ApplicationFiled: April 29, 2020Publication date: August 13, 2020Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yi-Feng CHANG, Jam-Wem LEE, Li-Wei CHU, Po-Lin PENG
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Patent number: 10734330Abstract: A semiconductor device includes a substrate and a metallization layer. The substrate has an active region that includes opposite first and second edges. The metallization layer is disposed above the substrate, and includes a pair of metal lines and a metal plate. The metal lines extend from an outer periphery of the active region into the active region and toward the second edge of the active region. The metal plate interconnects the metal lines and at least a portion of which is disposed at the outer periphery of the active region.Type: GrantFiled: January 30, 2015Date of Patent: August 4, 2020Assignee: Taiwan Semiconductor Manufacturing Company LimitedInventor: Yi-Feng Chang
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Patent number: 10643988Abstract: The present disclosure describes exemplary configurations and arrangements for various intelligent diodes. The intelligent diodes of the present disclosure can be implemented as part of electrostatic discharge protection circuitry to protect other electronic circuitry from the flow of electricity caused by electrostatic discharge events. The electrostatic discharge protection circuitry dissipates one or more unwanted transient signals which result from the electrostatic discharge event. In some situations, some carrier electrons and/or carrier holes can flow from intelligent diodes of the present disclosure into a semiconductor substrate. The exemplary configurations and arrangements described herein include various regions designed collect these carrier electrons and/or carrier holes to reduce the likelihood these carrier electrons and/or carrier holes cause latch-up of the other electronic circuitry.Type: GrantFiled: August 23, 2019Date of Patent: May 5, 2020Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yi-Feng Chang, Jam-Wem Lee, Li-Wei Chu, Po-Lin Peng
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Publication number: 20190378832Abstract: The present disclosure describes exemplary configurations and arrangements for various intelligent diodes. The intelligent diodes of the present disclosure can be implemented as part of electrostatic discharge protection circuitry to protect other electronic circuitry from the flow of electricity caused by electrostatic discharge events. The electrostatic discharge protection circuitry dissipates one or more unwanted transient signals which result from the electrostatic discharge event. In some situations, some carrier electrons and/or carrier holes can flow from intelligent diodes of the present disclosure into a semiconductor substrate. The exemplary configurations and arrangements described herein include various regions designed collect these carrier electrons and/or carrier holes to reduce the likelihood these carrier electrons and/or carrier holes cause latch-up of the other electronic circuitry.Type: ApplicationFiled: August 23, 2019Publication date: December 12, 2019Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yi-Feng CHANG, Jam-Wem LEE, Li-Wei CHU, Po-Lin PENG
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Publication number: 20190348416Abstract: A method includes the following operations: disconnecting at least one of drain regions that are formed on a first active area, of first transistors, from a first voltage; and disconnecting at least one of drain regions that are formed on a second active area, of second transistors coupled to the first transistors from a second voltage. The at least one of drain regions of the second transistors corresponds to the at least one of drain regions of the first transistors.Type: ApplicationFiled: July 29, 2019Publication date: November 14, 2019Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yi-Feng CHANG, Po-Lin PENG, Jam-Wem LEE
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Patent number: 10411005Abstract: The present disclosure describes exemplary configurations and arrangements for various intelligent diodes. The intelligent diodes of the present disclosure can be implemented as part of electrostatic discharge protection circuitry to protect other electronic circuitry from the flow of electricity caused by electrostatic discharge events. The electrostatic discharge protection circuitry dissipates one or more unwanted transient signals which result from the electrostatic discharge event. In some situations, some carrier electrons and/or carrier holes can flow from intelligent diodes of the present disclosure into a semiconductor substrate. The exemplary configurations and arrangements described herein include various regions designed collect these carrier electrons and/or carrier holes to reduce the likelihood these carrier electrons and/or carrier holes cause latch-up of the other electronic circuitry.Type: GrantFiled: March 28, 2018Date of Patent: September 10, 2019Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yi-Feng Chang, Jam-Wem Lee, Li-Wei Chu, Po-Lin Peng
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Patent number: 10396021Abstract: A fabrication method of a layer structure for mounting a semiconductor device is provided, which includes the steps of: providing a base material, wherein the base material has a conductive layer having a first surface having a plurality of first conductive elements and an opposite second surface having a plurality of second conductive elements, and a first encapsulant formed on the first surface of the conductive layer for encapsulating the first conductive elements; partially removing the conductive layer to form a circuit layer that electrically connects the first conductive elements and the second conductive elements; and forming a second encapsulant on a bottom surface of the first encapsulant for encapsulating the circuit layer and the second conductive elements, thus reducing the fabrication difficulty and increasing the product yield.Type: GrantFiled: April 11, 2018Date of Patent: August 27, 2019Assignee: Siliconware Precision Industries Co., Ltd.Inventors: Fang-Lin Tsai, Yi-Feng Chang, Cheng-Jen Liu, Yi-Min Fu, Hung-Chi Chen
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Patent number: 10366992Abstract: A semiconductor device includes a first active area of a first type, a second active area of a second type, and a plurality of gates. The gates are arranged above and across the first active area and the second active area. At a first side of a first gate of the plurality of gates, a first region of the first active area is configured to receive a first voltage and a first region of the second active area is configured to receive a second voltage. At a second side of the first gate, a second region of the first active area is disconnected from the first voltage and a second region of the second active area is disconnected from the second voltage.Type: GrantFiled: August 30, 2017Date of Patent: July 30, 2019Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yi-Feng Chang, Po-Lin Peng, Jam-Wem Lee
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Publication number: 20190148355Abstract: The present disclosure describes exemplary configurations and arrangements for various intelligent diodes. The intelligent diodes of the present disclosure can be implemented as part of electrostatic discharge protection circuitry to protect other electronic circuitry from the flow of electricity caused by electrostatic discharge events. The electrostatic discharge protection circuitry dissipates one or more unwanted transient signals which result from the electrostatic discharge event. In some situations, some carrier electrons and or carrier holes can flow from intelligent diodes of the present disclosure into a semiconductor substrate. The exemplary configurations and arrangements described herein include various regions designed collect these carrier electrons and/or carrier holes to reduce the likelihood these carrier electrons and/or carrier holes cause latch-up of the other electronic circuitry.Type: ApplicationFiled: March 28, 2018Publication date: May 16, 2019Applicant: Taiwan Semiconductor Manufactruring Co., Ltd.Inventors: Yi-Feng CHANG, Jam-Wem Lee, Li-Wei Chu, Po-Lin Peng
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Publication number: 20190123038Abstract: A device comprises a high voltage n well and a high voltage p well over a buried layer, a first low voltage n well over the high voltage n well, wherein a bottom portion of the first low voltage n well is surrounded by the high voltage n well, an N+ region over the first low voltage n well, a second low voltage n well and a low voltage p well over the high voltage p well, a first P+ region over the second low voltage n well and a second P+ region over the low voltage p well.Type: ApplicationFiled: December 20, 2018Publication date: April 25, 2019Inventors: Yi-Feng Chang, Jam-Wem Lee
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Publication number: 20190103395Abstract: An integrated circuit device with ESD protection includes a substrate with a well having a first conductivity type formed on the substrate. A drain region has at least one drain diffusion with a second conductivity type implanted in the well and at least one drain conductive insertion on the well. The drain conductive insertion is electrically connected to the drain diffusion and an I/O pad. A source region includes a plurality of source diffusions having the second conductivity type implanted in the well, and the source diffusions are electrically connected to a voltage terminal.Type: ApplicationFiled: September 29, 2017Publication date: April 4, 2019Inventors: Po-Lin Peng, Li-Wei Chu, Yi-Feng Chang, Jam-Wem Lee