Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.

Abstract: In one example, a video encoder divides a superblock of a video frame into subblocks. The dividing includes dividing the superblock according to a first and second partitioning schemes to generate a first and second combination of subblocks, respectively. The number of non-zero residuals in each subblock in the first and second combinations of subblocks is less than a corresponding threshold set for a size of the subblock. The encoder determines the subblocks for the superblock as the first combination of subblocks based on a first cost value associated with the first combination of subblocks being lower than a second cost value associated with the second combination of subblocks. The encoder further encodes the superblock into a video bitstream representing the video by encoding the subblocks.

Abstract: A method for generating metrology sampling scheme for a patterning process, the method including: obtaining a parameter map of a parameter of a patterning process for a substrate; decomposing the parameter map to generate a fingerprint specific to an apparatus of the patterning process and/or a combination of apparatuses of the patterning process; and based on the fingerprint, generating a metrology sampling scheme for a subsequent substrate at the apparatus of the patterning process and/or the combination of apparatuses of the patterning process, wherein the sampling scheme is configured to distribute sampling points on the subsequent substrate so as to improve a metrology sampling density.

Abstract: A computer implemented method of determining a placement metric relating to placement of one or more features on a substrate in a lithographic process. The method includes obtaining setup data including placement error contributor data relating to a plurality of placement error contributor parameters and yield data representative of yield and defining a statistical model for predicting a yield metric, the statistical model being based on a placement metric, the placement metric being a function of the placement error contributor parameters, and associated model coefficients. The model coefficients are fitted based on the setup data, and the placement metric determined from the fitted model coefficients.

Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage media related to multi-stream video encoding for screen sharing a communications session. The system may determine an active pixel area and a remaining pixel area of a video region. of a video region. A first video stream of the active pixel area is generated at a first frame rate. A second video stream of the remaining pixel area is generated at second frame rate, where the second frame rate is a frame rate lower than the first frame rate. A client device may transmit the first video stream and the second video stream to a second client device.

Abstract: In some implementations, a system may receive an audio stream associated with a call between a user and an agent. The system may process, by the device and using a speech alteration model, speech from a first channel of the audio stream to alter the speech from having a first speech characteristic to having a second speech characteristic, wherein the speech alteration model is trained based on reference audio data associated with the first speech characteristic and the second speech characteristic and based on reference speech data associated with the first speech characteristic and the second speech characteristic. The system may extract the speech from the first channel that has the first speech characteristic. The system may provide, within a second channel of the audio stream, altered speech that corresponds to the speech and that has the first speech characteristic.

Abstract: A method for generating metrology sampling scheme for a patterning process, the method including: obtaining a parameter map of a parameter of a patterning process for a substrate; decomposing the parameter map to generate a fingerprint specific to an apparatus of the patterning process and/or a combination of apparatuses of the patterning process; and based on the fingerprint, generating a metrology sampling scheme for a subsequent substrate at the apparatus of the patterning process and/or the combination of apparatuses of the patterning process, wherein the sampling scheme is configured to distribute sampling points on the subsequent substrate so as to improve a metrology sampling density.

Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage media for fast search of transform kernel selection. A set of transform kernels are selected. Multiple images are encoded via the AV1 coded using the selected transform kernels. The encoded images are transmitted to another computing device.

Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage media related to multi-stream video encoding for screen sharing a communications session. The system may determine an active pixel area and a remaining pixel area of a video region. of a video region. A first video stream of the active pixel area is generated at a first frame rate. A second video stream of the remaining pixel area is generated at second frame rate, where the second frame rate is a frame rate lower than the first frame rate. A client device may transmit the first video stream and the second video stream to a second client device.

Abstract: An esterification method for improving the dispersibility of a hydroxyl-containing nano-material is disclosed herein. The method comprises: S1, thoroughly stirring and uniformly mixing a hydroxyl-containing nano-material precursor and an organic solvent to obtain a mixture; S2, heating and fully pre-reacting the mixture in step S1; and S3, adding an acyl halide to the solution which is heated and fully pre-reacted in step S2, and then further reacting same to finally obtain a surface-modified hydroxyl-containing nano-material.

Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage media related to multi-stream video encoding for screen sharing a communications session. The system may determine an active pixel area and a remaining pixel area of a video region. of a video region. A first video stream of the active pixel area is generated at a first frame rate. A second video stream of the remaining pixel area is generated at second frame rate, where the second frame rate is a frame rate lower than the first frame rate. A client device may transmit the first video stream and the second video stream to a second client device.

Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage media related to multi-stream video encoding for screen sharing a communications session. The system may determine a sub-area and a remaining area of a display region. A first video stream of the sub-area is generated at a first frame rate. A second video stream of the remaining area is generated at second frame rate, where the second frame rate is a frame rate lower than the first frame rate. A client device may transmit the first video stream and the second video stream to a second client device.

Abstract: A method for generating metrology sampling scheme for a patterning process, the method including: obtaining a parameter map of a parameter of a patterning process for a substrate; decomposing the parameter map to generate a fingerprint specific to an apparatus of the patterning process and/or a combination of apparatuses of the patterning process; and based on the fingerprint, generating a metrology sampling scheme for a subsequent substrate at the apparatus of the patterning process and/or the combination of apparatuses of the patterning process, wherein the sampling scheme is configured to distribute sampling points on the subsequent substrate so as to improve a metrology sampling density.

Abstract: Embodiments described herein may provide devices, systems, methods, and/or computer readable medium for adverse event detection and severity estimation in surgical videos. The system can train multiple models for adverse detection and severity estimation. The system can load selected models for real-time adverse event detection and severity estimation.

Abstract: A method for generating metrology sampling scheme for a patterning process, the method including: obtaining a parameter map of a parameter of a patterning process for a substrate; decomposing the parameter map to generate a fingerprint specific to an apparatus of the patterning process and/or a combination of apparatuses of the patterning process; and based on the fingerprint, generating a metrology sampling scheme for a subsequent substrate at the apparatus of the patterning process and/or the combination of apparatuses of the patterning process, wherein the sampling scheme is configured to distribute sampling points on the subsequent substrate so as to improve a metrology sampling density.

Abstract: In some implementations, a system may receive an audio stream associated with a call between a user and an agent. The system may process, by the device and using a speech alteration model, speech from a first channel of the audio stream to alter the speech from having a first speech characteristic to having a second speech characteristic, wherein the speech alteration model is trained based on reference audio data associated with the first speech characteristic and the second speech characteristic and based on reference speech data associated with the first speech characteristic and the second speech characteristic. The system may extract the speech from the first channel that has the first speech characteristic. The system may provide, within a second channel of the audio stream, altered speech that corresponds to the speech and that has the first speech characteristic.

Abstract: In some implementations, a system may receive an audio stream associated with a call between a user and an agent. The system may analyze the audio stream to identify a trigger associated with the type of information. The system may monitor, based on identifying the trigger in a first section of the audio stream, a second section of the audio stream for audio content that identifies user information associated with the user. The system may identify a subsection of the second section that includes the audio content, wherein the subsection is identified based on a characteristic of the audio content and the type of information. The system may alter an audio characteristic of the subsection to prevent the agent from receiving the user information via the audio stream.

Abstract: A device for realizing surface cleaning of an optical element by ion wind and electrostatic coupling, comprising a fixing support, an optical element, an ion wind system, an electrostatic adsorption system, and a particle contaminant storage box; the ion wind system comprises an air knife, an ion bar, an ion bar support, a connecting sheet, and a three-degree-of-freedom combined displacement stage; the electrostatic adsorption system comprises rod-shaped electrodes, electrode fixing supports and a manual displacement stage; the particle contaminant storage box is connected to a working surface by means of storage box supports, and an included angle between the particle contaminant storage box and the storage box supports is 135 degrees.

Abstract: A method for determining lithographic matching performance includes obtaining first monitoring data from recurrent monitoring for stability control for an available EUV scanner. For a DUV scanner, second monitoring data is similarly obtained from recurrent monitoring for stability control. The EUV first monitoring data are in a first layout. The DUV second monitoring data are in a second layout. A cross-platform overlay matching performance between the first lithographic apparatus and the second lithographic apparatus is determined based on the first monitoring data and the second monitoring data. This is done by reconstructing the first and/or second monitoring data into a common layout to allow comparison of the first and second monitoring data.

Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.