Abstract: A ferroelectric memory includes at least one storage cell. Each storage cell includes a transistor, a first ferroelectric capacitor, and at least one voltage divider capacitor. The transistor includes a gate electrode, a source electrode, and a drain electrode. One electrode of the first ferroelectric capacitor is connected to the gate electrode. The other electrode of the first ferroelectric capacitor is connected to a word line. One electrode of each voltage divider capacitor in the at least one voltage divider capacitor is connected to the gate electrode, and the other electrode of each voltage divider capacitor in the at least one voltage divider capacitor is connected to the source electrode.

Abstract: The disclosure provides a touch module, a touch display panel and a display device. Each touch electrode includes a plurality of electrode blocks arranged along an extending direction, and electrode blocks belonging to other touch electrodes are distributed in an area where at least part of all the electrode blocks are located, which makes full use of an interior area of a traditional touch pattern and increases a coupling area between the touch electrodes. When touch occurs, an amount of change in a mutual capacitance value between the touch electrodes will be significantly increased, thereby increasing touch sensitivity.

Abstract: An esterification method for improving the dispersibility of a hydroxyl-containing nano-material is disclosed herein. The method comprises: S1, thoroughly stirring and uniformly mixing a hydroxyl-containing nano-material precursor and an organic solvent to obtain a mixture; S2, heating and fully pre-reacting the mixture in step S1; and S3, adding an acyl halide to the solution which is heated and fully pre-reacted in step S2, and then further reacting same to finally obtain a surface-modified hydroxyl-containing nano-material.

Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage media related to multi-stream video encoding for screen sharing a communications session. The system may determine an active pixel area and a remaining pixel area of a video region. of a video region. A first video stream of the active pixel area is generated at a first frame rate. A second video stream of the remaining pixel area is generated at second frame rate, where the second frame rate is a frame rate lower than the first frame rate. A client device may transmit the first video stream and the second video stream to a second client device.

Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage media related to multi-stream video encoding for screen sharing a communications session. The system may determine a sub-area and a remaining area of a display region. A first video stream of the sub-area is generated at a first frame rate. A second video stream of the remaining area is generated at second frame rate, where the second frame rate is a frame rate lower than the first frame rate. A client device may transmit the first video stream and the second video stream to a second client device.

Abstract: A method for generating metrology sampling scheme for a patterning process, the method including: obtaining a parameter map of a parameter of a patterning process for a substrate; decomposing the parameter map to generate a fingerprint specific to an apparatus of the patterning process and/or a combination of apparatuses of the patterning process; and based on the fingerprint, generating a metrology sampling scheme for a subsequent substrate at the apparatus of the patterning process and/or the combination of apparatuses of the patterning process, wherein the sampling scheme is configured to distribute sampling points on the subsequent substrate so as to improve a metrology sampling density.

Abstract: Embodiments described herein may provide devices, systems, methods, and/or computer readable medium for adverse event detection and severity estimation in surgical videos. The system can train multiple models for adverse detection and severity estimation. The system can load selected models for real-time adverse event detection and severity estimation.

Abstract: A method for generating metrology sampling scheme for a patterning process, the method including: obtaining a parameter map of a parameter of a patterning process for a substrate; decomposing the parameter map to generate a fingerprint specific to an apparatus of the patterning process and/or a combination of apparatuses of the patterning process; and based on the fingerprint, generating a metrology sampling scheme for a subsequent substrate at the apparatus of the patterning process and/or the combination of apparatuses of the patterning process, wherein the sampling scheme is configured to distribute sampling points on the subsequent substrate so as to improve a metrology sampling density.

Abstract: In some implementations, a system may receive an audio stream associated with a call between a user and an agent. The system may analyze the audio stream to identify a trigger associated with the type of information. The system may monitor, based on identifying the trigger in a first section of the audio stream, a second section of the audio stream for audio content that identifies user information associated with the user. The system may identify a subsection of the second section that includes the audio content, wherein the subsection is identified based on a characteristic of the audio content and the type of information. The system may alter an audio characteristic of the subsection to prevent the agent from receiving the user information via the audio stream.

Abstract: In some implementations, a system may receive an audio stream associated with a call between a user and an agent. The system may process, by the device and using a speech alteration model, speech from a first channel of the audio stream to alter the speech from having a first speech characteristic to having a second speech characteristic, wherein the speech alteration model is trained based on reference audio data associated with the first speech characteristic and the second speech characteristic and based on reference speech data associated with the first speech characteristic and the second speech characteristic. The system may extract the speech from the first channel that has the first speech characteristic. The system may provide, within a second channel of the audio stream, altered speech that corresponds to the speech and that has the first speech characteristic.

Abstract: A device for realizing surface cleaning of an optical element by ion wind and electrostatic coupling, comprising a fixing support, an optical element, an ion wind system, an electrostatic adsorption system, and a particle contaminant storage box; the ion wind system comprises an air knife, an ion bar, an ion bar support, a connecting sheet, and a three-degree-of-freedom combined displacement stage; the electrostatic adsorption system comprises rod-shaped electrodes, electrode fixing supports and a manual displacement stage; the particle contaminant storage box is connected to a working surface by means of storage box supports, and an included angle between the particle contaminant storage box and the storage box supports is 135 degrees.

Abstract: A method for determining lithographic matching performance includes obtaining first monitoring data from recurrent monitoring for stability control for an available EUV scanner. For a DUV scanner, second monitoring data is similarly obtained from recurrent monitoring for stability control. The EUV first monitoring data are in a first layout. The DUV second monitoring data are in a second layout. A cross-platform overlay matching performance between the first lithographic apparatus and the second lithographic apparatus is determined based on the first monitoring data and the second monitoring data. This is done by reconstructing the first and/or second monitoring data into a common layout to allow comparison of the first and second monitoring data.

Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.

Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.

Abstract: A method of determining a sampling control scheme and/or a processing control scheme for substrates processed by a device. The method uses a fingerprint model and an evolution model to generate the control scheme. The fingerprint model is based on fingerprint data for a processing parameter of at least one substrate processed by a device, and the evolution model represents variation of the fingerprint data over time. The fingerprint model and the evolution model are analyzed and a sampling and/or processing control scheme is generated using the analysis. The sampling control scheme provides an indication for where and when to take measurements on substrates processed by the device. The processing control scheme provides an indication for how to control the processing of the substrate. Also, there is provided a method of determining which of multiple devices contributed to a fingerprint of a processing parameter.

Abstract: A method for determining an image-metric of features on a substrate, the method including: obtaining a first image of a plurality of features on a substrate; obtaining one or more further images of a corresponding plurality of features on the substrate, wherein at least one of the one or more further images is of a different layer of the substrate than the first image; generating aligned versions of the first and one or more further images by performing an alignment process on the first and one or more further images; and calculating an image-metric in dependence on a comparison of the features in the aligned version of the first image and the corresponding features in the one or more aligned versions of the one or more further images.

Abstract: A method of determining a sampling control scheme and/or a processing control scheme for substrates processed by a device. The method uses a fingerprint model and an evolution model to generate the control scheme. The fingerprint model is based on fingerprint data for a processing parameter of at least one substrate processed by a device, and the evolution model represents variation of the fingerprint data over time. The fingerprint model and the evolution model are analyzed and a sampling and/or processing control scheme is generated using the analysis. The sampling control scheme provides an indication for where and when to take measurements on substrates processed by the device. The processing control scheme provides an indication for how to control the processing of the substrate. Also, there is provided a method of determining which of multiple devices contributed to a fingerprint of a processing parameter.

Abstract: A device manufacturing method includes: exposing a first substrate using a lithographic apparatus to form a patterned layer having first features; processing the first substrate to transfer the first features into the first substrate; determining displacements of the first features from their nominal positions in the first substrate; determining a correction to at least partly compensate for the displacements; and exposing a second substrate using a lithographic apparatus to form a patterned layer having the first features, wherein the correction is applied for or during the exposing the second substrate.