Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.

Abstract: A method of determining a sampling control scheme and/or a processing control scheme for substrates processed by a device. The method uses a fingerprint model and an evolution model to generate the control scheme. The fingerprint model is based on fingerprint data for a processing parameter of at least one substrate processed by a device, and the evolution model represents variation of the fingerprint data over time. The fingerprint model and the evolution model are analyzed and a sampling and/or processing control scheme is generated using the analysis. The sampling control scheme provides an indication for where and when to take measurements on substrates processed by the device. The processing control scheme provides an indication for how to control the processing of the substrate. Also, there is provided a method of determining which of multiple devices contributed to a fingerprint of a processing parameter.

Abstract: A method for determining an image-metric of features on a substrate, the method including: obtaining a first image of a plurality of features on a substrate; obtaining one or more further images of a corresponding plurality of features on the substrate, wherein at least one of the one or more further images is of a different layer of the substrate than the first image; generating aligned versions of the first and one or more further images by performing an alignment process on the first and one or more further images; and calculating an image-metric in dependence on a comparison of the features in the aligned version of the first image and the corresponding features in the one or more aligned versions of the one or more further images.

Abstract: A method of determining a sampling control scheme and/or a processing control scheme for substrates processed by a device. The method uses a fingerprint model and an evolution model to generate the control scheme. The fingerprint model is based on fingerprint data for a processing parameter of at least one substrate processed by a device, and the evolution model represents variation of the fingerprint data over time. The fingerprint model and the evolution model are analyzed and a sampling and/or processing control scheme is generated using the analysis. The sampling control scheme provides an indication for where and when to take measurements on substrates processed by the device. The processing control scheme provides an indication for how to control the processing of the substrate. Also, there is provided a method of determining which of multiple devices contributed to a fingerprint of a processing parameter.

Abstract: A device manufacturing method includes: exposing a first substrate using a lithographic apparatus to form a patterned layer having first features; processing the first substrate to transfer the first features into the first substrate; determining displacements of the first features from their nominal positions in the first substrate; determining a correction to at least partly compensate for the displacements; and exposing a second substrate using a lithographic apparatus to form a patterned layer having the first features, wherein the correction is applied for or during the exposing the second substrate.

Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.

Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.

Abstract: Microneedle and microneedle devices including implantable silk-based tips for sustained dermal delivery of a vaccine, kits, as well as methods of manufacturing and using the same are described herein. In other embodiments, compositions and methods for controlled- or sustained-administration of a vaccine (e.g., an influenza vaccine) to provide improved immunogenicity and/or broad-spectrum immunity to a subject are also described.

Abstract: A method for generating metrology sampling scheme for a patterning process, the method including: obtaining a parameter map of a parameter of a patterning process for a substrate; decomposing the parameter map to generate a fingerprint specific to an apparatus of the patterning process and/or a combination of apparatuses of the patterning process; and based on the fingerprint, generating a metrology sampling scheme for a subsequent substrate at the apparatus of the patterning process and/or the combination of apparatuses of the patterning process, wherein the sampling scheme is configured to distribute sampling points on the subsequent substrate so as to improve a metrology sampling density.

Abstract: Embodiments described herein may provide devices, systems, methods, and/or computer readable medium for adverse event detection and severity estimation in surgical videos. The system can train multiple models for adverse detection and severity estimation. The system can load selected models for real-time adverse event detection and severity estimation.

Abstract: Disclosed are a method and device for generating a predicted picture, the method comprising: determining a reference rectangular block of pixels by shifting or warping parameter information which includes a location of a target rectangular block of pixels, or the parameter information comprises a location of a target rectangular block of pixels and depth information of a reference view; mapping the reference rectangular block of pixels to a target view according to the depth information of the reference view to obtain a projection rectangular block of pixels; and acquiring a predicted picture block from the projection rectangular block of pixels.

Abstract: A device manufacturing method includes: exposing a first substrate using a lithographic apparatus to form a patterned layer having first features; processing the first substrate to transfer the first features into the first substrate; determining displacements of the first features from their nominal positions in the first substrate; determining a correction to at least partly compensate for the displacements; and exposing a second substrate using a lithographic apparatus to form a patterned layer having the first features, wherein the correction is applied for or during the exposing the second substrate.

Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.

Abstract: Disclosed are a method and device for generating a predicted picture, the method comprising: determining a reference rectangular block of pixels by shifting or warping parameter information which includes a location of a target rectangular block of pixels, or the parameter information comprises a location of a target rectangular block of pixels and depth information of a reference view; mapping the reference rectangular block of pixels to a target view according to the depth information of the reference view to obtain a projection rectangular block of pixels; and acquiring a predicted picture block from the projection rectangular block of pixels.

Abstract: Disclosed are a method and device for generating a predicted picture, the method comprising: determining a reference rectangular block of pixels according to parameter information which includes a location of a target rectangular block of pixels and/or depth information of a reference view; mapping the reference rectangular block of pixels to a target view according to the depth information of the reference view to obtain a projection rectangular block of pixels; and acquiring a predicted picture block from the projection rectangular block of pixels. The technical problem of relatively large dependence among the data brought by simultaneously employing the depth picture of the target view and the depth picture of the reference view in the process of generating the predicted picture in the prior art is solved, and the technical effects of reducing the dependence on the data and improving the encoding and decoding efficiency is achieved.

Abstract: Disclosed are a method and device for generating a predicted picture, the method comprising: determining a reference rectangular block of pixels according to parameter information which includes a location of a target rectangular block of pixels and/or depth information of a reference view; mapping the reference rectangular block of pixels to a target view according to the depth information of the reference view to obtain a projection rectangular block of pixels; and acquiring a predicted picture block from the projection rectangular block of pixels. The technical problem of relatively large dependence among the data brought by simultaneously employing the depth picture of the target view and the depth picture of the reference view in the process of generating the predicted picture in the prior art is solved, and the technical effects of reducing the dependence on the data and improving the encoding and decoding efficiency is achieved.