Patents by Inventor Ying-Hao Wang
Ying-Hao Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220032049Abstract: A microneedle electroporation device is provided, including a housing, a positioning member, an intermediate plate, a first microneedle assembly, a second microneedle assembly, a socket, a first wire, and a second wire. The positioning member is connected to the housing and the intermediate plate. The intermediate plate includes a plurality of first holes and a plurality of second holes. The first microneedle assembly includes a plurality of first microneedles and a first metal connecting portion connected to the first microneedles. The first microneedles pass through the first holes. The second microneedle assembly includes a plurality of second microneedles and a second metal connecting portion connected to the second microneedles. The second microneedles pass through the second holes. The first microneedle assembly and the second microneedle assembly are electrically independent of each other. The first wire connects the socket to the first metal connecting portion.Type: ApplicationFiled: June 29, 2021Publication date: February 3, 2022Inventors: Bo-Kai CHAO, Ying-Hao WANG, Jui-Hung TSAI, Chih-Hao HSU
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Patent number: 11112353Abstract: A residual toxicant detection device for testing residual toxicant in an aqueous solution is disclosed, which includes a first space cavity, a second space cavity, a connecting frame and a sensing cavity. The first space cavity includes a light source and a lens. The second space cavity includes a photo sensor and a circuit module. The connecting frame is configured to connect the first space cavity and the second space cavity. The sensing cavity for receiving an aqueous solution is formed between the first space cavity and the second space cavity and at one side of the connecting frame. The light source emits a light with a wavelength range. The photo sensor receives the sensing signal of the light passing through the sensing cavity. The circuit module is configured to calculate the absorbance and the variation in absorbance of the residual toxicants in the aqueous solution.Type: GrantFiled: December 27, 2019Date of Patent: September 7, 2021Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Chih-Hao Hsu, Jui-Hung Tsai, Ying-Hao Wang, Chia-Jung Chang
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Publication number: 20210156791Abstract: A residual toxicant detection device for testing residual toxicant in an aqueous solution is disclosed, which includes a first space cavity, a second space cavity, a connecting frame and a sensing cavity. The first space cavity includes a light source and a lens. The second space cavity includes a photo sensor and a circuit module. The connecting frame is configured to connect the first space cavity and the second space cavity. The sensing cavity for receiving an aqueous solution is formed between the first space cavity and the second space cavity and at one side of the connecting frame. The light source emits a light with a wavelength range. The photo sensor receives the sensing signal of the light passing through the sensing cavity. The circuit module is configured to calculate the absorbance and the variation in absorbance of the residual toxicants in the aqueous solution.Type: ApplicationFiled: December 27, 2019Publication date: May 27, 2021Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Chih-Hao HSU, Jui-Hung TSAI, Ying-Hao WANG, Chia-Jung CHANG
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Patent number: 10739682Abstract: Various embodiments of the present application are directed towards an edge-exposure tool with a light emitting diode (LED), as well as a method for edge exposure using a LED. In some embodiments, the edge-exposure tool comprises a process chamber, a workpiece table, a LED, and a controller. The workpiece table is in the process chamber and is configured to support a workpiece covered by a photosensitive layer. The LED is in the process chamber and is configured to emit radiation towards the workpiece. A controller is configured to control the LED to expose an edge portion of the photosensitive layer, but not a center portion of the photosensitive layer, to the radiation emitted by the LED. The edge portion of the photosensitive layer extends along an edge of the workpiece in a closed path to enclose the center portion of the photosensitive layer.Type: GrantFiled: November 25, 2019Date of Patent: August 11, 2020Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Ying-Hao Wang, Chia-Chi Chung, Han-Chih Chung, Yu-Xiang Lin, Yu-Shine Lin, Yu-Hen Wu, Han Wen Hsu
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Publication number: 20200192713Abstract: Methods, non-transitory machine readable media, and computing devices that more efficiently and effectively manage storage quota enforcement are disclosed. With this technology, a quota ticket comprising a tally generation number (TGN) and a local allowed usage amount (AUA) are obtained. The local AUA comprises a portion of a global AUA associated with a quota rule. The local AUA is increased following receipt of another portion of the global AUA in a response from a cluster peer, when another TGN in the response matches the TGN and the local AUA is insufficient to execute a received storage operation associated with the quota rule. The local AUA is decreased by an amount corresponding to, and following execution of, the storage operation, when the increased local AUA is sufficient to execute the storage operation.Type: ApplicationFiled: September 20, 2019Publication date: June 18, 2020Inventors: Xin Wang, Keith Allen Bare, II, Ying-Hao Wang, Jonathan Westley Moody, Bradley Raymond Lisson, Richard Wight, David Loren Rose, Richard P. Jernigan, IV, Daniel Tennant
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Publication number: 20200089120Abstract: Various embodiments of the present application are directed towards an edge-exposure tool with a light emitting diode (LED), as well as a method for edge exposure using a LED. In some embodiments, the edge-exposure tool comprises a process chamber, a workpiece table, a LED, and a controller. The workpiece table is in the process chamber and is configured to support a workpiece covered by a photosensitive layer. The LED is in the process chamber and is configured to emit radiation towards the workpiece. A controller is configured to control the LED to expose an edge portion of the photosensitive layer, but not a center portion of the photosensitive layer, to the radiation emitted by the LED. The edge portion of the photosensitive layer extends along an edge of the workpiece in a closed path to enclose the center portion of the photosensitive layer.Type: ApplicationFiled: November 25, 2019Publication date: March 19, 2020Inventors: Ying-Hao Wang, Chia-Chi Chung, Han-Chih Chung, Yu-Xiang Lin, Yu-Shine Lin, Yu-Hen Wu, Han Wen Hsu
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Patent number: 10509323Abstract: Various embodiments of the present application are directed towards an edge-exposure tool with a light emitting diode (LED), as well as a method for edge exposure using a LED. In some embodiments, the edge-exposure tool comprises a process chamber, a workpiece table, a LED, and a controller. The workpiece table is in the process chamber and is configured to support a workpiece covered by a photosensitive layer. The LED is in the process chamber and is configured to emit radiation towards the workpiece. A controller is configured to control the LED to expose an edge portion of the photosensitive layer, but not a center portion of the photosensitive layer, to the radiation emitted by the LED. The edge portion of the photosensitive layer extends along an edge of the workpiece in a closed path to enclose the center portion of the photosensitive layer.Type: GrantFiled: April 23, 2019Date of Patent: December 17, 2019Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Ying-Hao Wang, Chia-Chi Chung, Han-Chih Chung, Yu-Xiang Lin, Yu-Shine Lin, Yu-Hen Wu, Han Wen Hsu
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Publication number: 20190259710Abstract: The present disclosure relates a lithographic substrate marking tool. The tool includes a first electromagnetic radiation source disposed within a housing and configured to generate a first type of electromagnetic radiation. A radiation guide is configured to provide the first type of electromagnetic radiation to a photosensitive material over a substrate. A second electromagnetic radiation source is disposed within the housing and is configured to generate a second type of electromagnetic radiation that is provided to the photosensitive material.Type: ApplicationFiled: May 3, 2019Publication date: August 22, 2019Inventors: Hu-Wei Lin, Chih-Hsien Hsu, Yu-Wei Chiu, Hai-Yin Chen, Ying-Hao Wang, Yu-Hen Wu
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Publication number: 20190250513Abstract: Various embodiments of the present application are directed towards an edge-exposure tool with a light emitting diode (LED), as well as a method for edge exposure using a LED. In some embodiments, the edge-exposure tool comprises a process chamber, a workpiece table, a LED, and a controller. The workpiece table is in the process chamber and is configured to support a workpiece covered by a photosensitive layer. The LED is in the process chamber and is configured to emit radiation towards the workpiece. A controller is configured to control the LED to expose an edge portion of the photosensitive layer, but not a center portion of the photosensitive layer, to the radiation emitted by the LED. The edge portion of the photosensitive layer extends along an edge of the workpiece in a closed path to enclose the center portion of the photosensitive layer.Type: ApplicationFiled: April 23, 2019Publication date: August 15, 2019Inventors: Ying-Hao Wang, Chia-Chi Chung, Han-Chih Chung, Yu-Xiang Lin, Yu-Shine Lin, Yu-Hen Wu, Han Wen Hsu
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Patent number: 10295909Abstract: Various embodiments of the present application are directed towards an edge-exposure tool with a light emitting diode (LED), as well as a method for edge exposure using a LED. In some embodiments, the edge-exposure tool comprises a process chamber, a workpiece table, a LED, and a controller. The workpiece table is in the process chamber and is configured to support a workpiece covered by a photosensitive layer. The LED is in the process chamber and is configured to emit radiation towards the workpiece. A controller is configured to control the LED to expose an edge portion of the photosensitive layer, but not a center portion of the photosensitive layer, to the radiation emitted by the LED. The edge portion of the photosensitive layer extends along an edge of the workpiece in a closed path to enclose the center portion of the photosensitive layer.Type: GrantFiled: February 23, 2018Date of Patent: May 21, 2019Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Ying-Hao Wang, Chia-Chi Chung, Han-Chih Chung, Yu-Xiang Lin, Yu-Shine Lin, Yu-Hen Wu, Han Wen Hsu
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Patent number: 10283456Abstract: In some embodiments, the present disclosure relates a lithographic substrate marking tool. The lithographic substrate marking tool has a first lithographic exposure tool arranged within a shared housing and configured to generate a first type of electromagnetic radiation during a plurality of exposures. A mobile reticle has a plurality of different reticle fields respectively configured to block a portion of the first type of electromagnetic radiation to expose a substrate identification mark within a photosensitive material overlying a semiconductor substrate. A transversal element is configured to move the mobile reticle so that separate ones of the plurality of reticle fields are exposed onto the photosensitive material during separate ones of the plurality of exposures.Type: GrantFiled: May 13, 2016Date of Patent: May 7, 2019Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Hu-Wei Lin, Chih-Hsien Hsu, Yu-Wei Chiu, Hai-Yin Chen, Ying-Hao Wang, Yu-Hen Wu
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Patent number: 10283457Abstract: The present disclosure relates a method of forming substrate identification marks. In some embodiments, the method may be performed by forming a photosensitive material over a substrate. A first type of electromagnetic radiation is selectively provided to the photosensitive material to expose a plurality of substrate identification marks within the photosensitive material, and a second type of electromagnetic radiation is selectively provided to the photosensitive material to expose one or more alignment marks within the photosensitive material. Exposed portions of the photosensitive material are removed to form a patterned photosensitive material. The substrate is etched according to the patterned photosensitive material to form recesses within the substrate that are defined by the plurality of substrate identification marks and the one or more alignment marks.Type: GrantFiled: August 28, 2018Date of Patent: May 7, 2019Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Hu-Wei Lin, Chih-Hsien Hsu, Yu-Wei Chiu, Hai-Yin Chen, Ying-Hao Wang, Yu-Hen Wu
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Publication number: 20190094697Abstract: Various embodiments of the present application are directed towards an edge-exposure tool with a light emitting diode (LED), as well as a method for edge exposure using a LED. In some embodiments, the edge-exposure tool comprises a process chamber, a workpiece table, a LED, and a controller. The workpiece table is in the process chamber and is configured to support a workpiece covered by a photosensitive layer. The LED is in the process chamber and is configured to emit radiation towards the workpiece. A controller is configured to control the LED to expose an edge portion of the photosensitive layer, but not a center portion of the photosensitive layer, to the radiation emitted by the LED. The edge portion of the photosensitive layer extends along an edge of the workpiece in a closed path to enclose the center portion of the photosensitive layer.Type: ApplicationFiled: February 23, 2018Publication date: March 28, 2019Inventors: Ying-Hao Wang, Chia-Chi Chung, Han-Chih Chung, Yu-Xiang Lin, Yu-Shine Lin, Yu-Hen Wu, Han Wen Hsu
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Publication number: 20180366415Abstract: The present disclosure relates a method of forming substrate identification marks. In some embodiments, the method may be performed by forming a photosensitive material over a substrate. A first type of electromagnetic radiation is selectively provided to the photosensitive material to expose a plurality of substrate identification marks within the photosensitive material, and a second type of electromagnetic radiation is selectively provided to the photosensitive material to expose one or more alignment marks within the photosensitive material. Exposed portions of the photosensitive material are removed to form a patterned photosensitive material. The substrate is etched according to the patterned photosensitive material to form recesses within the substrate that are defined by the plurality of substrate identification marks and the one or more alignment marks.Type: ApplicationFiled: August 28, 2018Publication date: December 20, 2018Inventors: Hu-Wei Lin, Chih-Hsien Hsu, Yu-Wei Chiu, Hai-Yin Chen, Ying-Hao Wang, Yu-Hen Wu
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Publication number: 20180143128Abstract: Disclosed is a residual toxicant detection device for detecting the amount of residual toxicants in an aqueous solution to be measured. The residual toxicant detection device includes an accommodation space formed from a shell, a water inlet and a water outlet positioned on the shell for the aqueous solution to flow therein and thereout, respectively, a sensing chamber in the accommodation space, a light source emitter and a light sensor positioned near the sensing chamber, the light source emitter emitting light of a wavelength range, the light sensor receiving the light passing through the sensing chamber, and a circuit board receiving sensing signals sensed by the light sensor, such that absorbance and a change of the absorbance of residual toxicants in the aqueous solution to be measured are calculated.Type: ApplicationFiled: November 15, 2017Publication date: May 24, 2018Inventors: Jui-Hung Tsai, Ying-Hao Wang, Chia-Jung Chang, Chih-Hao Hsu, Jing-Yuan Lin
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Publication number: 20170117227Abstract: In some embodiments, the present disclosure relates a lithographic substrate marking tool. The lithographic substrate marking tool has a first lithographic exposure tool arranged within a shared housing and configured to generate a first type of electromagnetic radiation during a plurality of exposures. A mobile reticle has a plurality of different reticle fields respectively configured to block a portion of the first type of electromagnetic radiation to expose a substrate identification mark within a photosensitive material overlying a semiconductor substrate. A transversal element is configured to move the mobile reticle so that separate ones of the plurality of reticle fields are exposed onto the photosensitive material during separate ones of the plurality of exposures.Type: ApplicationFiled: May 13, 2016Publication date: April 27, 2017Inventors: Hu-Wei Lin, Chih-Hsien Hsu, Yu-Wei Chiu, Hai-Yin Chen, Ying-Hao Wang, Yu-Hen Wu