Patents by Inventor Ying Luo

Ying Luo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260193574
    Abstract: A detergent composition comprising an amphoteric surfactant and a perfume.
    Type: Application
    Filed: January 6, 2026
    Publication date: July 9, 2026
    Inventors: Dan XU, Ying LUO, Kejing DU
  • Patent number: 12665177
    Abstract: Apparatuses and systems for damping vibration of a vacuum vessel mounted with a pump include a pump body and a damping element coupled to the pump body, wherein the pump body and the damping element form a mass-based damper, and wherein the pump body forms a mass component of the mass-based damper; and the damping element forms a damping component of the mass-based damper. The apparatuses and systems also include a pump body configured to be secured to a column of a charged-particle inspection apparatus, a sensor coupled to the pump body, an actuator coupled to the pump body, and a circuitry communicatively coupled to the sensor and the actuator for receiving motion data indicative of a vibration of the column; determining a damping based on the motion data; and actuate the actuator to react to the vibration of the column in accordance with the damping.
    Type: Grant
    Filed: February 4, 2021
    Date of Patent: June 23, 2026
    Assignee: ASML Netherlands B.V.
    Inventors: Chenxi Fu, Long Di, Lucas Kuindersma, Kuo-Feng Tseng, Peter Paul Hempenius, Yu Liu, Ying Luo
  • Publication number: 20260171932
    Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.
    Type: Application
    Filed: December 12, 2025
    Publication date: June 18, 2026
    Applicant: ASML Netherlands B.V.
    Inventors: Jan-Gerard Cornelis VAN DER TOORN, Jeroen Gertruda Antonius HUINCK, Han Willem Hendrik SEVERT, Allard Eelco KOOIKER, Michael Johannes Christiaan RONDE, Arno Maria WELLINK, Shibing LIU, Ying LUO, Yixiang WANG, Chia-Yao CHEN, Bohang ZHU, Jurgen VAN SOEST
  • Patent number: 12652433
    Abstract: This disclosure describes systems, methods, and devices related to enhanced viewport switching. A device may determine a view point change from a first segment to a second segment of a video stream, wherein each segment comprises a plurality of video chunks. The device may download a chunk location box at an end of each video chunk of the plurality of video chunks. The device may parse the chunk location box to update a chunk indexing table. The device may perform a completion check on a video chunk of the plurality of video chunks.
    Type: Grant
    Filed: September 23, 2022
    Date of Patent: June 9, 2026
    Assignee: Intel Corporation
    Inventors: Ying Luo, Xiaomin Chen, Hongbo Lv, Wenquan Mao, Hua Zhang
  • Publication number: 20260081095
    Abstract: Systems and methods for irradiating a sample with a charged-particle beam are disclosed. The charged-particle beam system may comprise a stage configured to hold a sample and is movable in at least one of X-Y-Z axes. The charged-particle beam system may further comprise a position sensing system to determine a lateral and vertical displacement of the stage, and a beam deflection controller configured to apply a first signal to deflect a primary charged-particle beam incident on the sample to at least partly compensate for the lateral displacement, and to apply a second signal to adjust a focus of the deflected charged-particle beam incident on the sample to at least partly compensate for the vertical displacement of the stage. The first and second signals may comprise an electrical signal having a high bandwidth in a range of 10 kHz to 50 kHz, and 50 kHz to 200 kHz, respectively.
    Type: Application
    Filed: November 26, 2025
    Publication date: March 19, 2026
    Applicant: ASML Netherlands B.V.
    Inventors: Ying LUO, Zhonghua DONG, Xuehui YIN, Long DI, Nianpei DENG, Wei FANG, Lingling PU, Ruochong FEI, Bohang ZHU, Yu LIU
  • Publication number: 20260025550
    Abstract: This disclosure describes systems, methods, and devices related to enhanced viewport switching. A device may determine a view point change from a first segment to a second segment of a video stream, wherein each segment comprises a plurality of video chunks. The device may download a chunk location box at an end of each video chunk of the plurality of video chunks. The device may parse the chunk location box to update a chunk indexing table. The device may perform a completion check on a video chunk of the plurality of video chunks.
    Type: Application
    Filed: September 23, 2022
    Publication date: January 22, 2026
    Applicant: Intel Corporation
    Inventors: Ying Luo, Xiaomin Chen, Hongbo Lv, Wenquan Mao, Hua Zhang
  • Patent number: 12525900
    Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.
    Type: Grant
    Filed: May 21, 2024
    Date of Patent: January 13, 2026
    Assignee: ASML Netherlands B.V.
    Inventors: Jan-Gerard Cornelis Van Der Toorn, Jeroen Gertruda Antonius Huinck, Han Willem Hendrik Severt, Allard Eelco Kooiker, Michael Johannes Christiaan Ronde, Arno Maria Wellink, Shibing Liu, Ying Luo, Yixiang Wang, Chia-Yao Chen, Bohang Zhu, Jurgen Van Soest
  • Publication number: 20260011596
    Abstract: An electrostatic chuck control system configured to be utilized during an inspection process of a wafer, the electrostatic chuck control system comprising an electrostatic chuck of a stage configured to be undocked during the inspection process, wherein the electrostatic chuck comprises a plurality of components configured to influence an interaction between the wafer and the electrostatic chuck during the inspection process, a first sensor configured to generate measurement data between at least some of the plurality of components and the wafer, and a controller including circuitry configured to receive the measurement data to determine characteristics of the wafer relative to the electrostatic chuck and to generate adjustment data to enable adjusting, while the stage is undocked, at least some of the plurality of components based on the determined characteristics.
    Type: Application
    Filed: July 3, 2025
    Publication date: January 8, 2026
    Applicant: ASML Netherlands B.V.
    Inventors: Yixiang WANG, Shibing LIU, Ying LUO
  • Patent number: 12505974
    Abstract: Systems and methods for irradiating a sample with a charged-particle beam are disclosed. The charged-particle beam system may comprise a stage configured to hold a sample and is movable in at least one of X-Y-Z axes. The charged-particle beam system may further comprise a position sensing system to determine a lateral and vertical displacement of the stage, and a beam deflection controller configured to apply a first signal to deflect a primary charged-particle beam incident on the sample to at least partly compensate for the lateral displacement, and to apply a second signal to adjust a focus of the deflected charged-particle beam incident on the sample to at least partly compensate for the vertical displacement of the stage. The first and second signals may comprise an electrical signal having a high bandwidth in a range of 10 kHz to 50 kHz, and 50 kHz to 200 kHz, respectively.
    Type: Grant
    Filed: December 19, 2019
    Date of Patent: December 23, 2025
    Assignee: ASML Netherlands B.V.
    Inventors: Ying Luo, Zhonghua Dong, Xuehui Yin, Long Di, Nianpei Deng, Wei Fang, Lingling Pu, Ruochong Fei, Bohang Zhu, Yu Liu
  • Patent number: 12488918
    Abstract: Provided are a neodymium-iron-boron magnet material, raw material composition, preparation method, and application. The raw material composition of the neodymium-iron-boron magnet material comprises the following mass content components: R: 28-33%; R is a rare earth element, R comprises R1 and R2; R1 is a rare earth element added during smelting, and R1 comprises Nd and Dy; R2 is a rare earth element added during grain boundary diffusion, R2 comprises Tb, the content of R2 is 0.2%-1%; Co: <0.5%, but not 0; M: ?0.4%, but not 0, and M is one or more of Bi, Sn, Zn, Ga, In, Au, and Pb; Cu: ?0.15%, but not 0; B: 0.9-1.1%; Fe: 60-70%; the percentage is the mass percentage of the mass of each component to the total mass of the raw material composition. The neodymium-iron-boron magnet material has high remanence, coercivity, and good thermal stability.
    Type: Grant
    Filed: February 22, 2021
    Date of Patent: December 2, 2025
    Assignee: FUJIAN GOLDEN DRAGON RARE-EARTH Co., Ltd.
    Inventors: Ying Luo, Jiaying Huang, Zongbo Liao, Qin Lan, Yulin Lin, Dawei Shi, Juhua Xie, Yanqing Long
  • Patent number: 12461309
    Abstract: A method for improving wafer-level optical characteristic uniformity. The method includes forming a first layer of dielectric overlying the first wafer and a second layer of dielectric overlying the second wafer. The method also includes measuring a refractive index distribution of the second layer and measuring a first thickness distribution of the first layer. The method also includes determining a second thickness distribution for the first layer based on the refractive index distribution and the first thickness distribution. The method further includes removing material nonuniformly and selectively from the first layer based on the second thickness distribution, resulting in a third layer in the second thickness distribution characterized by a spectral response with a characteristic wavelength uniformity better than +/?2.5 nm across the first wafer.
    Type: Grant
    Filed: August 21, 2023
    Date of Patent: November 4, 2025
    Assignee: Avago Technologies International Sales Pte. Limited
    Inventors: Shiyun Lin, Amit Khanna, Ying Luo, Near Margalit, Nourhan Eid, Naser Dalvand
  • Patent number: 12418634
    Abstract: Techniques related to viewport selection in immersive video contexts are discussed. Such techniques include generating multiple viewport predictions each for a future time interval and based on different prediction models, ranking the viewport predictions using error descriptors of the prediction models, selecting a viewport prediction for the future time intervals using the ranking, and correcting the selected viewport predictions using the error descriptors.
    Type: Grant
    Filed: March 18, 2021
    Date of Patent: September 16, 2025
    Assignee: Intel Corporation
    Inventors: Ying Luo, Hua Zhang, Xiaomin Chen, Xin Kang
  • Publication number: 20250283521
    Abstract: Disclosed are an intelligent vibration isolator and a control method thereof.
    Type: Application
    Filed: June 24, 2024
    Publication date: September 11, 2025
    Applicant: Changsha University of Science and Technology
    Inventors: Lidong WANG, Yan HAN, Peng HU, Chunguang LI, Ying LUO, Hanyun LIU, Ziqiang LI, Xiumeng BU, Shaoling DING, Min ZENG
  • Patent number: 12413719
    Abstract: Techniques for implementing adaptive interpolation filter search in video encoding are disclosed. Conventional interpolation filter searching is simplified to implement adaptive interpolation filter search by selecting one or more first filter types to determine one or more initial interpolation costs. After identifying an MV that produces a target interpolation error for one of the one or more first filter types, one or more secondary interpolation costs are calculated for one or more additional filter types based on the identified MV, and one of the one or more first filter type and one or more additional filter types that results in minimal interpolation error is selected as the interpolation filter type.
    Type: Grant
    Filed: June 22, 2023
    Date of Patent: September 9, 2025
    Assignee: ATI TECHNOLOGIES ULC
    Inventors: Ying Luo, Razvan Florin Dan-Dobre, Min Wang, Edward Harold
  • Patent number: 12368067
    Abstract: An electrostatic chuck control system configured to be utilized during an inspection process of a wafer, the electrostatic chuck control system comprising an electrostatic chuck of a stage configured to be undocked during the inspection process, wherein the electrostatic chuck comprises a plurality of components configured to influence an interaction between the wafer and the electrostatic chuck during the inspection process, a first sensor configured to generate measurement data between at least some of the plurality of components and the wafer, and a controller including circuitry configured to receive the measurement data to determine characteristics of the wafer relative to the electrostatic chuck and to generate adjustment data to enable adjusting, while the stage is undocked, at least some of the plurality of components based on the determined characteristics.
    Type: Grant
    Filed: March 18, 2021
    Date of Patent: July 22, 2025
    Assignee: ASML Netherlands B.V.
    Inventors: Yixiang Wang, Shibing Liu, Ying Luo
  • Publication number: 20250218133
    Abstract: This disclosure describes systems, methods, and devices related to latency-adaptive viewport prediction for use in viewport-dependent content streaming. A method may include identifying, by a virtual reality (VR) or augmented reality (AR) device, first viewport data used by and received from a display device; generating a first estimated compensation latency based on at least one of a first network latency and by the processing circuitry, from among multiple candidate viewport prediction models each using a different respective time interval, a first viewport prediction model based on a comparison of the first estimated compensation latency to a first time interval used by the first viewport prediction model; generating, using the first viewport prediction model and the first viewport data, a first viewport prediction; and selecting, based on the first viewport prediction, a first content tile for rendering by the display device.
    Type: Application
    Filed: April 29, 2022
    Publication date: July 3, 2025
    Inventors: Ying LUO, Xiaomin CHEN, Hongbo LV, Yanying SUN, Hua ZHANG
  • Publication number: 20250119317
    Abstract: Methods (200, 1000), network nodes (1100, 1200, 1300, 1400), and computer readable storage media for supporting Ethernet bridging in a user plane are disclosed. The method (200) performed by a first network node (1100, 1200) capable of an Ethernet bridging function includes: obtaining (S201) information on frame detection and forwarding rules for an Ethernet PDU session; and performing (S203) detection and forwarding operations on a frame according to the frame detection and forwarding rules.
    Type: Application
    Filed: February 10, 2023
    Publication date: April 10, 2025
    Applicant: Telefonaktiebolaget LM Ericsson (publ)
    Inventors: Ying Luo, Yongfeng Xu, György Miklós, Ala Nazari, Hongxia Long, Stefan Rommer, Kun Wang
  • Patent number: 12272472
    Abstract: A rare earth permanent magnet material, a raw material composition, a preparation method, an application, and a motor. The present rare earth permanent magnet material comprises the following ingredients in mass percentage: R 28.5-33.0 wt. %; RH>1.5 wt. %; Cu 0-0.08 wt. %, but not 0 wt. %; Co 0.5-2.0 wt. %; Ga 0.05-0.30 wt. %; B 0.95-1.05 wt. %; and the remainder being Fe and unavoidable impurities. The R-T-B system permanent magnet material has excellent properties and, under the condition that the content of heavy rare earth elements in the permanent magnetic material is 3.0-4.5 wt. %, Br?12.78 kGs and Hcj?29.55 kOe; under the condition that the content of heavy rare earth elements in the permanent magnet material is 1.5-2.5 wt. %, Br?13.06 kGs and Hcj?26.31 kOe.
    Type: Grant
    Filed: July 7, 2020
    Date of Patent: April 8, 2025
    Assignee: FUJIAN GOLDEN DRAGON RARE-EARTH Co., Ltd.
    Inventors: Zongbo Liao, Ying Luo, Qin Lan, Jiaying Huang
  • Patent number: 12260965
    Abstract: An automatic leveling type maintenance platform for a high-temperature gas cooled reactor is provided. A floating plate is automatically leveled by using a leveling liquid. During leveling, only a water driving assembly needs to be controlled to drive a housing to be close to an inner bottom surface of a liquid storage container. A sliding block assembly and a lifting guide mechanism are controlled to be locked and fixed after the floating plate is leveled. The floating plate can allow for automatic and rapid leveling and locking operation. Thus, complex and time-consuming fine adjustment control does not need to be performed. Also, when the platform is used in a spherical top cap of a pressure vessel of the reactor for a maintenance operation, then support legs of a support assembly do not need to have telescopic motion.
    Type: Grant
    Filed: June 28, 2024
    Date of Patent: March 25, 2025
    Assignee: NUCLEAR POWER INSTITUTE OF CHINA
    Inventors: Ying Luo, Yiwei Jiang, Shuhua Chen, Hua Du, Dailin Dong, Hongxing Yu, Hang Peng, Dapeng Yan
  • Publication number: 20250067933
    Abstract: A method for improving wafer-level optical characteristic uniformity. The method includes forming a first layer of dielectric overlying the first wafer and a second layer of dielectric overlying the second wafer. The method also includes measuring a refractive index distribution of the second layer and measuring a first thickness distribution of the first layer. The method also includes determining a second thickness distribution for the first layer based on the refractive index distribution and the first thickness distribution. The method further includes removing material nonuniformly and selectively from the first layer based on the second thickness distribution, resulting in a third layer in the second thickness distribution characterized by a spectral response with a characteristic wavelength uniformity better than +/?2.5 nm across the first wafer.
    Type: Application
    Filed: August 21, 2023
    Publication date: February 27, 2025
    Inventors: Shiyun Lin, Amit Khanna, Ying Luo, Near Margalit, Nourhan Eid, Naser Dalvand