Abstract: In a non-volatile memory formed according to a NAND-type architecture that has, on one or both ends of the NAND strings, multiple select gates including some with programmable threshold voltages, a structure and corresponding for efficiently programming of such select gates. On the drain side, the end most of multiple drain select transistors is individually controllable and used for biasing purposes while one or more other drain side select gates are collectively programmed to set adjust their threshold voltage. Independently, on the source side, the end most of multiple source select transistors is individually controllable and used for biasing purposes while other source side select gates are collectively programmed to set adjust their threshold voltage.

Abstract: Techniques are provided for more accurately programming memory cells by reducing program noise caused by charge loss in a programming pass in which the number of verify tests varies in different program loops. In an nth program loop, at least one programming characteristic is modified based on the number (N) of data states which were subject to verify tests in the n?1st program loop. For example, a reduced step size or pulse duration, or an elevated bit line voltage (Vbl) can be used. The reduction in the step size or pulse duration, or the increase in Vbl, is proportional to N. The modification of the at least one programming characteristic results in a slowdown of the programming of the memory cells so that program noise is reduced.

Abstract: Techniques are provided for fabricating a three-dimensional, charge-trapping memory device with improved long term data retention. A corresponding three-dimensional, charge-trapping memory device is also provided which includes a stack of alternating word line layers and dielectric layers. A charge-trapping layer is deposited in a memory hole. The refractive index of portions of the charge-trapping layer which are adjacent to the word line layers is increased relative to the refractive index of portions of the charge-trapping layer which are adjacent to the dielectric layers. This can be achieved by doping the portions of the charge-trapping layer which are adjacent to the word line layers. In one approach, the charge-trapping layer is SiON and is doped with Si or N. In another approach, the charge-trapping layer is HfO and is doped with Hf. In another approach, the charge-trapping layer is HfSiON and is doped with Hf, Si or N.

Abstract: A read operation compensates for program disturb when distinguishing between an erased-state and a lowest programmed data state, where the program disturb is a function of the data state of an adjacent, previously-programmed memory cell on a common charge-trapping layer. The read operation occurs in connection with a programming operation which avoids program disturb of the programmed data states by using asymmetric pass voltages. Before reading the memory cells on a selected word line (WLn), the memory cells on the adjacent, previously-programmed word line (WLn?1) are read. The read operation for WLn uses multiple read voltages—one for each data state on WLn?1, and one of the read results is selected based on the data state of the adjacent memory cell. Other read operations distinguish between each pair of adjacent programmed data states using a read voltage which is independent of the data state of the adjacent memory cell.

Abstract: Techniques are provided for more accurately programming memory cells by reducing program noise caused by charge loss in a programming pass in which the number of verify tests varies in different program loops. In an nth program loop, at least one programming characteristic is modified based on the number (N) of data states which were subject to verify tests in the n-1st program loop. For example, a reduced step size or pulse duration, or an elevated bit line voltage (Vbl) can be used. The reduction in the step size or pulse duration, or the increase in Vbl, is proportional to N. The modification of the at least one programming characteristic results in a slowdown of the programming of the memory cells so that program noise is reduced.

Abstract: A NAND string includes dummy memory cells between data memory cells and source-side and drain-side select gates. A gradual increase in threshold voltage (Vth) for the dummy memory cells which occurs due to program-erase cycles is detected by read operations at an initial upper checkpoint voltage. If the Vth has increased beyond the checkpoint, the control gate voltage of the dummy memory cells is increased during subsequent programming operations. This maintains a relatively constant channel voltage in an unselected NAND string under the dummy memory cells during a program voltage. Disturbs which can be caused by an increase in a channel voltage gradient are therefore avoided. The dummy memory cells can be periodically read at successively higher checkpoint voltages and the control gate voltage repeatedly increased. If the control gate voltage reaches a maximum allowed level, the dummy memory cells can be erased and reprogrammed.

Abstract: Read disturb is reduced for dummy memory cells in a charge-trapping memory device such as a 3D memory device. The memory device includes a selected NAND string and an unselected NAND string. In the unselected NAND string, a dummy memory cell is adjacent to a select gate transistor. During a read operation involving the selected NAND string, a voltage of the dummy memory cell is increased in two steps to minimize a gradient in a channel of the unselected NAND string between the dummy memory cell and the select gate transistor. During the first step, the select gate transistor is conductive so that the channel is connected to a driven bit line. During the second step, the select gate transistor is non-conductive. Voltages on unselected word lines can also be increased in two steps to set a desired channel boosting level in the unselected NAND string.

Abstract: Techniques are provided for preventing program disturb of unselected memory cells during programming of a selected memory cell in a NAND string which includes a continuous charge-trapping layer, either in a two-dimensional or three-dimensional configuration. In such a NAND string, regions between the memory cells can be inadvertently programmed as parasitic cells due to the program voltage and pass voltages on the word lines. For programmed cells, an upshift in threshold voltage due to a parasitic cell can be avoided by providing a higher pass voltage on an adjacent later-programmed word line than on an adjacent previously-programmed word line. For erased cells, an upshift in threshold voltage due to the parasitic cells can be reduced by progressively lowering the pass voltage on the adjacent later-programmed word line. The lowering can occur when memory cells of a lowest target data state complete programming.

Abstract: Techniques are provided for preventing program disturb of unselected memory cells during programming of a selected memory cell in a NAND string which includes a continuous charge-trapping layer, either in a two-dimensional or three-dimensional configuration. In such a NAND string, regions between the memory cells can be inadvertently programmed as parasitic cells due to the program voltage and pass voltages on the word lines. For programmed cells, an upshift in threshold voltage due to a parasitic cell can be avoided by providing a higher pass voltage on an adjacent later-programmed word line than on an adjacent previously-programmed word line. For erased cells, an upshift in threshold voltage due to the parasitic cells can be reduced by progressively lowering the pass voltage on the adjacent later-programmed word line. The lowering can occur when memory cells of a lowest target data state complete programming.

Abstract: Techniques are provided to accelerate the redistribution of the holes in connection with an erase operation, so that there will be a reduced amount of redistribution of the holes after programming. As a result, short-term charge loss after programming is reduced. In one aspect, a positive control gate voltage is applied to a set of memory cells after erase and before programming. The positive control gate voltage has a relatively low amplitude and a long duration, compared to a programming voltage. The positive control gate voltage can be adjusted based on the erase depth of the memory cells and factors such as a count of program-erase cycles, a count of erase-verify iterations, sensing of a position of the lower tail, and a cross-sectional width of a vertical pillar of a memory hole.

Abstract: Techniques are provided to accelerate the redistribution of the holes in connection with an erase operation, so that there will be a reduced amount of redistribution of the holes after programming. As a result, short-term charge loss after programming is reduced. In one aspect, a positive control gate voltage is applied to a set of memory cells after erase and before programming. The positive control gate voltage has a relatively low amplitude and a long duration, compared to a programming voltage. The positive control gate voltage can be adjusted based on the erase depth of the memory cells and factors such as a count of program-erase cycles, a count of erase-verify iterations, sensing of a position of the lower tail, and a cross-sectional width of a vertical pillar of a memory hole.

Abstract: Techniques are provided for reducing the effects of short-term charge loss while programming charge-trapping memory cells. Short-term charge loss can result in a downshift and widening of a threshold voltage distribution. A programming operation includes a rough programming pass in which memory cells are programmed close to a final threshold voltage distribution, for each target data state. Subsequently, a negative voltage is applied to control gates of the memory cells. Subsequently, a final programming pass is performed in which the memory cells are programmed to the final threshold voltage distribution. Since the negative voltage accelerates charge loss, there is reduced charge loss after the final programming pass. The rough programming pass can use incremental step pulse programming for the lowest target data state to obtain information regarding programming speed. An initial program voltage in the final programming pass can be set based on the programming speed.

Abstract: In a non-volatile memory formed according to a NAND-type architecture that has, on one or both ends of the NAND strings, multiple select gates including some with programmable threshold voltages, a structure and corresponding for efficiently programming of such select gates. On the drain side, the end most of multiple drain select transistors is individually controllable and used for biasing purposes while one or more other drain side select gates are collectively programmed to set adjust their threshold voltage. Independently, on the source side, the end most of multiple source select transistors is individually controllable and used for biasing purposes while other source side select gates are collectively programmed to set adjust their threshold voltage.

Abstract: In a three-dimensional nonvolatile memory, when a block erase failure occurs, zones within a block may be separately verified to see if some zones pass verification. Zones that pass may be designated as good zones and may subsequently be used to store user data while bad zones in the same block may be designated as bad and may not be used for subsequent storage of user data.

Abstract: Techniques are provided for preventing inadvertent program or erase of select gate transistors and dummy memory cells during an erase operation involving data-storing memory cells in a three-dimensional memory device. The erase operation charges up a channel of a NAND string using gate-induced drain leakage from the select gate transistors. An erase voltage waveform and a select gate waveform are ramped up to intermediate levels which allow some charging of the channel to occur. The intermediate level of the select gate waveform is low enough to avoid inadvertent programming of the select gate transistors. Subsequently, the erase voltage waveform and the select gate waveform are ramped up to peak levels which allow additional charging of the channel to occur. The peak levels are set to avoid inadvertent erasing of the select gate transistors.

Abstract: Techniques are provided to accelerate the redistribution of the holes in connection with an erase operation, so that there will be a reduced amount of redistribution of the holes after programming. As a result, short-term charge loss after programming is reduced. In one aspect, a positive control gate voltage is applied to a set of memory cells after erase and before programming. The positive control gate voltage has a relatively low amplitude and a long duration, compared to a programming voltage. The positive control gate voltage can be adjusted based on the erase depth of the memory cells and factors such as a count of program-erase cycles, a count of erase-verify iterations, sensing of a position of the lower tail, and a cross-sectional width of a vertical pillar of a memory hole.

Abstract: In a three-dimensional stacked non-volatile memory device, a short circuit in a select gate layer is detected and prevented. A short circuit may occur when charges which are accumulated in select gate lines due to plasma etching, discharge through a remaining portion of the select gate layer in a short circuit path when the select gate lines are driven. To detect a short circuit, during a testing phase, an increasing bias is applied is applied to the remaining portion while a current is measured. An increase in the current above a threshold indicates that the bias has exceed a breakdown voltage of a short circuit path. A value of the bias at this time is recorded as an optimal bias. During subsequent operations involving select gate transistors or memory cells, such as programming, erasing or reading, the optimal bias is applied when the select gate lines are driven to prevent a current flow through the short circuit.

Abstract: In a nonvolatile memory array, such as a three-dimensional array of charge-storage memory cells, data is scrubbed according to a scheme which weights particular data that is exposed to potentially damaging voltages. Data that may cause damage to other data is moved to a location where such potential damage is reduced.

Abstract: A system for programming non-volatile storage is proposed that reduces the impact of interference from the boosting of neighbors. Memory cells are divided into two or more groups. In one example, the memory cells are divided into odd and even memory cells; however, other groupings can also be used. Prior to a first trigger, a first group of memory cells are programmed together with a second group of memory cells using a programming signal that increases over time. Subsequent to the first trigger and prior to a second trigger, the first group of memory cells are programmed separately from the second group of memory cells using a programming signal that has been lowered in magnitude in response to the first trigger. Subsequent to the second trigger, the first group of memory cells are programmed together with the second group of memory cells with the programming signal being raised in response to the second trigger.

Abstract: Channel coupling effects during verify and read of non-volatile storage are mitigated by matching the amount of channel coupling that occurs during read with channel coupling that occurred during verify. All bit lines may be read together during both verify and read. In one embodiment, first bias conditions are established on bit lines when verifying each of a plurality of programmed states. A separate set of first bias conditions may be established when verifying each state. Biasing a bit line may be based on the state to which a non-volatile storage elements on the bit line is being programmed. A separate set of second bias conditions are established for each state being read. The second bias conditions for a given state substantially match the first bias conditions for the given state.