Abstract: Techniques are provided for reducing program disturb in a 3D memory device. The techniques include compensating for a temperature dependence of program disturb. The techniques may include compensating for how program disturb depends on the location of the word line that is selected for programming. In one aspect, the voltage that is applied to the control gates drain side select transistors of unselected NAND strings is adjusted during programming based on temperature. Greater temperature compensation may be applied when the selected word line is closer to the drain side select transistors.

Abstract: Techniques are provided for programming memory cells while reducing the effects of detrapping which cause a downshift in the threshold voltage distribution. Detrapping is particularly problematic for charge-trapping memory cells such as in a 3D stacked non-volatile memory device. After completion of a full programming pass, a verify test is performed to identify cells for which reprogramming is warranted. The reprogramming can include multiple program-verify iterations which use longer program pulses than in the full programming pass. Moreover, the number of program-verify iterations is limited to reduce the reprogramming time. In one approach, cells of all target data states are programmed together. In another approach, cells of different target data states are programmed separately.

Abstract: Techniques are provided for programming memory cells while reducing the effects of detrapping which cause a downshift in the threshold voltage distribution. Detrapping is particularly problematic for charge-trapping memory cells such as in a 3D stacked non-volatile memory device. After completion of a full programming pass, a verify test is performed to identify cells for which reprogramming is warranted. The reprogramming includes a single program pulse for each target data state, where each program pulse is longer than in the full programming pass. The pulse widths can be optimized based on factors such as a programming speed or a threshold voltage distribution width from the full programming pass.

Abstract: In a three dimensional NAND memory, increased threshold voltages in back gate transistors may cause program failures, particularly along word lines near back gates. When back gate transistor threshold voltages cannot be returned to a desired threshold voltage range then modified program conditions, including increased back gate voltage, may be used to allow programming.

Abstract: In a three-dimensional stacked non-volatile memory device, a short circuit in a select gate layer is detected and prevented. A short circuit may occur when charges which are accumulated in select gate lines due to plasma etching, discharge through a remaining portion of the select gate layer in a short circuit path when the select gate lines are driven. To detect a short circuit, during a testing phase, an increasing bias is applied is applied to the remaining portion while a current is measured. An increase in the current above a threshold indicates that the bias has exceed a breakdown voltage of a short circuit path. A value of the bias at this time is recorded as an optimal bias. During subsequent operations involving select gate transistors or memory cells, such as programming, erasing or reading, the optimal bias is applied when the select gate lines are driven to prevent a current flow through the short circuit.

Abstract: A read operation for selected memory cell on a selected word line compensates for program disturb which is a nonlinear function of the data state of an adjacent memory cell on an adjacent word line. When a command to perform a read operation for the selected memory cell is received, a read operation is first performed on the adjacent memory cell to determine its data state, or to classify the adjacent memory cell into a threshold voltage range which includes one or more data states, or a portion of a data state. The selected memory cell is then read using a baseline control gate voltage which does not provide compensation, and one or more elevated control gate voltages which provide compensation, to distinguish between two adjacent data states. An optimal sensing result is selected based on the data state or threshold voltage range of the adjacent memory cell.

Abstract: Techniques are provided for reducing the effects of short-term charge loss while programming charge-trapping memory cells. Short-term charge loss can result in a downshift and widening of a threshold voltage distribution. A programming operation includes a rough programming pass in which memory cells are programmed close to a final threshold voltage distribution, for each target data state. Subsequently, a negative voltage is applied to control gates of the memory cells. Subsequently, a final programming pass is performed in which the memory cells are programmed to the final threshold voltage distribution. Since the negative voltage accelerates charge loss, there is reduced charge loss after the final programming pass. The rough programming pass can use incremental step pulse programming for the lowest target data state to obtain information regarding programming speed. An initial program voltage in the final programming pass can be set based on the programming speed.

Abstract: In a nonvolatile memory array in which a NAND string includes a back gate that has a charge storage element, the threshold voltage of the back gate is monitored, and if the threshold voltage deviates from a desired threshold voltage range, charge is added to, or removed from the charge storage element to return the threshold voltage to the desired threshold voltage range.

Abstract: A NAND string includes dummy memory cells between data memory cells and source-side and drain-side select gates. A gradual increase in threshold voltage (Vth) for the dummy memory cells which occurs due to program-erase cycles is periodically detected by a read operation at an upper checkpoint voltage. If the Vth has increased beyond the checkpoint, the control gate voltage of the dummy memory cells is decreased during subsequent erase operations of program-erase cycles, causing a gradual weak erase. A decrease in the Vth is later detected by a read operation at a lower checkpoint voltage. If the Vth has decreased too much, the control gate voltage is raised during subsequent erase operations, causing a gradual weak programming. The process can be repeated to keep the Vth within a desired range and avoid disturbs due to an increase in a channel voltage gradient which would otherwise occur.

Abstract: Configurable parameters may be used to access NAND flash memory according to schemes that optimize such parameters according to predicted characteristics of memory cells, for example, as a function of certain memory cell device geometry, which may be predicted based on the location of a particular device within a memory array.

Abstract: In a three-dimensional stacked non-volatile memory device, a short circuit is prevented in a select gate layer by providing a protective material such as a diode, capacitor, linear resistor or varistor between select gate lines and a remaining portion of the select gate layer. Charges which are accumulated in the select gate lines due to plasma etching are therefore prevented from discharging through the remaining portion in a short circuit path when the select gate lines are driven. The protective material can comprise a p-n diode, an n-i-n or p-i-p resistor, a thin oxide layer between doped polysilicon layers in a capacitor, or a variable-resistance material such as ZnO2 between oxide layers in a varistor.

Abstract: A NAND memory cell region of a NAND device includes a conductive source line that extends substantially parallel to a major surface of a substrate, a first semiconductor channel that extends substantially perpendicular to a major surface of the substrate, and a second semiconductor channel that extends substantially perpendicular to the major surface of the substrate. At least one of a bottom portion and a side portion of the first semiconductor channel contacts the conductive source line and at least one of a bottom portion and a side portion of the second semiconductor channel contacts the conductive source line.

Abstract: In a three-dimensional NAND memory in which a block contains multiple separately-selectable sets of strings connected to the same set of bit lines, sets of strings are zoned, and different operating parameters applied to different zones. Operating parameters for a zone are obtained from characterizing a reference set of strings in the zone.

Abstract: When data from a portion of a three dimensional NAND memory array is determined to be uncorrectable by Error Correction Code (ECC), a determination is made as to whether data is uncorrectable by ECC throughout some unit that is larger than the portion. If modified read conditions provide ECC correctable data, the modified read conditions are recorded for subsequent reads of the larger unit.

Abstract: A memory device and a method of making a memory device that includes a stack of alternating layers of a first material and a second material different from the first material over a substrate, where the layers of the second material form a plurality of conductive control gate electrodes. A plurality of NAND memory strings extend through the stack, where each NAND memory string includes a semiconductor channel which contains at least a first portion which extends substantially perpendicular to a major surface of the substrate and at least one memory film located between the semiconductor channel and the plurality of conductive control gate electrodes. A source line including a metal silicide material extends through the stack.

Abstract: Techniques are provided for programming memory cells while reducing the effects of detrapping which cause a downshift in the threshold voltage distribution. Detrapping is particularly problematic for charge-trapping memory cells such as in a 3D stacked non-volatile memory device. During programming, a temporary lockout mode is provided for memory cells which pass a verify test. During a checkpoint program-verify iteration, all memory cells of a target data state are subject to the verify test. The memory cells in the temporary lockout mode are therefore subject to the verify test a second time. Memory cells that fail the verify test in the checkpoint program-verify iteration are programmed further. A normal or slow programming mode is used for a memory cell depending on whether it had reached the temporary lockout mode. Threshold voltage distributions are narrowed by reprogramming some of the memory cells.

Abstract: Portions of data stored in a three dimensional memory array are selected based on their locations for calculation of redundancy data. Locations are selected so that no two portions in a set of portions for a given calculation are likely to become uncorrectable at the same time. Selected portions may be separated by at least one word line and separated by at least one string in a block.

Abstract: In a nonvolatile NAND memory array, a NAND block may be falsely determined to be in an erased condition because of the effect of unwritten cells prior to the erase operation. Such cells may be programmed with dummy data prior to erase, or parameters used for a verify operation may be modified to compensate for such cells. Read operations may be similarly modified to compensate for unwritten cells.

Abstract: Layers in a multi-layer memory array are categorized according to likely error rates as predicted from their memory hole diameters. Data to be stored along a word line in a high risk layer is subject to a redundancy operation (e.g. XOR) with data to be stored along a word line in a low risk layer so that the risk of both being bad is low.

Abstract: In a nonvolatile memory array, such as a three-dimensional array of charge-storage memory cells, data is scrubbed according to a scheme which weights particular data that is exposed to potentially damaging voltages. Data that may cause damage to other data is moved to a location where such potential damage is reduced.