Abstract: A method for detecting metal contamination from a film-forming process causing interface traps is described. The film-forming process is performed to form a dielectric film on a wafer. An annealing treatment is performed to reduce the interface traps between the wafer and the dielectric film. Thereafter, the bulk recombination lifetime (BRLT) of the wafer is measured to estimate the amount of the metal contamination.

Abstract: A data processing method for a context formation module and an arithmetic encoder in an embedded block coding with optimized truncation (EBCOT) module includes inputting column-based data into the context formation module, controlling the context formation module with a finite state so that the context formation module has a constant valid output in each clock cycle, separating the calculation and the normalization operation of registers into different pipeline stages of the arithmetic encoder, and interleaving inputs so that two different data are inputted into the arithmetic encoder in one clock cycle difference.

Abstract: A data processing method for a context formation module and an arithmetic encoder in an embedded block coding with optimized truncation (EBCOT) module includes inputting column-based data into the context formation module, controlling the context formation module with a finite state so that the context formation module has a constant valid output in each clock cycle, separating the calculation and the normalization operation of registers into different pipeline stages of the arithmetic encoder, and interleaving inputs so that two different data are inputted into the arithmetic encoder in one clock cycle difference.