Abstract: A heat treatment device includes: a heating plate configured to support and heat a substrate on which a resist film is formed; a chamber configured to cover a processing space above the heating plate; a gas supply configured to supply a gas into the chamber along a gas flow path connected to an inside of the chamber, the gas flow path beginning from an outer periphery of the heating plate and extending along an upper surface of the heating toward an end portion on an outer periphery of the substrate; and an exhaust port configured to evacuate inside of the chamber through exhaust holes that are formed above the processing space and open downwards.

Abstract: Provided is a method for producing an inorganic fluoride luminescent material having excellent light emission characteristics by using a non-aqueous hydrogen fluoride-containing liquid. The method for producing an inorganic fluoride luminescent material includes: bringing a first inorganic fluoride luminescent material and a non-aqueous hydrogen fluoride-containing liquid having a hydrogen fluoride content in a range of 20% by mass or more and 100% by mass or less into contact with each other to obtain a non-aqueous solution containing ions derived from the first inorganic fluoride luminescent material, and bringing the non-aqueous solution and a non-aqueous organic liquid having a hydrogen fluoride content of less than 20% by mass into contact with each other to precipitate a second inorganic fluoride luminescent material.

Abstract: A heat treatment apparatus includes: a stage on which a substrate is placed and heated, the substrate including an exposed resist film formed on a surface of the substrate, and the exposed resist film exhibiting a change in solubility of an exposed portion or an unexposed portion in a liquid developer by reacting with water and being heated; a lifting mechanism configured to relatively raise and lower the substrate between a first position at which the substrate is placed on the stage and a second position which is spaced apart from the stage; and a gas supply configured to supply a first gas to the substrate located at the second position before moving to the first position, the first gas having a humidity higher than that of an atmosphere in which the stage is provided.

Abstract: Provided is a method for producing an inorganic fluoride luminescent material using a non-aqueous solution. The method for producing an inorganic fluoride luminescent material includes: either preparing a first non-aqueous solution that contains a first ion, a second ion, and a first non-aqueous hydrogen fluoride-containing liquid, and a second non-aqueous solution that contains a third ion and a second non-aqueous hydrogen fluoride-containing liquid, or preparing a third non-aqueous solution that contains a first ion, a second ion, a third ion, and a third non-aqueous hydrogen fluoride-containing liquid; and either mixing the first non-aqueous solution and the second non-aqueous solution with a non-aqueous organic liquid, or mixing the third non-aqueous solution with a non-aqueous organic liquid, to obtain an inorganic fluoride luminescent material containing a first element M1 and/or ammonium, a second element M2, and a third element M3.

Abstract: A heat treatment device includes: a heating plate configured to support and heat a substrate on which a resist film is formed; a chamber configured to cover a processing space above the heating plate; a gas supply configured to supply a gas into the chamber along a gas flow path connected to an inside of the chamber, the gas flow path beginning from an outer periphery of the heating plate and extending along an upper surface of the heating toward an end portion on an outer periphery of the substrate; and an exhaust port configured to evacuate inside of the chamber through exhaust holes that are formed above the processing space and open downwards.

Abstract: A heat treatment device includes: a heating plate that supports and heats a substrate on which a resist film is formed, and the resist film is subjected to an exposure process; a chamber that covers a processing space above the heating plate; a gas ejecting unit that ejects a processing gas from above toward the substrate on the heating plate within the chamber; a gas supply unit that supplies a gas into the chamber from below a surface of the substrate, within the chamber; and an exhaust unit that evacuates inside of the chamber through exhaust holes that are formed above the processing space and open downwards.

Abstract: A method of painting a vehicle according to an embodiment including a first member and a second member which includes a painting surface and which is made of a material different from that of the first member. The method includes acquiring an environmental condition and a painting condition when the first member has been painted, and determining an environmental condition and a painting condition for the second member, which are determined in advance so that a color of the second member and a color of the first member will have a sameness in view of the acquired environmental condition and painting condition for the first member, as the environmental condition and the painting condition at the time of painting the second member which may be used together with the first member.

Abstract: A method includes a forming step of forming a first metal separator and a second metal separator each including a protruding sealing bead portion and a protruding stopper bead portion; a joining step of joining surfaces of the first metal separator and the second metal separator on sides opposite to sides on which their respective sealing bead portions protrude, and attaching seal members in an extension direction or on distal ends of the sealing bead portion; and a preload applying step of applying preload to a bead seal section formed of one pair of the sealing bead portions and the seal members and a stopper section formed of one pair of the stopper bead portions in a height direction thereof, thereby plastically deforming the bead seal section and the stopper section simultaneously.

Abstract: A method includes a forming step of forming a first metal separator and a second metal separator each including a protruding sealing bead portion and a protruding stopper bead portion; a joining step of joining surfaces of the first metal separator and the second metal separator on sides opposite to sides on which their respective sealing bead portions protrude, and attaching seal members in an extension direction or on distal ends of the sealing bead portion; and a preload applying step of applying preload to a bead seal section formed of one pair of the sealing bead portions and the seal members and a stopper section formed of one pair of the stopper bead portions in a height direction thereof, thereby plastically deforming the bead seal section and the stopper section simultaneously.

Abstract: A substrate processing apparatus includes a film forming processing unit configured to form a metal-containing resist film on a substrate; a heat treatment unit configured to perform a heating processing on the substrate on which the film is formed and in which an exposure processing is performed on the film; a developing processing unit configured to perform a developing processing on the film formed on the substrate on which the heating processing is performed; and an adjustment controller configured to reduce a difference between substrates in an amount of water that reacts in the film formed on the substrate during the heating processing.

Abstract: A metal bead seal with uniform sealing surface pressure and improved sealability is provided. A sealing bead is integrated with a basal part made of metal, and includes a curved part that is curved in a plan view and that includes a maximum bead width part having a maximum bead width w1, a straight part that is straight in a plan view and continuous from the curved part, the straight part including a minimum bead width part having a minimum bead width, a gradually varying bead width part that is positioned between the maximum bead width part and the minimum bead width part, the gradually varying bead width part having its bead width continuously varied from the maximum bead width to the minimum bead width.

Abstract: There is provided a substrate processing apparatus, including: a film forming part configured to form a metal-containing film on a front surface of a substrate; a film cleaning part configured to clean the metal-containing film formed on a peripheral edge portion of the substrate; and a controller. The controller is configured to control the film forming part so as to form the metal-containing film on the front surface of the substrate, and control the film cleaning part so as to supply a first chemical liquid and a second chemical liquid.

Abstract: A heat treatment device includes: a heating plate that supports and heats a substrate on which a resist film is formed, and the resist film is subjected to an exposure process; a chamber that covers a processing space above the heating plate; a gas ejecting unit that ejects a processing gas from above toward the substrate on the heating plate within the chamber; a gas supply unit that supplies a gas into the chamber from below a surface of the substrate, within the chamber; and an exhaust unit that evacuates inside of the chamber through exhaust holes that are formed above the processing space and open downwards.

Abstract: A production control system includes a plurality of processing machines configured to successively process a plurality of workpieces conveyed on a production line, and a system server connected to the plurality of processing machines, in which the system server acquires an operating status associated with a time from each of the plurality of processing machines, associates the acquired operating statuses with the plurality of workpieces successively arriving at the processing machines, and thereby identifies each of the plurality of workpieces conveyed on the production line.

Abstract: A substrate processing apparatus includes a film forming processing unit configured to form a metal-containing resist film on a substrate; a heat treatment unit configured to perform a heating processing on the substrate on which the film is formed and in which an exposure processing is performed on the film; a developing processing unit configured to perform a developing processing on the film formed on the substrate on which the heating processing is performed; and an adjustment controller configured to reduce a difference between substrates in an amount of water that reacts in the film formed on the substrate during the heating processing.

Abstract: A thermal treatment apparatus performs a thermal treatment on a metal-containing film formed on a substrate. The thermal treatment apparatus includes a treatment chamber that houses the substrate; a thermal treatment plate that is provided inside the treatment chamber and mounts the substrate thereon; and a moisture supply unit that supplies moisture to the metal-containing film. At the time of the thermal treatment, moisture is supplied to the metal-containing film of the substrate on the thermal treatment plate and an atmosphere in the treatment chamber is exhausted from a central portion of the treatment chamber.

Abstract: A method of painting a vehicle according to an embodiment including a first member and a second member which includes a painting surface and which is made of a material different from that of the first member. The method includes acquiring an environmental condition and a painting condition when the first member has been painted, and determining an environmental condition and a painting condition for the second member, which are determined in advance so that a color of the second member and a color of the first member will have a sameness in view of the acquired environmental condition and painting condition for the first member, as the environmental condition and the painting condition at the time of painting the second member which may be used together with the first member.

Abstract: An analysis apparatus includes: a storage unit configured to store a learned neural network; an acquisition unit configured to acquire determination image data obtained by capturing an image of a surface in which at least a surface layer of a coating layer stacked on the coating irregularity generated in the coating surface to be determined has been abraded; a determination unit configured to input the determination image data acquired by the acquisition unit to the learned neural network read out from the storage unit and determine the cause of occurrence of the coating irregularity generated in the coating surface to be determined; and an output unit configured to output information regarding the cause of occurrence determined by the determination unit.

Abstract: An analysis apparatus includes: a storage unit configured to store a learned neural network; an acquisition unit configured to acquire determination image data obtained by capturing an image of a surface in which at least a surface layer of a coating layer stacked on the coating irregularity generated in the coating surface to be determined has been abraded; a determination unit configured to input the determination image data acquired by the acquisition unit to the learned neural network read out from the storage unit and determine the cause of occurrence of the coating irregularity generated in the coating surface to be determined; and an output unit configured to output information regarding the cause of occurrence determined by the determination unit.

Abstract: There is provided a substrate processing apparatus, including: a film forming part configured to form a metal-containing film on a front surface of a substrate; a film cleaning part configured to clean the metal-containing film formed on a peripheral edge portion of the substrate; and a controller. The controller is configured to control the film forming part so as to form the metal-containing film on the front surface of the substrate, and control the film cleaning part so as to supply a first chemical liquid and a second chemical liquid.