Patents by Inventor Yohei Sano

Yohei Sano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10656526
    Abstract: A thermal treatment apparatus performs a thermal treatment on a metal-containing film formed on a substrate. The thermal treatment apparatus includes a treatment chamber that houses the substrate; a thermal treatment plate that is provided inside the treatment chamber and mounts the substrate thereon; and a moisture supply unit that supplies moisture to the metal-containing film. At the time of the thermal treatment, moisture is supplied to the metal-containing film of the substrate on the thermal treatment plate and an atmosphere in the treatment chamber is exhausted from a central portion of the treatment chamber.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: May 19, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Yohei Sano, Shinichiro Kawakami, Masashi Enomoto, Takahiro Shiozawa, Keisuke Yoshida, Tomoya Onitsuka
  • Publication number: 20200078809
    Abstract: A method of painting a vehicle according to an embodiment including a first member and a second member which includes a painting surface and which is made of a material different from that of the first member. The method includes acquiring an environmental condition and a painting condition when the first member has been painted, and determining an environmental condition and a painting condition for the second member, which are determined in advance so that a color of the second member and a color of the first member will have a sameness in view of the acquired environmental condition and painting condition for the first member, as the environmental condition and the painting condition at the time of painting the second member which may be used together with the first member.
    Type: Application
    Filed: July 16, 2019
    Publication date: March 12, 2020
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Yuichi HIRANO, Yohei SANO
  • Patent number: 10533849
    Abstract: An analysis apparatus includes: a storage unit configured to store a learned neural network; an acquisition unit configured to acquire determination image data obtained by capturing an image of a surface in which at least a surface layer of a coating layer stacked on the coating irregularity generated in the coating surface to be determined has been abraded; a determination unit configured to input the determination image data acquired by the acquisition unit to the learned neural network read out from the storage unit and determine the cause of occurrence of the coating irregularity generated in the coating surface to be determined; and an output unit configured to output information regarding the cause of occurrence determined by the determination unit.
    Type: Grant
    Filed: April 4, 2019
    Date of Patent: January 14, 2020
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Yohei Sano, Yuichi Hirano
  • Publication number: 20190331483
    Abstract: An analysis apparatus includes: a storage unit configured to store a learned neural network; an acquisition unit configured to acquire determination image data obtained by capturing an image of a surface in which at least a surface layer of a coating layer stacked on the coating irregularity generated in the coating surface to be determined has been abraded; a determination unit configured to input the determination image data acquired by the acquisition unit to the learned neural network read out from the storage unit and determine the cause of occurrence of the coating irregularity generated in the coating surface to be determined; and an output unit configured to output information regarding the cause of occurrence determined by the determination unit.
    Type: Application
    Filed: April 4, 2019
    Publication date: October 31, 2019
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Yohei SANO, Yuichi HIRANO
  • Publication number: 20190317407
    Abstract: There is provided a substrate processing apparatus, including: a film forming part configured to form a metal-containing film on a front surface of a substrate; a film cleaning part configured to clean the metal-containing film formed on a peripheral edge portion of the substrate; and a controller. The controller is configured to control the film forming part so as to form the metal-containing film on the front surface of the substrate, and control the film cleaning part so as to supply a first chemical liquid and a second chemical liquid.
    Type: Application
    Filed: April 5, 2019
    Publication date: October 17, 2019
    Inventors: Hiroshi MIZUNOURA, Yohei SANO, Shinichiro KAWAKAMI
  • Publication number: 20180335768
    Abstract: A production control system includes a plurality of processing machines configured to successively process a plurality of workpieces conveyed on a production line, and a system server connected to the plurality of processing machines, in which the system server acquires an operating status associated with a time from each of the plurality of processing machines, associates the acquired operating statuses with the plurality of workpieces successively arriving at the processing machines, and thereby identifies each of the plurality of workpieces conveyed on the production line.
    Type: Application
    Filed: April 17, 2018
    Publication date: November 22, 2018
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventor: Yohei SANO
  • Publication number: 20180164689
    Abstract: A thermal treatment apparatus that performs a thermal treatment on a metal-containing film formed on a substrate, includes: a treatment chamber that houses the substrate; a thermal treatment plate that is provided inside the treatment chamber and mounts the substrate thereon; and a moisture supply unit that supplies moisture to the metal-containing film, wherein at the time of the thermal treatment, moisture is supplied to the metal-containing film of the substrate on the thermal treatment plate and an atmosphere in the treatment chamber is exhausted from a central portion of the treatment chamber.
    Type: Application
    Filed: November 28, 2017
    Publication date: June 14, 2018
    Inventors: Yohei SANO, Shinichiro KAWAKAMI, Masashi ENOMOTO, Takahiro SHIOZAWA, Keisuke YOSHIDA, Tomoya ONITSUKA
  • Publication number: 20140083614
    Abstract: The gas supply unit includes first gas flow paths having an upstream side communicated with a common first gas supply hole and diverged on the way to have a downstream side, and second gas flow paths having an upstream side communicated with a common second gas supply hole and diverged on the way to have a downstream side. A flow path length and a flow path diameter of each of the diverged first gas flow paths and the diverged second gas flow paths are set such that periods of time for gas flowing from the first gas supply hole to the respective first gas ejecting holes are matched with each other, and periods of time for gas flowing from the second gas supply hole to the respective second gas ejecting holes are matched with each other.
    Type: Application
    Filed: September 19, 2013
    Publication date: March 27, 2014
    Applicant: Tokyo Electron Limited
    Inventors: Masashi Itonaga, Yohei Sano