Abstract: A radiation generating apparatus includes a radiation generating unit and a diaphragm unit that functions as a projector-collimator configured to simulate a radiation field with a visible-light field. The diaphragm unit includes a light source configured to generate visible light, an optical lens configured to control a state of diffusion of the visible light emitted from the light source, and field-limiting blades. The light source and the optical lens are provided between a radiation emission window and the field-limiting blades. The light source is movable into and retractable from a path of radiation generated by the radiation generating unit.

Abstract: A radiation generating apparatus 1 comprising a radiation generating unit 2 which emits radiation, and a movable diaphragm unit 3 which is arranged on the radiation generating unit 2, wherein the movable diaphragm unit 3 has restriction blades 18 which adjust a size of a radiation field, a light source 20 which emits visible light, and a reflecting plate 19 which reflects the visible light thereon and transmits the radiation therethrough, and simulatively shows the radiation field in a form of a visible light field by the visible light, wherein the light source 20 can be moved between a first position at which the light source 20 can simulatively show the radiation field by the visible light field, and a second position which is displaced from an irradiation path of the radiation which irradiates the radiation field.

Abstract: A radiation generating apparatus includes a radiation generating unit and a diaphragm unit that functions as a projector-collimator configured to simulate a radiation field with a visible-light field. The diaphragm unit includes a light source configured to generate visible light, an optical lens configured to control a state of diffusion of the visible light emitted from the light source, and field-limiting blades. The light source and the optical lens are provided between a radiation emission window and the field-limiting blades. The light source is movable into and retractable from a path of radiation generated by the radiation generating unit.

Abstract: Provided is a radiation generating apparatus, including: a radiation generating unit for emitting radiation; and a movable diaphragm unit including a light projecting/sighting system for making a simulation display of a radiation field with visible light. The light projecting/sighting system includes: a light source of the visible light; a light guiding plate that is provided across a radiation axis, and causes the visible light from the light source to exit from a front surface of the light guiding plate; and a louver that gives directivity to the visible light exiting from the front surface of the light guiding plate.

Abstract: An electrostatic lens includes a first electrode and a second electrode that are arranged oppositely relative to each other with a gap separating them from each other and the first and second electrodes have respective through-holes for allowing a charged particle beam to pass through the through-hole, wherein at least either the first electrode or the second electrode comprises two or more regions; and the through-hole of the electrode with the two or more regions is arranged at least in one of the regions; while the regions are electrically connected to each other by way of a resistor.

Abstract: An aperture that forms a charged particle beam includes a non-evaporable getter on a surface of the aperture. The non-evaporable getter is disposed in a position to which the charged particle beam is irradiated. The degradation of the exhaust performance around a charged particle source while the charged particle source is driven is suppressed.

Abstract: The present invention provides a non-evaporable getter for an FED which can remove a plurality of types of gases. The non-evaporable getter for the FED has a first layer containing titanium, and a second layer containing crystalline zirconium layered on the first layer. The average value of crystalline grain sizes of the crystalline zirconium is 3 nm or more but 20 nm or less.

Abstract: A manufacturing method of a vacuum airtight container includes a baking step of baking, in a vacuum atmosphere, a container in which a first non-evaporable getter and a second non-evaporable getter having an activation temperature higher than that of the first non-evaporable getter are disposed. The baking step further includes steps of baking the entire container by increasing the temperatures of the container to a temperature T1 and holding the temperature T1, which is equal to or higher than an activation temperature of the first non-evaporable getter and is lower than an activation temperature of the second non-evaporable getter. After holding the temperature T1, the entire container is baked by increasing the temperature of the container to a temperature T2, which is higher than the activation temperature of the second non-evaporable getter.

Abstract: Provided is a manufacturing method of forming an airtight container including an electron beam irradiation process for irradiating an electron beam to a non-evaporable type getter that has not been activated so as not to activate the non-evaporable type getter, and a sealing process for sealing a seal portion after the electron beam irradiation process.

Abstract: Provided is a manufacturing method of an airtight container, comprising: an electron beam irradiation process for irradiating an electron beam to a non-evaporable type getter that has not been activated so as not to activate the non-evaporable type getter; and a sealing process for sealing a seal portion after the electron beam irradiation process, and thereby forming the airtight container.

Abstract: To provide a method of manufacturing a vacuum airtight container, capable of activating a non-evaporable getter having a different activation temperature, without providing a process of giving external energy other than heat to be used in a baking process, the method of manufacturing the vacuum airtight container according to the present invention includes STEP 2 of activating only a first NEG by increasing a temperature in a decompression atmosphere up to a temperature T1 at which the first NEG is activated, and also includes STEP 4 of activating, after activating the first NEG, a second NEG by increasing the temperature in the decompression atmosphere up to a temperature T2 at which the second NEG is activated. The STEP 2 and the STEP 4 end in a baking step.

Abstract: The invention provides an image forming apparatus in which orbit shift can be prevented to perform good image display in an electron beam emitted from the electron-emitting device adjacent to the spacer when an antistatic spacer coated with a high resistance film is used. A surface shape is controlled by forming a fine particle film on the surface of a row directional wiring 5 in which a spacer 3 is arranged, the electron emission is realized from electron-emitting areas 14a and 14b near contacting areas 15a and 15b in a non-contacting area 16 in which the spacer 3 is not in contact with the row directional wiring 5, and the non-contacting area 16 of the spacer 3 is irradiated with the electron to decrease a potential, which allows a good equipotential line 17 to be formed.

Abstract: An electron beam apparatus in which a spacer having a high-resistance film coating a surface of a base material is inserted between a rear plate having electron emitting elements and row-direction wires, and a faceplate having a metal back. The row-direction wires and the metal back are electrically connected via the high-resistance film. An electric field near an electron emitting element near the spacer is maintained to substantially constant irrespective of the positional relationship between the spacer and the electron emitting element near the spacer. When a sheet resistance value of the high-resistance film on a first facing surface of the spacer that faces a row-direction wire is represented by R1, and a sheet resistance value of the high-resistance film on a side surface adjacent to the electron emitting element is represented by R2, R2/R1 is 10 to 200.

Abstract: To prevent an irregular shift of an electron beam emitted from an adjacent electron emitting device when preventing electrification of a spacer covered with a resistance film by using the spacer. A spacer 3 is set along a row-directional wiring 5 connected to a plurality of electron emitting devices 8 of a first substrate and a resistance film 14 formed on the surface of the spacer 3 is brought into contact with and electrically connected to a conductive member 11 such as a metal backing on a second substrate 2 and the row-directional wiring 5 on the first substrate while the shape of the contact face between the resistance film 14 and the row-directional wiring 5 or the resistance film 14 and the conductive member 11 has a concave shape or convex shape to be almost symmetric with respect to the center line of the spacer 3.

Abstract: In order to prevent a spacer from being charged by using a plate shaped spacer covered with a high resistance film, the present invention is aimed at preventing irregular displacements of electron beams emitted from adjacent electron-emitting devices and suppressing displacements of impinging positions of the electron beams emitted from the adjacent electron-emitting devices even with a slight displacement of an installation position of the spacer. The spacer is disposed along a row directional wiring. The high resistance film is allowed to come into contact with a metal back and the row directional wiring to achieve electrical connection therebetween. Contact portions between the high resistance film of the spacer and the row directional wiring are provided at predetermined intervals.

Abstract: An image forming apparatus comprises first and second substrates, a support frame arranged between the first and second substrates, and surrounding a space between the first and second substrates, electron emitting devices arranged on the first substrate facing the space, and an image forming member arranged on the second substrate. A spacer is disposed in the space between the first and second substrates, and a conductive film is arranged on the second substrate to surround the image forming member. The conductive film is supplied with a potential lower than that applied to the image forming member, and the spacer has a length greater than that of the image forming member. Each longitudinal end of the spacer is arranged between the inner periphery of the support frame and a respective plane through which a corresponding end of the conductive film extends perpendicularly to a principal surface of the second substrate.

Abstract: An irregular shift of the electron beam caused by a spacer is compensated without making a design change of the spacer. A rear plate 1 in which an electron source substrate 9 disposed with plural electron-emitting devices 8 emitting the electron is fixed and a face plate 2 in which a metal back 11 for accelerating the electron is formed are disposed in opposition to each other, and these plates are supported by the spacers 3 with constant intervals, and the initial velocity vector of the electron emitted from the electron-emitting device 8 is different according to the distance from the spacer 3.

Abstract: A display apparatus includes a vacuum case having a face plate and a rear plate with a conductive member on a surface, electrodes facing the conductive member in the vacuum case, and a spacer abutting one of the electrodes. The spacer has a concavity, and the interior surface of the concavity abuts the conductive member.

Abstract: In order to prevent a spacer from being charged by using a plate shaped spacer covered with a high resistance film, the present invention is aimed at preventing irregular displacements of electron beams emitted from adjacent electron-emitting devices and suppressing displacements of impinging positions of the electron beams emitted from the adjacent electron-emitting devices even with a slight displacement of an installation position of the spacer. The spacer is disposed along a row directional wiring. The high resistance film is allowed to come into contact with a metal back and the row directional wiring to achieve electrical connection therebetween. Contact portions between the high resistance film of the spacer and the row directional wiring are provided at predetermined intervals.

Abstract: In order to prevent a spacer from being charged by using a plate shaped spacer covered with a high resistance film, the present invention is aimed at preventing irregular displacements of electron beams emitted from adjacent electron-emitting devices and suppressing displacements of impinging positions of the electron beams emitted from the adjacent electron-emitting devices even with a slight displacement of an installation position of the spacer. The spacer is disposed along a row directional wiring. The high resistance film is allowed to come into contact with a metal back and the row directional wiring to achieve electrical connection therebetween. Contact portions between the high resistance film of the spacer and the row directional wiring are provided at predetermined intervals.