Patents by Inventor Yoichi Kubota

Yoichi Kubota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8908176
    Abstract: A spectral characteristic obtaining apparatus includes a detection unit detecting light quantities in plural wavelength bands from a measurement target, a storage unit storing pre-obtained spectral characteristics of the measurement target, a calculation unit calculating a primary transformation matrix from the light quantities and the pre-obtained spectral characteristics of at least one reference sample and a secondary transformation matrix from one of the pre-obtained spectral characteristics corresponding to a primary wavelength band and another one of the pre-obtained spectral characteristics corresponding to a secondary wavelength band, an estimation unit estimating the spectral characteristics of the measurement target by performing a primary estimation on the light quantities in the plural wavelength bands by using the primary transformation matrix, performing a secondary estimation on a result of the primary estimation by using the secondary transformation matrix, and compositing a result of the seco
    Type: Grant
    Filed: January 15, 2013
    Date of Patent: December 9, 2014
    Assignee: Ricoh Company, Ltd.
    Inventors: Yoichi Kubota, Naoko Shigemori, Naohiro Kamijo, Kohei Shimbo, Manabu Seo
  • Patent number: 8900464
    Abstract: A microelectronic interconnect element can include a plurality of first metal lines and a plurality of second metal lines interleaved with the first metal lines. Each of the first and second metal lines has a surface extending within the same reference plane. The first metal lines have surfaces above the reference plane and remote therefrom and the second metal lines have surfaces below the reference plane and remote therefrom. A dielectric layer can separate a metal line of the first metal lines from an adjacent metal line of the second metal lines.
    Type: Grant
    Filed: June 10, 2013
    Date of Patent: December 2, 2014
    Assignee: Invensas Corporation
    Inventors: Chang Myung Ryu, Kimitaka Endo, Belgacem Haba, Yoichi Kubota
  • Publication number: 20140333927
    Abstract: A spectral characteristic acquisition device includes a member configured to have a plurality of openings arrayed in a predetermined direction, each of the plurality of openings inclined with respect to the predetermined direction, the plurality of openings being configured to pass light beams from a plurality of positions on an object therethrough, a spectrally dispersing part configured to spectrally disperse the light beams having passed through the plurality of openings in a direction orthogonal to the predetermined direction, and a plurality of one-dimensional image capturing parts provided at a predetermined interval in a plurality of lines and configured to be irradiated with the light beams having been spectrally dispersed by the spectrally dispersing part, a plurality of pixels of the plurality of one-dimensional image capturing parts being arrayed in a direction parallel to the predetermined direction.
    Type: Application
    Filed: May 8, 2014
    Publication date: November 13, 2014
    Applicant: RICOH COMPANY, LTD.
    Inventors: Kohei SHIMBO, Naohiro Kamijo, Yoichi Kubota
  • Patent number: 8879057
    Abstract: A spectral characteristic acquiring apparatus is provided which includes: an area dividing part; a spectrum separating part; a light receiving part; and a calculating part, wherein the calculating part includes a transformation matrix storing part that stores a transformation matrix used for calculating the spectral characteristic corresponding to electrical signals of a first diffraction pattern group including two or more adjacent diffraction patterns, and a spectral characteristic calculating part that calculates, based on the electrical signals of the first diffraction pattern group and the corresponding transformation matrix, the spectral characteristic at the locations of the image carrying medium corresponding to the apertures of the first diffraction pattern group.
    Type: Grant
    Filed: July 27, 2012
    Date of Patent: November 4, 2014
    Assignee: Ricoh Company, Ltd.
    Inventors: Kohei Shimbo, Naohiro Kamijo, Yoichi Kubota, Manabu Seo
  • Publication number: 20140262460
    Abstract: A packaged microelectronic element includes connection component incorporating a dielectric layer (22) carrying traces (58) remote from an outer surface (26), posts (48) extending from the traces and projecting beyond the outer surface of the dielectric, and pads (30) exposed at the outer surface of the dielectric layer, the pads being connected to the posts by the traces. The dielectric element overlies the front surface of a microelectronic element, and contacts (74) exposed on the front surface of the microelectronic element are connected to the pads by elongated leads (76) such as wire bonds. Methods of making the connection component are also disclosed.
    Type: Application
    Filed: December 10, 2013
    Publication date: September 18, 2014
    Applicant: Tessera, Inc.
    Inventors: YOICHI KUBOTA, Tec-Gyu Kang, Jae Park, Belgacem Haba
  • Patent number: 8755046
    Abstract: A spectrometer includes a light source to project a light beam to a target object, a spectral element to disperse the light beam reflected by the target object and including a diffraction element to diffract the light beam, and a light receiving element to receive, at pixels, light beams with different spectral characteristics from each other dispersed by the spectral element, wherein the diffraction element and the light receiving element are integrally formed.
    Type: Grant
    Filed: March 7, 2013
    Date of Patent: June 17, 2014
    Assignee: Ricoh Company, Ltd.
    Inventors: Kohei Shimbo, Naohiro Kamijo, Yoichi Kubota, Manabu Seo
  • Publication number: 20140145329
    Abstract: A method includes applying a final etch-resistant material to an in-process substrate so that the final etch-resistant material at least partially covers first microcontact portions integral with the substrate and projecting upwardly from a surface of the substrate, and etching the surface of the substrate so as to leave second microcontact portions below the first microcontact portions and integral therewith, the final etch-resistant material at least partially protecting the first microcontact portions from etching during the further etching step. A microelectronic unit includes a substrate, and a plurality of microcontacts projecting in a vertical direction from the substrate, each microcontact including a base region adjacent the substrate and a tip region remote from the substrate, each microcontact having a horizontal dimension which is a first function of vertical location in the base region and which is a second function of vertical location in the tip region.
    Type: Application
    Filed: January 30, 2014
    Publication date: May 29, 2014
    Applicant: TESSERA, INC.
    Inventors: Belgacem Haba, Yoichi Kubota, Teck-Gyu Kang, Jae M. Park
  • Patent number: 8641913
    Abstract: A method includes applying a final etch-resistant material to an in-process substrate so that the final etch-resistant material at least partially covers first microcontact portions integral with the substrate and projecting upwardly from a surface of the substrate, and etching the surface of the substrate so as to leave second microcontact portions below the first microcontact portions and integral therewith, the final etch-resistant material at least partially protecting the first microcontact portions from etching during the further etching step. A microelectronic unit includes a substrate, and a plurality of microcontacts projecting in a vertical direction from the substrate, each microcontact including a base region adjacent the substrate and a tip region remote from the substrate, each microcontact having a horizontal dimension which is a first function of vertical location in the base region and which is a second function of vertical location in the tip region.
    Type: Grant
    Filed: March 13, 2007
    Date of Patent: February 4, 2014
    Assignee: Tessera, Inc.
    Inventors: Belgacem Haba, Yoichi Kubota, Teck-Gyu Kang, Jae M. Park
  • Publication number: 20130341299
    Abstract: A microelectronic interconnect element can include a plurality of first metal lines and a plurality of second metal lines interleaved with the first metal lines. Each of the first and second metal lines has a surface extending within the same reference plane. The first metal lines have surfaces above the reference plane and remote therefrom and the second metal lines have surfaces below the reference plane and remote therefrom. A dielectric layer can separate a metal line of the first metal lines from an adjacent metal line of the second metal lines.
    Type: Application
    Filed: June 10, 2013
    Publication date: December 26, 2013
    Inventors: Chang Myung RYU, Kimitaka ENDO, Belgacem HABA, Yoichi KUBOTA
  • Patent number: 8604348
    Abstract: A packaged microelectronic element includes connection component incorporating a dielectric layer (22) carrying traces (58) remote from an outer surface (26), posts (48) extending from the traces and projecting beyond the outer surface of the dielectric, and pads (30) exposed at the outer surface of the dielectric layer, the pads being connected to the posts by the traces. The dielectric element overlies the front surface of a microelectronic element, and contacts (74) exposed on the front surface of the microelectronic element are connected to the pads by elongated leads (76) such as wire bonds. Methods of making the connection component are also disclosed.
    Type: Grant
    Filed: June 8, 2011
    Date of Patent: December 10, 2013
    Assignee: Tessera, Inc.
    Inventors: Yoichi Kubota, Teck-Gyu Kang, Jae M. Park, Belgacem Haba
  • Patent number: 8593628
    Abstract: Spectral characteristics of an object is estimated using an extended sensor response, which includes a product of at least two light intensity signals whose wavelength ranges are partially overlapped with each other.
    Type: Grant
    Filed: June 21, 2011
    Date of Patent: November 26, 2013
    Assignee: Ricoh Company, Limited
    Inventors: Kohei Shimbo, Naohiro Kamijo, Manabu Seo, Yoichi Kubota
  • Patent number: 8559005
    Abstract: A spectral characteristic measuring device includes an illuminating unit that illuminates a medium; a light dividing unit that divides reflection light from the medium into reflection light beams; a first imaging unit that includes first lenses and second lenses arranged alternately in a staggered pattern and focuses the respective reflection light beams; a diffraction unit that includes a first diffraction region and a second diffraction region and diffracts the focused reflection light beams to form diffraction images; and a light receiving unit that includes plural pixels for receiving the diffraction images. The reflection light beams focused by the first lenses enter the first diffraction region to form first diffraction images, the reflection light beams focused by the second lenses enter the second diffraction region to form second diffraction images, and the first and second diffraction images are arranged alternately on the light receiving unit in a pixel arrangement direction.
    Type: Grant
    Filed: January 9, 2013
    Date of Patent: October 15, 2013
    Assignee: Ricoh Company, Ltd.
    Inventors: Kohei Shimbo, Naohiro Kamijo, Manabu Seo, Yoichi Kubota
  • Publication number: 20130235249
    Abstract: A spectrometer includes a light source to project a light beam to a target object, a spectral element to disperse the light beam reflected by the target object and including a diffraction element to diffract the light beam, and a light receiving element to receive, at pixels, light beams with different spectral characteristics from each other dispersed by the spectral element, wherein the diffraction element and the light receiving element are integrally formed.
    Type: Application
    Filed: March 7, 2013
    Publication date: September 12, 2013
    Applicant: Ricoh Company, Ltd.
    Inventors: Kohei SHIMBO, Naohiro KAMIJO, Yoichi KUBOTA, Manabu SEO
  • Publication number: 20130235376
    Abstract: A spectrometer includes a light source to project a light beam to a target object, an optical element including a plurality of apertures through which the light beam reflected by the target object transmits, a diffraction element to form diffracted images from a plurality of light beams having transmitted through the optical element, and a light receiving element to receive the diffracted images formed by the diffraction element and including an optical shield to block a diffracted image other than a certain-order diffracted image.
    Type: Application
    Filed: March 5, 2013
    Publication date: September 12, 2013
    Applicant: Ricoh Company, Ltd.
    Inventors: Naohiro KAMIJO, Kohei SHIMBO, Yoichi KUBOTA, Manabu SEO
  • Publication number: 20130182256
    Abstract: A spectral characteristic obtaining apparatus includes a detection unit detecting light quantities in plural wavelength bands from a measurement target, a storage unit storing pre-obtained spectral characteristics of the measurement target, a calculation unit calculating a primary transformation matrix from the light quantities and the pre-obtained spectral characteristics of at least one reference sample and a secondary transformation matrix from one of the pre-obtained spectral characteristics corresponding to a primary wavelength band and another one of the pre-obtained spectral characteristics corresponding to a secondary wavelength band, an estimation unit estimating the spectral characteristics of the measurement target by performing a primary estimation on the light quantities in the plural wavelength bands by using the primary transformation matrix, performing a secondary estimation on a result of the primary estimation by using the secondary transformation matrix, and compositing a result of the seco
    Type: Application
    Filed: January 15, 2013
    Publication date: July 18, 2013
    Applicant: RICOH COMPANY, LTD.
    Inventors: Yoichi KUBOTA, Naohiro Kamijo, Kohei Shimbo, Manabu Seo, Naoko Shigemori
  • Publication number: 20130182251
    Abstract: A spectral characteristic measuring device includes an illuminating unit that illuminates a medium; a light dividing unit that divides reflection light from the medium into reflection light beams; a first imaging unit that includes first lenses and second lenses arranged alternately in a staggered pattern and focuses the respective reflection light beams; a diffraction unit that includes a first diffraction region and a second diffraction region and diffracts the focused reflection light beams to form diffraction images; and a light receiving unit that includes plural pixels for receiving the diffraction images. The reflection light beams focused by the first lenses enter the first diffraction region to form first diffraction images, the reflection light beams focused by the second lenses enter the second diffraction region to form second diffraction images, and the first and second diffraction images are arranged alternately on the light receiving unit in a pixel arrangement direction.
    Type: Application
    Filed: January 9, 2013
    Publication date: July 18, 2013
    Inventors: Kohei Shimbo, Naohiro Kamijo, Manabu Seo, Yoichi Kubota
  • Patent number: 8472019
    Abstract: A spectroscopic characteristics acquisition unit includes a light emitting unit to illuminate a measurement target; a lens array including lenses to receive reflected light reflected from the measurement target; a light blocking member having a pinhole array including openings; a focusing unit to focus light coming from the pinhole array; a diffraction unit to diffract the light to different directions depending on wavelength of light received by the focusing unit; and a light receiving unit to receive the reflected light diffracted by the diffraction unit. The light receiving unit includes a spectroscopic sensor array having spectroscopy sensors including pixels. Each of the lenses constituting the lens array corresponds to one of the openings of the pinhole array. The numerical aperture NA of the lens in the arrangement direction in the lens array satisfies the formula NA>sin(?max) with respect to the maximum angle of view ?max of the focusing unit.
    Type: Grant
    Filed: March 1, 2011
    Date of Patent: June 25, 2013
    Assignee: Ricoh Company, Ltd.
    Inventors: Manabu Seo, Naohiro Kamijo, Kohei Shimbo, Yoichi Kubota
  • Patent number: 8461460
    Abstract: A microelectronic interconnect element can include a plurality of first metal lines and a plurality of second metal lines interleaved with the first metal lines. Each of the first and second metal lines has a surface extending within the same reference plane. The first metal lines have surfaces above the reference plane and remote therefrom and the second metal lines have surfaces below the reference plane and remote therefrom. A dielectric layer can separate a metal line of the first metal lines from an adjacent metal line of the second metal lines.
    Type: Grant
    Filed: July 8, 2009
    Date of Patent: June 11, 2013
    Assignee: Invensas Corporation
    Inventors: Chang Myung Ryu, Kimitaka Endo, Belgacem Haba, Yoichi Kubota
  • Publication number: 20130063723
    Abstract: A spectral characteristic acquiring apparatus is provided which includes: an area dividing part; a spectrum separating part; a light receiving part; and a calculating part, wherein the calculating part includes a transformation matrix storing part that stores a transformation matrix used for calculating the spectral characteristic corresponding to electrical signals of a first diffraction pattern group including two or more adjacent diffraction patterns, and a spectral characteristic calculating part that calculates, based on the electrical signals of the first diffraction pattern group and the corresponding transformation matrix, the spectral characteristic at the locations of the image carrying medium corresponding to the apertures of the first diffraction pattern group.
    Type: Application
    Filed: July 27, 2012
    Publication date: March 14, 2013
    Applicant: RICOH COMPANY, LTD.
    Inventors: Kohei SHIMBO, Naohiro KAMIJO, Yoichi KUBOTA, Manabu SEO
  • Patent number: 8329581
    Abstract: A microelectronic package includes a microelectronic element having faces and contacts, the microelectronic element having an outer perimeter, and a substrate overlying and spaced from a first face of the microelectronic element, whereby an outer region of the substrate extends beyond the outer perimeter of the microelectronic element. The microelectronic package includes a plurality of etched conductive posts exposed at a surface of the substrate and being electrically interconnected with the microelectronic element, whereby at least one of the etched conductive posts is disposed in the outer region of the substrate. The package includes an encapsulating mold material in contact with the microelectronic element and overlying the outer region of the substrate, the encapsulating mold material extending outside of the etched conductive posts for defining an outermost edge of the microelectronic package.
    Type: Grant
    Filed: July 14, 2011
    Date of Patent: December 11, 2012
    Assignee: Tessera, Inc.
    Inventors: Belgacem Haba, Masud Beroz, Teck-Gyu Kang, Yoichi Kubota, Sridhar Krishnan, John B. Riley, III, Ilyas Mohammed