Abstract: A coal is finely pulverized. The finely pulverized coal is subjected to dry distillation. A tar obtained by the dry distillation is added to an aqueous slurry together with the dry-distilled coal to effect the submerged granulation.

Abstract: A flame-retardant resin composition comprising (A) at least one polymer resin selected from the group consisting of thermoplastic polyesters and thermoplastic polycarbonates and, per 100 parts by weight of the polymer resin, (B) 0.1 to 30 parts by weight, as the weight of the halogen element, of an organic halogen compound, and (C) 0.1 to 20 parts by weight, as the weight of the antimony element, of antimony trioxide treated with an alkoxysilane compound. The composition may further comprise up to 30 parts by weight of an organic acid ester compoundf and/or up to 200 parts by weight of a filler, per 100 parts by weight of the polymer resin.

Abstract: The present invention relates to a method for forming ultra fine patterns on films of polymethyl isopropenyl ketone or a mixture of polymethyl isopropenyl ketone and a benzophenone compound by exposing such films to ultra violet rays in the range of from 1,000 to 3,500 A. The present invention is particularly useful for providing semiconductors having ultra fine patterns and ultra LSI's. The electric or electronic circuits for electronic or electric apparatus and equipment have been produced by wiring resistors, condensers, coils, vacuum tubes and the like necessary components. However, because of various disadvantages such as assembly requiring much time, complication of work, necessity of using large equipment, reasons or causes for errors, limitation of productivity, impossibility of reducing price or cost and the like, the present invention has been developed for printed circuit boards.

Abstract: The present invention relates to a method for forming ultra fine patterns on films of polymethyl isopropenyl ketone or a mixture of polymethyl isopropenyl ketone and a benzophenone compound by exposing such films to ultra violet rays in the range of from 1,000 to 3,500 A. The present invention is particularly useful for providing semiconductors having ultra fine patterns and ultra LSI's. The electric or electronic circuits for electronic or electric apparatus and equipment have been produced by wiring resistors, condensers, coils, vacuum tubes and the like necessary components. However, because of various disadvantages such as assembly requiring much time, complication of work, necessity of using large equipment, reasons or causes for errors, limitation of productivity, impossibility of reducing price or cost and the like, the present invention has been developed for printed circuit boards.

Abstract: A sensitive composition comprising polymethyl isopropenyl ketone of limited molecular weight and a compound of a given general formula. The formation of a pattern of less than 1 .mu.m is made possible by employing ultraviolet rays of wave lengths of 100-350 nm in place of those of 350-450 nm utilized in conventional processes. The sensitive composition is highly sensitive to ultraviolet rays in said wave range and reproduces a fine pattern precisely.

Abstract: A method for the preparation of a modified crystalline propylene polymer usable as a bonding material is disclosed, in which method a crystalline propylene polymer, for example, isotactic polypropylene and a propylene-ethylene block or random copolymer, is uniformly admixed with a modifying composition consisting of at least one organic peroxide, and a modifying agent consisting of .gamma.-methacryloyloxypropyl trimethoxysilane (Component (1)) and at least one ethylenically unsaturated organic compound (Component (2)) selected from the groups consisting of the formulae (I) through (V): ##STR1## wherein R.sub.1 through R.sub.

Abstract: A modified crystalline propylene polymer usable as a bonding material is prepared by uniformly admixing a crystalline propylene polymer, for example, isotactic polypropylene and propylene-ethylene block or random copolymer, with at least (a) one modifying agent of the formula (I) or (II): ##EQU1## or ##SPC1##Wherein R represents a hydrogen atom or methyl radical, Me represents a Metal atom selected from Groups I, II, III and VIII in the Periodic Table, l represents an integer corresponding to the valence of the Metal atom Me, and m and n each represent 0 or 1, and (b) an organic peroxide, and heating the above admixture at a temperature not lower than the melting point and not higher than the thermal decomposing point of said crystalline propylene polymer.