Patents by Inventor Yoichi Ueda

Yoichi Ueda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040265471
    Abstract: The present invention relates to a method for producing a cysteine-rich food material by maintaining a food material containing &ggr;-glutamylcysteine at a ratio of at least 1 wt % to the solid content thereof at a temperature ranging from 50 to 120° C. and at a pH ranging from 1 to 7. This process is conducted in the absence of a sugar and in the presence of water. The present invention also relates to a method for producing a cysteine-rich food material by reacting the food material with a &ggr;-glutamyl peptide hydrolase at a pH ranging from 3 to 9 and at a temperature ranging from 15 to 70° C. in the present of water. Further, the present invention relates to a method for producing a flavor-enhancing material for use in food, food products obtained by these processes, and yeast cells or extracts for use in food products.
    Type: Application
    Filed: December 2, 2002
    Publication date: December 30, 2004
    Applicant: AJINOMOTO CO. INC
    Inventors: Masanori Kohmura, Yasushi Nishimura, Koh-ichiro Sano, Hirokazu Kawaguchi, Gaku Hibino, Reiko Sugimoto, Hiroaki Nishiuchi, Hidehiko Wakabayashi, Yoichi Ueda, Kyousuke Ishiguro, Minori Ishiguro, Tatsuya Ishiguro, Shouji Ishiguro, Youhei Ishiguro
  • Publication number: 20040219636
    Abstract: The object of the present invention is to provide Koji mold aminopeptidases capable of efficiently hydrolyzing persistent peptides and also genes encoding the aminopeptidases. The present invention provides Aspergillus nidulans aminopeptidase and nucleic acid molecules encoding it. In particular, the present invention provides a protein having an amino acid sequence represented by amino acid Nos. 1 to 519 in SEQ ID NO: 2, or a protein containing the substitution, deletion, insertion, addition or inversion of one or more amino acids in said sequence, and which protein has an activity of catalyzing the reaction for releasing an amino acid at an N-terminal of a peptide, and nucleic acid molecules encoding them.
    Type: Application
    Filed: September 22, 2003
    Publication date: November 4, 2004
    Applicant: AJINOMOTO CO., INC.
    Inventors: Kyoko Koibuchi, Daiki Ninomiya, Mari Kojima, Yoichi Ueda, Jun-ichi Maruyama, Katsuhiko Kitamoto
  • Publication number: 20040028787
    Abstract: In the present application are disclosed a method for enhancing or improving the flavor of foods or drinks in general with the use of a non-volatile thiazolidine compound alone or a non-volatile flavor compound and/or a reaction flavor concurrently with the non-volatile thiazolidine compound, a simple and effective method for improving the flavor of a retort food by suppressing the flavor-deterioration upon heat sterilization or the unpleasant odor at the time of eating, and a simple and effective method for improving the flavor of a soybean-incorporated food product by suppressing the unpleasant, weed-like odor peculiar to soybean.
    Type: Application
    Filed: July 17, 2003
    Publication date: February 12, 2004
    Inventors: Hirokazu Kawaguchi, Hidehiko Wakabayashi, Masanori Kohmura, Mika Uda, Yasushi Nishimura, Yoichi Ueda
  • Publication number: 20030138521
    Abstract: Disclosed in this application are a method for producing a food material containing cysteinylglycine at a high content, which comprises the step of (a) maintaining a starting food material containing glutathione in a ratio of 1% by weight or more based on the solid content at a temperature of 50 to 120° C. and a pH of 1 to 7 in the presence of water, or (b) treating the food material with a &ggr;-glutamylpeptide hydrolase at a temperature of 15 to 70° C. and a pH of 3 to 9 in the presence of water, whereby a food material rich in cysteinylglycine is allowed to result, as well as a method for producing a food flavor (or savor) enhancer, which comprises the steps of (a) adding a sugar to cysteinylglycine or a food material containing cysteinylglycine in a ratio of 0.5% by weight or more based on the solid content, and (b) heating the resulting mixture at a temperature of 70 to 180° C.
    Type: Application
    Filed: January 2, 2003
    Publication date: July 24, 2003
    Inventors: Yasushi Nishimura, Yuji Kato, Masanori Kohmura, Yoichi Ueda
  • Publication number: 20030124684
    Abstract: Yeast extract is produced by using a strain of Saccharomyces cerevisiae, which can contain 1% by weight or more of &ggr;-glutamylcysteine and contains 0.004-0.1% by weight of glutathione during its logarithmic growth phase, when the strain is cultured in a medium in which a glutathione synthetase deficient strain shows a slower growth rate than a wild strain of Saccharomyces cerevisiae, for example, a strain of Saccharomyces cerevisiae, wherein glutathione synthetase encoded by a glutathione synthetase gene on a chromosome has deletion of a C-terminus region from the 370th arginine residue. There are provided yeast that can be used for production at industrial level and shows a high &ggr;-glutamylcysteine accumulation amount, and yeast extract produced by using the yeast.
    Type: Application
    Filed: January 25, 2002
    Publication date: July 3, 2003
    Inventors: Hiroaki Nishiuchi, Kouichiro Sano, Reiko Sugimoto, Yoichi Ueda
  • Publication number: 20020067763
    Abstract: Data are transmitted only at FEXT interval. Data transmission is stopped at NEXT interval. Concretely, in a dual bit map system, a NEXT-use bit map is set so that the transmission rate becomes zero. This setting is forcibly done on a receiving side where the bit map is created. Moreover, while the data transmission is being stopped, the operation of the transmission digital filter, transmission analog filter and the like of an xDSL modem is stopped to avoid wasteful power consumption.
    Type: Application
    Filed: April 19, 2001
    Publication date: June 6, 2002
    Inventors: Noriyasu Suzuki, Yoichi Ueda
  • Publication number: 20010021219
    Abstract: An xDSL transceiver comprising a transmission unit for transmitting a DMT-modulated signal through a subscriber line as a transmission path and a receiving unit for receiving the DMT-modulated signal from the subscriber line. The xDSL transceiver further comprises an echo signal suppression unit for suppressing the echo signal from the transmission unit to the receiving unit by matching the phase between the frame of the transmission signal and the frame of the receiving signal.
    Type: Application
    Filed: November 29, 2000
    Publication date: September 13, 2001
    Applicant: FUJITSU LIMITED
    Inventors: Takashi Sasaki, Masato Hori, Kumiko Maruo, Akira Oshima, Noriyasu Suzuki, Yoichi Ueda
  • Patent number: 6037438
    Abstract: A cyanate resin composition comprising as essential components a cyanate compound represented by formula (1) or its prepolymer and a curing agent: ##STR1## wherein each of R.sub.1 and R.sub.2 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms; A represents an alkyl group having 1 to 3 carbon atoms; i represents an integer of 0 to 3 alone or together with a brominated epoxy compound or a maleimide compound or its prepolymer, said cyanate resin composition giving a cured product having a low-dielectric constant, and a copper-clad laminate composed of a prepreg of said cyanate resin composition and a copper foil.
    Type: Grant
    Filed: December 19, 1995
    Date of Patent: March 14, 2000
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Yasuhiro Endo, Yoichi Ueda, Toshiaki Hayashi, Mitsuhiro Shibata, Shuichi Kanagawa, Shinichiro Kitayama, Hisashi Watabu
  • Patent number: 5846307
    Abstract: Disclosed is an aqueous pigment ink composition comprising water and oxidized carbon black dispersed stably in the water, wherein said oxidized carbon black is obtained by oxidizing carbon black using hypohalous acid and/or salt thereof and wherein at least a part of an acidic group existing on the surface of said oxidized carbon black associates with an amine compound to form an ammonium salt. The aqueous pigment ink composition realizes smooth printing with ink jet nozzle, and smooth writing with fine pen tip and it has sufficient density. Further, the recorded traces obtained by using the ink composition is excellent in water resistance.
    Type: Grant
    Filed: April 16, 1997
    Date of Patent: December 8, 1998
    Assignee: Orient Chemical Industries, Ltd.
    Inventors: Toshiyuki Nagasawa, Sohko Itoh, Yoichi Ueda
  • Patent number: 5708684
    Abstract: A high-frequency signal output from an active radio transmitter is input to a phase comparator via a standby radio receiver. A transmitting data processing unit delays a frame data signal and a clock signal by a predetermined time and inputs them to the phase comparator. The phase comparator compares the phases of the two frame data signals and the two clock signals, and the delay time adjuster in the active radio transmitter adjusts the phases of the frame data signal and the clock signal input from the data processing unit so that the phases of both data signals and clock signals are coincident with each other. Similarly, the delay time adjuster in the standby radio transmitter adjusts the phases of the data signal and the clock signal input from the data processing unit. In this manner, the delay times (signal phases) of the active radio transmitter and the standby radio transmitter are automatically adjusted during the operation of a radio equipment.
    Type: Grant
    Filed: August 10, 1995
    Date of Patent: January 13, 1998
    Assignee: Fujitsu Limited
    Inventor: Yoichi Ueda
  • Patent number: 5665166
    Abstract: Disclosed is a plasma processing apparatus, comprising a first electrode on which an object to be processed is to be disposed, a second electrode arranged to face the first electrode, a high frequency power supply for supplying a high frequency power between the first and second electrodes, a processing gas supplying mechanism for forming a plasma into a region between the first and second electrodes, and a bias potential detecting mechanism for detecting the bias potential of the first electrode. The bias detecting mechanism has a detecting terminal positioned in the vicinity of the object to be processed.
    Type: Grant
    Filed: October 23, 1996
    Date of Patent: September 9, 1997
    Assignee: Tokyo Electron Limited
    Inventors: Youichi Deguchi, Satoru Kawakami, Yoichi Ueda, Mitsuaki Komino
  • Patent number: 5567267
    Abstract: A susceptor of a plasma etching apparatus is arranged on a heater fixing frame incorporating a heater. The fixing frame is arranged on a cooling block containing liquid nitrogen. A boundary clearance is formed between the fixed frame and the cooling block and on a heat transfer path. A method of controlling the temperature of the susceptor includes an initialization mode, an idle mode following the initialization mode, process and maintenance modes selectively following the idle mode. The initialization mode includes the steps of filling the boundary clearance with a heat transfer gas and observing a change in temperature of the susceptor caused by cold transferred from the cooling block. The idle mode is executed after the temperature of the susceptor reaches a predetermined temperature. The idle mode includes the step of exhausting the boundary clearance to set it in a vacuum state to sever the heat transfer path.
    Type: Grant
    Filed: November 19, 1993
    Date of Patent: October 22, 1996
    Assignee: Tokyo Electron Limited
    Inventors: Kouichi Kazama, Mitsuaki Komino, Kenji Ishikawa, Yoichi Ueda
  • Patent number: 5563237
    Abstract: A cyanate resin composition suitable for a copper-clad laminate comprises components (A) and (B).(A) a cyanate compound of the formula: ##STR1## wherein R and Q each represents halogen, C.sub.1-10 alkyl, C.sub.5-7 cycloalkyl or C.sub.6-20 hydrocarbon; i and j each represents 0-4 and M is (2): ##STR2## wherein T represents halogen, C.sub.1-10 alkyl, C.sub.5-7 cycloalkyl or C.sub.6-20 hydrocarbon; k represents 0-10 and m represents 0-8, and(B) a hardener.
    Type: Grant
    Filed: February 23, 1994
    Date of Patent: October 8, 1996
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Yasuhiro Endo, Yoichi Ueda, Toshiaki Hayashi, Mitsuhiro Shibata, Shinichiro Kitayama, Shuichi Kanagawa, Hisashi Watabu
  • Patent number: 5478429
    Abstract: The present invention provides a plasma process apparatus wherein RF power is applied to a process gas, thereby to convert the gas into plasma for processing an object, the apparatus having a process chamber, an upper electrode located in the process chamber and having a gas-supplying section for supplying a process gas, a lower electrode located in the process chamber, having a cooling means, and opposing the upper electrode, for supporting an object, and RF power supplying means electrically connected to the lower electrode, protruding from the process chamber and connected to a RF power supply, for supplying RF power between the upper and lower electrodes, wherein the RF power supplying means includes, an outer conductive pipe surrounding the inner conductive rod and spaced therefrom, and a fixing member inserted between the inner conductive rod and the outer conductive pipe and having concaves and convexes, the inner conductive rod and the outer conductive pipe being electrically connected to an RF power
    Type: Grant
    Filed: January 19, 1994
    Date of Patent: December 26, 1995
    Assignee: Tokyo Electron Limited
    Inventors: Mitsuaki Komino, Yoichi Ueda, Youichi Deguchi, Satoru Kawakami
  • Patent number: 5376213
    Abstract: A plasma etching apparatus includes a wafer-mount arranged in an aluminum-made process chamber. The wafer-mount comprises an aluminum-made susceptor, a heater fixing frame and a cooling block, and a ceramics heater is attached to the heater fixing frame. A bore in which liquid nitrogen is contained is formed in the cooling block. The cold of the cooling block is transmitted to a wafer on the susceptor to cool it while it is being etched. The ceramics heater adjusts the temperature of the wafer cooled. Liquid nitrogen is circulated in the bore in the cooling block, passing through coolant passages defined by a pair of joint devices which connect the bottom of the process chamber and the cooling block to each other.
    Type: Grant
    Filed: July 28, 1993
    Date of Patent: December 27, 1994
    Assignee: Tokyo Electron Limited
    Inventors: Yoichi Ueda, Mitsuaki Komino, Koichi Kazama
  • Patent number: 5223113
    Abstract: A semiconductor wafers processing apparatus comprises a susceptor for mounting and fixing a wafer thereon, a cooling jacket for cooling the susceptor, a process chamber whose wall encloses the susceptor and the cooling jacket, an O-ring for shielding from process atmosphere in the process chamber a clearance formed between an inner cylinder of the process chamber wall and the outer circumferences of the susceptor and the cooling jacket, and an exhaust pump for exhausting gas in the clearance. It further comprises load lock chambers for carrying the wafer into and out of the process chamber, and heat insulating members interposed between those faces of the process chamber and each of the load lock chambers which are opposed to each other. The process chamber wall can be heat-insulated from the susceptor and the cooling jacket by the exhausted clearance and the process chamber can be heat-insulated from each of the load lock chambers by the heat insulating members.
    Type: Grant
    Filed: July 18, 1991
    Date of Patent: June 29, 1993
    Assignees: Tokyo Electron Limited, Kabushiki Kaisha Toshiba
    Inventors: Satoshi Kaneko, Taichi Fugita, Toshihisa Nozawa, Yoichi Ueda, Yukimasa Yoshida, Isahiro Hasegawa, Haruo Okano
  • Patent number: 4359663
    Abstract: An AC plasma display panel with a coated thin film dielectric layer on the electrodes has a structure which includes double layers of chromium (Cr) and copper (Cu). After three metal layers of chromium, copper, and chromium are formed on a glass substrate, these three metal layers are subjected to patterning with the desired electrode pattern in such a fashion as to eliminate the upper chromium layer. Then, a thin dielectric film of alumina (Al.sub.2 O.sub.3) is evaporated onto the two remaining metal layers forming the electrodes. This combination of two layer metal electrodes and dielectric layer is very useful in providing a self-shifting plasma display panel having high quality and reliability.
    Type: Grant
    Filed: October 5, 1979
    Date of Patent: November 16, 1982
    Assignee: Fujitsu Limited
    Inventors: Tsutae Shinoda, Shizuo Andoh, Yoichi Ueda, Yoshinori Miyashita
  • Patent number: 4138626
    Abstract: A first glass substrate supports a plurality of electrodes arranged in concentric circles. A second glass substrate supports a plurality of shift electrodes arranged radially. The substrates are positioned face to face with a specified space between them filled with an ionizable gas. The radially arranged shift electrodes are periodically connected to common buses each connected to a corresponding one of a plurality of shift driver circuits equal in number to the buses. At least one of the shift electrodes is selectively connected to a write driver circuit and to one of the shift driver circuits. When the one of the shift electrodes is energized by a signal from the write driver circuit, discharge spots are generated at the intersection of the one of the shift electrodes and the concentrically arranged electrodes.
    Type: Grant
    Filed: May 26, 1976
    Date of Patent: February 6, 1979
    Assignee: Fujitsu Limited
    Inventors: Tomoyuki Unotoro, Yoichi Ueda, Yasunari Shirouchi, Hideo Yamashita, Sei Sato, Kenji Murase