Patents by Inventor Yoichiro Tabata
Yoichiro Tabata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11505463Abstract: A small-scale application apparatus including an ozone generation apparatus configured to generate ozone gas, the application apparatus being configured to perform ozone usage processing. The ozone generation apparatus includes a load-resonant high-frequency step-up transformer configured to obtain a stepped-up high-frequency voltage and an ozone generator configured to receive the stepped-up high-frequency voltage as an operating voltage to generate the ozone gas having an ozone concentration of at least 200 g/m3 from raw gas containing oxygen gas. The application apparatus receives the ozone gas under a pressure environment of at least 0.2 MPa.Type: GrantFiled: August 9, 2017Date of Patent: November 22, 2022Assignee: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATIONInventors: Yoichiro Tabata, Yuji Ono, Takasho Sato
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Patent number: 11466366Abstract: An electric discharge generator and power supply device of electric discharge generator includes a radical gas generation apparatus, a process chamber apparatus, and an n-phase inverter power supply device. The radical gas generation apparatus is located adjacent to the process chamber apparatus. The radical gas generation apparatus includes a plurality of (n) discharge cells. The n-phase inverter power supply device includes a power supply circuit configuration offering a means to control output of n-phase alternating current voltages and variably controls, according to positions of the plurality of discharge cells, the alternating current voltages of different phases.Type: GrantFiled: October 29, 2014Date of Patent: October 11, 2022Assignee: TOSHIBA MITSUBISHI—ELECTRIC INDUSTRIAL SYSTEMS CORPORATIONInventors: Yoichiro Tabata, Kensuke Watanabe, Shinichi Nishimura
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Patent number: 11453945Abstract: A gas ejector of a gas supply apparatus includes a nozzle portion. The opening of a first-stage restricting cylinder constituting the nozzle portion has a circular cross-sectional shape with a diameter r1. A second-stage restricting cylinder is continuously formed with the first-stage restricting cylinder along a Z direction. The opening of the second-stage restricting cylinder has a circular cross-sectional shape with a diameter r2, and supplies a source gas supplied from the first-stage restricting cylinder to a low-vacuum processing chamber below. At this time, the diameter r2 is set to satisfy “r2>r1”.Type: GrantFiled: June 1, 2020Date of Patent: September 27, 2022Assignee: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATIONInventors: Shinichi Nishimura, Kensuke Watanabe, Yoichiro Tabata
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Patent number: 11239059Abstract: The present invention has features (1) to (3). The feature (1) is that “an active gas generation electrode group is formed in such a manner that a ground side electrode component supports a high-voltage side electrode component”. The feature (2) is that “stepped parts are provided in a discharge space outside region of a dielectric electrode in the high-voltage side electrode component, and project downward, and by a formation height of these stepped parts, the gap length of a discharge space is defined”. The feature (3) is that “the high-voltage side electrode component and the ground side electrode component are formed to have the thickness of a discharge space formation region relatively thin and the thickness of a discharge space outside region relatively thick”.Type: GrantFiled: January 10, 2018Date of Patent: February 1, 2022Assignee: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATIONInventors: Kensuke Watanabe, Shinichi Nishimura, Ren Arita, Yoshihito Yamada, Yoichiro Tabata
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Patent number: 11007497Abstract: A gas jetting apparatus capable of uniformly jetting, even onto a treatment-target object having a high-aspect-ratio groove, a gas into the groove. The gas jetting apparatus includes a gas jetting cell unit for jetting a gas toward a treatment-target object. The gas jetting cell unit includes a first cone-shaped member and a second cone-shaped member. A gap is formed between a side surface of a first cone shape and a side surface of the second cone-shaped member. Apex sides of the cone-shaped members face the treatment-target object.Type: GrantFiled: October 29, 2014Date of Patent: May 18, 2021Assignee: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATIONInventors: Yoichiro Tabata, Kensuke Watanabe, Shinichi Nishimura
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Patent number: 10879085Abstract: Six gas generator units each including a gas generator, one unit of multiple AC power supply section that supplies six high frequency AC voltages to the six gas generator units, one unit of gas control section that controls raw material gas and output gas in the six gas generator units, and one unit of control/operation section constituting section that performs an AC power control operation to allow six high frequency AC voltages having desired electric energy, independent from each other, to be supplied. The six gas generator units, one unit of multiple AC power supply section, one unit of gas control section, and one unit of control/operation section constituting section are integrally provided.Type: GrantFiled: December 19, 2016Date of Patent: December 29, 2020Assignee: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATIONInventors: Yoichiro Tabata, Yuji Ono, Takasho Sato
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Publication number: 20200343078Abstract: The present invention has features (1) to (3). The feature (1) is that “an active gas generation electrode group is formed in such a manner that a ground side electrode component supports a high-voltage side electrode component”. The feature (2) is that “stepped parts are provided in a discharge space outside region of a dielectric electrode in the high-voltage side electrode component, and project downward, and by a formation height of these stepped parts, the gap length of a discharge space is defined”. The feature (3) is that “the high-voltage side electrode component and the ground side electrode component are formed to have the thickness of a discharge space formation region relatively thin and the thickness of a discharge space outside region relatively thick”.Type: ApplicationFiled: January 10, 2018Publication date: October 29, 2020Applicant: Toshiba Mitsubishi-Electric Industrial Systems CorporationInventors: Kensuke WATANABE, Shinichi NISHIMURA, Ren ARITA, Yoshihito YAMADA, Yoichiro TABATA
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Patent number: 10793953Abstract: In an activated gas generation apparatus, metal electrodes are formed on a bottom surface of a dielectric electrode, and are disposed so as to face each other with a central region of the dielectric electrode interposed therebetween in plan view. The metal electrodes face each other along the Y direction. A wedge-shaped stepped part is provided so as to protrude upward in the central region on an upper surface of the dielectric electrode. The wedge-shaped stepped part is formed so as to have a shorter formation width in the Y direction as approaching each of a plurality of gas spray holes in plan view.Type: GrantFiled: January 18, 2016Date of Patent: October 6, 2020Assignee: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATIONInventors: Kensuke Watanabe, Shinichi Nishimura, Yoichiro Tabata
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Publication number: 20200291515Abstract: A gas ejector of a gas supply apparatus includes a nozzle portion. The opening of a first-stage restricting cylinder constituting the nozzle portion has a circular cross-sectional shape with a diameter r1. A second-stage restricting cylinder is continuously formed with the first-stage restricting cylinder along a Z direction. The opening of the second-stage restricting cylinder has a circular cross-sectional shape with a diameter r2, and supplies a source gas supplied from the first-stage restricting cylinder to a low-vacuum processing chamber below. At this time, the diameter r2 is set to satisfy “r2>r1”.Type: ApplicationFiled: June 1, 2020Publication date: September 17, 2020Applicant: Toshiba Mitsubishi-Electric Industrial Systems CorporationInventors: Shinichi NISHIMURA, Kensuke WATANABE, Yoichiro TABATA
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Patent number: 10745277Abstract: As a metal compound layer provided between a dielectric and a ground electrode of an ozone generator, there is used a metal compound satisfying the condition (1) the metal compound is not a substance promoting ozone decomposition, the condition (2) the metal compound is not a conductor, the condition (3) the band gap of the metal compound layer is in the range of 2.0 to 4.0 (eV), and the condition (4) the hole potential of a valence band portion formed in the excited state of the metal compound layer is larger than the binding potential (1.25 (eV)) of an oxygen molecule. In addition, as ozone generation processing are executed under an environment in which various ozone decomposition suppression requirements for suppressing a decomposition amount of ozone are imposed on the ozone generator.Type: GrantFiled: December 8, 2015Date of Patent: August 18, 2020Assignee: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATIONInventors: Takasho Sato, Yoichiro Tabata, Yuji Ono
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Publication number: 20200207620Abstract: A small-scale application apparatus including an ozone generation apparatus configured to generate ozone gas, the application apparatus being configured to perform ozone usage processing. The ozone generation apparatus includes a load-resonant high-frequency step-up transformer configured to obtain a stepped-up high-frequency voltage and an ozone generator configured to receive the stepped-up high-frequency voltage as an operating voltage to generate the ozone gas having an ozone concentration of at least 200 g/m3 from raw gas containing oxygen gas. The application apparatus receives the ozone gas under a pressure environment of at least 0.2 MPa.Type: ApplicationFiled: August 9, 2017Publication date: July 2, 2020Applicant: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATIONInventors: Yoichiro TABATA, Yuji ONO, Takasho SATO
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Patent number: 10676825Abstract: The gas jetting apparatus according to the present invention includes a gas jetting cell unit for rectifying a gas and jetting the rectified gas into the film formation apparatus. The gas jetting cell unit has a fan shape internally formed with a gap serving as a gas route. A gas in a gas dispersion supply unit enters from a wider-width side of the fan shape into the gap, and, due to the fan shape, the gas is rectified, accelerated, and output from a narrower-width side of the fan shape into the film formation apparatus.Type: GrantFiled: October 29, 2014Date of Patent: June 9, 2020Assignee: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATIONInventors: Yoichiro Tabata, Kensuke Watanabe, Shinichi Nishimura
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Patent number: 10450654Abstract: In a radical gas generation system according to the present invention, a process chamber apparatus includes a table that causes a target object to rotate. A radical gas generator includes a plurality of discharge cells. Each of the plurality of discharge cells includes an opening. The opening is connected to the inside of the process chamber apparatus and faces the target object. Through the opening, a radical gas is output. Of the plurality of discharge cells, a discharge cell located farther from a center position of the rotation of the target object in a plan view includes a larger facing surface area that is a region in which a first electrode member and a second electrode member face each other.Type: GrantFiled: October 29, 2014Date of Patent: October 22, 2019Assignee: Toshiba Mitsubishi-Electric Industrial Systems CorporationInventors: Kensuke Watanabe, Yoichiro Tabata, Shinichi Nishimura
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Publication number: 20190259637Abstract: Six gas generator units each including a gas generator, one unit of multiple AC power supply section that supplies six high frequency AC voltages to the six gas generator units, one unit of gas control section that controls raw material gas and output gas in the six gas generator units, and one unit of control/operation section constituting section that performs an AC power control operation to allow six high frequency AC voltages having desired electric energy, independent from each other, to be supplied. The six gas generator units, one unit of multiple AC power supply section, one unit of gas control section, and one unit of control/operation section constituting section are integrally provided.Type: ApplicationFiled: December 19, 2016Publication date: August 22, 2019Applicant: Toshiba Mitsubishi-Electric Industrial Systems CorporationInventors: Yoichiro TABATA, Yuji ONO, Takasho SATO
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Patent number: 10384939Abstract: In an ozone generation apparatus, a discharge cell includes a first electrode part, a second electrode part, and a dielectric partition plate. The first electrode part and the second electrode part face each other, and the dielectric partition plate is provided between the first and second electrode parts.Type: GrantFiled: October 29, 2014Date of Patent: August 20, 2019Assignee: Toshiba Mitsubishi-Electric Industrial Systems CorporationInventors: Yoichiro Tabata, Yujiro Okihara, Shinichi Nishimura
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Patent number: 10297423Abstract: A plasma generation apparatus according to the present invention includes an electrode cell and a housing that encloses an electrode cell. The electrode cell includes a first electrode, a second electrode facing the first electrode with interposition of a discharge space therebetween, and dielectrics arranged on main surfaces of the electrodes. The plasma generation apparatus further includes a pipe passage configured to directly supply a source gas from the outside of the housing to the discharge space without being connected to a space within the housing where the electrode cell is not arranged.Type: GrantFiled: April 23, 2012Date of Patent: May 21, 2019Assignee: TOSHIBA MITSUBISHI—ELECTRIC INDUSTRIAL SYSTEMS CORPORATIONInventors: Yoichiro Tabata, Kensuke Watanabe
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Publication number: 20180327264Abstract: As a metal compound layer provided between a dielectric and a ground electrode of an ozone generator, there is used a metal compound satisfying the condition (1) the metal compound is not a substance promoting ozone decomposition, the condition (2) the metal compound is not a conductor, the condition (3) the band gap of the metal compound layer is in the range of 2.0 to 4.0 (eV), and the condition (4) the hole potential of a valence band portion formed in the excited state of the metal compound layer is larger than the binding potential (1.25 (eV)) of an oxygen molecule. In addition, as ozone generation processing are executed under an environment in which various ozone decomposition suppression requirements for suppressing a decomposition amount of ozone are imposed on the ozone generator.Type: ApplicationFiled: December 8, 2015Publication date: November 15, 2018Applicant: Toshiba Mitsubishi-Electric Industrial Systems CorporationInventors: Takasho SATO, Yoichiro TABATA, Yuji ONO
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Publication number: 20180291509Abstract: In an activated gas generation apparatus, metal electrodes are formed on a bottom surface of a dielectric electrode, and are disposed so as to face each other with a central region of the dielectric electrode interposed therebetween in plan view. The metal electrodes face each other along the Y direction. A wedge-shaped stepped part is provided so as to protrude upward in the central region on an upper surface of the dielectric electrode. The wedge-shaped stepped part is formed so as to have a shorter formation width in the Y direction as approaching each of a plurality of gas spray holes in plan view.Type: ApplicationFiled: January 18, 2016Publication date: October 11, 2018Applicant: Toshiba Mitsubishi-Electric Industrial Systems CorporationInventors: Kensuke WATANABE, Shinichi NISHIMURA, Yoichiro TABATA
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Publication number: 20180223433Abstract: The present invention has an object to provide, as a film formation process system of remote plasma type, a radical gas generation system in which a process can be performed evenly on, for example, a target object having a large area through the use of a radical gas. In a radical gas generation system (500) according to the present invention, a process chamber apparatus (200) includes a table (201) that causes a target object (202) to rotate. A radical gas generator (100) includes a plurality of discharge cells (70). Each of the plurality of discharge cells (70) includes an opening (102). The opening (102) is connected to the inside of the process chamber apparatus (200) and faces the target object (202). Through the opening (102), a radical gas (G2) is output.Type: ApplicationFiled: October 29, 2014Publication date: August 9, 2018Applicant: Toshiba Mitsubishi-Electric Industrial Systems CorporationInventors: Kensuke WATANABE, Yoichiro TABATA, Shinichi NISHIMURA
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Publication number: 20180200687Abstract: A gas jetting apparatus capable of uniformly jetting, even onto a treatment-target object having a high-aspect-ratio groove, a gas into the groove. The gas jetting apparatus includes a gas jetting cell unit for jetting a gas toward a treatment-target object. The gas jetting cell unit includes a first cone-shaped member and a second cone-shaped member. A gap is formed between a side surface of a first cone shape and a side surface of the second cone-shaped member. Apex sides of the cone-shaped members face the treatment-target object.Type: ApplicationFiled: October 29, 2014Publication date: July 19, 2018Applicant: Toshiba Mitsubishi-Electric Industrial Systems CorporationInventors: Yoichiro TABATA, Kensuke WATANABE, Shinichi NISHIMURA