Patents by Inventor Yoko Suzuki
Yoko Suzuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20060159084Abstract: This invention is to provide a technique enabling efficient routing in the entire network by totally viewing a state of the entire network from a specific server. An information processing method for managing paths between arbitrary nodes in a specific network according to the invention, includes: obtaining data concerning a utilization state of each link constituting a path, from associated nodes in the specific network; and calculating a value of dynamic transmission bandwidth in an entire path by using the data concerning the utilization state of each link constituting the path, and storing the calculated value into a management data storage. By the dynamic transmission bandwidth, that is, bandwidth, which can actually be used for communication to be carried out from now, it becomes possible to carry out efficient routing.Type: ApplicationFiled: December 8, 2005Publication date: July 20, 2006Applicant: FUJITSU LIMITEDInventors: Takao Shimizu, Kiyoharu Makinose, Norikazu Matsukawa, Naoyuki Takahashi, Kazuhiro Iitsuka, Michio Kitade, Hideo Yamaguchi, Yoko Suzuki
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Patent number: 6875282Abstract: A substrate transport container is used, for example, in the process of manufacturing integrated circuits of less than 0.13 ?m line width, can hold the level of contaminants in the interior of the container for at least particles, acidic gases, basic gases, organic substances and humidity at controlled low levels, and has the size and structure to be compatible with automated semiconductor manufacturing plants. The container is provided with a door for loading and unloading substrates on a surface of a container main body and is constructed so as to hold the substrates inside the container main body at a given distance of separation. Air conditioning apparatuses for reducing the levels of particulate and gaseous contaminants are disposed roughly symmetrically on the container main body.Type: GrantFiled: May 16, 2002Date of Patent: April 5, 2005Assignee: Ebara CorporationInventors: Akira Tanaka, Yoko Suzuki, Takashi Kishi
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Publication number: 20050064703Abstract: A substrate processing method comprising steps for forming a copper film on a surface of a substrate. These steps includes the step of filling a first metal in the trenches so as to form a plated film of the first metal on an entire surface of the substrate by electroplating, wherein the electromagnetic field is adjusted by the virtual anode so that differences of thickness of the plated film between the central portion and the peripheral portion of the substrate being minimized, and polishing and removing the plated film by pressing the substrate to the polishing surface, wherein the pressures pressing the substrate to the polishing surface at a central portion and a peripheral portion are adjusted.Type: ApplicationFiled: October 29, 2004Publication date: March 24, 2005Inventors: Fumio Kondo, Koji Mishima, Akira Tanaka, Yoko Suzuki, Tetsuji Togawa, Hiroaki Inoue
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Patent number: 6828225Abstract: A substrate procesing method comprising steps for forming a copper film on a surface of a substrate. These steps includes the step of filling a first metal in the trenches so as to form a plated film of the first metal on an entire surface of the substrate by electroplating, wherein the electromagnetic field is adjusted by the virtual anode so that differences of thickness of the plated film between the central portion and the peripheral portion of the substrate being minimized, and polishing and removing the plated film by pressing the substrate to the polishing surface, wherein the pressures pressing the substrate to the polishing surface at a central portion and a peripheral portion are adjusted.Type: GrantFiled: February 27, 2004Date of Patent: December 7, 2004Assignee: Ebara CorporationInventors: Fumio Kondo, Koji Mishima, Akira Tanaka, Yoko Suzuki, Tetsuji Togawa, Hiroaki Inoue
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Publication number: 20040187451Abstract: A method of using a substrate transport pod is suitable for manufacturing semiconductor devices with copper wiring and low dielectric insulating film having dielectric constants of less than 3. The method is based on loading the substrates into a pod from an atmosphere of a first process, and circulating a gaseous atmosphere through interior of the pod in such a way to selectively remove at least one contaminant including moisture, particulate substances or chemical substances, and to expose the substrates to a controlled atmosphere intermittently or continually while the substrates are held in the pod before they are unloaded from the pod and introduced into a second process. For a pod that is used to house the substrates for the purpose of retaining or transporting, the pod has a pod main body and a door that provides a hermetic seal, the pod is made primarily of a materiel that has moisture absorption factor of less than 0.Type: ApplicationFiled: January 29, 2004Publication date: September 30, 2004Inventors: Yoko Suzuki, Akira Tanaka, Takashi Kishi
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Patent number: 6790763Abstract: A substrate processing method comprising steps for forming a copper film on a surface of a substrate. These steps includes the step of filling a first metal in the trenches so as to form a plated film of the first metal on an entire surface of the substrate by electroplating, wherein the electromagnetic field is adjusted by the virtual anode so that differences of thickness of the plated film between the central portion and the peripheral portion of the substrate being minimized, and polishing and removing the plated film by pressing the substrate to the polishing surface, wherein the pressures pressing the substrate to the polishing surface at a central portion and a peripheral portion are adjusted.Type: GrantFiled: October 11, 2002Date of Patent: September 14, 2004Assignee: Ebara CorporationInventors: Fumio Kondo, Koji Mishima, Akira Tanaka, Yoko Suzuki, Tetsuji Togawa, Hiroaki Inoue
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Publication number: 20040171269Abstract: A substrate processing method comprising steps for forming a copper film on a surface of a substrate. These steps includes the step of filling a first metal in the trenches so as to form a plated film of the first metal on an entire surface of the substrate by electroplating, wherein the electromagnetic field is adjusted by the virtual anode so that differences of thickness of the plated film between the central portion and the peripheral portion of the substrate being minimized, and polishing and removing the plated film by pressing the substrate to the polishing surface, wherein the pressures pressing the substrate to the polishing surface at a central portion and a peripheral portion are adjusted.Type: ApplicationFiled: February 27, 2004Publication date: September 2, 2004Inventors: Fumio Kondo, Koji Mishima, Akira Tanaka, Yoko Suzuki, Tetsuji Togawa, Hiroaki Inoue
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Patent number: 6770109Abstract: A substrate transport container having a carrier box including a container body and a door hermetically sealably covering an opening provided in the front of the container body. Partitions form a circulating flow path in the carrier box. The circulating flow path has a flow path in which air flows toward substrates and a flow path in which air flows toward a fan. A substrate carrying section is disposed in the flow path in which air flows toward the substrates to carry the substrates in such a way that the principal surfaces of the substrates are approximately parallel to the flow path in which air flows toward the substrates. A particle removing filter and a gaseous impurity trapping filter are placed on the upstream side of the substrate carrying section in the flow path in which air flows toward the substrates. A fan motor for driving the fan is incorporated in the carrier box to form an air current for circulating through the circulating flow path.Type: GrantFiled: March 12, 2002Date of Patent: August 3, 2004Assignee: Ebara CorporationInventors: Akira Tanaka, Kazuo Okubo, Yoko Suzuki
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Patent number: 6758876Abstract: A method of using a substrate transport pod is provided, which is suitable for manufacturing semiconductor devices with copper wiring and low dielectric insulating film having dielectric constants of less than 3. The method is based on loading the substrates into a pod from an atmosphere of a first process, and circulating a gaseous atmosphere through interior of the pod in such a way to selectively remove at least one contaminant including moisture, particulate substances or chemical substances, and to expose the substrates to a controlled atmosphere intermittently or continually while the substrates are held in the pod before they are unloaded from the pod and introduced into a second process. For a pod that is used to house the substrates for the purpose of retaining or transporting, the pod has a pod main body and a door that provides a hermetic sealing seal, and the pod is made primarily of a materiel that has moisture absorption factor of less than 0.Type: GrantFiled: December 4, 2001Date of Patent: July 6, 2004Assignee: Ebara CorporationInventors: Yoko Suzuki, Akira Tanaka, Takashi Kishi
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Patent number: 6752648Abstract: In a connector provided with a slider for detecting a half-engagement with respect to a mating connector in accordance with a state of the slider, a resin housing includes a slider receiving section for accommodating the slider and a terminal receiving section for accommodating a terminal connected with an electric wire, which are vertically arranged so as to oppose to each other while defining a gap therebetween. A reinforcing wall member is integrally molded with the housing so as to bridge the slider receiving section and the terminal receiving section in at least one side portion of the housing.Type: GrantFiled: March 14, 2002Date of Patent: June 22, 2004Assignee: Yazaki CorporationInventors: Motohisa Kashiyama, Yoko Suzuki
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Patent number: 6723151Abstract: A gas removal filter has an ion exchanger for adsorbing a gas and at least a pair of electric resistance measuring electrodes disposed on the ion exchanger. By measuring a change in the electric resistance between at least the pair of electric resistance measuring electrodes disposed on the ion exchanger, it is possible to estimate an ion exchange group consumption ratio of the ion exchanger. The ion exchange group consumption ratio of the ion exchanger can be detected in a short period of time, and a remaining adsorption capability of the ion exchanger can be known with ease.Type: GrantFiled: September 26, 2002Date of Patent: April 20, 2004Assignee: Ebara CorporationInventors: Akira Tanaka, Yoko Suzuki, Takashi Kishi
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Publication number: 20030168353Abstract: A substrate container includes a container housing having an opening for storing a substrate therethrough and a cover sealingly covering the opening, a fan motor mounted in the container housing for producing a circulating path of air in contact with the substrate in the container housing, and a particle removing filter and a gaseous impurity trapping filter which are disposed in the a portion of the circulating path which extends toward the substrate. A dehumidifying unit for dehumidifying a space in the container housing comprises a solid polymer electrolyte film disposed in the circulating path and voltage applying means for applying a voltage to the solid polymer electrolyte film to decompose water in air flowing in the circulating path thereby to dehumidify a space in the container housing.Type: ApplicationFiled: March 11, 2003Publication date: September 11, 2003Applicant: EBARA CORPORATIONInventors: Yoko Suzuki, Akira Tanaka, Kazuo Okubo
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Publication number: 20030092261Abstract: A substrate processing method comprising steps for forming a copper film on a surface of a substrate. These steps includes the step of filling a first metal in the trenches so as to form a plated film of the first metal on an entire surface of the substrate by electroplating, wherein the electromagnetic field is adjusted by the virtual anode so that differences of thickness of the plated film between the central portion and the peripheral portion of the substrate being minimized, and polishing and removing the plated film by pressing the substrate to the polishing surface, wherein the pressures pressing the substrate to the polishing surface at a central portion and a peripheral portion are adjusted.Type: ApplicationFiled: October 11, 2002Publication date: May 15, 2003Inventors: Fumio Kondo, Koji Mishima, Akira Tanaka, Yoko Suzuki, Tetsuji Togawa, Hiroaki Inoue
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Patent number: 6547953Abstract: A substrate container includes a container housing having an opening for storing a substrate therethrough and a cover sealingly covering the opening, a fan motor mounted in the container housing for producing a circulating path of air in contact with the substrate in the container housing, and a particle removing filter and a gaseous impurity trapping filter which are disposed in the a portion of the circulating path which extends toward the substrate. A dehumidifying unit for dehumidifying a space in the container housing comprises a solid polymer electrolyte film disposed in the circulating path and voltage applying means for applying a voltage to the solid polymer electrolyte film to decompose water in air flowing in the circulating path thereby to dehumidify a space in the container housing.Type: GrantFiled: January 26, 2001Date of Patent: April 15, 2003Assignee: Ebara CorporationInventors: Yoko Suzuki, Akira Tanaka, Kazuo Okubo
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Publication number: 20030056646Abstract: A gas removal filter has an ion exchanger for adsorbing a gas and at least a pair of electric resistance measuring electrodes disposed on the ion exchanger. By measuring a change in the electric resistance between at least the pair of electric resistance measuring electrodes disposed on the ion exchanger, it is possible to estimate an ion exchange group consumption ratio of the ion exchanger. The ion exchange group consumption ratio of the ion exchanger can be detected in a short period of time, and a remaining adsorption capability of the ion exchanger can be known with ease.Type: ApplicationFiled: September 26, 2002Publication date: March 27, 2003Applicant: EBARA CORPORATIONInventors: Akira Tanaka, Yoko Suzuki, Takashi Kishi
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Patent number: 6521007Abstract: A cleanbox that can prevent contamination from not only external sources but also from within the cleanbox from such sources as substrates and internal components of the cleanbox, includes a casing container (18) formed by a container main body (12) and a lid member (14) for hermetically sealing a top opening section of the container main body; a dividing wall (20) for forming circulation paths having an upstreaming path and a downstreaming paths within the casing container; a substrate holding section (24) disposed in the upstreaming path for holding broad surfaces of substrates (W) approximately parallel to the upstreaming path; an air filter (26) and a gas removal filter (28) disposed upstream in relation to the substrate holding section in the upstreaming path; and a motor-driven fan (30) housed in the casing container for producing air streams circulating in the circulating paths.Type: GrantFiled: July 24, 2000Date of Patent: February 18, 2003Assignee: Ebara CorporationInventors: Akira Tanaka, Kazuo Ohkubo, Yoko Suzuki, Hideaki Sekiguchi
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Publication number: 20020135966Abstract: This invention provides a substrate transport container for use, for example, in the process of manufacturing integrated circuits of less than 0.13 &mgr;m line width, to enable to hold the level of contaminants in the interior of the container for at least particles, acidic gases, basic gases, organic substances and humidity at controlled low levels, and having the size and structure to be compatible with automated semiconductor manufacturing plants. The container is provided with a door for loading and unloading substrates on a surface of a container main body and is constructed so as to hold the substrates inside the container main body at a given distance of separation, wherein air conditioning apparatuses for reducing the levels of particulate and gaseous contaminants, are disposed roughly symmetrically on the container main body.Type: ApplicationFiled: May 16, 2002Publication date: September 26, 2002Inventors: Akira Tanaka, Yoko Suzuki, Takashi Kishi
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Publication number: 20020129707Abstract: A substrate transport container having a carrier box including a container body and a door hermetically sealably covering an opening provided in the front of the container body. Partitions form a circulating flow path in the carrier box. The circulating flow path has a flow path in which air flows toward substrates and a flow path in which air flows toward a fan. A substrate carrying section is disposed in the flow path in which air flows toward the substrates to carry the substrates in such a way that the principal surfaces of the substrates are approximately parallel to the flow path in which air flows toward the substrates. A particle removing filter and a gaseous impurity trapping filter are placed on the upstream side of the substrate carrying section in the flow path in which air flows toward the substrates. A fan motor for driving the fan is incorporated in the carrier box to form an air current for circulating through the circulating flow path.Type: ApplicationFiled: March 12, 2002Publication date: September 19, 2002Applicant: EBARA CORPORATIONInventors: Akira Tanaka, Kazuo Okubo, Yoko Suzuki
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Patent number: D479399Type: GrantFiled: December 19, 2001Date of Patent: September 9, 2003Assignee: Ebara CorporationInventors: Akira Tanaka, Yoko Suzuki, Takashi Kishi
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Patent number: D491725Type: GrantFiled: December 19, 2001Date of Patent: June 22, 2004Assignee: Ebara CorporationInventors: Akira Tanaka, Yoko Suzuki, Takashi Kishi