Abstract: A fan out type multi-chip stacked package includes a chip stacked assembly having a plurality of chips vertically stacked. The electrodes of the chips and one active surface among all active surfaces are not covered by the stacked chips. A plurality of flip-chip bumps of a dummy flip chip are coupled to the electrodes of the chips. An encapsulant encapsulates the chip stacked assembly and the flip-chip bumps. The encapsulant has a planar surface. The flip-chip bumps have a plurality of bonding surfaces exposed from and coplanar to the planar surface. A redistribution layer is disposed on the planar surface and includes a plurality of fan out circuits electrically connected the bonding surfaces of the flip-chip bumps. Thus, the package has better resistance against mold flow impact to effectively reduce the risk of wire sweeping.

Abstract: The disclosure provides a method for diagnosing an active mycobacterium tuberculosis infection by detecting certain RNA biomarkers present in secreted extracellular vesicles isolated from a bodily fluid. The RNA biomarkers in the secreted extracellular vesicles may include a certain mycobacterium RNAs as well as certain host cell RNAs. Also provided is an RNA signature of certain mycobacterium and host cell RNA present in secreted extracellular vesicles indicative of an active tuberculosis infection.

Abstract: A LDMOS transistor includes a semiconductor substrate with a first doping type; a plurality of first trenches formed in the semiconductor substrate; a wave-shaped drift region with an increased conductive path and a second doping type formed on the semiconductor substrate between adjacent first trenches and the semiconductor substrate exposed by side and bottom surfaces of the first trenches; a first shallow trench isolation (STI) structure formed in each of the first trenches; a body region with the first doping type formed in semiconductor substrate at one side of the drift region; a gate structure formed over portions of the body region, the drift region and the first STI structure most close to the body region; a source region formed in the body region; and a drain region formed in the drift region at one side of the first STI structure most far away from the body region.

Abstract: A thin fan-out multi-chip stacked package structure including a plurality of stacked chips is provided. The electrodes of the stacked chips and the active surface of the top chip are exposed. A dummy spacer is disposed on the active surface. Each bonding wire has a bonding thread bonded to a chip electrode and an integrally-connected vertical wire segment. A flat encapsulant encapsulates the chip stacked structure and the bonding wires. Polished cross-sectional surfaces of the bonding wires and a surface of the dummy spacer are exposed by the flat surface of the encapsulant. A redistribution layer structure is formed on the flat surface. A passivation layer covers the flat surface and the surface of the dummy spacer but exposes the polished cross-sectional surfaces. Fan-out circuits are formed on the passivation layer and are connected to the polished cross-sectional surfaces of the bonding wires.

Abstract: Disclosed is a BGA package with protective circuitry layouts to prevent cracks of the bottom circuit in the specific area of the substrate leading to package failure and to enhance packaging yield of BGA packages. A chip is disposed on the upper surface of the substrate. A chip projective area is defined inside the bottom surface of the substrate and is established by vertically projecting the edges of the chip on the upper surface to the bottom surface of the substrate. At least an external contact pad vulnerable to thermal stress is located within the chip projective area. A protective area and a wiring area are respectively defined in the chip projective area at two opposing sides of the external contact pad. A plurality of protective mini-pads are arranged in a dotted-line layout and disposed in the projective area to partially surround the external contact pad to avoid thermal stress concentrated on the protective area and to further prevent circuitry cracks in the package structure.

Abstract: A fan out type multi-chip stacked package includes a chip stacked assembly having a plurality of chips vertically stacked. The electrodes of the chips and one active surface among all active surfaces are not covered by the stacked chips. A plurality of flip-chip bumps of a dummy flip chip are coupled to the electrodes of the chips. An encapsulant encapsulates the chip stacked assembly and the flip-chip bumps. The encapsulant has a planar surface. The flip-chip bumps have a plurality of bonding surfaces exposed from and coplanar to the planar surface. A redistribution layer is disposed on the planar surface and includes a plurality of fan out circuits electrically connected the bonding surfaces of the flip-chip bumps. Thus, the package has better resistance against mold flow impact to effectively reduce the risk of wire sweeping.

Abstract: A LDMOS transistor includes a semiconductor substrate with a first doping type; a plurality of first trenches formed in the semiconductor substrate; a wave-shaped drift region with an increased conductive path and a second doping type formed on the semiconductor substrate between adjacent first trenches and the semiconductor substrate exposed by side and bottom surfaces of the first trenches; a first shallow trench isolation (STI) structure formed in each of the first trenches; a body region with the first doping type formed in semiconductor substrate at one side of the drift region; a gate structure formed over portions of the body region, the drift region and the first STI structure most close to the body region; a source region formed in the body region; and a drain region formed in the drift region at one side of the first STI structure most far away from the body region.

Abstract: Provided is a package structure including a substrate, N dies, N first pads, N vertical wires, and a second pad. The N dies are stacked alternatively on the substrate, so as to form a multi-die stack structure. The N dies include, from bottom to top, first to Nth dies, wherein N is an integer greater than 1. The first die is a bottom die, and the Nth die is a top die. The first pads are disposed on an active surface of the dies respectively. The vertical wires are disposed on the first pads respectively. The second pad is disposed on the top die.

Abstract: A package structure and a manufacturing method thereof are provided. The package structure includes a redistribution layer (RDL), at least one first die, a plurality of conductive terminals and solder balls, a first encapsulant, a plurality of second dies, and a second encapsulant. The RDL has a first surface and a second surface opposite to the first surface. The first die and the conductive terminals are electrically connected to the RDL and are located on the first surface of the RDL. The first encapsulant encapsulates the first die and the conductive terminals. The first encapsulant exposes part of the conductive terminals. The solder balls are electrically connected to the conductive terminals and are located over the conductive terminals exposed by the first encapsulant. The second dies are electrically connected to the RDL and are located on the second surface of the RDL. The second encapsulant encapsulates the second dies.

Abstract: A layout structure, a semiconductor device and an electronic apparatus are provided. The layout structure includes at least one LDMOS. The LDMOS includes a source, a drain and a gate. The drain is strip-shaped, the source and gate are cyclic structures, the inner circumference of the source is less than the outer circumference of the gate but is greater than the inner circumference of the gate, the inner ring of the source overlaps with the gate in all directions, and the drain is located inside the inner ring of the gate. Because the source and gate are configured as cyclic structures and the inner ring of the source overlaps with the gate in every direction, the layout structure can increase the current and reduce the area of LDMOS devices. Semiconductor devices manufactured based on the layout structure and electronic apparatuses including the semiconductor devices also have the above-described advantages.

Abstract: Provided is a package structure including a substrate, N dies, N first pads, N vertical wires, and a second pad. The N dies are stacked alternatively on the substrate, so as to form a multi-die stack structure. The N dies include, from bottom to top, first to Nth dies, wherein N is an integer greater than 1. The first die is a bottom die, and the Nth die is a top die. The first pads are disposed on an active surface of the dies respectively. The vertical wires are disposed on the first pads respectively. The second pad is disposed on the top die.

Abstract: An N-type Lateral Diffused Metal-Oxide-Semiconductor (NLDMOS) transistor is provided. The NLDMOS transistor comprises a P-type substrate; and a semiconductor layer having a deep N-type well region formed on the P-type substrate. Further, the NLDMOS transistor also includes at least a P-type body region and an N-type drift region formed in the deep N-type well region; and an N-type heavily doped drain region formed in the N-type drift region. Further, the NLDMOS transistor includes a P-type doped reverse type region formed below the N-type drift region in the deep N-type well region, being physically connected with the first P-type body region, and preventing carriers from escaping between the N-type source region and external devices.

Abstract: A method for detecting symmetry of optical fibers and a device thereof are provided. The method includes: receiving, by a boundary clock, a first timestamp message carrying a first timestamp via a slave port, and a second timestamp message carrying a second timestamp via a passive port; and determining, by the boundary clock, symmetry of optical fibers according to at least the first timestamp and the second timestamp. The method and device for detecting symmetry of optical fibers provided by the present disclosure reduce the cost of detecting symmetry of optical fibers in the conventional technology, and improve the efficiency of detecting symmetry of optical fibers in the conventional technology.

Abstract: A lipophilic starch is provided along with methods of making the same. The starch is prepared by modifying the starch with an organic acid anhydride reagent, such as octenyl succinic anhydride, drying the modified starch to a moisture content of less than 15% by weight, and then heat treating the dried starch at a temperature of at least 100° C. for at least one minute.

Abstract: A layout structure, a semiconductor device and an electronic apparatus are provided. The layout structure includes at least one LDMOS. The LDMOS includes a source, a drain and a gate. The drain is strip-shaped, the source and gate are cyclic structures, the inner circumference of the source is less than the outer circumference of the gate but is greater than the inner circumference of the gate, the inner ring of the source overlaps with the gate in all directions, and the drain is located inside the inner ring of the gate. Because the source and gate are configured as cyclic structures and the inner ring of the source overlaps with the gate in every direction, the layout structure can increase the current and reduce the area of LDMOS devices. Semiconductor devices manufactured based on the layout structure and electronic apparatuses including the semiconductor devices also have the above-described advantages.

Abstract: An N-type Lateral Diffused Metal-Oxide-Semiconductor (NLDMOS) transistor is provided. The NLDMOS transistor comprises a P-type substrate; and a semiconductor layer having a deep N-type well region formed on the P-type substrate. Further, the NLDMOS transistor also includes at least a P-type body region and an N-type drift region formed in the deep N-type well region; and an N-type heavily doped drain region formed in the N-type drift region. Further, the NLDMOS transistor includes a P-type doped reverse type region formed below the N-type drift region in the deep N-type well region, being physically connected with the first P-type body region, and preventing carriers from escaping between the N-type source region and external devices.

Abstract: A method for detecting paths and amount of loss of desulfurization organic components in a flue gas desulfurization system includes preparing a to-be-measured solution and a base standard solution, and diluting the base standard solution with water to a plurality of standard solutions containing different concentrations of desulfurization organic components; adjusting the to-be-measured solution and standard solutions to have a strong acidity, respectively, such that each of desulfurization organic components in the to-be-measured solution and standard solutions exists in ion forms; heating and oscillating the to-be-measured solution and standard solutions, respectively; respectively detecting carbon elements in the standard solutions, to form a linear relationship between concentrations of the desulfurization organic components in the standard solutions and detected carbon element data; and detecting carbon elements in the to-be-measured solution, and obtaining a total concentration of the desulfurization or

Abstract: A transistor device may include a substrate that has a recess and a substrate surface, wherein the recess is recessed with respect to the substrate surface. The transistor device may further include a source and a drain that overlap the substrate. The transistor device may further include a gate structure that has a first gate structure portion and a second gate structure portion, wherein the first gate structure portion is positioned inside the recess, and wherein the second gate structure portion is connected to the first gate structure and is positioned outside the first recess.

Abstract: A LDMOS transistor includes a semiconductor substrate with a first doping type; a plurality of first trenches formed in the semiconductor substrate; a wave-shaped drift region with an increased conductive path and a second doping type formed on the semiconductor substrate between adjacent first trenches and the semiconductor substrate exposed by side and bottom surfaces of the first trenches; a first shallow trench isolation (STI) structure formed in each of the first trenches; a body region with the first doping type formed in semiconductor substrate at one side of the drift region; a gate structure formed over portions of the body region, the drift region and the first STI structure most close to the body region; a source region formed in the body region; and a drain region formed in the drift region at one side of the first STI structure most far away from the body region.

Abstract: A method for manufacturing a semiconductor device may include the following steps: preparing a semiconductor substrate that includes a first substrate region, a second substrate region, and a third substrate region; providing a first mask that overlaps the semiconductor substrate; etching, using the first mask, the first semiconductor substrate to form a trench in each of the substrate regions; providing a second mask that overlaps the semiconductor substrate and includes three openings corresponding to the substrate regions; performing first ion implantation through the three openings to form a P-doped region in each of the substrate regions; performing second ion implantation through the three openings to form an N-doped region in each of the substrate regions; and performing third ion implantation through the three openings to form another N-doped region in each of the substrate regions; and forming an isolation member in each of the trenches.