Abstract: A hinge system of a portable wireless terminal not only enables a folder to be opened from a terminal body but also enables front and rear surfaces of a folder of a portable wireless terminal to be turned over. The hinge system a folder-opening hinge module and a rotary-type hinge module, the cooperation of which realizes the above operation. The rotary-type hinge module includes a hinge housing rotatably assembled with the terminal body, a supporting shaft fixed to the hinge housing, and a rotary shaft rotatably assembled with the supporting shaft. The rotary shaft is connected with the folder and can be rotated with respect to the terminal body, thereby enabling the folder to be turned over in a state that the folder is opened.

Abstract: A mobile radio communication terminal automatically disconnects a call after completion of a telephone conversation. A speaker signal detector generates a first detection signal upon detection of an audio signal received from another party, and a microphone signal detector generates a second detection signal upon detection of an audio signal input from a microphone. A controller disconnects an established speech path when the first and second detection signals are not input from respective speaker signal detector and the microphone signal detector, for a predetermined time.

Abstract: Material is deposited from an active shutter onto a substrate located in a processing chamber housing with a shutter target coupled to a shutter target assembly. A first target assembly located in the housing supports a target for physical-vapor deposition of a first material onto the substrate. A shutter is selectively moveable to extend into a closed or activated position and to retract into an open position. The shutter target assembly is coupled to the shutter such that when the shutter is in the closed position, the shutter target assembly is positioned to allow deposition of material from the shutter target onto the substrate. When the shutter is in the open position, the first target is positioned to deposit material onto the substrate. Alternating layers of materials may be deposited by the shutter target and first target by cycling the shutter between an open position and a closed position.

Abstract: An integrated circuit (IC) is designed by generating a circuit diagram of the IC using one or more blocks. An information repository is provided that contains layout information that is associated with one or more template blocks. A symbol layout abstraction model is then generated by associating the layout information that is associated with one or more of the template blocks with at least one of the circuit diagram blocks of the IC.

Abstract: An apparatus and method supports thermal processing of a microelectronic device such as a semiconductor chip in a substrate by heating the substrate with secondary radiation from an energy transfer device 40, which has a first set of energy transfer regions comprised of an emissive and thermally conductive material, and a second set of thermally insulating regions comprised of a reduced emissivity and reduced thermal conductivity material or free space. A multi-zone radiant energy source 30 provides radiative energy to energy transfer device 40, with a process controller 36, preferably a multi-zone controller, altering the amount of energy provided by each heat zone associated with each emissive region of energy transfer device 40. Sensors detect the thermal energy level of each energy transfer region to allow controller 36 to adjust the secondary radiation emitted by each region in real time, resulting in a predetermined and controlled distribution of thermal energy on substrate 20.

Abstract: A system for rapid thermal processing of a substrate in a process chamber while measuring and controlling the temperature at the substrate to establish substantially uniform substrate temperature in real time. The system includes an essentially continuous spirally-configured multizone illuminator having a plurality of substantially concentric rings of heating lamps for directing optical power toward the substrate and a fluid cooled optical reflector facing the substrate frontside and having a relatively high optical reflectivity. The illuminator can also be offset from the geometric center of the substrate. The system can also include a plurality of contact devices to provide thermal conductivity from each, or some subset, of the plurality of heating lamps. The illumination system of the present invention provides improved spatial resolution and improved thermal properties at the heating lamps.

Abstract: A system for rapid thermal processing of a substrate in a process chamber while measuring and controlling the temperature at the substrate to establish substantially uniform substrate temperature in real time. The system includes an essentially continuous spirally-configured multizone illuminator having a plurality of substantially concentric rings of heating lamps for directing optical power toward the substrate and a fluid cooled optical reflector facing the substrate frontside and having a relatively high optical reflectivity. The illuminator can also be offset from the geometric center of the substrate. The system can also include a plurality of contact devices to provide thermal conductivity from each, or some subset, of the plurality of heating lamps. The illumination system of the present invention provides improved spatial resolution and improved thermal properties at the heating lamps.

Abstract: This invention presents an automatic calibration system and method for calibration of a substrate temperature sensor in a thermal processing equipment, such as a rapid thermal processing system. The calibration system includes a temperature-sensitive probe associated with the substrate temperature sensor to calibrate the substrate temperature sensor and an actuator to position the temperature-sensitive probe relative to the substrate during a calibration cycle. The actuator and temperature-sensitive probe of the automatic calibration system can be incorporated into the thermal processing equipment in order to maintain the thermal processing equipment cleanliness and integrity during a calibration cycle, and to allow rapid automated calibration. In the preferred embodiment of this invention, the temperature-sensitive probe and its actuator are implemented in the gas showerhead assembly of a rapid thermal processing system.

Abstract: An opening/closing device for a discharge hole of a filter-drier is disclosed, in which an outer shell of a driving means for driving the opening/closing device of the discharge hole is sealed, so that during the discharge of the processed powders, the processed powders can be prevented from being introduced into the outer shell. A discharge tube 1 is fastened to the discharge hole 4 by means of a fastening device 1a, so that processed drug powders can be discharged though a discharge tube hole 4a. A cylindrical opening 2c is formed inside a flange 2b of the outer shell 2. A sealing cover 3b extends from the opening/closing plate 3 to be inserted into the opening 2c, and the sealing cover 3b is longer than the actuation distance of the opening/closing plate 3. The sealing cover 3b does not depart from the opening 2c, but is always maintained within the opening 2c to seal off the interior of the outer shell 2.

Abstract: This invention presents an automatic calibration system and method for calibration of a substrate temperature sensor in a thermal processing equipment, such as a rapid thermal processing system. The calibration system includes a temperature-sensitive probe associated with the substrate temperature sensor to calibrate the substrate temperature sensor and an actuator to position the temperature-sensitive probe relative to the substrate during a calibration cycle. The actuator and temperature-sensitive probe of the automatic calibration system can be incorporated into the thermal processing equipment in order to maintain the thermal processing equipment cleanliness and integrity during a calibration cycle, and to allow rapid automated calibration. In the preferred embodiment of this invention, the temperature-sensitive probe and its actuator are implemented in the gas showerhead assembly of a rapid thermal processing system.

Abstract: A method and apparatus for multi-zone injection apparatus of multiple process gases onto a work piece during manufacture. The multi-zone injection apparatus uses a gas injection plate with multiple injection zones to deliver the multiple process gases into the chamber for deposition onto the work piece (for example, a silicon wafer). The gas showerhead separates the multiple process in a manner that avoids premixing the process gases, thereby minimizing gas-phase nucleation and particulate generation. The showerhead also allows real-time independent control over the gas flow rates in N channels to achieve deposition uniformity. Different gases can be configured in adjacent channels to provide M zones of multi-gas radial control.

Abstract: A system for rapid thermal processing of a substrate in a process chamber while measuring and controlling the temperature at the substrate to establish substantially uniform substrate temperature in real time. The system includes an axisymmetrical multi-zone illuminator having a plurality of substantially concentric rings of heating lamps to direct optical power toward said substrate, a fluid cooled optical reflector facing the substrate frontside and having a relatively high optical reflectivity. The system also includes a multizone temperature measurement system having a plurality of pyrometry sensors coupled to said multi-zone illuminator, a system for real-time measurement and compensation of substrate emissivity and illuminator lamp light interference effects, and a multi-variable temperature controller for providing multi-zone real-time temperature control. The system also incorpotates a plurality of illuminator lamp power supplies.

Abstract: An apparatus and method for wafer rotation in microelectronics manufacturing equipment is presented. The present invention combines an external stator assembly having a plurality of electromagnetic actuator coils with an internal rotor assembly having a plurality of multipolar permanent magnets or ferromagnetic coupling tabs. The rotor assembly supports the semiconductor wafer or any other substrate inside the process chamber. The electromagnetic actuator coils of the stator assembly receive a plurality of multi-phase, controlled frequency electrical currents to create magnetic fields around the actuator coils that interact with the multipolar permanent magnets or ferromagnetic coupling tabs of the rotor assembly to provide the rotational force to rotate the rotor assembly and thus, rotate the semiconductor wafer or any other substrate within the process chamber.