Abstract: A method for receiving a normal or an inverted paging signal in a radio pager, which includes the steps of detecting a preamble of a paging signal by reading a cap-code identifying an inherent address of the radio pager and synchronizing with a reference channel frequency; deciding a form of assumption of the paging signal to be received by confirming whether a local area is serviceable according to the detection of a sync code after a predetermined time period; and receiving the paging signal by inverting the same when the local area is not serviceable, and receiving the paging signal as is when the local area is serviceable.

Abstract: In a radio pager which includes: a memory having a memory area for sequentially storing calling messages, and a message table which includes a first area and a second area and stores addresses of the memory area where calling messages are stored; and an operation panel which has a calling message delete key and an erased calling message recovery key, and displays calling messages stored in a selected address when an address of the memory area stored in the first area of the message table is selected, a method and apparatus for recovering an erased calling message includes: moving an address of the memory area where a calling message to be erased is stored among the addresses stored in the first area of the message table into the second area, while maintaining the storage of the calling message to be erased in the memory area when the calling message delete key is pressed; arranging the remaining addresses stored in the first area except for the address moved into the second area; and moving a selected address

Abstract: A method for electrically connecting a thin film electrode to a connecting terminal on an active matrix in the manufacture of a thin film actuated mirror is disclosed. The method includes the steps of: forming a thin film sacrificial layer having an empty cavity on top of the active matrix; forming an elastic, a second thin film and a thin film electrodisplacive layers, successively, on top of the thin film sacrificial layer including the empty cavity; forming a contact hole extending from top of the thin film electrodisplacive layer to top of the connecting terminal; forming a first thin film layer on top of the thin film electrodisplacive layer including the contact hole; patterning the first thin film, the thin film electrodisplacive, the second thin film and the elastic layers, respectively; and removing the thin film sacrificial layer, thereby forming the thin film actuated mirror.

Abstract: An array of M.times.N thin film actuated mirrors for use in an optical projection system comprises an active matrix, an array of M.times.N thin film actuating structures, each of the thin film actuating structures being provided with a first and a second actuating parts, each of the first and second actuating parts including at least a thin film layer of a motion-inducing material, a pair of electrodes, each of the electrodes being provided on top and bottom of the motion-inducing thin film layer, an array of M.times.N supporting members, each of the supporting members being used for holding each of the actuating structures in place by cantilevering each of the actuating structures and also for electrically connecting each of the actuating structures and the active matrix, and an array of M.times.

Abstract: The thin film AMA has a substrate, an actuator, a common line, and a reflecting member. The substrate has an electrical wiring and a connecting terminal and the actuator has a supporting layer, a bottom electrode, a top electrode, and an active layer. The common line is formed on a portion of actuator and is connected to top electrode. The electrical wiring and connecting terminal may not be damaged because actuator is formed on a portion of substrate adjacent to the portion where electrical wiring and connecting terminal are formed. The voltage drop of a second signal can be minimized because common line is formed thickly on a portion of actuator, so a sufficient second signal is applied to top electrode. The flatness of reflecting member may be enhanced because reflecting member is formed on a second sacrificial layer.

Abstract: A method for electrically connecting a thin film electrode with a connecting terminal on an active matrix in a thin film actuated mirror includes the steps of: forming a thin film sacrificial layer having an empty cavity on top of the active matrix, wherein the empty cavity encompasses the connecting terminal; forming an elastic layer on top of the thin film sacrificial layer including the empty cavity; creating a hole on the elastic layer, the hole exposing the connecting terminal and having inner surfaces; forming the thin film electrode on top of the elastic layer including the inner surfaces of the hole to thereby establish an electrical connection between the thin film electrode to the connecting terminal; and filling the hole with an insulating material. The insulating material prevents the thin film electrodes in each of the thin film actuated mirrors from coming into an electrical contact with each other, thereby preventing a short-circuit therebetween.

Abstract: A method for manufacturing an array of M.times.

Abstract: An inventive array of thin film actuated mirrors is provided with an active matrix having an array of switching devices, an array of actuating structures and an array of mirrors, wherein each of the actuating structures is cantilevered on the active matrix, and each of the switching devices is positioned on the active matrix beside the position at which each of the actuating structures is cantilevered. In the array, during the operation of the array, since each of the mirrors is connected to the actuating structure through a recessed portion thereof, the mirror stays planar, allowing more accurate and effective reflection of the light beams, which will, in turn, enhance the overall optical efficiency of the array.

Abstract: An array of M.times.N thin film actuated mirrors for use in an optical projection system comprises an active matrix, an array of M.times.N thin film actuating structures, each of the thin film actuating structures including at least a thin film layer of a motion-inducing material, a pair of electrodes, each of the electrodes being provided on top and bottom of the thin film motion-inducing layer, an array of M.times.N supporting members, each of the supporting members being used for holding each of the actuating structures in place by cantilevering each of the actuating structures and also for electrically connecting each of the actuating structures and the active matrix, an array of M.times.N spacer members, each of the spacer members being mounted on the top surface of each of the actuating structures at the distal end thereof, and an array of M.times.N mirror layers for reflecting light beams, each of the mirror layers being secured on each of the spacer members of the actuating structures.

Abstract: An inventive array of M.times.N thin film actuated mirrors includes an active matrix, an insulating layer, an etchant stopping layer, and an array of M.times.N actuating structures. Each of the actuating structures has a tip at a distal end thereof and an etching aperture traversing therethrough, and further includes a first thin film electrode with a horizontal stripe, a thin film electrodisplacive member, a second thin film electrode, an elastic member and a conduit. The horizontal stripe, the tip and the etching aperture are created in order to increase the optical efficiency of each of the thin film actuated mirrors, facilitate the removal of the rinse and allow easy removal of the thin film sacrificial layer, respectively.

Abstract: An inventive array of M.times.N thin film actuated mirrors includes an active matrix and an array of M.times.N actuating structures. Each of the actuating structures includes an upper thin film electrode, a thin film electrodisplacive member, a lower thin film electrode, an elastic member and a conduit. In the array, since the upper thin film electrode is electrically connected individually to the active matrix through the conduit in each of the actuated mirrors, if one thereof becomes inoperable for any reason, e.g., short-circuit due to the scratch in the upper thin film electrode, other thin film actuated mirrors in the same row or column in the array 200 are not affected.

Abstract: The inventive method for the manufacturing an array of M.times.N electrodisplacive actuated mirrors comprises a step of: preparing a ceramic wafer, made of an electrodisplacive material, having a top and bottom surface; forming an array of M.times.N first electrodes and an array of M+1 second electrodes on the bottom and top surface of ceramic wafer, respectively; mounting the ceramic wafer on top of an active matrix; covering each of the M +1 second electrodes with an insulating layer; forming a set of M trenches; placing an array of M.times.N hinges on the top surface of the ceramic wafer; and forming a mirror on the top surface of each of the M.times.N hinges to thereby form an array of M.times.N electrodisplacive actuated mirrors.

Abstract: An array of M.times.N thin film actuated mirrors includes an active matrix including a substrate with an array of M.times.N pairs of connecting terminals and an array of M.times.N transistors, and an array of M.times.N actuating structures, each of the actuating structures having an actuating and a light reflecting portions, wherein the actuating portion further includes a first and a second parts. Each of the actuating structures is provided with a first thin film electrode, a thin film electrodisplacive member, a second thin film electrode, an elastic member and a first and a second conduits.

Abstract: An array of M.times.N thin film actuated mirrors includes an active matrix having a substrate, an array of M.times.N connecting terminals and an array of M.times.N transistors, and an array of M.times.N actuating structures. Each of the actuating structures is of a bimorph structure and includes an actuating portion and a light reflecting portion, the actuating portion including a front portion of a second thin film electrode, a lower electrodisplacive member, an intermediate electrode, an upper electrodisplacive member, and a front portion of a first thin film electrode. The front portion of the second thin film electrode is electrically connected to each of the connecting terminals and each of the transistors, and the remaining portion of the first thin film electrode is placed on top of the remaining portion of the second thin film electrode to form the light reflecting portion, allowing the first and the second thin film electrodes to function as a signal electrode.

Abstract: An array of thin film actuated mirrors includes an active matrix and an array of actuating structures, each of the actuating structures including an elastic member, a pair of conduits, a second thin film electrode with a stripe, a thin film electrodisplacive member and a first thin film electrode.

Abstract: An array of M.times.N electrodisplacive actuated mirrors for use in an optical projection system is assembled by way of: (a) preparing two identical ceramic wafers; (b) forming M identical trenches thereon; (c) interlocking and bonding together to form a ceramic block; (d) forming a composite ceramic structure from the ceramic block by polishing the top and bottom surfaces thereof; (e) providing M.times.N signal electrodes and M+1 bias electrodes; (f) mounting on an active matrix to thereby form an array of M.times.N actuators; (g) placing M+1 photoresistive segments; (h) preparing places for attaching platforms, to be formed thereon a light reflecting layer; (i) forming a light reflecting layer; (j) pattering the light reflecting layer, including the platform, into an array of M.times.N mirrors; and (k) removing the M+1 photoresistive segments to thereby form the array of M.times.N electrodisplacive actuated mirrors.

Abstract: A method for forming an array of thin film actuated mirrors for use in an optical projection system comprises the steps of: (a) providing a base; (b) depositing a separation layer on top of the base; (c) forming a first an electrodisplacive, a second, an elastic and a sacrificial layers successively on top of the separation layer; (d) forming an array of M.times.N supporting members, each thereof having a conduit; (e) patterning to form an array of multilayered actuated mirror structures; (f) attaching an active matrix included therein an array of transistors to the array of multilayered actuated mirror structures; (g) separating the base to form said array of thin film actuated mirrors. In the inventive method, the heat treatment of the electrodisplacive layer is carried out prior to the attaching of the active matrix, thereby preventing the transistors from being degraded by the heat.

Abstract: An array of M.times.N actuated mirrors comprises an active matrix, an array of M.times.N elastic members, an array of M.times.N pairs of actuating structures and an array of M.times.N mirrors. Each of the elastic members is provided with a distal and a proximal ends, the proximal end including a first and a second tab portions, the first tab and the second tab portions being separated by a retraction therebetween, the distal end including a protrusion. Each of the actuating structures is located on the first and the second tab portions on each of the elastic members, respectively. Each of the mirrors is formed on top of the elastic members. When the pair of actuating structures deform in response to an electrical signal, the first and the second tab portions tilt while the remainder of the elastic member, and, the mirror formed on top thereof, stays planar, thereby allowing all of the mirrors to reflect the light beams.

Abstract: An array of M.times.N thin film actuated mirrors for use in an optical projection system comprises an active matrix, an array of M.times.N supporting members, and an array of M.times.N thin film actuating structures. Each of the actuating structures includes a first, an electrodisplacive, a second layers and an elastic layer, wherein the first and the seconds layers are placed on top and bottom of the electrodisplacive layer, and the elastic layer is placed on bottom of the second layer. The first layer is divided into a proximal and a distal ends. In each of the actuated mirrors, the proximal end of the first layer is connected to a conduction line pattern to thereby act as a bias electrode and the second layer is connected electrically to one of the transistors through a conduit placed in each of the supporting members to thereby act as a signal electrode. The distal end of the first layer functions as a mirror for reflecting the light beam.

Abstract: An array of M.times.N thin film actuated mirrors for use in an optical projection system comprises an active matrix, an array of M.times.N supporting members, M.times.N trinities of first, second and third conduits and an array of M.times.N thin film actuating structures. Each of the actuating structures includes a first, an electrodisplacive and a second layers, wherein the first and seconds layers are placed on top and bottom of the electrodisplacive layer. In each of the actuated mirrors, the first layer therein is connected, individually and electrically, to a conduction line pattern through the second and the third conduits, thereby acting as bias electrode and the second layer is connected electrically to one of the transistors included in through the first conduit to thereby act as a signal electrode.