Patents by Inventor Yongqi Hu
Yongqi Hu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6790768Abstract: Method and apparatus are provided for polishing substrates comprising conductive and low k dielectric materials with reduced or minimum substrate surface damage and delamination. In one aspect, a method is provided for processing a substrate including positioning a substrate having a conductive material formed thereon in a polishing apparatus having one or more rotational carrier heads and one or more rotatable platens, wherein the carrier head comprises a retaining ring and a membrane for securing a substrate and the platen has a polishing article disposed thereon, contacting the substrate surface and the polishing article to each other at a retaining ring contact pressure of about 0.4 psi or greater than a membrane pressure, and polishing the substrate to remove conductive material.Type: GrantFiled: December 18, 2001Date of Patent: September 14, 2004Assignee: Applied Materials Inc.Inventors: Yongsik Moon, David Mai, Kapila Wijekoon, Rajeev Bajaj, Rahul Surana, Yongqi Hu, Tony S. Kaushal, Shijian Li, Jui-Lung Li, Shi-Ping Wang, Gary Lam, Fred C. Redeker
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Publication number: 20040134792Abstract: Embodiments of a ball assembly are provided. In one embodiment, a ball assembly includes a housing, a ball, a conductive adapter and a contact element. The housing has an annular seat extending into a first end of an interior passage. The conductive adapter is coupled to a second end of the housing. The contact element electrically couples the adapter and the ball with is retained in the housing between seat and the adapter.Type: ApplicationFiled: June 26, 2003Publication date: July 15, 2004Applicant: Applied Materials, Inc.Inventors: Paul D. Butterfield, Liang-Yuh Chen, Yongqi Hu, Antoine P. Manens, Rashid Mavliev, Stan D. Tsai, Feng Q. Liu, Ralph Wadensweiler
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Publication number: 20040121708Abstract: Embodiments of a processing pad assembly for processing a substrate are provided. The processing pad assembly includes an upper layer having a processing surface and an electrode having a top side coupled to the upper layer and a bottom side opposite the top side. A first set of holes is formed through the upper layer for exposing the electrode to the processing surface. At least one aperture is formed through the upper layer and the electrode.Type: ApplicationFiled: December 3, 2003Publication date: June 24, 2004Applicant: Applied Materials, Inc.Inventors: Yongqi Hu, Stan D. Tsai, Yan Wang, Feng Q. Liu, Shou-Sung Chang, Liang-Yuh Chen
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Publication number: 20040082289Abstract: Embodiments of a ball assembly are provided. In one embodiment, a ball assembly includes a housing, a ball, a conductive adapter and a contact element. The housing has an annular seat extending into a first end of an interior passage. The conductive adapter is coupled to a second end of the housing. The contact element electrically couples the adapter and the ball with is retained in the housing between seat and the adapter.Type: ApplicationFiled: August 15, 2003Publication date: April 29, 2004Inventors: Paul D. Butterfield, Liang-Yuh Chen, Yongqi Hu, Antoine P. Manens, Rashid Mavliev, Stan D. Tsai, Feng Q. Liu, Ralph Wadensweiler, Lizhong Sun, Siew S. Neo, Alain Duboust
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Patent number: 6709314Abstract: Endpoint of a chemical mechanical polishing process is detected by monitoring acoustical emissions produced by contact between a polishing pad and a wafer. The acoustic information is resolved into a frequency spectrum utilizing techniques such as fast Fourier transformation. Characteristic changes in frequency spectra of the acoustic emissions reveal transition in polishing between different material layers. CMP endpoint indicated by a change in the acoustic frequency spectrum is validated by correlation with other sensed properties, including but not limited to time-based changes in amplitude of acoustic emissions, frictional coefficient, capacitance, and/or resistance. CMP endpoint revealed by a change in acoustic frequency spectrum can also be validated by comparison with characteristic frequency spectra obtained at endpoints or polishing transitions of prior operational runs.Type: GrantFiled: November 7, 2001Date of Patent: March 23, 2004Assignee: Applied Materials Inc.Inventors: Tony S. Kaushal, Chuong Quang Dam, Yongqi Hu
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Publication number: 20040053499Abstract: Polishing compositions and methods for removing conductive materials from a substrate surface are provided. In one aspect, a method is provided for processing a substrate to remove conductive material disposed over narrow feature definitions formed in a substrate at a higher removal rate than conductive material disposed over wide feature definitions formed in a substrate by an electrochemical mechanical polishing technique. The electrochemical mechanical polishing technique may include a polishing composition comprising an acid based electrolyte system, one or more chelating agents, one or more corrosion inhibitors, one or more inorganic or organic acid salts, one or more pH adjusting agents to provide a pH between about 2 and about 10, and a solvent.Type: ApplicationFiled: June 26, 2003Publication date: March 18, 2004Applicant: Applied Materials, Inc.Inventors: Feng Q. Liu, Liang-Yuh Chen, Stan D. Tsai, Alain Duboust, Siew S. Neo, Yongqi Hu, Yan Wang, Paul D. Butterfield
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Publication number: 20040020789Abstract: Embodiments of a polishing article for processing a substrate are provided. In one embodiment, a polishing article for processing a substrate comprises a fabric layer having a conductive layer disposed thereover. The conductive layer has an exposed surface adapted to polish a substrate. The fabric layer may be woven or non-woven. The conductive layer may be comprised of a soft material and, in one embodiment, the exposed surface may be planar.Type: ApplicationFiled: June 6, 2003Publication date: February 5, 2004Applicant: Applied Materials, Inc.Inventors: Yongqi Hu, Yan Wang, Alain Duboust, Stan D. Tsai, Feng Q. Liu, Liang-Yuh Chen, Robert A. Ewald
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Publication number: 20040020788Abstract: Systems and methods for electrochemically processing. A contact element defines a substrate contact surface positionable in contact a substrate during processing. In one embodiment, the contact element comprises a wire element. In another embodiment the contact element is a rotating member. In one embodiment, the contact element comprises a noble metal.Type: ApplicationFiled: August 2, 2002Publication date: February 5, 2004Applicant: Applied Materials, Inc.Inventors: Rashid Mavliev, Stan Tsai, Yongqi Hu, Paul Butterfield, Antoine Manens, Liang-Yuh Chen
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Publication number: 20040023610Abstract: Embodiments of a polishing article for processing a substrate are provided. In one embodiment, a polishing article for processing a substrate comprises a fabric layer having a conductive layer disposed thereover. The conductive layer has an exposed surface adapted to polish a substrate. The fabric layer may be woven or non-woven. The conductive layer may be comprised of a soft metal and, in one embodiment, the exposed surface may be planar.Type: ApplicationFiled: June 6, 2003Publication date: February 5, 2004Applicant: Applied Materials, Inc.Inventors: Yongqi Hu, Yan Wang, Alain Duboust, Feng Q. Liu, Antoine P. Manens, Siew S. Neo, Stan D. Tsai, Liang-Yuh Chen, Paul D. Butterfield, Yuan A. Tian, Sen-Hou Ko
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Publication number: 20040023495Abstract: Systems and methods for electrochemically processing. A contact element defines a substrate contact surface positionable in contact a substrate during processing. In one embodiment, the contact element comprises a wire element. In another embodiment the contact element is a rotating member. In one embodiment, the contact element comprises a noble metal.Type: ApplicationFiled: August 2, 2002Publication date: February 5, 2004Applicant: Applied Materials, Inc.Inventors: Paul Butterfield, Liang-Yuh Chen, Yongqi Hu, Antoine Manens, Rashid Mavliev, Stan Tsai
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Publication number: 20030234184Abstract: Polishing compositions and methods for removing conductive materials from a substrate surface are provided. In one aspect, a composition includes an acid based electrolyte system, one or more chelating agents, one or more corrosion inhibitors, one or more inorganic or organic acid salts, one or more pH adjusting agents to provide a pH between about 2 and about 10, a polishing enhancing material selected from the group of abrasive particles, one or more oxidizers, and combinations thereof, and a solvent. The composition may be used in an conductive material removal process including disposing a substrate having a conductive material layer formed thereon in a process apparatus comprising an electrode, providing the composition between the electrode and substrate, applying a bias between the electrode and the substrate, and removing conductive material from the conductive material layer.Type: ApplicationFiled: June 6, 2003Publication date: December 25, 2003Applicant: Applied Materials, Inc.Inventors: Feng Q. Liu, Stan D. Tsai, Yongqi Hu, Siew S. Neo, Yan Wang, Alain Duboust, Liang-Yuh Chen
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Publication number: 20030213703Abstract: A method and apparatus are provided for polishing a substrate surface. In one aspect, an apparatus for polishing a substrate includes a pad assembly having a conductive pad, a backing and a conductive layer adapted to be biased by a power source. In another embodiment, an apparatus for polishing a substrate includes a pad assembly disposed in a basin. The basin has two electrodes coupled to opposite poles of a power source. Each electrode extends partially through a respective aperture formed in the pad assembly. The apparatus may be part of an electro-chemical polishing station that may optionally be part of a system that includes chemical mechanical polishing stations.Type: ApplicationFiled: May 16, 2002Publication date: November 20, 2003Applicant: Applied Materials, Inc.Inventors: Yan Wang, Feng Q. Liu, Yongqi Hu, Alain Duboust, Liang-Yuh Chen, Paul D. Butterfield, Ralph M. Wadensweiler
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Publication number: 20030216045Abstract: An apparatus and method for planarizing a surface of a substrate using a chamber separated into two parts by a membrane, and two separate electrolytes is provided. The embodiments of the present invention generally provide an electrochemical mechanical polishing system that reduces the number of defects found on the substrate surface after polishing. An exemplary electrochemical apparatus includes a physical barrier that prevents any trapped gas or gas generated during processing from residing in areas that can cause defects on the substrate. The process can be aided by the addition of various chemical components to the electrolyte that tend to reduce the gas generation at the cathode surface during the ECMP anodic dissolution process.Type: ApplicationFiled: June 6, 2003Publication date: November 20, 2003Applicant: Applied Materials, Inc.Inventors: Yan Wang, Feng Q. Liu, Alain Duboust, Siew S. Neo, Liang-Yuh Chen, Yongqi Hu
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Publication number: 20030209448Abstract: An article of manufacture, method, and apparatus are provided for planarizing a substrate surface. In one aspect, an article of manufacture is provided for polishing a substrate including a polishing article having a body comprising at least a portion of fibers coated with a conductive material, conductive fillers, or combinations thereof, and adapted to polish the substrate. In another aspect, a polishing article includes a body having a surface adapted to polish the substrate and at least one conductive element embedded in the polishing surface, the conductive element comprising dielectric or conductive fibers coated with a conductive material, conductive fillers, or combinations thereof. The conductive element may have a contact surface that extends beyond a plane defined by the polishing surface. A plurality of perforations and a plurality of grooves may be formed in the articles to facilitate flow of material through and around the polishing article.Type: ApplicationFiled: May 7, 2002Publication date: November 13, 2003Inventors: Yongqi Hu, Yan Wang, Alain Duboust, Feng Q. Liu, Rashid Mavliev, Liang-Yuh Chen, Ratson Morad, Sasson Somekh
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Publication number: 20030178320Abstract: Polishing compositions and methods for removing conductive materials from a substrate surface are provided. In one aspect, a composition includes an acid based electrolyte system, one or more chelating agents, one or more corrosion inhibitors, one or more inorganic or organic acid salts, one or more pH adjusting agents to provide a pH between about 3 and about 10, a polishing enhancing material selected from the group of abrasive particles, one or more oxidizers, and combinations thereof, and a solvent. The composition may be used in an conductive material removal process including disposing a substrate having a conductive material layer formed thereon in a process apparatus comprising an electrode, providing the composition between the electrode and substrate, applying a bias between the electrode and the substrate, and removing conductive material from the conductive material layer.Type: ApplicationFiled: February 26, 2003Publication date: September 25, 2003Applicant: APPLIED MATERIALS, INC.Inventors: Feng Q. Liu, Stan D. Tsai, Yongqi Hu, Siew S. Neo, Yan Wang, Alain Duboust, Liang-Yuh Chen
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Publication number: 20030087586Abstract: Endpoint of a chemical mechanical polishing process is detected by monitoring acoustical emissions produced by contact between a polishing pad and a wafer. The acoustic information is resolved into a frequency spectrum utilizing techniques such as fast Fourier transformation. Characteristic changes in frequency spectra of the acoustic emissions reveal transition in polishing between different material layers. CMP endpoint indicated by a change in the acoustic frequency spectrum is validated by correlation with other sensed properties, including but not limited to time-based changes in amplitude of acoustic emissions, frictional coefficient, capacitance, and/or resistance. CMP endpoint revealed by a change in acoustic frequency spectrum can also be validated by comparison with characteristic frequency spectra obtained at endpoints or polishing transitions of prior operational runs.Type: ApplicationFiled: November 7, 2001Publication date: May 8, 2003Applicant: APPLIED MATERIALS, INC.Inventors: Tony S. Kaushal, Chuong Quang Dam, Yongqi Hu
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Publication number: 20030029841Abstract: Method and apparatus are provided for polishing substrates comprising conductive and low k dielectric materials with reduced or minimum substrate surface damage and delamination. In one aspect, a method is provided for processing a substrate including positioning a substrate having a conductive material formed thereon in a polishing apparatus having one or more rotational carrier heads and one or more rotatable platens, wherein the carrier head comprises a retaining ring and a membrane for securing a substrate and the platen has a polishing article disposed thereon, contacting the substrate surface and the polishing article to each other at a retaining ring contact pressure of about 0.4 psi or greater than a membrane pressure, and polishing the substrate to remove conductive material.Type: ApplicationFiled: December 18, 2001Publication date: February 13, 2003Applicant: Applied Materials, Inc.Inventors: Yongsik Moon, David Mai, Kapila Wijekoon, Rajeev Bajaj, Rahul Surana, Yongqi Hu, Tony S. Kaushal, Shijian Li, Jui-Lung Li, Shi-Ping Wang, Gary Lam, Fred C. Redeker