Patents by Inventor Yoshiaki Fukuzumi

Yoshiaki Fukuzumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11908512
    Abstract: A microelectronic device comprises local digit line structures, global digit line structures, source line structures, sense transistors, read transistors, and write transistors. The local digit line structures are coupled to strings of memory cells. The global digit line structures overlie the local digit line structures. The source line structures are interposed between the local digit line structures and the global digit line structures. The sense transistors are interposed between the source line structures and the global digit line structures, and are coupled to the local digit line structures and the source line structures. The read transistors are interposed between and are coupled to the sense transistors and the global digit line structures. The write transistors are interposed between and are coupled to the global digit line structures and the local digit line structures. Additional microelectronic devices, memory devices, and electronic systems are also described.
    Type: Grant
    Filed: December 30, 2022
    Date of Patent: February 20, 2024
    Assignee: Micron Technology, Inc .
    Inventors: Tomoharu Tanaka, Yoshiaki Fukuzumi
  • Publication number: 20240057337
    Abstract: Microelectronic devices include a stack structure comprising a vertically alternating sequence of insulative structures and conductive structures arranged in tiers. A series of pillars extends through the stack structure. At least one isolation structure extends through an upper stack portion of the stack structure. The at least one isolation structure protrudes into pillars of neighboring columns of pillars of the series of pillars. Conductive contacts are in electrical communication with the pillars into which the at least one isolation structure protrudes. Related methods and electronic systems are also disclosed.
    Type: Application
    Filed: October 23, 2023
    Publication date: February 15, 2024
    Inventors: Matthew J. King, David A. Daycock, Yoshiaki Fukuzumi, Albert Fayrushin, Richard J. Hill, Chandra S. Tiwari, Jun Fujiki
  • Patent number: 11903207
    Abstract: A nonvolatile semiconductor memory device that have a new structure are provided, in which memory cells are laminated in a three dimensional state so that the chip area may be reduced. The nonvolatile semiconductor memory device of the present invention is a nonvolatile semiconductor memory device that has a plurality of the memory strings, in which a plurality of electrically programmable memory cells is connected in series. The memory strings comprise a pillar shaped semiconductor; a first insulation film formed around the pillar shaped semiconductor; a charge storage layer formed around the first insulation film; the second insulation film formed around the charge storage layer; and first or nth electrodes formed around the second insulation film (n is natural number more than 1). The first or nth electrodes of the memory strings and the other first or nth electrodes of the memory strings are respectively the first or nth conductor layers that are spread in a two dimensional state.
    Type: Grant
    Filed: May 20, 2022
    Date of Patent: February 13, 2024
    Assignee: Kioxia Corporation
    Inventors: Masaru Kito, Hideaki Aochi, Ryota Katsumata, Akihiro Nitayama, Masaru Kidoh, Hiroyasu Tanaka, Yoshiaki Fukuzumi, Yasuyuki Matsuoka, Mitsuru Sato
  • Patent number: 11903196
    Abstract: A microelectronic device comprises a stack structure comprising a stack structure comprising a vertically alternating sequence of conductive structures and insulative structures arranged in tiers, the stack structure divided into block structures separated from one another by slot structures, strings of memory cells vertically extending through the block structures of the stack structure, the strings of memory cells individually comprising a channel material vertically extending through the stack structure, an additional stack structure vertically overlying the stack structure and comprising a vertical sequence of additional conductive structures and additional insulative structures arranged in additional tiers, first pillars extending through the additional stack structure and vertically overlying the strings of memory cells, each of the first pillars horizontally offset from a center of a corresponding string of memory cells, second pillars extending through the additional stack structure and vertically ove
    Type: Grant
    Filed: December 18, 2020
    Date of Patent: February 13, 2024
    Assignee: Micron Technology, Inc.
    Inventors: Yoshiaki Fukuzumi, Jun Fujiki, Matthew J. King, Sidhartha Gupta, Paolo Tessariol, Kunal Shrotri, Kye Hyun Baek, Kyle A. Ritter, Shuji Tanaka, Umberto Maria Meotto, Richard J. Hill, Matthew Holland
  • Patent number: 11903205
    Abstract: A nonvolatile semiconductor memory device that have a new structure are provided, in which memory cells are laminated in a three dimensional state so that the chip area may be reduced. The nonvolatile semiconductor memory device of the present invention is a nonvolatile semiconductor memory device that has a plurality of the memory strings, in which a plurality of electrically programmable memory cells is connected in series. The memory strings comprise a pillar shaped semiconductor; a first insulation film formed around the pillar shaped semiconductor; a charge storage layer formed around the first insulation film; the second insulation film formed around the charge storage layer; and first or nth electrodes formed around the second insulation film (n is natural number more than 1). The first or nth electrodes of the memory strings and the other first or nth electrodes of the memory strings are respectively the first or nth conductor layers that are spread in a two dimensional state.
    Type: Grant
    Filed: May 13, 2022
    Date of Patent: February 13, 2024
    Assignee: Kioxia Corporation
    Inventors: Masaru Kito, Hideaki Aochi, Ryota Katsumata, Akihiro Nitayama, Masaru Kidoh, Hiroyasu Tanaka, Yoshiaki Fukuzumi, Yasuyuki Matsuoka, Mitsuru Sato
  • Publication number: 20240040787
    Abstract: Methods, systems, and devices for lateral etch stops for access line formation in a memory die are described. A memory die may be formed with isolation regions that provide an etch stop to limit the extent of voids formed by removing a sacrificial material between layers of a dielectric region. For example, first trenches may be formed through a stack of alternating layers of a dielectric material and a sacrificial material, in which one or more materials may formed. Second trenches may be formed between a first trench and an array portion of the memory die, or between pairs of the first trenches, which may support the removal of at least a portion of the sacrificial material to form voids for access line formation. However, the materials formed in the first trenches may provide a boundary, or a restriction zone, that limits an extent of the material removal operation.
    Type: Application
    Filed: July 28, 2022
    Publication date: February 1, 2024
    Inventors: Raja Kumar Varma Manthena, Yoshiaki Fukuzumi
  • Publication number: 20240038577
    Abstract: Methods, systems, and devices for isolation regions within a memory die are described. During fabrication, memory pillars may be formed through a stack of material in a plurality regions of a memory die. In some cases, a first plurality of trenches extending in a first direction and a second plurality of trenches extending in a second direction may be formed through the stack of material (e.g., interposed between the plurality of regions). Additionally or alternatively, first voids may be formed via the first plurality of trenches, and a dielectric material may be deposited in the first voids and the first plurality of trenches, forming first isolation regions. Then, second voids may be formed via the second plurality of trenches, and a dielectric material may be deposited in the second voids and the second plurality of trenches, forming second isolation regions.
    Type: Application
    Filed: July 28, 2022
    Publication date: February 1, 2024
    Inventors: Raja Kumar Varma Manthena, Yoshiaki Fukuzumi
  • Publication number: 20240021219
    Abstract: A microelectronic device comprises a stack structure, pillar structures, a conductive plug structure, a sense transistor, and selector transistors. The stack structure comprises a vertically alternating sequence of conductive material and insulative material, and is divided into blocks separated by dielectric slot structures. The blocks individually include sub-blocks horizontally extending in parallel with one another. The pillar structures vertically extend through one of the blocks of the stack structure. Each pillar structure of a group of the pillar structures is positioned within a different one of the sub-blocks of the one of the blocks than each other pillar structure of the group. The conductive plug structure is coupled to multiple of the pillar structures of the group of the pillar structures. The sense transistor is gated by the conductive plug structure. The selector transistors couple the sense transistor to a read source line structure and a digit line structure.
    Type: Application
    Filed: July 12, 2022
    Publication date: January 18, 2024
    Inventors: Yoshiaki Fukuzumi, Shuji Tanaka, Yoshihiko Kamata, Jun Fujiki, Tomoharu Tanaka
  • Patent number: 11871576
    Abstract: According to one embodiment, the array chip includes a three-dimensionally disposed plurality of memory cells and a memory-side interconnection layer connected to the memory cells. The circuit chip includes a substrate, a control circuit provided on the substrate, and a circuit-side interconnection layer provided on the control circuit and connected to the control circuit. The circuit chip is stuck to the array chip with the circuit-side interconnection layer facing to the memory-side interconnection layer. The bonding metal is provided between the memory-side interconnection layer and the circuit-side interconnection layer. The bonding metal is bonded to the memory-side interconnection layer and the circuit-side interconnection layer.
    Type: Grant
    Filed: December 7, 2020
    Date of Patent: January 9, 2024
    Assignee: Kioxia Corporation
    Inventors: Yoshiaki Fukuzumi, Hideaki Aochi, Mie Matsuo, Kenichiro Yoshii, Koichiro Shindo, Kazushige Kawasaki, Tomoya Sanuki
  • Publication number: 20240008276
    Abstract: A nonvolatile semiconductor memory device, includes: a stacked structural unit including a plurality of insulating films alternately stacked with a plurality of electrode films in a first direction; a selection gate electrode stacked on the stacked structural unit in the first direction; an insulating layer stacked on the selection gate electrode in the first direction; a first semiconductor pillar piercing the stacked structural unit, the selection gate electrode, and the insulating layer in the first direction, a first cross section of the first semiconductor pillar having an annular configuration, the first cross section being cut in a plane orthogonal to the first direction; a first core unit buried in an inner side of the first semiconductor pillar, the first core unit being recessed from an upper face of the insulating layer; and a first conducting layer of the first semiconductor pillar provided on the first core unit to contact the first core unit.
    Type: Application
    Filed: September 12, 2023
    Publication date: January 4, 2024
    Applicant: KIOXIA CORPORATION
    Inventors: Yoshiaki FUKUZUMI, Ryota KATSUMATA, Masaru KITO, Masaru KIDOH, Hiroyasu TANAKA, Yosuke KOMORI, Megumi ISHIDUKI, Junya MATSUNAMI, Tomoko FUJIWARA, Hideaki AOCHI, Ryouhei KIRISAWA, Yoshimasa MIKAJIRI, Shigeto OOTA
  • Publication number: 20230402103
    Abstract: A memory device includes a memory array comprising memory cells and control logic. The control logic performs operations including: causing a first erase pulse to be applied to a memory line of the memory array to perform an erase operation, the memory line being a conductive line coupled to a string of the memory cells; suspending the erase operation in response to receipt of a suspend command during a ramping period of the first erase pulse; recording a suspend voltage level of the first erase pulse when suspended; causing the erase operation to be resumed in response to an erase resume command; selectively modifying a pulse width of a flattop period of a second erase pulse based on the suspend voltage level; and causing the second erase pulse to be applied to the memory line during a resume of the erase operation.
    Type: Application
    Filed: August 15, 2022
    Publication date: December 14, 2023
    Inventors: Jiun-horng Lai, Pitamber Shukla, Ching-Huang Lu, Chengkuan Yin, Yoshiaki Fukuzumi
  • Patent number: 11844218
    Abstract: A non-volatile semiconductor storage device has a plurality of memory strings to each of which a plurality of electrically rewritable memory cells are connected in series. Each of the memory strings includes first semiconductor layers each having a pair of columnar portions extending in a vertical direction with respect to a substrate and a coupling portion formed to couple the lower ends of the pair of columnar portions; a charge storage layer formed to surround the side surfaces of the columnar portions; and first conductive layers formed to surround the side surfaces of the columnar portions and the charge storage layer. The first conductive layers function as gate electrodes of the memory cells.
    Type: Grant
    Filed: June 17, 2022
    Date of Patent: December 12, 2023
    Assignee: KIOXIA CORPORATION
    Inventors: Yoshiaki Fukuzumi, Ryota Katsumata, Masaru Kidoh, Masaru Kito, Hiroyasu Tanaka, Yosuke Komori, Megumi Ishiduki, Hideaki Aochi
  • Publication number: 20230395422
    Abstract: Methods, systems, and devices for selective cavity merging for isolation regions in a memory die are described. For example, formation of material structures of a memory die may include depositing a stack of alternating layers of a first material and a second material over a substrate of the memory die, forming a pattern of cavities through the stack of alternating material layers, and forming voids between layers of the first material based on removing portions of the second material. An electrical isolation region may be formed between portions of the memory die based on depositing a dielectric material in at least some of the cavities and in at least a portion of the voids between the layers of the first material.
    Type: Application
    Filed: July 12, 2022
    Publication date: December 7, 2023
    Inventors: Yoshiaki Fukuzumi, David H. Wells, Byeung Chul Kim, Richard H. Hill, Paolo Tessariol
  • Publication number: 20230395511
    Abstract: Methods, systems, and devices for techniques for concurrently-formed cavities in three-dimensional memory arrays are described. As part of forming a memory die, a plurality of cavities may be formed by a set of one or more material removal operations, and different subsets of the plurality of cavities may be used to form different features of the memory die. In some examples, a sacrificial region may be formed in accordance with one or more material addition or removal operations, and such a sacrificial region may include openings that support the formation of various structures of a memory device. After the formation of such structures, the sacrificial region may be isolated from an active region by merging a subset of the previously-formed plurality of cavities.
    Type: Application
    Filed: August 1, 2022
    Publication date: December 7, 2023
    Inventors: Yoshiaki Fukuzumi, David H. Wells
  • Publication number: 20230397422
    Abstract: Methods, systems, and devices for merged cavities and buried etch stops for three-dimensional memory arrays are described. For example, a row of cavities may be formed using a cavity etching process and material separating cavities of the row may be removed to merge the row of cavities to form a trench. In some cases, a trench may be formed from multiple rows of cavities. Additionally, or alternatively, a trench may be formed from a pattern of cavities that includes different quantities of rows at different locations along the trench. In some examples, etch stopping material portions (e.g., etch stops) may be formed at locations corresponding to cavities prior to the cavity etching process. For example, exposed material surfaces at locations corresponding to cavities or trenches may be oxidized to form etch stops.
    Type: Application
    Filed: August 9, 2022
    Publication date: December 7, 2023
    Inventors: Yoshiaki Fukuzumi, David H. Wells, Byeung Chul Kim, Richard J. Hill, Paolo Tessariol
  • Publication number: 20230389319
    Abstract: According to an embodiment, a non-volatile memory device includes a first conductive layer, electrodes, an interconnection layer and at least one semiconductor layer. The electrodes are arranged between the first conductive layer and the interconnection layer in a first direction perpendicular to the first conductive layer. The interconnection layer includes a first interconnection and a second interconnection. The semiconductor layer extends through the electrodes in the first direction, and is electrically connected to the first conductive layer and the first interconnection. The device further includes a memory film between each of the electrodes and the semiconductor layer, and a conductive body extending in the first direction. The conductive body electrically connects the first conductive layer and the second interconnection, and includes a first portion and a second portion connected to the second interconnection. The second portion has a width wider than the first portion.
    Type: Application
    Filed: August 9, 2023
    Publication date: November 30, 2023
    Applicant: Kioxia Corporation
    Inventors: Masaki TSUJI, Yoshiaki FUKUZUMI
  • Publication number: 20230363167
    Abstract: A semiconductor memory device includes a connecting member including a semiconductor material, a first electrode film, a first insulating film, a stacked body and three or more semiconductor pillars. The stacked body includes second electrode films and second insulating films that alternately stacked. The semiconductor pillars are arrayed along two or more directions, extend in a stacking direction, pierce through the stacked body and the first insulating film, and are connected to the connecting member. The device includes a third insulating film provided between the semiconductor pillars and the stacked body and between the connecting member and the first electrode film. A charge storage layer is provided at least between one of the second electrode films and the third insulating film.
    Type: Application
    Filed: July 7, 2023
    Publication date: November 9, 2023
    Applicant: Kioxia Corporation
    Inventors: Yoshiaki FUKUZUMI, Shinya ARAI, Masaki TSUJI, Hideaki AOCHI, Hiroyasu TANAKA
  • Publication number: 20230352091
    Abstract: Some embodiments include apparatuses and methods of forming the apparatuses. One of the apparatuses includes tiers located one over another, each of the tiers including memory cells and a control gate for the memory cells, each of the tiers including first transistors connected in series between the control gate in a respective tier and a conductive line, and second transistors connected in series between the control gate in the respective tier and the conductive line, the second transistors connected in parallel with the first transistors between the control gate and the conductive line, conductive joints coupled to channel regions of the first and second transistors, and gates for the first transistors and second transistors, each of the gates shared by one of the first transistors and one of the second transistors.
    Type: Application
    Filed: May 2, 2022
    Publication date: November 2, 2023
    Inventors: Jun Fujiki, Yoshiaki Fukuzumi, Akira Goda
  • Patent number: 11800717
    Abstract: Microelectronic devices include a stack structure comprising a vertically alternating sequence of insulative structures and conductive structures arranged in tiers. A series of pillars extends through the stack structure. At least one isolation structure extends through an upper stack portion of the stack structure. The at least one isolation structure protrudes into pillars of neighboring columns of pillars of the series of pillars. Conductive contacts are in electrical communication with the pillars into which the at least one isolation structure protrudes. Related methods and electronic systems are also disclosed.
    Type: Grant
    Filed: May 2, 2022
    Date of Patent: October 24, 2023
    Inventors: Matthew J. King, David A. Daycock, Yoshiaki Fukuzumi, Albert Fayrushin, Richard J. Hill, Chandra S. Tiwari, Jun Fujiki
  • Patent number: 11792992
    Abstract: A nonvolatile semiconductor memory device, includes: a stacked structural unit including a plurality of insulating films alternately stacked with a plurality of electrode films in a first direction; a selection gate electrode stacked on the stacked structural unit in the first direction; an insulating layer stacked on the selection gate electrode in the first direction; a first semiconductor pillar piercing the stacked structural unit, the selection gate electrode, and the insulating layer in the first direction, a first cross section of the first semiconductor pillar having an annular configuration, the first cross section being cut in a plane orthogonal to the first direction; a first core unit buried in an inner side of the first semiconductor pillar, the first core unit being recessed from an upper face of the insulating layer; and a first conducting layer of the first semiconductor pillar provided on the first core unit to contact the first core unit.
    Type: Grant
    Filed: January 14, 2022
    Date of Patent: October 17, 2023
    Assignee: Kioxia Corporation
    Inventors: Yoshiaki Fukuzumi, Ryota Katsumata, Masaru Kito, Masaru Kidoh, Hiroyasu Tanaka, Yosuke Komori, Megumi Ishiduki, Junya Matsunami, Tomoko Fujiwara, Hideaki Aochi, Ryouhei Kirisawa, Yoshimasa Mikajiri, Shigeto Oota