Patents by Inventor Yoshiaki Moriya

Yoshiaki Moriya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210221365
    Abstract: A control unit determines whether a rapid acceleration pedal depression operation has been performed. The control unit determines whether a low impact collision has occurred. When it is determined that the rapid acceleration pedal depression operation has been performed and the low impact collision has occurred, the control unit executes a secondary collision damage mitigation control. Consequently, the secondary collision damage mitigation control can be appropriately executed even when a collision that does not cause an air bag to be inflated has occurred.
    Type: Application
    Filed: December 23, 2020
    Publication date: July 22, 2021
    Inventors: Yusuke MASE, Hideyuki USUI, Yoshiaki MORIYA, Jiro OHACHI, Yuki TOMIKU, Yuji MISUMI, Tetsuhiro NARITA, Masakatsu ONITSUKA
  • Publication number: 20210221383
    Abstract: A driving assist apparatus comprises a driver monitor sensor which detects a state of a driver of an own vehicle installed with the driving assist apparatus. The apparatus determines whether the driver is in a drowsy state, based on the state of the driver detected by the driver monitor sensor. The apparatus determines that a light collision occurs when a light collision determination condition that at least one collision index value representing a level of a collision of the own vehicle is larger than a light collision determination threshold at which an airbag is not developed, is satisfied. The apparatus executes a secondary collision damage mitigation control to apply a braking force to the own vehicle or limit a driving force applied to the own vehicle when determining that the driver is in the drowsy state, and the light collision occurs.
    Type: Application
    Filed: September 9, 2020
    Publication date: July 22, 2021
    Inventors: Yusuke MASE, Hideyuki USUI, Yoshiaki MORIYA, Jiro OHACHI, Yuki TOMIKU, Yuji MISUMI, Tetsuhiro NARITA, Masakatsu ONITSUKA
  • Publication number: 20210221364
    Abstract: A control unit performs a lane departure suppression control when a host vehicle is about to depart from a traveling lane. The control unit determines whether a low impact collision has occurred. The control unit performs a secondary collision damage mitigation control when the low impact collision is determined to have occurred while the lane departure suppression control is being performed.
    Type: Application
    Filed: October 8, 2020
    Publication date: July 22, 2021
    Inventors: Yusuke MASE, Hideyuki USUI, Masakatsu ONITSUKA, Yoshiaki MORIYA, Jiro OHACHI, Yuki TOMIKU, Tetsuhiro NARITA, Yuji MISUMI
  • Patent number: 11024528
    Abstract: An electrostatic chuck device comprising: a placing table having a placing surface on which a plate-shaped sample is placed, an electrostatic attraction electrode, which is located on a lower side of the placing table in such a manner that the electrode is located on a surface side opposite to the placing surface of the placing table, a base part on which at least the placing table and the electrostatic attraction electrode are mounted, a focus ring which surrounds the placing table wherein the focus ring is a continuous ring or is divided into two or more portions, and a lift pin which is movable in an up-down direction and raises the entirety of or at least a part of the focus ring from the base part.
    Type: Grant
    Filed: October 21, 2016
    Date of Patent: June 1, 2021
    Assignee: SUMITOMO OSAKA CEMENT CO., LTD.
    Inventors: Yoshiaki Moriya, Keigo Maki, Hitoshi Kouno, Kazuto Ando, Yuuki Kinpara
  • Publication number: 20200357674
    Abstract: A robot hand is provided. The robot hand includes a transfer plate that has a loading region; an electrostatic chuck configured to adsorb a wafer disposed on the loading region of the transfer plate; and a heating element configured to heat the loading region of the transfer plate.
    Type: Application
    Filed: March 9, 2020
    Publication date: November 12, 2020
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventor: Yoshiaki MORIYA
  • Publication number: 20200227300
    Abstract: An electrostatic chuck that fixes a work substrate by an electrostatic force, the electrostatic chuck is disclosed. The electrostatic chuck includes a dielectric plate being configured to support the work substrate, a base plate being configured to support the dielectric plate and an adsorption electrode interposed between the dielectric plate and the base plate, and being configured to generate an electrostatic force for adsorbing the work substrate. The dielectric plate is a sapphire plate, the base plate consists of a alumina ceramic material, the adsorption electrode has a resistance change rate of 20% or less in a range of ?200° C. to 400° C., and the dielectric plate and the base plate are integrally bonded through the adsorption electrode.
    Type: Application
    Filed: January 13, 2020
    Publication date: July 16, 2020
    Applicant: SEMES CO., LTD.
    Inventors: Sang Kee LEE, Yoshiaki MORIYA
  • Publication number: 20190276014
    Abstract: A vehicle control apparatus is provided with: an avoidance supporter configured to perform an avoidance support control for avoiding a collision between a host vehicle and an object; a determinator configured to determine, while the host vehicle is passing a front object, (i) whether or not a distance between a first part of the host vehicle and a second part of the front object is less than or equal to a predetermined distance threshold value, or (ii) whether or not a time required for the first part of the host vehicle to reach a position corresponding to the second part of the front object is less than or equal to a predetermined time threshold value; a detector configured to detect a re-entry intention of a driver of the host vehicle; and a controller programmed to control said avoidance supporter not to perform the avoidance support control.
    Type: Application
    Filed: March 6, 2019
    Publication date: September 12, 2019
    Applicant: Toyota Jidosha Kabushiki Kaisha
    Inventor: Yoshiaki Moriya
  • Patent number: 10389278
    Abstract: Provided is an electrostatic chuck device in which the attachment of particles to the rear surface of a plate-like specimen can be further suppressed by suppressing the generation source of the particles and, furthermore, an effect of cooling the plate-like specimen using a cooling gas can be improved. The electrostatic chuck device is formed by including an electrostatic chuck portion in which an upper surface (2a) of a ceramic plate-like body (2) is used as a placement surface on which a wafer is placed and an electrostatic adsorption electrode is provided inside the ceramic plate-like body (2) or on the rear surface thereof, multiple protrusions (11) are formed on the upper surface (2a), and multiple fine protrusions (13) are formed in regions (12) excluding the multiple protrusions (11) in the upper surface (2a).
    Type: Grant
    Filed: March 11, 2014
    Date of Patent: August 20, 2019
    Assignee: Sumitomo Osaka Cement Co., Ltd.
    Inventors: Yoshiaki Moriya, Kazuto Ando
  • Patent number: 10189745
    Abstract: Provided are a corrosion-resistant member and an electrostatic chuck device using the same, in which corrosion resistance to halogen corrosive gas such as fluorine corrosive gas or chlorine corrosive gas and plasma thereof is high, dielectric constant and volume resistivity are high, and dielectric loss is low. The corrosion-resistant member is formed of a composite oxide sintered compact containing aluminum, samarium, and a rare earth metal element other than samarium, in which the rare earth metal element other than samarium has an ionic radius of 0.88×10?10 m or more.
    Type: Grant
    Filed: October 15, 2014
    Date of Patent: January 29, 2019
    Assignee: SUMITOMO OSAKA CEMENT CO., LTD.
    Inventors: Kentaro Takahashi, Yoshiaki Moriya, Megumi Ootomo
  • Publication number: 20180308737
    Abstract: An electrostatic chuck device comprising: a placing table having a placing surface on which a plate-shaped sample is placed, an electrostatic attraction electrode, which is located on a lower side of the placing table in such a manner that the electrode is located on a surface side opposite to the mounting surface of the placing table, a base part on which at least the placing table and the electrostatic attraction electrode are mounted, a focus ring which surrounds the placing table wherein the focus ring is a continuous ring or is divided into two or more portions, and a lift pin which is movable in an up-down direction and raises the entirety of or at least a part of the focus ring from the base part.
    Type: Application
    Filed: October 21, 2016
    Publication date: October 25, 2018
    Applicant: Sumitomo Osaka Cement Co., Ltd.
    Inventors: Yoshiaki MORIYA, Keigo MAKI, Hitoshi KOUNO, Kazuto ANDO, Yuuki KINPARA
  • Patent number: 9837296
    Abstract: An electrostatic chuck apparatus is disclosed which can be prevented from being damaged or fractured when the temperature abruptly increases or decreases when plasma is irradiated on a plate-like specimen, the heater is heated, or the like, and can also prevent corrosion when a corrosive gas or plasma is provided. The electrostatic chuck apparatus has an electrostatic chuck portion 2 having a mounting plate 11 made of a corrosion-resistant ceramic, a supporting plate 12 which is integrated with the mounting plate 11 so as to support the mounting plate 11 and is made of an insulating ceramic having a larger thermal conductivity than the thermal conductivity of the corrosion-resistant ceramic, and an internal electrode for electrostatic adsorption 13 provided between the mounting plate 11 and the supporting plate 12; and a temperature-controlling base portion 3 which adjusts the electrostatic chuck portion 2 to a desired temperature.
    Type: Grant
    Filed: December 18, 2012
    Date of Patent: December 5, 2017
    Assignee: Sumitomo Osaka Cement Co., Ltd.
    Inventors: Shinichi Maeta, Yoshiaki Moriya, Kei Furuuchi
  • Publication number: 20160251265
    Abstract: Provided are a corrosion-resistant member and an electrostatic chuck device using the same, in which corrosion resistance to halogen corrosive gas such as fluorine corrosive gas or chlorine corrosive gas and plasma thereof is high, dielectric constant and volume resistivity are high, and dielectric loss is low. The corrosion-resistant member is formed of a composite oxide sintered compact containing aluminum, samarium, and a rare earth metal element other than samarium, in which the rare earth metal element other than samarium has an ionic radius of 0.88×10?10 m or more.
    Type: Application
    Filed: October 15, 2014
    Publication date: September 1, 2016
    Inventors: Kentaro Takahashi, Yoshiaki Moriya, Megumi Ootomo
  • Patent number: 9343346
    Abstract: An electrostatic chuck apparatus including: an electrostatic chuck section having one main surface that is a mounting surface on which a plate specimen is mounted, and being equipped with an electrostatic adsorbing internal electrode; and a temperature adjusting base section that adjusts the electrostatic chuck section to a desired temperature, wherein a heating member is bonded to a main surface of the electrostatic chuck section, which is opposite to the mounting surface, via an adhesive material, the whole or a part of the main surface of the temperature adjusting base section, which is on the side of the electrostatic chuck section, is covered with a sheet or film of insulating material, and the electrostatic chuck section bonded with the heating member and the temperature adjusting base section covered with the insulating material are bonded and integrated via an insulating organic adhesive layer formed by curing a liquid adhesive.
    Type: Grant
    Filed: January 28, 2011
    Date of Patent: May 17, 2016
    Assignee: Sumitomo Osaka Cement Co., Ltd.
    Inventors: Mamoru Kosakai, Kazunori Ishimura, Takashi Satou, Ryuuji Hayahara, Takeshi Watanabe, Yoshiaki Moriya, Kei Furuuchi
  • Patent number: 9287156
    Abstract: The electrostatic chucking device 1 of the invention includes an electrostatic chucking portion 2 which includes a plate-like body 11, a top surface 11a of which is used as a mounting surface that mounts a plate-like specimen W, an electrostatic adsorption electrode 12 provided in the plate-like body 11 and a power-feeding terminal 13 that applies a direct-current voltage to the electrostatic adsorption electrode 12; and a base portion 31 that supports the electrostatic chucking portion 2, in which the plate-like body 11 is a corrosion-resistant ceramic, a circular insulation member 21 is provided in a circumferential edge portion between the electrostatic chucking portion 2 and the base portion 31, and a heat radiation plate 34 is provided on the top surface 31a of the base portion 31.
    Type: Grant
    Filed: January 15, 2014
    Date of Patent: March 15, 2016
    Assignee: Sumitomo Osaka Cement Co., Ltd.
    Inventors: Yoshiaki Moriya, Yukio Miura, Shinichi Maeta
  • Publication number: 20160036355
    Abstract: Provided is an electrostatic chuck device in which the attachment of particles to the rear surface of a plate-like specimen can be further suppressed by suppressing the generation source of the particles and, furthermore, an effect of cooling the plate-like specimen using a cooling gas can be improved. The electrostatic chuck device is formed by including an electrostatic chuck portion in which an upper surface (2a) of a ceramic plate-like body (2) is used as a placement surface on which a wafer is placed and an electrostatic adsorption electrode is provided inside the ceramic plate-like body (2) or on the rear surface thereof, multiple protrusions (11) are formed on the upper surface (2a), and multiple fine protrusions (13) are formed in regions (12) excluding the multiple protrusions (11) in the upper surface (2a).
    Type: Application
    Filed: March 11, 2014
    Publication date: February 4, 2016
    Inventors: Yoshiaki Moriya, Kazuto Ando
  • Publication number: 20140204501
    Abstract: The electrostatic chucking device 1 of the invention includes an electrostatic chucking portion 2 which includes a plate-like body 11, a top surface 11a of which is used as a mounting surface that mounts a plate-like specimen W, an electrostatic adsorption electrode 12 provided in the plate-like body 11 and a power-feeding terminal 13 that applies a direct-current voltage to the electrostatic adsorption electrode 12; and a base portion 31 that supports the electrostatic chucking portion 2, in which the plate-like body 11 is a corrosion-resistant ceramic, a circular insulation member 21 is provided in a circumferential edge portion between the electrostatic chucking portion 2 and the base portion 31, and a heat radiation plate 34 is provided on the top surface 31a of the base portion 31.
    Type: Application
    Filed: January 15, 2014
    Publication date: July 24, 2014
    Applicant: Sumitomo Osaka Cement Co., Ltd.
    Inventors: Yoshiaki Moriya, Yukio Miura, Shinichi Maeta
  • Publication number: 20130265690
    Abstract: An electrostatic chuck apparatus is disclosed which can be prevented from being damaged or fractured when the temperature abruptly increases or decreases when plasma is irradiated on a plate-like specimen, the heater is heated, or the like, and can also prevent corrosion when a corrosive gas or plasma is provided. The electrostatic chuck apparatus has an electrostatic chuck portion 2 having a mounting plate 11 made of a corrosion-resistant ceramic, a supporting plate 12 which is integrated with the mounting plate 11 so as to support the mounting plate 11 and is made of an insulating ceramic having a larger thermal conductivity than the thermal conductivity of the corrosion-resistant ceramic, and an internal electrode for electrostatic adsorption 13 provided between the mounting plate 11 and the supporting plate 12; and a temperature-controlling base portion 3 which adjusts the electrostatic chuck portion 2 to a desired temperature.
    Type: Application
    Filed: December 18, 2012
    Publication date: October 10, 2013
    Applicant: SUMITOMO OSAKA CEMENT CO., LTD.
    Inventors: Shinichi Maeta, Yoshiaki Moriya, Kei Furuuchi
  • Patent number: 8358493
    Abstract: The present invention relates to an electrostatic chuck comprising a specific composite oxide sintered body, wherein in the sintered body, an L* value of a reflected color tone measured by a C light source on a 2° angle visual field condition is 10 or more and 50 or less in a CIEL*a*b* color system prescribed in JIS Z 8729-1994 and an electrostatic chuck device comprising an electrostatic chuck member (A) having a tabular body provided with a clamping surface for clamping a sample by the electrostatic force, an internal electrode layer for clamping a sample by electrostatic force which is provided on the back face of the tabular body and an insulation layer, wherein at least the sample clamping surface of the tabular body in the electrostatic chuck member (A) comprises the composite oxide sintered body constituting the electrostatic chuck described above.
    Type: Grant
    Filed: February 10, 2010
    Date of Patent: January 22, 2013
    Assignee: Sumitomo Osaka Cement Co., Ltd.
    Inventors: Hironori Kugimoto, Kazuto Ando, Yoshiaki Moriya
  • Publication number: 20120299253
    Abstract: The present invention provides an electrostatic chuck apparatus including: an electrostatic chuck section having one main surface that is a mounting surface on which a plate specimen is mounted, and being equipped with an electrostatic adsorbing internal electrode; and a temperature adjusting base section that adjusts the electrostatic chuck section to a desired temperature, wherein a heating member is bonded to a main surface of the electrostatic chuck section, which is opposite to the mounting surface, via an adhesive material, the whole or a part of the main surface of the temperature adjusting base section, which is on the side of the electrostatic chuck section, is covered with a sheet-like or film-like insulating material, and the electrostatic chuck section bonded with the heating member and the temperature adjusting base section covered with the sheet-like or the film-like insulating material are bonded and integrated via an insulating organic adhesive layer formed by curing a liquid adhesive.
    Type: Application
    Filed: January 28, 2011
    Publication date: November 29, 2012
    Applicant: SUMITOMO OSAKA CEMENT CO., LTD.
    Inventors: Mamoru Kosakai, Kazunori Ishimura, Takashi Satou, Ryuuji Hayahara, Takeshi Watanabe, Yoshiaki Moriya, Kei Furuuchi
  • Publication number: 20110149462
    Abstract: The present invention relates to an electrostatic chuck comprising a specific composite oxide sintered body, wherein in the sintered body, an L* value of a reflected color tone measured by a C light source on a 2° angle visual field condition is 10 or more and 50 or less in a CIEL*a*b* color system prescribed in JIS Z 8729-1994 and an electrostatic chuck device comprising an electrostatic chuck member (A) having a tabular body provided with a clamping surface for clamping a sample by the electrostatic force, an internal electrode layer for clamping a sample by electrostatic force which is provided on the back face of the tabular body and an insulation layer, wherein at least the sample clamping surface of the tabular body in the electrostatic chuck member (A) comprises the composite oxide sintered body constituting the electrostatic chuck described above.
    Type: Application
    Filed: February 10, 2010
    Publication date: June 23, 2011
    Applicant: SUMITOMO OSAKA CEMENT CO., LTD.
    Inventors: Hironori Kugimoto, Kazuto Ando, Yoshiaki Moriya