Abstract: A heater stage includes an insulating ceramic substrate including lower and upper substrates, each including a first ceramic, and a heat generating element located between the lower substrate and the upper substrate and including a second ceramic and a second metal carbide. The first ceramic of the insulating ceramic substrate and the second ceramic of the heat generating element include at least one of a metal nitride and a metal oxide, a content of the second ceramic in the heat generating element is greater than a content of the second metal carbide in the heat generating element, the heat generating element has a relative density of 95% or more and a volume resistance value of 1.0 ?·cm or less at room temperature, and a rate of change of the volume resistance value of the heat generating element with an increase in temperature by 100° C. is 0.1 or less.

Abstract: A control unit performs a lane departure suppression control when a host vehicle is about to depart from a traveling lane. The control unit determines whether a low impact collision has occurred. The control unit performs a secondary collision damage mitigation control when the low impact collision is determined to have occurred while the lane departure suppression control is being performed.

Abstract: A wafer temperature sensor includes a first wafer, a second wafer, and a fiber bragg gratings (FBG)-type optical fiber, wherein the first wafer and the second wafer are bonded to each other, wherein at least one of a bonding surface of the first wafer and a bonding surface of the second wafer comprises a spiral groove, wherein the FBG-type optical fiber is in the spiral groove, and wherein the FBG-type optical fiber comprises a plurality of temperature measurement points in the spiral groove.

Abstract: An electrostatic chuck apparatus is provided that is capable of effectively reducing temperature imbalance of a wafer substrate that is heated to a high temperature. The electrostatic chuck apparatus includes a base including a cooling flow path through which a refrigerant may flow, an adiabatic layer on the base, a uniform heating plate on the adiabatic layer, a heating element between the adiabatic layer and the uniform heating plate, an insulating layer on the uniform heating plate and including a ceramic, a conductive layer on the insulating layer and having an area smaller than an area of the insulating layer, and a dielectric layer on the conductive layer and including a ceramic.

Abstract: A control unit determines whether a rapid acceleration pedal depression operation has been performed. The control unit determines whether a low impact collision has occurred. When it is determined that the rapid acceleration pedal depression operation has been performed and the low impact collision has occurred, the control unit executes a secondary collision damage mitigation control. Consequently, the secondary collision damage mitigation control can be appropriately executed even when a collision that does not cause an air bag to be inflated has occurred.

Abstract: The present disclosure provides an electrostatic chuck device capable of uniformly cooling or heating a fixedly adsorbed substrate. The electrostatic chuck device includes an electrostatic chuck plate, a bonding layer, and a base. The bonding layer has a bonding agent bonded to a rear surface of the electrostatic chuck plate. The base has a bonding surface bonded to the bonding layer and a plurality of protrusions radially extending from a central part toward an outer circumferential surface of the bonding surface. The ends of the respective protrusions on the central part may be arranged at intervals.

Abstract: A robot hand is provided. The robot hand includes a transfer plate that has a loading region; an electrostatic chuck configured to adsorb a wafer disposed on the loading region of the transfer plate; and a heating element configured to heat the loading region of the transfer plate.

Abstract: An apparatus for manufacturing a semiconductor device may include a vacuum chamber, an electrostatic chuck (ESC), a cooler, an RF plate, a casing, a base plate and a gas supplier. The ESC may be arranged in the vacuum chamber. The cooler may be configured to cool the ESC. The RF plate may be arranged under the cooler. The casing may be configured to support the cooler. The base plate may be opposite to the RF plate to form an inner space together with the casing. The gas supplier may supply a gas having a low dew point to the inner space. Thus, a generation of the dew condensation at the very low temperature may be prevented so that a damage caused by a short, which may be generated by the dew condensation, may also be prevented.

Abstract: An electrostatic chuck that fixes a work substrate by an electrostatic force, the electrostatic chuck is disclosed. The electrostatic chuck includes a dielectric plate being configured to support the work substrate, a base plate being configured to support the dielectric plate and an adsorption electrode interposed between the dielectric plate and the base plate, and being configured to generate an electrostatic force for adsorbing the work substrate. The dielectric plate is a sapphire plate, the base plate consists of a alumina ceramic material, the adsorption electrode has a resistance change rate of 20% or less in a range of ?200° C. to 400° C., and the dielectric plate and the base plate are integrally bonded through the adsorption electrode.

Abstract: A driving assist apparatus comprises a driver monitor sensor which detects a state of a driver of an own vehicle installed with the driving assist apparatus. The apparatus determines whether the driver is in a drowsy state, based on the state of the driver detected by the driver monitor sensor. The apparatus determines that a light collision occurs when a light collision determination condition that at least one collision index value representing a level of a collision of the own vehicle is larger than a light collision determination threshold at which an airbag is not developed, is satisfied. The apparatus executes a secondary collision damage mitigation control to apply a braking force to the own vehicle or limit a driving force applied to the own vehicle when determining that the driver is in the drowsy state, and the light collision occurs.

Abstract: The present disclosure provides an electrostatic chuck device capable of uniformly cooling or heating a fixedly adsorbed substrate. The electrostatic chuck device includes an electrostatic chuck plate, a bonding layer, and a base. The bonding layer has a bonding agent bonded to a rear surface of the electrostatic chuck plate. The base has a bonding surface bonded to the bonding layer and a plurality of protrusions radially extending from a central part toward an outer circumferential surface of the bonding surface. The ends of the respective protrusions on the central part may be arranged at intervals.

Abstract: A control unit performs a lane departure suppression control when a host vehicle is about to depart from a traveling lane. The control unit determines whether a low impact collision has occurred. The control unit performs a secondary collision damage mitigation control when the low impact collision is determined to have occurred while the lane departure suppression control is being performed.

Abstract: A control unit determines whether a rapid acceleration pedal depression operation has been performed. The control unit determines whether a low impact collision has occurred. When it is determined that the rapid acceleration pedal depression operation has been performed and the low impact collision has occurred, the control unit executes a secondary collision damage mitigation control. Consequently, the secondary collision damage mitigation control can be appropriately executed even when a collision that does not cause an air bag to be inflated has occurred.

Abstract: A driving assist apparatus comprises a driver monitor sensor which detects a state of a driver of an own vehicle installed with the driving assist apparatus. The apparatus determines whether the driver is in a drowsy state, based on the state of the driver detected by the driver monitor sensor. The apparatus determines that a light collision occurs when a light collision determination condition that at least one collision index value representing a level of a collision of the own vehicle is larger than a light collision determination threshold at which an airbag is not developed, is satisfied. The apparatus executes a secondary collision damage mitigation control to apply a braking force to the own vehicle or limit a driving force applied to the own vehicle when determining that the driver is in the drowsy state, and the light collision occurs.

Abstract: An electrostatic chuck device comprising: a placing table having a placing surface on which a plate-shaped sample is placed, an electrostatic attraction electrode, which is located on a lower side of the placing table in such a manner that the electrode is located on a surface side opposite to the placing surface of the placing table, a base part on which at least the placing table and the electrostatic attraction electrode are mounted, a focus ring which surrounds the placing table wherein the focus ring is a continuous ring or is divided into two or more portions, and a lift pin which is movable in an up-down direction and raises the entirety of or at least a part of the focus ring from the base part.

Abstract: A robot hand is provided. The robot hand includes a transfer plate that has a loading region; an electrostatic chuck configured to adsorb a wafer disposed on the loading region of the transfer plate; and a heating element configured to heat the loading region of the transfer plate.

Abstract: An electrostatic chuck that fixes a work substrate by an electrostatic force, the electrostatic chuck is disclosed. The electrostatic chuck includes a dielectric plate being configured to support the work substrate, a base plate being configured to support the dielectric plate and an adsorption electrode interposed between the dielectric plate and the base plate, and being configured to generate an electrostatic force for adsorbing the work substrate. The dielectric plate is a sapphire plate, the base plate consists of a alumina ceramic material, the adsorption electrode has a resistance change rate of 20% or less in a range of ?200° C. to 400° C., and the dielectric plate and the base plate are integrally bonded through the adsorption electrode.

Abstract: A vehicle control apparatus is provided with: an avoidance supporter configured to perform an avoidance support control for avoiding a collision between a host vehicle and an object; a determinator configured to determine, while the host vehicle is passing a front object, (i) whether or not a distance between a first part of the host vehicle and a second part of the front object is less than or equal to a predetermined distance threshold value, or (ii) whether or not a time required for the first part of the host vehicle to reach a position corresponding to the second part of the front object is less than or equal to a predetermined time threshold value; a detector configured to detect a re-entry intention of a driver of the host vehicle; and a controller programmed to control said avoidance supporter not to perform the avoidance support control.

Abstract: Provided is an electrostatic chuck device in which the attachment of particles to the rear surface of a plate-like specimen can be further suppressed by suppressing the generation source of the particles and, furthermore, an effect of cooling the plate-like specimen using a cooling gas can be improved. The electrostatic chuck device is formed by including an electrostatic chuck portion in which an upper surface (2a) of a ceramic plate-like body (2) is used as a placement surface on which a wafer is placed and an electrostatic adsorption electrode is provided inside the ceramic plate-like body (2) or on the rear surface thereof, multiple protrusions (11) are formed on the upper surface (2a), and multiple fine protrusions (13) are formed in regions (12) excluding the multiple protrusions (11) in the upper surface (2a).

Abstract: Provided are a corrosion-resistant member and an electrostatic chuck device using the same, in which corrosion resistance to halogen corrosive gas such as fluorine corrosive gas or chlorine corrosive gas and plasma thereof is high, dielectric constant and volume resistivity are high, and dielectric loss is low. The corrosion-resistant member is formed of a composite oxide sintered compact containing aluminum, samarium, and a rare earth metal element other than samarium, in which the rare earth metal element other than samarium has an ionic radius of 0.88×10?10 m or more.