Patents by Inventor Yoshifumi Ueno

Yoshifumi Ueno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9577158
    Abstract: A phosphor sheet-forming resin composition uses a low-cost resin material having high light fastness and low visible light absorption and is capable of providing a phosphor sheet at low cost with deterioration of a phosphor due to moisture being suppressed. The phosphor sheet-forming resin composition contains a film-forming resin composition and a powdery phosphor that emits fluorescence when irradiated with excitation light. The film-forming resin composition contains a hydrogenated styrene-based copolymer, and uses a sulfide-based phosphor as the phosphor. Examples of the hydrogenated styrene-based copolymer include hydrogenated products of styrene-ethylene-butylene-styrene block copolymers. CaS:Eu is used as a preferred sulfide-based phosphor.
    Type: Grant
    Filed: July 5, 2012
    Date of Patent: February 21, 2017
    Assignee: DEXERIALS CORPORATION
    Inventors: Yasushi Ito, Yoshifumi Ueno, Hirofumi Tani
  • Publication number: 20170009109
    Abstract: Provided are a sealing tape that can prevent tape width misalignment, air bubble inclusion, and creasing even when the sealing tape is affixed in a folded state, a phosphor sheet using the same, a lighting device, a liquid-crystal display, a method for manufacturing a phosphor sheet, and a sealing method. The sealing tape (10) includes an adhesive layer (11), a gas barrier layer (12), a bonding layer (13), and a support film layer (14) laminated in stated order, and has an incision (15) into the support film layer (14) in a thickness direction. The incision (15) is located substantially centrally in a width direction and extends in a longitudinal direction. Accordingly, tape width misalignment, air bubble inclusion, and creasing can be prevented even when the sealing tape is affixed in a folded state.
    Type: Application
    Filed: February 5, 2015
    Publication date: January 12, 2017
    Applicant: Dexerials Corporation
    Inventors: Yasushi ITO, Tomomitsu HORI, Teruo HIYAMA, Akihiro YAMAZAKI, Yoshifumi UENO
  • Patent number: 9192037
    Abstract: A control method for a target supply device includes melting a target material by heating the target material within a target generator using a heating unit, pushing out the target material from a nozzle hole in a nozzle by pressurizing the interior of the target generator using a pressure control unit, determining whether or not the size of an adhering area of the target material that forms when the target material is pushed out from the nozzle hole and adheres to a leading end of the nozzle has reached a set size that covers the entire nozzle hole, stopping the pressurization of the interior of the target generator by the pressure control unit when the size of the adhering area has reached the set size, and hardening the target material in the target generator and the adhering area by stopping the heating of the target material by the heating unit.
    Type: Grant
    Filed: August 6, 2013
    Date of Patent: November 17, 2015
    Assignee: Gigaphoton Inc.
    Inventor: Yoshifumi Ueno
  • Publication number: 20150083939
    Abstract: An extreme ultraviolet light generation device may be configured to generate extreme ultraviolet light by irradiating a target with a laser beam to turn the target into plasma. The extreme ultraviolet light generation device may comprise: a chamber provided with at least one through-hole; an optical system configured to introduce the laser beam into a predetermined region in the chamber through the at least one through-hole; and a target supply device configured to supply a powder target as the target to the predetermined region.
    Type: Application
    Filed: November 28, 2014
    Publication date: March 26, 2015
    Inventors: Yoshifumi UENO, Osamu WAKABAYASHI
  • Patent number: 8901522
    Abstract: A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet through which a laser beam outputted from the laser apparatus enters the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a magnetic field generation unit for generating a magnetic field in the predetermined region; and a charged particle collection unit disposed in a direction of a magnetic flux of the magnetic field for collecting a charged particle thereinto, the charged particle being generated when the target material is irradiated with the laser beam inside the chamber and traveling along the magnetic flux.
    Type: Grant
    Filed: August 2, 2011
    Date of Patent: December 2, 2014
    Assignee: Gigaphoton Inc.
    Inventors: Yoshifumi Ueno, Shinji Nagai, Osamu Wakabayashi
  • Patent number: 8841639
    Abstract: A control method for a target supply device may employ a target supply device, provided in an EUV light generation apparatus including an image sensor, that includes a target generator having a nozzle and configured to hold a target material and a pressure control unit configured to control a pressure within the target generator, and the method may include outputting the target material in the target generator from a nozzle hole in the nozzle by pressurizing the interior of the target generator using the pressure control unit, determining whether or not a difference between an output direction of the target material outputted from the nozzle hole that is detected by the image sensor and a set direction is within a predetermined range, and holding the pressure in the target generator using the pressure control unit until the difference falls within the predetermined range.
    Type: Grant
    Filed: September 11, 2013
    Date of Patent: September 23, 2014
    Assignee: Gigaphoton Inc.
    Inventors: Takayuki Yabu, Yoshifumi Ueno, Takeshi Kodama
  • Publication number: 20140124813
    Abstract: A phosphor sheet-forming resin composition uses a low-cost resin material having high light fastness and low visible light absorption and is capable of providing a phosphor sheet at low cost with deterioration of a phosphor due to moisture being suppressed. The resin composition contains a film-forming resin composition and a powdery phosphor that emits fluorescence when irradiated with excitation light. The film-forming resin composition used contains a polyolefin copolymer component and a maleic anhydride component. A sulfurized phosphor, an oxide-based phosphor, or a phosphor mixture thereof is preferably used as the phosphor.
    Type: Application
    Filed: July 5, 2012
    Publication date: May 8, 2014
    Applicant: DEXERIALS CORPORATION
    Inventors: Yasushi Ito, Yoshifumi Ueno, Hirofumi Tani
  • Patent number: 8710475
    Abstract: An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.
    Type: Grant
    Filed: March 18, 2013
    Date of Patent: April 29, 2014
    Assignee: Gigaphoton Inc.
    Inventors: Hiroshi Komori, Tatsuya Yanagida, Yoshifumi Ueno, Akira Sumitani, Akira Endo, Tsukasa Hori
  • Publication number: 20140097461
    Abstract: A phosphor sheet-forming resin composition uses a low-cost resin material having high light fastness and low visible light absorption and is capable of providing a phosphor sheet at low cost with deterioration of a phosphor due to moisture being suppressed. The phosphor sheet-forming resin composition contains a film-forming resin composition and a powdery phosphor that emits fluorescence when irradiated with excitation light. The film-forming resin composition contains a hydrogenated styrene-based copolymer, and uses a sulfide-based phosphor as the phosphor. Examples of the hydrogenated styrene-based copolymer include hydrogenated products of styrene-ethylene-butylene-styrene block copolymers. CaS:Eu is used as a preferred sulfide-based phosphor.
    Type: Application
    Filed: July 5, 2012
    Publication date: April 10, 2014
    Applicant: DEXERIALS CORPORATION
    Inventors: Yasushi Ito, Yoshifumi Ueno, Hirofumi Tani
  • Publication number: 20140070021
    Abstract: A control method for a target supply device may employ a target supply device, provided in an EUV light generation apparatus including an image sensor, that includes a target generator having a nozzle and configured to hold a target material and a pressure control unit configured to control a pressure within the target generator, and the method may include outputting the target material in the target generator from a nozzle hole in the nozzle by pressurizing the interior of the target generator using the pressure control unit, determining whether or not a difference between an output direction of the target material outputted from the nozzle hole that is detected by the image sensor and a set direction is within a predetermined range, and holding the pressure in the target generator using the pressure control unit until the difference falls within the predetermined range.
    Type: Application
    Filed: September 11, 2013
    Publication date: March 13, 2014
    Applicant: GIGAPHOTON INC.
    Inventors: Takayuki YABU, Yoshifumi UENO, Takeshi KODAMA
  • Publication number: 20140042653
    Abstract: A control method for a target supply device includes melting a target material by heating the target material within a target generator using a heating unit, pushing out the target material from a nozzle hole in a nozzle by pressurizing the interior of the target generator using a pressure control unit, determining whether or not the size of an adhering area of the target material that forms when the target material is pushed out from the nozzle hole and adheres to a leading end of the nozzle has reached a set size that covers the entire nozzle hole, stopping the pressurization of the interior of the target generator by the pressure control unit when the size of the adhering area has reached the set size, and hardening the target material in the target generator and the adhering area by stopping the heating of the target material by the heating unit.
    Type: Application
    Filed: August 6, 2013
    Publication date: February 13, 2014
    Applicant: GIGAPHOTON INC.
    Inventor: Yoshifumi UENO
  • Publication number: 20140029238
    Abstract: Provided is an illumination device that can be made thin and increases the efficiency of extracting light to the outside. The present invention is provided with: light-emitting structures wherein a blue light-emitting element is embedded in a transparent resin having a convex surface shape; a substrate wherein the light-emitting structures are disposed two-dimensionally; a diffuser plate that diffuses the blue light of the blue light-emitting elements; and a fluorescent sheet that is disposed spaced from the substrate and that contains a particulate fluorescent body that obtains a white light from the blue light of the blue light-emitting elements.
    Type: Application
    Filed: July 5, 2012
    Publication date: January 30, 2014
    Applicant: DEXERIALS CORPORATION
    Inventors: Yasushi Ito, Yoshifumi Ueno, Hirofumi Tani, Tomomitsu Hori
  • Publication number: 20140021376
    Abstract: An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.
    Type: Application
    Filed: July 3, 2013
    Publication date: January 23, 2014
    Applicant: GIGAPHOTON INC.
    Inventors: Hiroshi KOMORI, Yoshifumi UENO, Georg SOUMAGNE
  • Patent number: 8604453
    Abstract: An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.
    Type: Grant
    Filed: May 29, 2013
    Date of Patent: December 10, 2013
    Assignee: Gigaphoton Inc.
    Inventors: Akira Endo, Yoshifumi Ueno, Youichi Sasaki, Osamu Wakabayashi
  • Patent number: 8586953
    Abstract: An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.
    Type: Grant
    Filed: February 9, 2012
    Date of Patent: November 19, 2013
    Assignee: Gigaphoton Inc.
    Inventors: Hiroshi Komori, Yoshifumi Ueno, Georg Soumagne
  • Publication number: 20130284949
    Abstract: An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.
    Type: Application
    Filed: March 18, 2013
    Publication date: October 31, 2013
    Inventors: Hiroshi KOMORI, Tatsuya YANAGIDA, Yoshifumi UENO, Akira SUMITANI, Akira ENDO, Tsukasa HORI
  • Publication number: 20130256568
    Abstract: An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.
    Type: Application
    Filed: May 29, 2013
    Publication date: October 3, 2013
    Applicant: GIGAPHOTON INC.
    Inventors: Akira ENDO, Yoshifumi UENO, Youichi SASAKI, Osamu WAKABAYASHI
  • Patent number: 8513630
    Abstract: In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder 20 is arranged for collecting the ion, and ion collision surfaces Sa and Sb of the ion collection cylinder 20 are provided with or coated with Si, which is a metal whose sputtering rate with respect to the ion is less than one atom/ion.
    Type: Grant
    Filed: October 17, 2011
    Date of Patent: August 20, 2013
    Assignee: Gigaphoton Inc.
    Inventors: Yoshifumi Ueno, Georg Soumagne, Shinji Nagai, Akira Endo, Tatsuya Yanagida
  • Patent number: 8492738
    Abstract: An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.
    Type: Grant
    Filed: May 7, 2012
    Date of Patent: July 23, 2013
    Assignee: Gigaphoton, Inc.
    Inventors: Yoshifumi Ueno, Osamu Wakabayashi, Tamotsu Abe, Akira Sumitani, Hideo Hoshino, Akira Endo, Georg Soumagne
  • Patent number: 8471226
    Abstract: An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.
    Type: Grant
    Filed: August 26, 2009
    Date of Patent: June 25, 2013
    Assignee: Gigaphoton Inc.
    Inventors: Hiroshi Komori, Tatsuya Yanagida, Yoshifumi Ueno, Akira Sumitani, Akira Endo, Tsukasa Hori