Abstract: According to an aspect, a gas supply mechanism for supplying a gas to a semiconductor manufacturing apparatus is provided. The gas supply mechanism includes a pipe connecting a gas source and the semiconductor manufacturing apparatus to each other, and a valve which is provided on the pipe. The valve includes a plate rotatable about an axis, the axis extending in a plate thickness direction, and a housing provided along the plate without contacting the plate to accommodate the plate, the housing providing a gas supply path along with the pipe. A through hole is formed in the plate, the through hole penetrating the plate at a position on a circle which extends around the axis and intersects the gas supply path.

Abstract: A plasma processing apparatus includes a baffle structure between a mounting table and a processing chamber. The baffle structure has a first member and a second member. The first member has a first cylindrical part extending between the mounting table and the processing chamber, and a plurality of through-holes elongated in the vertical direction is formed in an array in the circumferential direction in the first cylindrical part. The second member has a second cylindrical part having an inner diameter greater than the outer diameter of the cylindrical part for the first member. The second member moves up and down in a region that includes the space between the first member and the processing chamber.

Abstract: A baffle structure of a plasma processing apparatus includes a first member and at least one second member. The first member includes a cylindrical portion extending between a placement table and a processing container. A plurality of vertically elongated through holes are formed in the cylindrical portion to be arranged in the circumferential direction. The at least one second member is disposed in the outside of the cylindrical portion of the first member in the radial direction. The at least one second member is arranged to form a cylindrical body having an inner diameter larger than the outer diameter of the cylindrical portion. The vertical positions of a plurality of second members may be individually changed. Or, the horizontal position of a single second member may be changed. Or, the single second member may be made to be inclined.

Abstract: A moisture-permeable, waterproof fabric comprising a textile fabric and a resin coating containing a fluorine-containing polyurethane resin and polyurethane resin having a low degree of polymerization on at least one side of said textile fabric. This moisture-permeable, waterproof fabric is obtained by a process comprising coating a resin solution, containing a fluorine-containing polyurethane resin and a polyurethane resin having a low degree of polymerization, on at least one side of a textile fabric, followed by coagulating the resin, removing the solvent, drying the fabric and applying a water repellent.

Abstract: A moisture-permeable, waterproof fabric comprising a textile fabric and a resin coating containing a fluorine-containing polyurethane resin and polyurethane resin having a low degree of polymerization on at least one side of said textile fabric. This moisture-permeable, waterproof fabric is obtained by a process comprising coating a resin solution, containing a fluorine-containing polyurethane resin and a polyurethane resin having a low degree of polymerization, on at least one side of a textile fabric, followed by coagulating the resin, removing the solvent, drying the fabric and applying a water repellent.

Abstract: An electrical connector having contact elements, for mounting a leadless circuit board to a mother board. Each contact element is provided with a projection laterally projecting therefrom which engages with the lower opening edge of a through-hole of the mother board to maintain the connector in contact with the surface of the mother board. Connector apertures are arranged to a zigzag pattern to form first and second rows, and the contact elements are inserted in the apertures of the first and second rows with reversed orientation.