Abstract: A positive-working light-sensitive composition comprising (a) a compound having at least two enol ether groups, represented by the following general formula (I); (b) a linear polymer having acidic groups; and (c) a compound capable of generating an acid through irradiation with actinic light rays or radiant rays, the component (a) and the component (b) being thermally crosslinked:(R.sup.2)(R.sup.1)C.dbd.C(R.sup.3)--O-- (I)wherein R.sup.1, R.sup.2 and R.sup.3 may be the same or different and each represents a hydrogen atom, an alkyl group or an aryl group, provided that each two of R.sup.1, R.sup.2 and R.sup.3 may be linked together to form a saturated or olefinically unsaturated ring. The positive-working light-sensitive composition has high light-sensitivity and permits the use of light rays extending over a wide range of wavelengths. Therefore, the positive-working light-sensitive composition of the present invention can provide clear positive images and has a wide development latitude.

Abstract: A photopolymerizable composition is described, comprising components (i) a compound having at least one addition-polymerizable ethylenically unsaturated bond, (ii) a compound represented by the following formula (I): ##STR1## and (iii) an activating agent which generates an active radical upon light irradiation in the co-presence of component (ii). The substituents in formula (I) are defined in the specification.

Abstract: A positive-working light-sensitive composition comprises a diazonium salt represented by the following general formula (I) and an alkali-soluble polymer: ##STR1## wherein R.sup.1 represents a substituted or unsubstituted alkyl group having 3 to 18 carbon atoms; R.sup.2 represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted phenoxy group or a halogen atom; A represents an organic group; X.sup.-- represents a counterion or an anion; n is an integer ranging from 1 to 4 and m is an integer ranging from 1 to 3, provided that the sum of n and m is equal to 4. The positive-working light-sensitive composition has high sensitivity and can ensure the formation of clear images.

Abstract: A positive-working light-sensitive composition whose solubility in a developer is increased by irradiation of light, which comprises:(a) a vinyl ether compound having at least one group represented by the following formula (A); ##STR1## wherein R.sup.3 represents a linear or branched alkylene group having 1 to 10 carbon atoms and n represents an integer of 0 or 1;(b) a compound capable of being decomposed by irradiation of an actinic light ray or a radiant ray and releasing an acid; and(c) an alkali-soluble polymer, the light-sensitive composition having high sensitivity to light and permitting the use of light of a wide wavelength range.

Abstract: The photosensitive resin composition of the present invention comprises an admixture of 5 to 100 weight parts of a photosensitive material having the following general formula (A) and 100 weight parts of an alkali-soluble resin:General formula (A) ##STR1## where R.sub.1 to R.sub.8 each independently represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxyl group, an aralkyl group, an aryl group, an amino group, a monoalkylamino group, a dialkylamino group, an acylamino group, an alkylcarbamoyl group, an arylcarbamoyl group, an alkylsulfamoyl group, an arylsulfamoyl group, a carboxyl group, a cyano group, a nitro group, an acyl group, an alkyloxycarbonyl group, an aryloxycarbonyl group, an acyloxy group, or --OD, --N(R)--D (where R represents a hydrogen atom or an alkyl group, and D represents a 1,2-napthoquinoediazide-5-sulfonyl group or a 1,2-napthoquinoediazide-4-sulfonyl group), and at least one of R.sub.1 to R.sub.8 represents --OD or --N(R)--D; R.sub.9 to R.sub.

Abstract: A photopolymerizable composition comprises a photopolymerizable ethylenically unsaturated compound having at least two terminal ethylene groups, a photopolymerization initiator and an organic polymer binder, wherein the photopolymerization initiator is an aromatic sulfonic acid salt of an onium compound. The composition has high sensitivity to actinic rays over a wide range of wavelength extending from ultraviolet to visible region and thus can be used for preparing a lithographic printing plate, a resin-letterpress plate, a resist or photomask for making a printed board, a monochromatic and colored sheet for transfer or color-development and a color-developing sheet.

Abstract: A positive working photosensitive composition comprising a polymeric compound insoluble in water but soluble in an aqueous alkaline solution and an aromatic sulfonic acid salt of an onium compound. The positive working photosensitive composition having high sensitivity and being capable of forming high-contrast images.

Abstract: Microcapsules are disclosed containing (a) a vinyl compound which has at least two polymerizable, ethylenically unsaturated groups linked to each other through a linking group comprising a chemical bond capable of being split by the action of an acid, (b) a thermal polymerization initiator, and (c) one or more compounds capable of producing acid when irradiated with actinic radiation.A light-sensitive recording material is also disclosed, which has on its support the above-described microcapsules or a thermally cured product thereof.

Abstract: Light-sensitive compositions comprise a light-sensitive diazo resin, a binder and a compound having a pivaloyl group. Lithographic printing plates prepared by using the light-sensitive compositions of the invention are excellent in ink receptivity.

Abstract: A photopolymerizable composition is described, comprising an addition polymerizable unsaturated compound having at least two ethylenically unsaturated double bonds per molecule, a photopolymerization initiator, and a binder, wherein said binder is a copolymer represented by formula (I) ##STR1## wherein Ar.sup.1 and Ar.sup.2 each represent a substituted or unsubstituted phenyl group; and n.sub.1, n.sub.2, n.sub.3, and n.sub.4 each represents mol % of the respective repeating unit, wherein n.sub.1 is from 0 to about 70; n.sub.2 is from 0 to about 70; n.sub.3 is from about 5 to 50; and n.sub.4 is from about 5 to 50; provided that n.sub.1 and n.sub.2 are not 0 at the same time, the sum of n.sub.3 and n.sub.4 is from about 30 to 80. The composition is useful as an alkali-developable light-sensitive layer which provides a photosensitive dry film resist having excellent performance characteristics.

Abstract: A positively working resist material is disclosed, comprising a compound having at least one silyl ether group and capable of directly dissociating an Si-O-C bond upon irradiation with far ultraviolet rays, X-rays, an electron beam, or an ion beam. The resist material has high sensitivity to high energy radiation, excellent resistance to dry etching, and can be developed with an alkaline aqueous solution.

Abstract: A light-sensitive composition is herein disclosed, which comprises at least one light-sensitive s-triazine compound represented by the following general formula (I) and at least one compound having at least one ethylenically unsaturated double bond and capable of causing addition polymerization: ##STR1## wherein R.sub.1 and R.sub.2 independently represent hdyrogen atom, a substituted or unsubstituted alkyl or aryl group, or a group represented by the general formula: R.sub.5 --CO-- or N(R.sub.6) (R.sub.7)--CO-- (wherein R.sub.5 stands for a substituted or unsubstituted alkyl or aryl group; and R.sub.6 and R.sub.7 independently represent hydrogen atom or a substituted or unsubstituted alkyl or aryl group), provided that R.sub.1 and R.sub.2 may form a heterocyclic ring consisting of non-metallic atoms together with the nitrogen atom to which they are bonded; R.sub.3 and R.sub.4 represent hydrogen, a halogen, an alkyl or an alkoxyl; X and Y independently represent chlorine or bromine; and m and n are 0, 1 or 2.

Abstract: A light-sensitive composition containing a novel light-sensitive s-triazine compound represented by the formula (I) as a free radical-generating agent is disclosed. The s-triazine compound responds radiation in the range of the near ultraviolet to visible light, shows high sensitivity for photolysis and, therefore, the compositon has high light-sensitivity.

Abstract: A negative working light-sensitive lithographic plate requiring no dampening solution and a plate making process are described, the negative working light-sensitive lithographic plate comprising a support having, in sequence, on said support, (A) a light-sensitive layer containing (1) an o-quinonediazide compound and (2) a coupling component which causes a diazo coupling reaction under a basic environment, and (B) a silicone rubber layer, and the plate making process comprising imagewise exposing the negative working light-sensitive lithographic plate and developing said exposed plate to obtain a lithographic plate requiring no dampening solution, wherein a step of processing with base is carried out after imagewise exposure.

Abstract: A photopolymerizable composition containing an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator is disclosed, wherein the photopolymerizable composition contains at least one compound represented by following general formula (I) or (II) as the photopolymerization initiator: ##STR1## wherein, R.sub.1, R.sub.2, R.sub.3, R.sub.4, and R.sub.5 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an allyl group or a substituted allyl group, said R.sub.1 and R.sub.2 may combine with each other to form a ring together with the carbon atoms to which they are bonded; Y represents --O--, --S--, --Se--, --C(CH.sub.3).sub.2 -- or --CH.dbd.CH--; X.sub.1 represents an oxygen atom or a sulfur atom; R.sub.11, R.sub.12, R.sub.17, and R.sub.

Abstract: A photopolymerizable composition is described, comprising a polymerizable compound having an ethylenically unsaturated bond and a photopolymerization initiator represented by formula (I) ##STR1## wherein Z represents a non-metallic atomic group forming a nitrogen-containing heterocyclic ring; and R represents a substituted or unsubstituted aryl group or a substituted or unsubstituted heterocyclic ring. The photopolymerization initiator (I) greatly improves the sensitivity of the composition.

Abstract: A negative working light-sensitive composition and a lithographic printing plate using the composition are described. The printing plate is comprised of a hydrophilic support and a thin layer of a negative working light-sensitive composition on the support. The light-sensitive composition contains a light-sensitive diazo compound and a compound capable of increasing absorption over the light-sensitive wavelength region of the composition with increasing exposure time.

Abstract: A photopolymerizable composition is described, which comprises a polymerizable compound containing at least one ethylenically unsaturated double bond and a photopolymerization initiator wherein the photopolymerization initiator is a combination of a 3-keto-substituted cumarin compound and an active halogeno compound. This composition can be easily cured by irradiation with radiation and, therefore, is very useful in the preparation of light-sensitive materials.

Abstract: A light-sensitive printing plate precursor is disclosed. The printing plate precursor is comprised of an aluminum support base having provided on a grained and anodized surface. The surface is coated with a layer which is comprised of a positive working light-sensitive composition and an oxonol dye. The printing plate has high printing durability, high water retention ability and high color stain resistance. When used the plate precursor provides an image having high contrast. The plate precursor forms less color stain than conventional plates whether used with a fresh developing solution or a fatigued developing solution. The plate precursor does not result in causing uneven development when using manual development methods.

Abstract: A silver halide color photographic light-sensitive material comprising a support having coated thereon at least one silver halide emulsion layer, the color photographic light-sensitive material having at least one layer containing at least one kind of 5-pyrazolone type 2-equivalent magenta coupler represented by the following general formula (Ia): ##STR1## wherein W represents phenyl substituted with at least one halogen, alkyl, alkoxy, alkoxycarbonyl or cyano; Y represents acylamino or anilino; and Z represents aryloxy, alkoxy, heterocyclic oxy, alkylthio, arylthio, heterocyclic thio, acylthio, acylamino, sulfonamido, alkoxycarbonylamino, aryloxycarbonylamino or nitrogen containing heterocyclic ring which is bonded to the active position of the pyrazolone ring through the nitrogen atom, and at least one kind of compound represented by the following general formula (II): ##STR2## wherein R.sub.1 represents substituted or unsubstituted alkyl, aralkyl, cycloalkyl or alkenyl; R.sub.