Abstract: At least one exemplary embodiment is directed to an exposure apparatus which includes a chamber, an evacuating device configured to evacuate the chamber, a sensor configured to measure at least any one of the position and the height of a substrate, and a cover for hermetically sealing at least part of the sensor.

Abstract: An imaging optical system for imaging a pattern of an object plane onto an image plane includes a first imaging optical system for imaging at a first imaging position, the first imaging optical system having a magnification ? in a vacuum atmosphere, and a second imaging optical system for imaging at a second imaging position, the second imaging optical system having a magnification ? in the vacuum atmosphere, wherein when an environment in which the imaging optical system is placed changes from the vacuum atmosphere to an air atmosphere or vise versa, a direction of the first imaging position that moves along an optical axis is opposite to a direction of the second imaging position that moves along the optical axis.

Abstract: A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature variation mechanism that changes a temperature of part of the cooling apparatus in a non-contact manner.

Abstract: A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature variation mechanism that changes a temperature of part of the cooling apparatus in a non-contact manner.

Abstract: At least one exemplary embodiment is directed to an exposure apparatus which includes a chamber, an evacuating device configured to evacuate the chamber, a sensor configured to measure at least any one of the position and the height of a substrate, and a cover for hermetically sealing at least part of the sensor.

Abstract: An imaging optical system for imaging a pattern of an object plane onto an image plane includes a first imaging optical system for imaging at a first imaging position, the first imaging optical system having a magnification ? in a vacuum atmosphere, and a second imaging optical system for imaging at a second imaging position, the second imaging optical system having a magnification ? in the vacuum atmosphere, wherein when an environment in which the imaging optical system is placed changes from the vacuum atmosphere to an air atmosphere or vise versa, a direction of the first imaging position that moves along an optical axis is opposite to a direction of the second imaging position that moves along the optical axis.

Abstract: A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature variation mechanism that changes a temperature of part of the cooling apparatus in a non-contact manner.

Abstract: A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature variation mechanism that changes a temperature of part of the cooling apparatus in a non-contact manner.

Abstract: Disclosed is a mirror holding system by which aberration resulting from deformation or positional deviation of an optical member, causing degradation of imaging performance, can be reduced whereby a desired optical performance is assured. Also disclosed is an exposure apparatus and a device manufacturing method based on such mirror holding system. The holding system includes a supporting member for supporting the optical element at a plurality of supports which are movable along an approximately radial direction about a predetermined point.

Abstract: An exposure apparatus for exposing a substrate using a plurality of masters. The apparatus includes a stage being able to install at least one of the plurality of masters, a first housing surrounding the stage, a second housing for stocking at least one of the plurality of masters, the second housing being installed adjacent to the first housing or installed in an interior of the first housing, the second housing being allowed to communicate with the first housing, and a third housing being installed between an inside space and an outside space of the first housing, the third housing being different from the first and second housings. The first and second housings are filled by an inert gas or are adapted to be evacuated.

Abstract: A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature variation mechanism that changes a temperature of part of the cooling apparatus in a non-contact manner.

Abstract: Disclosed is a mirror holding system by which aberration resulting from deformation or positional deviation of an optical member, causing degradation of imaging performance, can be reduced whereby a desired optical performance is assured. Also disclosed is an exposure apparatus and a device manufacturing method based on such mirror holding system. The holding system includes a supporting member for supporting the optical element at a plurality of supports which are movable along an approximately radial direction about a predetermined point.

Abstract: An exposure apparatus for exposing a substrate using a plurality of masters. The apparatus includes a stage being able to install at least one of the plurality of masters, a first housing surrounding the stage, a second housing for stocking at least one of the plurality of masters, the second housing being installed adjacent to the first housing or installed in an interior of the first housing, the second housing being allowed to communicate with the first housing, and a third housing being installed between an inside space and an outside space of the first housing, the third housing being different from the first and second housings. The first and second housings are filled by an inert gas or are adapted to be evacuated.

Abstract: An exposure apparatus to be used with an excimer laser as a light source includes an optical system disposed along a path of excimer laser light, a chamber for accommodating the optical system therein and having an inside space being able to be replaced by a predetermined gas, a gas circulation mechanism having a gas circulation path for connecting a gas discharging port for discharging a gas from the chamber and a gas supplying port for supplying a gas into the chamber, and a switching device for selectively using plural purifiers disposed in the gas circulation path.

Abstract: An exposure apparatus for exposing a substrate using a plurality of masters. The apparatus includes a stage being able to install at least one of the plurality of masters, a first housing surrounding said stage, a second housing for stocking at least one of the plurality of masters, the second housing being installed adjacent to the first housing or installed in an interior of the first housing, the second housing being allowed to communicate with the first housing, and a third housing being installed between an inside space and an outside space of the first housing, the third housing being different from said first and second housings. The first and second housings are filled by an inert gas or are adapted to be evacuated.

Abstract: Disclosed is a mirror holding system by which aberration resulting from deformation or positional deviation of an optical member, causing degradation of imaging performance, can be reduced whereby a desired optical performance is assured. Also disclosed is an exposure apparatus and a device manufacturing method based on such mirror holding system. The holding system includes a supporting member for supporting the optical element at a plurality of supports which are movable along an approximately radial direction about a predetermined point.

Abstract: An exposure apparatus includes a light source, one or two or more housings each for accommodating therein an optical element disposed along an exposure light path extending from the light source to a substrate, a first substitution system for substituting the interior of the housing with an inert gas ambience, and a second substitution system for substituting the interior of a holding mechanism for holding the optical element accommodated in the housing, with an inert gas ambience. The structure enables reduction in time for substitution of the exposure light path with an inert gas, and assures enlargement of a throughput of the exposure apparatus.

Abstract: A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature variation mechanism that changes a temperature of part of the cooling apparatus in a non-contact manner.

Abstract: An exposure apparatus for transferring a pattern of a mask onto a substrate. The apparatus includes a door and a sensor for detecting ozone in a space enclosed by the door. Opening of the door is prohibited when ozone concentration detected by the sensor is not less than a predetermined value.

Abstract: An exposure apparatus includes an illumination system for illuminating a mask with an exposure beam having a wavelength of 250 nm or less, wherein a pattern of the mask can be lithographically transferred to a substrate through the illumination by the illumination system, a conditioning system for circulating an inside gas of the exposure apparatus; and a control system for performing at least one of ozone removal and ozone detection, for ozone in the gas circulated.