Abstract: An exposure apparatus includes an illumination system for illuminating a mask with an exposure beam having a wavelength of 250 nm or less, wherein a pattern of the mask can be lithographically transferred to a substrate through the illumination by the illumination system, a conditioning system for circulating an inside gas of the exposure apparatus and a control system for performing at least one of ozone removal and ozone detection, for ozone in the gas circulated.

Abstract: An exposure apparatus includes a light source, one or two or more housings each for accommodating therein an optical element disposed along an exposure light path extending from the light source to a substrate, a first substitution system for substituting the interior of the housing with an inert gas ambience, and a second substitution system for substituting the interior of a holding mechanism for holding the optical element accommodated in the housing, with an inert gas ambience. The structure enables reduction in time for substitution of the exposure light path with an inert gas, and assures enlargement of a throughput of the exposure apparatus.

Abstract: An exposure apparatus for transferring a pattern onto an object. The apparatus includes an optical member constituting part of an optical system arranged between a light source and the object, a rotor having a hole extending in an axial direction thereof, the optical member being mounted in the hole, a stator, the rotor and the stator constituting a motor for rotating the optical member, and a non-contact bearing for supporting the rotor.

Abstract: An exposure apparatus includes a light source, one or two or more housings each for accommodating therein an optical element disposed along an exposure light path extending from the light source to a substrate, a first substitution system for substituting the interior of the housing with an inert gas ambience, and a second substitution system for substituting the interior of a holding mechanism for holding the optical element accommodated in the housing, with an inert gas ambience. The structure enables reduction in time for substitution of the exposure light path with an inert gas, and assures enlargement of a throughput of the exposure apparatus.

Abstract: In order to perform integrated exposure control with high precision even if the wavelength of a light source is changed, an exposure apparatus includes an exposure optical system, an exposure amount control unit, a wavelength changing unit, and a correction unit. The exposure optical system has a laser as a light source to irradiate a photosensitive substrate with light from the light source. The exposure amount control unit controls an exposure amount for the photosensitive substrate. The wavelength changing unit changes an oscillation wavelength of the laser to a predetermined wavelength. The correction unit corrects a target exposure amount to irradiate the photosensitive substrate in accordance with the oscillation wavelength of the laser.

Abstract: An exposure apparatus includes an illumination system for illuminating a mask with an exposure beam having a wavelength of 250 nm or less, wherein a pattern of the mask can be lithographically transferred to a substrate through the illumination by the illumination system, a conditioning system for circulating an inside gas of the exposure apparatus; and a control system for performing at least one of ozone removal and ozone detection, for ozone in the gas circulated.

Abstract: An exposure apparatus includes a light source, one or two or more housings each for accommodating therein an optical element disposed along an exposure light path extending from the light source to a substrate, a first substitution system for substituting the interior of the housing with an inert gas ambience, and a second substitution system for substituting the interior of a holding mechanism for holding the optical element accommodated in the housing, with an inert gas ambience. The structure enables reduction in time for substitution of the exposure light path with an inert gas, and assures enlargement of a throughput of the exposure apparatus.

Abstract: An exposure apparatus for transferring a pattern on a master to a substrate via an optical system includes a first housing for surrounding the exposure position of the master, a second housing for stocking the master, and a third housing for transferring the master between the inside and outside of the first housing. The interior of each housing is controlled to a predetermined atmosphere.

Abstract: Disclosed is an exposure apparatus to be used with an excimer laser as a light source, which includes an optical system disposed along a path of excimer laser light, a chamber for accommodating the optical system therein and having an inside space being able to be replaced by a predetermined gas, a gas circulation mechanism having a gas discharging port for discharging a gas from the chamber and a gas supply port for supplying a gas into the chamber, and a switching device for selectively using plural purifiers disposed in a portion of a gas circulation path.

Abstract: This invention relates to an exposure apparatus for transferring a pattern onto a wafer, and includes a wedge prism constituting part of an optical system arranged between an excimer laser and a wafer to change the phase of interference fringes, a rotor frame to which the wedge prism is mounted, a non-contact gas bearing for supporting a rotor frame, and a driving mechanism for rotating the rotor frame together with the wedge prism.

Abstract: A projection exposure apparatus capable of detecting projection exposure conditions in the middle of a laser beam irradiation path. The apparatus includes a laser source for generating a laser beam, an illumination optical system for illuminating a reticle with the laser beam, a projection optical unit for projecting a pattern of the reticle onto a wafer, a light shielding member in which the path of the laser beam emitted by the laser source is enclosed and in which an inert gas is supplied, a removable enclosure for enclosing the light shielding member, an insertion slot formed in the light shielding member so that a detector for detecting a physical or chemical characteristic in the vicinity of the laser beam path may be inserted into the insertion slot, and a light shielding lid provided on the light shielding member. The light shielding lid can be opened and closed when the detector is inserted or removed.

Abstract: An exposure apparatus includes an illumination system including an optical element and an inside movable portion, and a driving mechanism for driving the movable portion. The driving mechanism includes at least one of a non-contact type bearing and a non-contact type motor. The illumination system can be placed in a predetermined gas ambience, while the movable portion can be placed in the same gas ambience.