Abstract: In an exposure apparatus for projecting and exposing a transfer pattern formed on a master onto a substrate placed on a movable stage, a step mark placed on the movable stage and formed from a step is imaged on an image sensing element at an exposure wavelength through a projection optical system, thereby receiving an image. The imaging performance of the projection optical system is calculated on the basis of the resultant image data.

Abstract: According to an aligning method, the position of an alignment mark within a plurality of sample shots formed on a substrate is measured with a predetermined measurement condition, and the substrate is positioned on the basis of the position measurement result. This measurement condition is selected on the basis of the change amount of a position measurement value which is obtained from the position measurement result. This position measurement result is obtained by moving the alignment mark in a direction different from the measurement direction and sequentially measuring the position of the alignment mark.

Abstract: An exposure apparatus includes a stage on which a substrate to be exposed is provided, a projection optical system for projecting a pattern onto the substrate and an aberration detection system for forming an image of a pattern of a mask formed by light passed through the projection optical system plural times, for detecting an intensity distribution of the image of the pattern of the mask, and for detecting a wavefront aberration of the projection optical system on the basis of the detected intensity distribution.

Abstract: An optical characteristic measuring apparatus capable of making a measurement area smaller and facilitating the precise checking of the position of the measurement area includes a filter having a small hole disposed between a semispherical glass and a photodetector, so that a light beam reflected at a specific interface is detected with the photodetector and a light beam reflected at an interface different from the specific interface is not detected with the photodetector. By this arrangement, measurement precision by the photodetector can be maintained. Moreover, since a conventional upper semispherical glass is not placed on a liquid crystal device, the position of a measurement area can be precisely checked easily with a microscope.

Abstract: In an optical anisotropy measurement apparatus for emitting a light flux from a He-Ne laser to be incident to an object to be examined, such as a liquid crystal in a liquid crystal cell, and detecting a light flux totally reflected from the object to be examined to measure an optical anisotropy of the object, a portion of the incident light flux is designed to be incident at an angle smaller than a critical angle of total reflection to and transmitted through the object to be examined. As a result, a light flux-incident region causing total reflection at the boundary is allowed to have a shape closer to a circle and have a smaller size, thus allowing detection of a local alignment change in optical anisotropy as caused by, e.g., a minute alignment defect in a liquid crystal device. Further by detecting the transmitted portion of the incident light flux, an optical anisotropy of the object to be examined at a position other than a boundary thereof can be measured simultaneously.

Abstract: A detecting system for detecting positional information related to a surface of an object. The detecting system includes a variable pattern generator for projecting an arbitrary pattern image on the surface of the object, a light projecting optical system for projecting a pattern, defined by the variable pattern generator, to the surface of the object along an oblique direction, a light receiving optical system for directing light from an image of the pattern and a light receiving element for detecting the light directed by the light receiving optical system. Surface position information about the surface of the object is detected on the basis of the detection by the light receiving element.

Abstract: An optical anisotropy measurement apparatus including a light source emitting a light beam and a photodetector disposed opposite to the light source is provided for measuring an optical anisotropy of an object to be examined disposed between the light source and the photodetector so as to intersect a straight line connecting the light source and the photodetector. The apparatus further includes: a supporting member for supporting the object to be examined rotatably about a rotation axis extending perpendicular to the straight line, a polarizer positioned between the light source and the object to be examined, an analyzer positioned between the object to be examined and the photodetector, and an optical member disposed between the light source and the object to be examined so as to cause the beam to pass through an intersection of the straight line and the rotation axis.

Abstract: An apparatus for measuring an optical anisotropy of an object to be examined, such as a liquid crystal, based on an interaction of an evanescent wave occurring during total reflection of a beam with the object is disclosed.