Patents by Inventor Yoshio Mori

Yoshio Mori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9206336
    Abstract: A polishing composition is composed of a filtered diluted liquid obtained through an undiluted liquid-preparing step, an undiluted liquid-filtering step, a diluting step, and a diluted liquid-filtering step. In the undiluted liquid-preparing step, an undiluted liquid is prepared by mixing raw materials for the polishing composition. In the undiluted liquid-filtering step, the undiluted liquid is filtered. In the diluting step, the filtered undiluted liquid is diluted to obtain a diluted liquid. In the diluted liquid-filtering step, the diluted liquid is filtered. The polishing composition is used, for example, for polishing a silicon substrate material to produce a silicon substrate.
    Type: Grant
    Filed: January 16, 2013
    Date of Patent: December 8, 2015
    Assignee: FUJIMI INCORPORATED
    Inventors: Shuhei Takahashi, Kohsuke Tsuchiya, Shinichiro Takami, Yoshio Mori
  • Publication number: 20150166838
    Abstract: A polishing composition is obtained through diluting an undiluted liquid containing abrasive grains. When R1 is defined as an average secondary particle diameter of the abrasive grains in the undiluted liquid and R2 is defined as an average secondary particle diameter of the abrasive grains in the polishing composition, the ratio R2/R1 is 1.2 or less. The polishing composition is used for polishing a silicon substrate material to produce a silicon substrate.
    Type: Application
    Filed: January 16, 2013
    Publication date: June 18, 2015
    Applicant: FUJIMI INCORPORATED
    Inventors: Kohsuke Tsuchiya, Yoshio Mori, Shuhei Takahashi, Shinichiro Takami
  • Publication number: 20150079789
    Abstract: The polishing composition has a pH of 7 or more and is used in applications for polishing a silicon substrate. The polishing composition contains abrasive grains and a water-soluble polymer. The water-soluble polymer is a copolymer including a first monomer unit having a characteristic value P of 50-100 inclusive, and a second monomer unit having a characteristic value P of at least ?100 and less than 50. The characteristic value P is the result of subtracting an adsorption coefficient S2 of the abrasive grains obtained through a specific standard test B from a wettability coefficient S1 of the silicon substrate obtained through a specific standard test A.
    Type: Application
    Filed: March 12, 2013
    Publication date: March 19, 2015
    Applicant: FUJIMI INCORPORATED
    Inventors: Yoshio Mori, Kohsuke Tsuchiya, Maki Asada, Shuhei Takahashi
  • Publication number: 20150072568
    Abstract: A metal plate contact has two slits running from an upper end towards a bottom wall. First and second trench for receiving trunk and branching cables, respectively, and a recess for mounting a contact that crosses these trenches are created in a middle portion in a lateral direction of a housing. Left and right movable ends are connected to the middle portion on the two sides in a longitudinal direction via a connection band. The movable ends can be folded towards the top of the middle portion. First and second upper side trenches for covering the top of the first trench and covering the top of the second trench, respectively, are created in these movable ends. A wire lid for positioning a cable end is formed in one end or in the two ends of the second trench or of the second upper side trench.
    Type: Application
    Filed: September 2, 2014
    Publication date: March 12, 2015
    Inventors: Yoshio MORI, Yuji NAKAJIMA
  • Publication number: 20150056122
    Abstract: A polishing composition is composed of a filtered diluted liquid obtained through an undiluted liquid-preparing step, an undiluted liquid-filtering step, a diluting step, and a diluted liquid-filtering step. In the undiluted liquid-preparing step, an undiluted liquid is prepared by mixing raw materials for the polishing composition. In the undiluted liquid-filtering step, the undiluted liquid is filtered. In the diluting step, the filtered undiluted liquid is diluted to obtain a diluted liquid. In the diluted liquid-filtering step, the diluted liquid is filtered. The polishing composition is used, for example, for polishing a silicon substrate material to produce a silicon substrate.
    Type: Application
    Filed: January 16, 2013
    Publication date: February 26, 2015
    Inventors: Shuhei Takahashi, Kohsuke Tsuchiya, Shinichiro Takami, Yoshio Mori
  • Patent number: 8944836
    Abstract: A wire line connector includes a main contact body is provided with an electrical connection trench into which an insulated wire is compressed at the rear end, a protrusion that engages with a housing and prevents disconnection in the middle portion, and a contact portion at the front end. The portion of the contact portion on the rear end side forms parallel walls and the portion on the front end side forms protruding parallel walls in such a manner that the outer surfaces of the protruding walls and the inner surfaces of the parallel walls make contact with each other when the two connector portions are connected. The housing is provided with a step to be engaged with the protrusion for preventing disconnection of the main contact body, and an engaging hole and an engaging protrusion which prevent disconnection when the housing is connected with another housing.
    Type: Grant
    Filed: January 31, 2013
    Date of Patent: February 3, 2015
    Assignee: Nichifu Terminal Industries Co., Ltd.
    Inventors: Yoshio Mori, Ryuji Kuriyama
  • Publication number: 20140302752
    Abstract: Provided is a polishing composition, which comprises abrasive grains, a water-soluble polymer, an aggregation inhibitor and water. The ratio R1/R2 is 1.3 or less, where R1 represents the average particle diameter of the particles present in the polishing composition and R2 represents the average particle diameter of the abrasive grains when the abrasive grains are dispersed in water at the same concentration as that of the abrasive grains in the polishing composition. The polishing composition can be used mainly for polishing the surface of a silicon substrate.
    Type: Application
    Filed: October 9, 2012
    Publication date: October 9, 2014
    Applicant: FUJIMI INCORPORATED
    Inventors: Kohsuke Tsuchiya, Yoshio Mori, Shinichiro Takami, Shuhei Takahashi
  • Publication number: 20140203117
    Abstract: An electrostatic atomizing apparatus is provided with a discharge electrode, a water feeder for supplying water to the electrode, and a high voltage supply configured to generate a high intensity electric field to electrostatically atomize the water supplied to the discharge electrode. The electrode and the high voltage supply are held by an identical circuit substrate.
    Type: Application
    Filed: July 25, 2012
    Publication date: July 24, 2014
    Applicant: PANASONIC CORPORATION
    Inventors: Takeshi Yano, Yukari Nakano, Yutaka Uratani, Yoshio Mori
  • Patent number: 7776181
    Abstract: A novel retention aid is provided, which can realizes not only high retention but also excellent paper formation and is easy to use, in various papermaking processes. A composition for improving retention is provided, which comprises (A) a cationic water-soluble polymer and (B) an amphoteric water-soluble polymer. The component (A) preferably is a copolymer having a cation equivalent of 0.05 to 4.00 meq/g or one having a 0.5% salted viscosity of 30 to 200 mPa·s. The component (B) preferably is either a copolymer comprising a cationic radical-polymerizable monomer unit, an anionic radical-polymerizable monomer unit, and a nonionic radical-polymerizable monomer unit, or an amphoteric water-soluble polymer obtained by polymerizing a cationic radical-polymerizable monomer with an anionic radical-polymerizable monomer in the presence of a polysaccharide.
    Type: Grant
    Filed: December 28, 2005
    Date of Patent: August 17, 2010
    Assignee: Toagosei Co., Ltd.
    Inventors: Yoshio Mori, Koichi Adachi, Ken Takeda, Tetsuya Tsuzuki
  • Publication number: 20100068386
    Abstract: The object of the invention is to provide an aqueous coating agent which I applied onto a recording medium in the ink-jet system to form a film excellent in scratch resistance, water resistance and gloss on the surface of an image, and an aqueous coating solution containing this aqueous coating agent.
    Type: Application
    Filed: October 1, 2007
    Publication date: March 18, 2010
    Applicant: TOAGOSEI CO., LTD.
    Inventors: Shinya Kanbe, Takayuki Maki, Yousuke Asai, Morikatsu Matsunaga, Yoshio Mori
  • Publication number: 20090176925
    Abstract: To provide a dispersing agent that contains a water-soluble polymer that has excellent dispersibility and stability over time even for a high concentration of a dispersoid such as a pigment and can give a pigment slurry having stable viscosity characteristics and redispersibility due to a large dispersion stabilization effect. A dispersing agent containing a water-soluble polymer and/or an alkali metal salt or an ammonium salt of the water-soluble polymer, the water-soluble polymer containing (A) an ethylenically unsaturated monocarboxylic acid monomer or an anhydride thereof, or an ethylenically unsaturated dicarboxylic acid monomer or an anhydride thereof, and (B) a polyether compound, a ratio [(B)/(A)] of the number of moles of alkylene oxide added in component (B) relative to the number of moles of carboxyl group in component (A) being no greater than 0.6, and component (B) being less than 25 wt % relative to the total amount.
    Type: Application
    Filed: May 17, 2007
    Publication date: July 9, 2009
    Inventors: Morikatsu Matsunaga, Yoshio Mori, Minoru Tanaka
  • Patent number: 7449439
    Abstract: A water-soluble thickener which is highly effective even in thickening strongly acidic aqueous solutions and has excellent stability in such solutions. It comprises a water-soluble copolymer having a weight-average molecular weight of 6,000,000 or higher obtainable by polymerizing a monomer mixture which comprises 2-acrylamido-2-methylpropanesulfonic acid and/or a salt thereof and acrylic acid and/or a salt thereof as essential components and optionally one or more other copolymerizable monomer components including the compound represented by the following Formula (1) and/or a salt thereof, wherein the 2-acrylamido-2-methylpropanesulfonic acid and/or a salt thereof represents 20 mol % or more of all the monomers. (wherein n is an integer of 1 to 12).
    Type: Grant
    Filed: October 6, 2003
    Date of Patent: November 11, 2008
    Assignee: Toagosei Co., Ltd.
    Inventors: Kenji Ito, Yoshio Mori
  • Publication number: 20080230193
    Abstract: An object of the present invention is to provide a composition excellent in various flocculation performances for various sludge and papermaking systems, especially excellent as a polymer flocculant, and provide a sludge-dewatering agent excellent in dewatering performances for various sludge, especially excellent in flocculationability, as well as a retention aid which can realize a high retention and ensure excellent formation of paper and which is easy to use. A composition is provided, which comprises two or more amphoteric water-soluble polymers in combination shown below, the polymers being obtained by polymerizing a cationic radical-polymerizable monomer and an anionic radical-polymerizable monomer in a presence of a polysaccharide. 1. A combination of a polymer satisfying the molar ratio of the cationic radical-polymerizable monomer to the anionic radical-polymerizable monomer (hereinafter referred to as Ca/An) of Ca/An?1, and a polymer satisfying Ca/An<1, or 2.
    Type: Application
    Filed: January 20, 2005
    Publication date: September 25, 2008
    Applicant: Toagosei Co., Ltd.
    Inventors: Yoshio Mori, Koichi Adachi, Ken Takeda, Tetsuya Tsuzuki
  • Patent number: 7419923
    Abstract: An optical glass comprising in mass %: P2O5 25%-less than 45% B2O3 6-20% BaO 24%-less than 40% ZnO 3-14% MgO 0-15% CaO 0-15% SrO 0-15% Li2O 0-5% Na2O 0-5% K2O 0-5% WO3 0-5% and Al2O3 0-5%. The optical glass should preferably contain 0.1-5% WO3, 3.6-15% MgO, 0.1-5% Li2O+Na2O+K2O, 0—less than 0.5% and Sb2O3+As2O3 with the mass ratio of ZnO/BaO being 0.12—less than 0.50. The optical glass should preferably have refractive index (nd) within a range from 1.54 to 1.65 and Abbe number (?d) within a range exceeding 57 up to 69 and liquid phase temperature within a range from 870° C. to 930° C. There is provided an optical glass having high resistance to devitrification and medium refractive index and low dispersion characteristics which is free of ingredients such as Ta2O5 having a high cost of raw material and therefore can be manufactured at a relatively low cost of raw materials.
    Type: Grant
    Filed: January 29, 2003
    Date of Patent: September 2, 2008
    Assignee: Kabushiki Kaisha Ohara
    Inventors: Yoshio Mori, Masahiro Onozawa
  • Patent number: 7322609
    Abstract: An apparatus includes first and second steering column members disposed for movement relative to one another. The apparatus also includes an anvil associated with one of the first and second steering column members. The anvil is spaced from the other of the first and second steering column members. The apparatus also includes a strap having a mounting end fixedly associated with the other of the first and second steering column members. The strap also includes a free end spaced from the mounting end. The strap is drawable over the anvil in response to movement between the first and second steering column members. The strap also includes a slot extending away from the mounting end to the free end. The slot has a length and a variable width along at least a portion of its length.
    Type: Grant
    Filed: August 10, 2004
    Date of Patent: January 29, 2008
    Assignee: Delphi Technologies, Inc.
    Inventors: Steven P. Finkbeiner, Yoshio Mori
  • Publication number: 20080004405
    Abstract: A novel retention aid is provided, which can realizes not only high retention but also excellent paper formation and is easy to use, in various papermaking processes. A composition for improving retention is provided, which comprises (A) a cationic water-soluble polymer and (B) an amphoteric water-soluble polymer. The component (A) preferably is a copolymer having a cation equivalent of 0.05 to 4.00 meq/g or one having a 0.5% salted viscosity of 30 to 200 mPa·s. The component (B) preferably is either a copolymer comprising a cationic radical-polymerizable monomer unit, an anionic radical-polymerizable monomer unit, and a nonionic radical-polymerizable monomer unit, or an amphoteric water-soluble polymer obtained by polymerizing a cationic radical-polymerizable monomer with an anionic radical-polymerizable monomer in the presence of a polysaccharide.
    Type: Application
    Filed: December 28, 2005
    Publication date: January 3, 2008
    Applicant: TOAGOSEI CO., LTD.
    Inventors: Yoshio Mori, Koichi Adachi, Ken Takeda, Tetsuya Tsuzuki
  • Publication number: 20070138105
    Abstract: An object of the present invention is to provide a process for easily producing a water-soluble polymer which has a reduced residual monomer amount and has excellent various flocculating performances when used as a flocculant, the process being capable of grafting a high molecular weight polymer onto starch. A process for producing a water-soluble polymer is provided, which comprises polymerizing water-soluble radical-polymerizable monomers comprising a cationic radical-polymerizable monomer as an essential component in a presence of a polysaccharide, an azo polymerization initiator, and a hydrogen-abstracting agent. A polymer flocculant is also provided, which comprises a water-soluble polymer obtained by the production process.
    Type: Application
    Filed: December 2, 2004
    Publication date: June 21, 2007
    Inventors: Ken Takeda, Koichi Adachi, Tetsuya Tsuzuki, Yoshio Mori
  • Publication number: 20070101573
    Abstract: In order to obtain a 3D circuit board manufacturing method capable of improving productivity and accuracy of circuit formation, the metal hoop material 1 provided with the positioning pilot holes 2 is employed. Since the 3D structures 3 are formed on the hoop material 1 with a preset interval maintained therebetween in a lengthwise direction of the hoop material 1, the series of processes can be conducted on a roll 1A (winding of the hoop material 1) basis, which results that handling between the individual processes can be done more easily while increase of troubles and manufacturing costs can be prevented. Further, since the positioning pilot holes 2 serve to facilitate accurate positioning, plating and/or laser processing can be conducted continuously with high precision while a tact time for the positioning work can be reduced.
    Type: Application
    Filed: November 9, 2006
    Publication date: May 10, 2007
    Applicant: Matsushita Electric Works, Ltd.
    Inventors: Yasufumi Masaki, Masahide Mutou, Takashi Shindou, Masato Kawashima, Yoshio Mori, Tsuguo Wada, Yoshiyuki Uchinono, Norimasa Kaji
  • Publication number: 20070032590
    Abstract: [Problem] To provide an aqueous ink comprising a dispersant comprising a graft copolymer with excellent dispersibility of a dispersoid such as a pigment in an aqueous medium and is capable of maintaining a dispersion state stably for a prolonged period. [Means for solution] Aqueous ink comprising, as a dispersant, a graft copolymer having a weight average molecular weight of from 1,000 to 100,000 and comprising: a polymer having a weight average molecular weight of from 300 to 10,000 represented by the following formula (1) or (2) as a side chain; and a polymer as a main chain comprising a hydrophobic monomer unit as an essential component, and, if necessary, other copolymerizable monomer unit as a constitutional component: wherein the sum of m and n is 1 or more, p is 0 or 1 or more, and R is a chemical structural unit having an ionic functional group: wherein q is 1 or more.
    Type: Application
    Filed: October 26, 2004
    Publication date: February 8, 2007
    Inventors: Katsuhiro Hayashi, Yoshio Mori
  • Patent number: 7141181
    Abstract: A composition is provided which comprises amphoteric polymers comprising, as constituent monomer units, a cationic monomer unit, an anionic monomer unit, and optionally a nonionic monomer unit and having a 0.5% salted viscosity of 10 to 120 mPa·s, wherein said amphoteric polymers comprise a first amphoteric polymer satisfying the following expression (1) and a second amphoteric polymer satisfying the following expression (2) or a third amphoteric polymer satisfying the following expressions (3) and (4): Ca1/An1?1??(1) Ca2/An2<1??(2) Ca3/An3?1??(3) |(Ca1?An1)?(Ca3?An3)|?1.
    Type: Grant
    Filed: September 4, 2002
    Date of Patent: November 28, 2006
    Assignee: Toagosei Co., Ltd.
    Inventors: Yoshio Mori, Koichi Adachi