Abstract: A pair of flanges (12, 12) which have through-holes (17) for a rotating shaft, and a shaft part which connects the central parts of these flanges (12, 12) at a specified spacing, are formed from cardboard plates; furthermore, the above-mentioned shaft part is formed so that this shaft part is foldable. For example, flaps (13) which extend in the radial direction, and which have base ends (13a) on the side of the central part of the corresponding flange (12) are formed by stamping in each of the pair of flanges (12, 12) and slits (14) which extend in the circumferential direction of each flange (12) are formed on a circle that is concentric with the flange (12), and which includes the base ends (13a) of the flaps (13). The flaps (13) of the respective flanges (12) are pulled into upright positions, and the projecting parts (13b) of the flaps (13) of one of the flanges (12) are inserted into the slits (14) of the other flange (12), thus fastening the flanges (12) to each other, so that a reel (11) is formed.

Abstract: The heat exchanger of the present invention is capable of easily adjusting temperature of a machining liquid, e.g., slurry, etching liquid. The heat exchanger of the present invention, which adjusts temperature of the machining liquid, comprises a ceramic heat exchanging tube, which is made by baking silicon carbide (SiC).

Abstract: The method of the present invention cleans abrasive faces of an upper abrasive plate and a lower abrasive plate of an abrasive machine. The method is executed by a cleaning device including: a nozzle for jetting water; a brush for preventing the jetted water from scattering in the air, the brush enclosing the nozzle; and another brush for closing a gap between the preventing brush and an outer edge of the upper abrasive plate, the method is characterized by the steps of: jetting water from the nozzle toward the abrasive face of the upper abrasive plate; moving the nozzle toward the outer edge of the upper abrasive plate; and closing the gap by the closing brush when the gap is formed between the preventing brush and the outer edge of the upper abrasive plate.

Abstract: A semiconductor device including: an insulated gate type transistor having a columnar semiconductor region formed on the main side of a semiconductor substrate, a gate electrode formed on the side surface of the columnar semiconductor region while interposing a gate insulating film and main electrode regions respectively formed on and formed below the columnar semiconductor region; and a memory element which is formed on the upper main electrode region and which can be broken electrically.

Abstract: An active noise control system for reducing road noise of low frequency generated inside the cabin of a vehicle is provided. The active noise control system includes a noise detector, a signal generator for,processing the input noise signal to generate a signal for producing noise canceling waves, a limiting amplifier having a specified threshold value for variably amplifying the processed signal so that the amplitude of output signal will not exceed the threshold value, and an electrical acoustic converter for producing noise canceling acoustic waves in accordance with the output signal.

Abstract: The disk edge polishing machine is capable of polishing an inner edge of a center hole of a disk and an outer edge thereof. In the disk edge polishing machine, a sucking member has a cylindrical end section. The sucking member sucks the disk by the cylindrical end section and exposes the inner edge and the outer edge of the disk. The sucking member spins together with the disk. An outer polishing member polishes the outer edge of the disk. An inner polishing member is inserted into the center hole and simultaneously polishes the inner edge of the disk. A first driving mechanism relatively moves the outer polishing member and the sucking member close to and away from the outer edge of the disk along a predetermined course. A second driving mechanism relatively moves the inner polishing member and the sucking member close to and away from the inner edge of the disk along another predetermined course extended from the predetermined course.

Abstract: In an active noise control apparatus in which an audio signal and a noise control signal are mixed to thereby sound a loudspeaker inside a motor vehicle, a general-purpose audio head unit cannot conventionally be freely changed for the one already mounted on the motor vehicle. As a solution, an active noise control unit is provided with a buffer amplifier and a mixer. An audio signal amplified by a power amplifier in an audio head unit is adjusted in level by the buffer amplifier such that a level of an audio signal outputted after amplification by the first amplifier becomes substantially equal to a level of the audio signal outputted from the audio head unit. Then, at the mixer, a noise control signal outputted from an active noise controller is added to an audio signal outputted from the buffer amplifier. Therefore, any audio head unit can be freely changed for the one already mounted on the vehicle as long as the audio head unit contains therein a power amplifier.

Abstract: The polishing machine is capable of preventing fine vibrations of a polishing face of a polishing plate. In the polishing machine, a plate holder is rotatably provided to a base. The polishing plate is mounted on the plate holder, and an upper face of the polishing plate is covered with a polishing cloth as the polishing face. A press unit presses a surface of a work piece onto the polishing face of the polishing plate so as to polish the surface of the work piece like a mirror face. A fluid bearing rotatably supports the plate holder by fluid pressure, at a position between the plate holder and the base, so as to keep the polishing face of the polishing plate flat.

Abstract: The abrasive machine of the present invention is capable of smoothly adjust the pressing force of an upper plate. The abrasive machine includes a plate supporting mechanism, which supports the upper polishing plate and is capable of adjusting a pressing force. The plate supporting mechanism comprises: a base frame; a cylinder unit being provided to an upper part of the base frame,; a rotary plate being rotatably attached to a lower end of a piston rod of the cylinder unit; a plurality of connecting rods being pierced through the rotary plate, lower ends of the connecting rods being connected to the upper plate so as to rotate the upper plate together with the rotary plate; and a plurality of elastic members being provided between the stopper sections of the connecting rods and the rotary plate, whereby the pressing force of the upper plate is adjusted by adjusting a lifting force of the cylinder unit, which suspends the upper plate.

Abstract: The abrasive machine of the present invention is capable of smoothly adjust the pressing force of an upper plate. The abrasive machine includes a plate supporting mechanism, which supports the upper polishing plate and is capable of adjusting a pressing force. The plate supporting mechanism comprises: a base frame; a cylinder unit being provided to an upper part of the base frame, ; a rotary plate being rotatably attached to a lower end of a piston rod of the cylinder unit; a plurality of connecting rods being pierced through the rotary plate, lower ends of the connecting rods being connected to the upper plate so as to rotate the upper plate together with the rotary plate; and a plurality of elastic members being provided between the stopper sections of the connecting rods and the rotary plate, whereby the pressing force of the upper plate is adjusted by adjusting a lifting force of the cylinder unit, which suspends the upper plate.

Abstract: The abrasive machine is capable of preventing deformation and bad abrasion of an abrasive cloth, maintaining flatness of an abrasive face of an abrasive plate and improving abrading accuracy. The abrasive machine comprises the abrasive plate and a holding unit for holding a work piece. In the holding unit, an inner head has a first concave section. An outer head has a second concave section. A holding plate is provided in the first concave section. An elastic holding member forms a first chamber. An outer enclosing member is provided to the outer head. An inner enclosing member is provided between the outer enclosing member and the inner head. A pressing member presses the abrasive face of the abrasive plate and encloses the holding plate. An elastic ring member a second chamber. A pressurizing unit pressurizes the chambers so as to press the work piece and the pressing member onto the abrasive face.

Abstract: A process is provided for fabricating a structure wherein the longitudinal direction of a base electrode and the longitudinal direction of an emitter electrode are the same. This structure is special and provides the advantage that, even if the element is microminiaturized, improved driving performance can be obtained. In another aspect, the longitudinal direction of the gate electrode is the same as the longitudinal direction of the source-drain electrodes. Thereby, miniaturization in the gate-width direction can be achieved together with an improvement in the driving performance.

Abstract: The rotary conveyor of the present invention has a simple structure and is capable of preventing an electric cable and an air tube from twisting and cutting. In the rotary conveyor, a rotating section can rotate in the both directions. A number N (an integer three or more) of movable stations are provided to the rotating section with regular angular separations (an angle &thgr;1). The movable stations respectively machine work pieces. The number N of fixed stations are provided on the base section and located at positions corresponding on the movable stations. The fixed stations respectively machine the work pieces with the movable stations. The rotating section is intermittently turned the angle &thgr;1 a prescribed number (N−1) of times, in one direction, from an initial position of the rotating section, then the rotating section is continuously turned, in the other direction, until reaching the initial position.

Abstract: The polishing machine of the present invention is capable of improving flatness of work pieces. In the polishing machine, a carrier is formed into a thin plate having a through-hole in which a work piece is accommodated. An upper polishing plate polishes an upper face of the work piece. A lower polishing plate pinches the work piece with the upper polishing plate and polishes a lower face of the work piece. A driving mechanism moves the carrier along a circular orbit in a plane without revolving. With this structure, the upper and lower faces of the work piece, which has been pinched between the polishing plates, are polished by the polishing plates.

Abstract: Cheap semiconductor memory devices are provided so as to enable high-speed writing and reading but rarely to malfunction, thus being high in reliability. In a semiconductor device which comprises a plurality of cells each having a semiconductor layer between a pair of conductors, at least one of the pair of conductors is made of a metal, and the semiconductor layer comprises an amorphous silicon that can form a silicide region with the metal as reacting at a reaction rate of not less than 10 m/sec. Another device is characterized in that the semiconductor layer is an amorphous silicon, in that at least one of the pair of conductors is made of a metal silicide-reacting with the amorphous silicon, and in that the silicide region formed is conic.

Abstract: A semiconductor device including: an insulated gate type transistor having a columnar semiconductor region formed on the main side of a semiconductor substrate, a gate electrode formed on the side surface of the columnar semiconductor region while interposing a gate insulating film and main electrode regions respectively formed on and formed below the columnar semiconductor region; and a memory element which is formed on the upper main electrode region and which can be broken electrically.

Abstract: In the polishing system of the present invention, a adhering unit adheres a wafer on a carrying plate using liquid. A polishing unit polishes the wafer using a polishing plate. A feeding unit conveys the carrying plate from the adhering unit to the polishing unit. A dismounting unit removes the wafer from the carrying plate. A first discharging unit conveys the carrying plate from the polishing unit to the dismounting unit. A cleaning unit cleans the vacant carrying plate. A second discharging unit conveys the carrying plate from the dismounting unit to the cleaning unit. A third discharging unit conveys the carrying plate from the cleaning unit to the adhering unit. The units are formed into a loop lines so that the carrying plate is circulated in the loop line and the wafers are polished therein.

Abstract: Very high magnetic flux density grain-oriented electrical steel slab containing 2.5 to 4.0 weight percent silicon as an essential component and having a very high magnetic flux density B.sub.8 of not less than 1.92 tesla, in which by area not less than 80 percent is accounted for by matrix secondary recrystallization grains having a diameter not larger than 100 mm and not smaller than 10 mm in a direction of cold rolling and not larger than 50 mm and not smaller than 5 mm in a direction perpendicular to the cold rolling direction, and in which, moreover, of the grains in said matrix, not fewer than 50 percent by ratio of number are fine secondary recrystallization grains having an average diameter not larger than 5 mm.

Abstract: A process for preparing optically active (R)-3-chloro-1,2-propanediol, which comprises subjecting (R,S)-3-chloro-1,2-propanediol to the reaction of a microorganism belonging to genus Serratia in a reaction mixture, and then collecting the residual (R)-3-chloro-1,2-propanediol. According to the process of the present invention, (R)-3-chloro-1,2-propanediol can be efficiently prepared starting from low cost (R,S)-3-chloro-1,2-propanediol.

Abstract: In opposition to a lower electrode (31) fixed to a frame (3), an upper electrode (29) is carried by an upper pressing base (23), which is engaged with a vertical guide rail (25) and joined by a resilient slide mechanism to a piston rod (35L) of a hydraulic cylinder (35) connected to a hydraulic circuit operable for an increased distance (L3) between electrode shanks (15, 7) and fastened at a head end thereof to a lower pressing base (33), which is engaged with the guide rail and joined to a piston rod (37L) of an air cylinder (37) fastened at a head end thereof to the frame and connected to a pneumatic circuit operable for supplying a balancing pressure to have the piston rod (37L) thereof contracted to stand with a total load and for relieving the pressure when a mechanical valve (85) is operated with a pedal arm (49) stepped down for starting a welding, while the pneumatic circuit is changed over by a limit switch (57) to force down the lower pressing base.