Patents by Inventor Yoshio Yamada

Yoshio Yamada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11059729
    Abstract: A liquid treatment device that achieves an effective treatment by forcibly contacting a swirl flow of a hydrogen peroxide-containing treated liquid with a liquid to be treated that has been processed to contain copper ions or iron ions includes a rod-like first electrode, a plate-like second electrode formed of a copper- or iron-containing metal, and a first treatment vessel that causes a liquid to swirl and generate a gas phase in a swirl flow of the liquid. A pulse voltage is applied to the generated gas phase to generate a plasma. The second electrode serves as an anode, and reaches inside of a supply section for a liquid to be treated. The liquid to be treated containing the generated copper ions or iron ions is forcibly brought into contact with hydrogen peroxide generated by the plasma. In this way, the Fenton's reaction effectively takes place, and the liquid treatment performance improves.
    Type: Grant
    Filed: November 26, 2018
    Date of Patent: July 13, 2021
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Takahiro Kitai, Genichiro Matsuda, Gaku Miyake, Yoshio Yamada, Naofumi Hino
  • Patent number: 10875790
    Abstract: An apparatus for producing reforming liquid includes a treatment tank in which an introduced liquid is swirled so as to generate a gas phase in the vicinity of a swirling center of a swirling flow of the liquid, a first electrode which has at least a portion which is disposed in the treatment tank and comes into contact with the liquid in the treatment tank, a second electrode which is disposed so as to come into contact with the liquid in the treatment tank and a power source which is configured to apply a voltage between the first electrode and the second electrode so as to generate plasma in the gas phase. A reformed liquid is produced in a manner that the plasma is generated in the gas phase so as to form a reformed component, and the formed reformed component is dissolved and dispersed in the liquid.
    Type: Grant
    Filed: May 17, 2017
    Date of Patent: December 29, 2020
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Gaku Miyake, Takahiro Kitai, Masanori Minamio, Yoshio Yamada, Genichiro Matsuda
  • Patent number: 10843942
    Abstract: There is provided a liquid treatment apparatus which includes a treatment tank which generates a gas phase in a swirling flow of liquid, by swirling an introduced liquid and which treats liquid by applying a pulse voltage to a generated gas phase to generate plasma, in which an insulator which is an insulating space forming member is disposed on a wall surface of one end of the treatment tank so as to prevent a swirling flow from being affected, faces the space connected via the through-hole of the insulator, and thus the first electrode is disposed.
    Type: Grant
    Filed: February 1, 2018
    Date of Patent: November 24, 2020
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Gaku Miyake, Yoshio Yamada, Genichiro Matsuda, Takahiro Kitai
  • Patent number: 10794455
    Abstract: A tensioner includes a power spring, and a backup member being in contact with the power spring and supporting the power spring by acting an urging force in a direction opposite to a radial shift of the power spring in a direction in which the power spring is wound. The power spring is unwound in a condition in which an inter-plate frictional force of the power spring is small in a case where an urging force acting from a power spring to a tension member is greater than a load acting from the tensioner arm to the power spring and the power spring is wound in a condition in which the inter-plate frictional force of the power spring is large in a case where the urging force acting from the power spring to the tension member is smaller than the load acting from the tension member to the power spring.
    Type: Grant
    Filed: August 1, 2019
    Date of Patent: October 6, 2020
    Assignees: DAIDO KOGYO CO., LTD., NHK SPRING CO., LTD.
    Inventors: Hideaki Seki, Yoshio Yamada, Takao Kobayashi, Kazuhito Hiraoka, Shuji Takahashi
  • Patent number: 10723637
    Abstract: A liquid treatment apparatus including: a tubular treatment tank whose end along a central axis is closed and sectional shape orthogonal to the central axis is a circular shape; a first electrode disposed on one end of the central axis of the treatment tank and having a bar shape; a second electrode disposed on the other end thereof; a power supply applying voltage between the first electrode and the second electrode; a rotation mechanism rotating the first electrode about a central axis of the first electrode; and an air introduction portion introducing the liquid to the one end of the central axis of the treatment tank from a tangential direction of the circular sectional shape of the treatment tank, and causing liquid to swirl about the central axis of the treatment tank therein to generate a gas phase in a swirling flow of the liquid.
    Type: Grant
    Filed: January 29, 2018
    Date of Patent: July 28, 2020
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Genichiro Matsuda, Takahiro Kitai, Gaku Miyake, Yoshio Yamada
  • Patent number: 10723638
    Abstract: A liquid treatment device includes a rod-shaped first electrode; a plate-shaped second electrode configured from a metal containing copper or iron; and a treatment vessel in which introduced liquid swirls, and generates a gas phase in a swirl flow of the liquid. A plasma is generated by applying a pulse voltage to the generated gas phase, and a negative DC voltage is applied between the first electrode and the second electrode serving as a cathode and an anode, respectively. Under the applied negative voltage, the plate-like second electrode generates copper ions or iron ions, and the copper or iron ions undergo Fenton's reaction with the hydrogen peroxide generated by the plasma so that liquid can be efficiently treated.
    Type: Grant
    Filed: November 14, 2018
    Date of Patent: July 28, 2020
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Genichiro Matsuda, Takahiro Kitai, Gaku Miyake, Yoshio Yamada
  • Patent number: 10654730
    Abstract: A liquid processing apparatus includes a processing tank, a first electrode, an insulator, a liquid introduction port, a discharge portion, a second electrode, an opening portion, and a power supply. The first electrode is disposed at the first end of the processing tank. The insulator covers at least a part of a side surface of the first electrode disposed to protrude from an inner wall of the first end of the processing tank into the processing tank. The liquid introduction port causes a liquid to swirl by introducing the liquid in a tangential direction of the processing tank and generates a gas phase in a swirling flow of the liquid. An outer diameter of the insulator is smaller than an outer diameter of a gas-phase generating space where the gas phase is generated in the processing tank.
    Type: Grant
    Filed: January 30, 2019
    Date of Patent: May 19, 2020
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Genichiro Matsuda, Gaku Miyake, Hiromi Matsumoto, Yoshio Yamada, Yukiko Kitahara
  • Patent number: 10610821
    Abstract: Plasma is generated in a gas phase in a processing tub to produce a reforming component, the produced reforming component is dissolved in a liquid and is dispersed in the liquid to produce a reforming liquid, the produced reforming liquid is discharged from the processing tub to be stored in the storage tub, and gas is supplied from a gas supplier into the reforming liquid in the storage tub. The supplied gas has a bubble shape, comes into contact with the reforming liquid stored in the storage tub, and is deodorized.
    Type: Grant
    Filed: April 18, 2018
    Date of Patent: April 7, 2020
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Gaku Miyake, Genichiro Matsuda, Takahiro Kitai, Yoshio Yamada
  • Publication number: 20200088257
    Abstract: A pressing structure is arranged between a first pressed body and a second pressed body opposite to the first pressed body and presses the first pressed body and second pressed body. The pressing structure includes a spring member including: a base portion formed of a single strip-like member and having a curved principal surface; two extended portions extending respectively from end portions of the base portion and curved in a form inverse of a curving form of the base portion; and two bent portions extending respectively from end portions of the two extended portions, the end portions being at sides opposite to sides connected to the base portion, the two bent portions being curved in a form inverse of the curving form of the extended portions; and the maximum thickness of the extended portions and bent portions is smaller than the maximum thickness of the base portion.
    Type: Application
    Filed: December 6, 2017
    Publication date: March 19, 2020
    Inventors: Hironobu Imaizumi, Norihiro Tajima, Yoshio Yamada, Shuji Takahashi, Atsushi Yoneoka
  • Patent number: 10561760
    Abstract: A space modification apparatus includes a treatment tank configured to generate a gas phase around a rotating center of a rotating flow of a liquid by rotating the liquid, a first electrode of which at least a part is in the treatment tank so as to be in contact with the liquid in the treatment tank, a second electrode in contact with the liquid in the treatment tank, and a power source configured to apply a voltage between the first electrode and the second electrode to generate plasma in the gas phase to generate modification components, the modification components being dissolved and dispersed in the liquid, and a modification liquid being generated and retained in a storage tank. The modification liquid is sprayed or scattered from a nozzle into a treatment target space via a supply pump in the form of mist.
    Type: Grant
    Filed: April 20, 2018
    Date of Patent: February 18, 2020
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Takahiro Kitai, Genichiro Matsuda, Yoshio Yamada, Gaku Miyake
  • Publication number: 20200010340
    Abstract: There is provided a liquid treatment apparatus which includes a treatment tank which generates a gas phase in a swirling flow of liquid, by swirling an introduced liquid and which treats liquid by applying a pulse voltage to a generated gas phase to generate plasma, in which an insulator which is an insulating space forming member is disposed on a wall surface of one end of the treatment tank so as to prevent a swirling flow from being affected, faces the space connected via the through-hole of the insulator, and thus the first electrode is disposed.
    Type: Application
    Filed: February 1, 2018
    Publication date: January 9, 2020
    Inventors: GAKU MIYAKE, YOSHIO YAMADA, GENICHIRO MATSUDA, TAKAHIRO KITAI
  • Publication number: 20190353227
    Abstract: A tensioner includes a power spring, and a backup member being in contact with the power spring and supporting the power spring by acting an urging force in a direction opposite to a radial shift of the power spring in a direction in which the power spring is wound. The power spring is unwound in a condition in which an inter-plate frictional force of the power spring is small in a case where an urging force acting from a power spring to a tension member is greater than a load acting from the tensioner arm to the power spring and the power spring is wound in a condition in which the inter-plate frictional force of the power spring is large in a case where the urging force acting from the power spring to the tension member is smaller than the load acting from the tension member to the power spring.
    Type: Application
    Filed: August 1, 2019
    Publication date: November 21, 2019
    Inventors: Hideaki SEKI, Yoshio YAMADA, Takao KOBAYASHI, Kazuhito HIRAOKA, Shuji TAKAHASHI
  • Publication number: 20190352199
    Abstract: A liquid processing apparatus includes a processing tank, a first electrode, an insulator, a liquid introduction port, a discharge portion, a second electrode, an opening portion, and a power supply. The first electrode is disposed at the first end of the processing tank. The insulator covers at least a part of a side surface of the first electrode disposed to protrude from an inner wall of the first end of the processing tank into the processing tank. The liquid introduction port causes a liquid to swirl by introducing the liquid in a tangential direction of the processing tank and generates a gas phase in a swirling flow of the liquid. An outer diameter of the insulator is smaller than an outer diameter of a gas-phase generating space where the gas phase is generated in the processing tank.
    Type: Application
    Filed: January 30, 2019
    Publication date: November 21, 2019
    Inventors: GENICHIRO MATSUDA, GAKU MIYAKE, HIROMI MATSUMOTO, YOSHIO YAMADA, YUKIKO KITAHARA
  • Publication number: 20190256385
    Abstract: treatment apparatus including: a tubular treatment tank whose end along a central axis is closed and sectional shape orthogonal to the central axis is a circular shape; a first electrode disposed on one end of the central axis of the treatment tank and having a bar shape; a second electrode disposed on the other end thereof; a power supply applying voltage between the first electrode and the second electrode; a rotation mechanism rotating the first electrode about a central axis of the first electrode; and an air introduction portion introducing the liquid to the one end of the central axis of the treatment tank from a tangential direction of the circular sectional shape of the treatment tank, and causing liquid to swirl about the central axis of the treatment tank therein to generate a gas phase in a swirling flow of the liquid.
    Type: Application
    Filed: January 29, 2018
    Publication date: August 22, 2019
    Inventors: GENICHIRO MATSUDA, TAKAHIRO KITAI, GAKU MIYAKE, YOSHIO YAMADA
  • Publication number: 20190177187
    Abstract: A liquid treatment device that achieves an effective treatment by forcibly contacting a swirl flow of a hydrogen peroxide-containing treated liquid with a liquid to be treated that has been processed to contain copper ions or iron ions includes a rod-like first electrode, a plate-like second electrode formed of a copper- or iron-containing metal, and a first treatment vessel that causes a liquid to swirl and generate a gas phase in a swirl flow of the liquid. A pulse voltage is applied to the generated gas phase to generate a plasma. The second electrode serves as an anode, and reaches inside of a supply section for a liquid to be treated. The liquid to be treated containing the generated copper ions or iron ions is forcibly brought into contact with hydrogen peroxide generated by the plasma. In this way, the Fenton's reaction effectively takes place, and the liquid treatment performance improves.
    Type: Application
    Filed: November 26, 2018
    Publication date: June 13, 2019
    Inventors: TAKAHIRO KITAI, GENICHIRO MATSUDA, GAKU MIYAKE, YOSHIO YAMADA, NAOFUMI HINO
  • Publication number: 20190169051
    Abstract: A liquid treatment device that can improve liquid treatment performance by taking advantage of the Fenton's reaction while efficiently generating plasma for liquid treatment, in addition to enabling stable plasma generation for extended time periods includes a first electrode that is rod-like in shape; a second electrode that is plate-like in shape and is configured from a metal containing copper or iron; and a treatment vessel in which introduced liquid swirls, and generates a gas phase in a swirl flow of the liquid. A plasma is generated by applying a pulse voltage to the generated gas phase, and a negative DC voltage is applied between the first electrode and the second electrode serving as a cathode and an anode, respectively. Under the applied negative voltage, the plate-like second electrode generates copper ions or iron ions, and the copper or iron ions undergo Fenton's reaction with the hydrogen peroxide generated by the plasma so that liquid can be efficiently treated.
    Type: Application
    Filed: November 14, 2018
    Publication date: June 6, 2019
    Inventors: GENICHIRO MATSUDA, TAKAHIRO KITAI, GAKU MIYAKE, YOSHIO YAMADA
  • Publication number: 20180345210
    Abstract: Plasma is generated in a gas phase in a processing tub to produce a reforming component, the produced reforming component is dissolved in a liquid and is dispersed in the liquid to produce a reforming liquid, the produced reforming liquid is discharged from the processing tub to be stored in the storage tub, and gas is supplied from a gas supplier into the reforming liquid in the storage tub. The supplied gas has a bubble shape, comes into contact with the reforming liquid stored in the storage tub, and is deodorized.
    Type: Application
    Filed: April 18, 2018
    Publication date: December 6, 2018
    Inventors: GAKU MIYAKE, GENICHIRO MATSUDA, TAKAHIRO KITAI, YOSHIO YAMADA
  • Publication number: 20180344889
    Abstract: There are provided a treatment tank generating a gas phase around a rotating center of a rotating flow of a liquid by rotating the introduced liquid, a first electrode whose at least a part is disposed in the treatment tank and in contact with a liquid in the treatment tank, a second electrode disposed so as to be in contact with the liquid in the treatment tank, and a power source applying a voltage between the first electrode and the second electrode to generate plasma in a gas phase, the plasma is generated in the gas phase to generate modification components, the generated modification components are dissolved and dispersed in the liquid, and a modification liquid is generated and retained in the storage tank. The modification liquid is sprayed or scattered from a nozzle into a treatment target space via a supply pump in the form of mist.
    Type: Application
    Filed: April 20, 2018
    Publication date: December 6, 2018
    Inventors: TAKAHIRO KITAI, GENICHIRO MATSUDA, YOSHIO YAMADA, GAKU MIYAKE
  • Publication number: 20180327284
    Abstract: A washing machine rinse water purification device and washing apparatus including the washing machine rinse water purification device. The washing machine rinse water purification device includes a first liquid supplier, a processing tub, a buffer tub and a washing tub. In the first liquid supplier, a first liquid introduced from an introduction portion into a processing tub is swirled from an introduction portion to a discharge portion to generate a swirling flow, plasma is generated in a gas phase to produce a reforming component, the produced reforming component is dissolved in the first liquid and is dispersed in the first liquid to produce a reforming liquid, the produced reforming liquid temporarily passes through a buffer tub from a discharge portion and then is supplied into a washing tub as a second liquid.
    Type: Application
    Filed: April 11, 2018
    Publication date: November 15, 2018
    Inventors: GAKU MIYAKE, GENICHIRO MATSUDA, TAKAHIRO KITAI, YOSHIO YAMADA
  • Patent number: 10082525
    Abstract: A probe unit according to the present invention is suitable for allowing a large current to flow. In the probe unit that accommodates a plurality of contact probes for electrically connecting an inspection target object and a signal processing device used to output an inspection signal, both ends of a large current probe (3) are electrically connected to electrodes of a contact target object, and a large current is made to flow via a metal block (50) that comes into contact with both end portions of the large current probe (3).
    Type: Grant
    Filed: September 18, 2015
    Date of Patent: September 25, 2018
    Assignee: NHK Spring Co., Ltd.
    Inventors: Yoshio Yamada, Kohei Hironaka