Abstract: A semiconductor device (200) includes: an electrical fuse (100) including: a lower layer interconnect (120) formed on a substrate; a via (130) provided on the lower layer interconnect (120) so as to be connected to the lower layer interconnect (120); and an upper layer interconnect (110) provided on the via (130) so as to be connected to the via (130), the electrical fuse being cut, in a state after being cut, through formation of a flowing-out portion, the flowing-out portion being formed when an electrical conductor forming the upper layer interconnect (110) flows outside the upper layer interconnect (110); and a guard upper layer interconnect (152) (conductive heat-absorbing member) formed in at least the same layer as the upper layer interconnect (110), for absorbing heat generated in the upper layer interconnect (110).

Abstract: An electrical fuse including a polysilicon layer; a silicide layer formed over the polysilicon layer; and a first metal contact and a second metal contact arranged over the silicide layer, while being spaced from each other, the electrical fuse being configured so that the silicide layer, after disconnection, is excluded from a region right under the second metal contact, and from a region between the second metal contact and the first metal contact is provided.

Abstract: Objects of the invention are to provide a novel vapor deposition material for coating from which a thermal barrier coating film excellent in heat resistance and thermal shock resistance can be satisfactorily formed even by the EB-PVD method, and to provide a method of vapor deposition in which the vapor deposition material is used. The vapor deposition material comprises a zirconia sintered body containing a stabilizer, wherein the sintered body has a content of monoclinic crystals of from 25 to 90% and has a maximum thermal expansion ratio not exceeding 6×10−3 based on room temperature when heated in the temperature range of from room temperature to 1,200° C. This zirconia sintered body preferably has a tapped density of from 3.0 to 5.5 g/cm3, a porosity of from 5 to 50%, and a mode size of pores of from 0.3 to 10 &mgr;m, and in the sintered body the volume of pores of from 0.1 to 10 &mgr;m preferably accounts for at least 90% of the total pore volume.

Abstract: An abrasive molding predominantly comprised of manganese oxide is described, which has a bulk density of 0.4 to 4.0 g/cm3, a BET specific surface area of 0.2 to 250 m2/g and an average particle diameter of 0.005 to 10 &mgr;m. The abrasive molding has a multiplicity of minute pores, preferably with a pore diameter distribution such that the integrated pore volume of minute pores having a pore diameter of at least 1 &mgr;m is at least 20%, the integrated pore volume of minute pores having a pore diameter of 10 to 100 &mgr;m is at least 15%, and the integrated pore volume of minute pores having a pore diameter exceeding 100 &mgr;m is not larger than 5%, based on the total integrated pore volume of the minute pores of the abrasive molding. The porosity is preferably in the range of 30 to 95% by volume based on the apparent volume of the abrasive molding. The minute pores are preferably interconnecting minute pores which are open to the exterior, wherein a solid is contained which is soluble in a polishing liquid.

Abstract: An abrasive member made of a silica molding predominantly comprised of silica is described. The abrasive member has a bulk density of 0.2 to 1.5 g/cm3, a BET specific surface area of 10 to 400 m2/g, an average particle diameter of 0.001 to 0.5 &mgr;m, and a multiplicity of interconnecting minute pores which are open to the exterior. A solid soluble in a polishing liquid is made present within the minute pores of the silica molding. The abrasive member is fixed or fitted to a supporting auxiliary to be assembled into an abrasive disc. The abrasive disc is used for polishing a material to be polished, by rubbing the material to be polished therewith while at least one of the abrasive disc and the material to be polished is moved and while a polishing liquid is applied to the abrasive disc.

Abstract: A molded abrasive product which is made mainly of a zirconia component and which has a bulk density of from 0.5 to 5.2 g/cm3, a BET specific surface area of from 0.1 to 100 m2/g and an average particle size of from 0.005 to 50 &mgr;m.

Abstract: An abrasive shaped article composed of at least 90% by weight, based on the weight of the abrasive shaped article, of silica and having a bulk density of 0.2 g/cm3 to 1.5 g/cm3, a BET specific surface area of 10 m2/g to 400 m2/g and an average particle diameter of 0.001 &mgr;m to 0.5 &mgr;m. An abrasive disc having fitted thereto at least one of the abrasive shaped article is advantageously used for polishing a material such as substrate. Preferably at least two kinds of abrasive shaped articles are fitted to the supporting auxiliary, at least one kind of which has a bulk density of 0.7 g/cm3 to 1.5 g/cm3 and at least one kind of which has a bulk density of at least 0.2 g/cm3 but smaller than 0.7 g/cm3.

Abstract: A vapor deposition material which is a molded body composed of powdery zirconia and a stabilizer, the molded body having a fine structure constituted of a mixture of granules of zirconia particles and non-granulated particles; granules of particle diameter ranging from 20 to 300 .mu.m constitute 20 to 90% of the molded body; the granules of the zirconia particles containing substantially no stabilizer, and being constituted of crystals of a monoclinic phase and a cubic phase with a ratio of the monoclinic phase of 70% or higher; and the particles constituting the granules having an average particle diameter from 0.5 to 15 .mu.m. A process for vapor deposition which employs the above vapor deposition material, and further a member is provided of a base article coated directly, or with interposition of a third film, with a thin zirconia film.

Abstract: An abrasive shaped article composed of at least 90% by weight, based on the weight of the abrasive shaped article, of silica and having a bulk density of 0.2 g/cm.sup.3 to 1.5 g/cm.sup.3, a BET specific surface area of 10 m.sup.2 /g to 400 m.sup.2 /g and an average particle diameter of 0.001 .mu.m to 0.5 .mu.m. An abrasive disc having fitted thereto at least one of the abrasive shaped article is advantageously used for polishing a material such as substrate. Preferably at least two kinds of abrasive shaped articles are fitted to the supporting auxiliary, at least one kind of which has a bulk density of 0.7 g/cm.sup.3 to 1.5 g/cm.sup.3 and at least one kind of which has a bulk density of at least 0.2 g/cm.sup.3 but smaller than 0.7 g/cm.sup.3.

Abstract: A clutch disc assembly (1) includes a hub (2), a separate flange (5), a retaining plate (3), a clutch plate (4), a first bushing (16), a second bushing (18) and a third bushing (20). The first bushing (16) is disposed between the hub (2) and the retaining plate (3) and slidably moves against them. The second bushing (18) has a friction coefficient different from that of the first bushing (16). The second bushing (18) is disposed between the separate flange (5) and the retaining plate (3) and slidably moves against them. The friction coefficient of a portion facing to the hub (2) of the third bushing (20) is substantially identical with that of the first bushing (16), while the friction coefficient of a portion facing to the separate flange (5) of the third bushing (20) is identical with that of the second bushing (18). The third bushing (20) is disposed between the hub (2), the separate flange (5), and the clutch plate 4, and slidably moves against them.

Abstract: A vapor deposition material which is a sintered body of zirconia containing a stabilizer, wherein the content of monoclinic phase is from 25 to 70%, the content of tetragonal phase is at most 3% and the rest is cubic phase, and of which the bulk density is from 3.0 to 5.0 g/cm.sup.3, the porosity is from 15 to 50%, the mode size of pores is from 0.5 to 3 .mu.m, and the volume of pores of from 0.1 to 5 .mu.m constitutes at least 90% of the total pore volume.

Abstract: A laminated silicon oxide film capacitor including a conductive or semiconductive silicon substrate and, formed on the substrate surface, at least one laminated film comprising a silicon oxide layer and an electrode layer laminated one on the other, and electrodes.

Abstract: A preparation method for zircon powder, which comprises heating a feed powder mixture comprising:(1) silica and zirconia obtained by subjecting a liquid having a pH of not higher than 8 and containing silica and zirconia in a SiO.sub.2 /ZrO.sub.2 molar ratio of substantially 1/1, to liquid-removing treatment, and(2) zircon in an amount of at least 0.1% by weight based on the total amount of said silica and zirconia,at a heating rate of not higher than 5.degree. C./min from 1,200.degree. C. to a calcination temperature, and maintaining it at a calcination temperature of from 1,300.degree. to 1,700.degree. C. for from 1.0 to 24 hours.

Abstract: An oxide sintered product represented by the formula(TiO.sub.2).sub.1-x (SbO.sub.5/2)x(0.1.gtoreq.x.gtoreq.0.005)and having a bulk density of not less than 4.1 g/cm.sup.3.

Abstract: A high strength metal working tool such as cutting tools and dies made of a zirconia-base sintered material comprising 50 to 98 weight percent of zirconia (ZrO.sub.2) containing 1.5 to 5 mol percent of yttira (Y.sub.2 O.sub.3) and 50 to 2 weight percent of alumina (Al.sub.2 O.sub.3) and/or spinel (MgAl.sub.2 O.sub.4) and having a three point bending strength of not less than 1700 MPa.

Abstract: This invention describes a water-impermeable elastomer-coated cloth composite in which the end sections of mutually adjacent elastomer-coated cloths are overlapped and sewn together in such a way that the thread passes up and down through this overlapped section. After a seam is sewn together, it is covered by an adhesive tape applied so that it extends over the sewn section of the seam and onto the portion of each section of the cloth beyond the sewn section to form a strong, watertight, airtight composite.