Patents by Inventor Yoshiyuki Takata
Yoshiyuki Takata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7998656Abstract: The present invention provides a chemically amplified positive composition comprising: a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and an acid generator.Type: GrantFiled: August 5, 2009Date of Patent: August 16, 2011Assignee: Sumitomo Chemical Company, LimitedInventors: Masahiko Shimada, Kazuhiko Hashimoto, Satoshi Yamaguchi, Soon Shin Kim, Yoshiyuki Takata, Takashi Hiraoka
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Patent number: 7862980Abstract: The present invention provides a salt represented by the formula (I): wherein P1, P2, P3, Q1, Q2 and R are defined in the specification and the present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).Type: GrantFiled: July 30, 2007Date of Patent: January 4, 2011Assignee: Sumitomo Chemical Company, LimitedInventors: Yukako Harada, Isao Yoshida, Yoshiyuki Takata
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Publication number: 20100279226Abstract: The present invention has the object of providing a method of manufacturing a resist pattern in which an extremely fine and highly accurate resist pattern can be formed which is obtained using the resist composition for forming a first resist pattern in a multi-patterning method such as a double patterning method. The resist processing method comprising; forming a first resist film by applying a first resist composition onto a substrate and drying, the first resist composition comprising a resin (A), a photo acid generator (B) and a cross-linking agent (C), the resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution but of being rendered soluble in alkali aqueous solution through the action of an acid; prebaking; exposure processing; post-exposure baking; developing; hard-baking the first resist pattern; and obtaining a second resist film; pre-baking; exposure processing; post-exposure baking; developing to obtain a second resist pattern.Type: ApplicationFiled: December 22, 2008Publication date: November 4, 2010Inventors: Mitsuhiro Hata, Yoshiyuki Takata, Satoshi Yamaguchi, Ichiki Takemoto, Takayuki Miyagawa, Yusuke Fuji
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Patent number: 7803513Abstract: A chemically amplified resist composition comprising: (A) a salt represented by the formula (I): wherein R21 represents a C1-C30 hydrocarbon group etc., Q1 and Q2 each independently represent a fluorine atom etc., and A+ represents at least one organic cation selected from a cation represented by the formula (Ia): wherein P1, P2 and P3 each independently represent a C1-C30 alkyl group etc., a cation represented by the formula (Ib): wherein P4 and P5 each independently represent a hydrogen atom etc., and a cation represented by the formula (Ic): wherein P10, P11, P12, P13, P14, P15, P16, P17, P18, P19, P20 and P21 each independently represent a hydrogen atom etc.Type: GrantFiled: March 19, 2008Date of Patent: September 28, 2010Assignee: Sumitomo Chemical Company, LimitedInventors: Satoshi Yamaguchi, Yoshiyuki Takata, Kaoru Araki
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Publication number: 20100035180Abstract: The present invention provides a chemically amplified positive composition comprising: a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and an acid generator.Type: ApplicationFiled: August 5, 2009Publication date: February 11, 2010Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Masahiko Shimada, Kazuhiko Hashimoto, Satoshi Yamaguchi, Soon Shin Kim, Yoshiyuki Takata, Takashi Hiraoka
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Patent number: 7575850Abstract: The present invention provides a chemically amplified resist composition comprising: a resin which comprises a structural unit having an acid-labile group and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, ring X represents a C3-C30 cyclic hydrocarbon group in which one —CH2— is substituted with —COO—, and at least one hydrogen atom in the C3-C30 cyclic hydrocarbon group may be substituted, and p represents an integer of 1 to 4, and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and at least two salts selected from a salt represented by the formula (II): wherein Y1 and Y2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A+ represents an organic counter ion and R21 represents a C1-C30 hydrocarbon group which may be substituted and at least one —CH2— in the C1-C30 hydrocarbon group may be substituted with —COType: GrantFiled: January 28, 2008Date of Patent: August 18, 2009Assignee: Sumitomo Chemical Company, LimitedInventors: Yoshiyuki Takata, Satoshi Yamamoto, Satoshi Yamaguchi
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Patent number: 7572570Abstract: The present invention provides a chemically amplified resist composition comprising: (A) a resin which comprises (a) a structural unit having an acid-labile group, (b) a structural unit having at least one hydroxyl group, (c) a structural unit having at least one lactone structure, and (d) a structural unit represented by the formula (Ia) or (Ib): wherein R1 represents a hydrogen atom or a methyl group, R3 represents a methyl group, n represents an integer of 0 to 14, and Z represents a single bond or —[CH2]k—COO—, and (B) at least one acid generator.Type: GrantFiled: March 20, 2008Date of Patent: August 11, 2009Assignee: Sumitomo Chemical Company, LimitedInventors: Yusuke Fuji, Yoshiyuki Takata
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Patent number: 7566522Abstract: The present invention provides a chemically amplified resist composition comprising a resin which comprises a structural unit having an acid-labile group and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, ring X represents a C3-C30 cyclic hydrocarbon group in which one —CH2— is substituted with —COO—, and at least one hydrogen atom in the C3-C30 cyclic hydrocarbon group may be substituted, and p represents an integer of 1 to 4, and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and a salt represented by the formula (II): wherein Y1 and Y2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A+ represents an organic counter ion, and R21 represents a C1-C30 hydrocarbon group which may be substituted and at least one —CH2— in the C1-C30 hydrocarbon group may be substituted with —CO— or —O—.Type: GrantFiled: December 11, 2007Date of Patent: July 28, 2009Assignee: Sumitomo Chemical Company, LimitedInventors: Yoshiyuki Takata, Takayuki Miyagawa, Kunishige Edamatsu
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Publication number: 20090156827Abstract: An object of the present invention is to provide a material for high-brightness, high-efficiency, longer-life organic EL elements and an organic EL element produced by using the same. Provided is a material for organic EL elements, comprising a compound represented by the following General Formula (1): wherein, R1 and R2 each independently represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group or a substituted or unsubstituted heterocyclic group.Type: ApplicationFiled: March 19, 2007Publication date: June 18, 2009Applicant: TOYO INK MFG. CO., LTD.Inventor: Yoshiyuki Takata
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Publication number: 20080274426Abstract: The present invention provides a chemically amplified resist composition comprising: (A) a resin which comprises (a) a structural unit having an acid-labile group, (b) a structural unit having at least one hydroxyl group, (c) a structural unit having at least one lactone structure, and (d) a structural unit represented by the formula (Ia) or (Ib): wherein R1 represents a hydrogen atom or a methyl group, R3 represents a methyl group, n represents an integer of 0 to 14, and Z represents a single bond or —[CH2]k—COO—, and (B) at least one acid generator.Type: ApplicationFiled: March 20, 2008Publication date: November 6, 2008Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yusuke FUJI, Yoshiyuki TAKATA
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Publication number: 20080248423Abstract: A chemically amplified resist composition comprising: (A) a salt represented by the formula (I): wherein R21 represents a C1-C30 hydrocarbon group etc., Q1 and Q2 each independently represent a fluorine atom etc., and A+ represents at least one organic cation selected from a cation represented by the formula (Ia): wherein P1, P2 and P3 each independently represent a C1-C30 alkyl group etc., a cation represented by the formula (Ib): wherein P4 and P5 each independently represent a hydrogen atom etc., and a cation represented by the formula (Ic): wherein P10, P11, P12, P13, P14, P15, P16, P17, P18, P19, P20 and P21 each independently represent a hydrogen atom etc.Type: ApplicationFiled: March 19, 2008Publication date: October 9, 2008Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Satoshi YAMAGUCHI, Yoshiyuki TAKATA, Kaoru ARAKI
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Publication number: 20080220369Abstract: The present invention provides a chemically amplified resist composition containing: (A) a salt represented by the formula (I): A+?O3S-Q1 ??(I) wherein A+ and Q1 are defined in the specification; (B) a salt represented by the formula (II): wherein R22, A3, A4 and A?+ are defined in the specification; and (C) a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.Type: ApplicationFiled: March 4, 2008Publication date: September 11, 2008Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Satoshi YAMAGUCHI, Yoshiyuki TAKATA, Satoshi YAMAMOTO
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Publication number: 20080193874Abstract: The present invention provides a chemically amplified resist composition comprising: a resin which comprises a structural unit having an acid-labile group and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, ring X represents a C3-C30 cyclic hydrocarbon group in which one —CH2— is substituted with —COO—, and at least one hydrogen atom in the C3-C30 cyclic hydrocarbon group may be substituted, and p represents an integer of 1 to 4, and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and at least two salts selected from a salt represented by the formula (II): wherein Y1 and Y2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A+ represents an organic counter ion and R21 represents a C1-C30 hydrocarbon group which may be substituted and at least one —CH2— in the C1-C30 hydrocarbon group may be substituted with —CO— orType: ApplicationFiled: January 28, 2008Publication date: August 14, 2008Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yoshiyuki TAKATA, Satoshi YAMAMOTO, Satoshi YAMAGUCHI
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Publication number: 20080166660Abstract: The present invention provides a chemically amplified resist composition comprising a resin which comprises a structural unit having an acid-labile group and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, ring X represents a C3-C30 cyclic hydrocarbon group in which one —CH2— is substituted with —COO—, and at least one hydrogen atom in the C3-C30 cyclic hydrocarbon group may be substituted, and p represents an integer of 1 to 4, and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and a salt represented by the formula (II): wherein Y1 and Y2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A+ represents an organic counter ion, and R21 represents a C1-C30 hydrocarbon group which may be substituted and at least one —CH2— in the C1-C30 hydrocarbon group may be substituted with —CO— or —O—.Type: ApplicationFiled: December 11, 2007Publication date: July 10, 2008Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yoshiyuki Takata, Takayuki Miyagawa, Kunishige Edamatsu
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Publication number: 20080081293Abstract: The present invention provides a salt represented by the formula (I): wherein P1, P2 and P3 each independently represent a C1-C30 alkyl group which may be substituted with at least one selected from a hydroxyl group, a C3-C12 cyclic hydrocarbon group and a C1-C12 alkoxy group, or a C3-C30 cyclic hydrocarbon group which may be substituted with at least one selected from a hydroxyl group and a C1-C12 alkoxy group, provided that all of P1, P2 and P3 are not simultaneously phenyl groups which may be substituted, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and R represents a group represented by the formula: wherein A1 represents —OH or —Y1—OH, n represents an integer of 1 to 9, and Y1 represents a divalent C1-C6 saturated aliphatic hydrocarbon group; a group represented by the formula: wherein ring X1 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which one —CH2— group is substituted with —CO—, and at least one hydrogen atom in the monType: ApplicationFiled: July 30, 2007Publication date: April 3, 2008Applicant: Sumitomo Chemical Company, LimitedInventors: Yukako Harada, Isao Yoshida, Yoshiyuki Takata
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Patent number: 7262321Abstract: The present invention provides a salt of the formula (I): wherein X represents divalent or trivalent residue of acyclic hydrocarbon having 1 to 30 carbon atoms or divalent or trivalent residue of hydrocarbon having 3 to 30 carbon atoms which contains monocyclic or bicyclic ring, wherein —CH2— in the hydrocarbon may be substituted with —O— and one or more hydrogen atom in X is optionally substituted with alkoxy group having 1 to 6 carbon atoms, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; Y represents hydroxyl group, cyano group or methoxy group; and n shows 1 or 2. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).Type: GrantFiled: September 7, 2006Date of Patent: August 28, 2007Assignee: Sumitomo Chemical Company, LimitedInventors: Yukako Harada, Isao Yoshida, Yoshiyuki Takata
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Patent number: 7220532Abstract: The present invention provides a chemical amplification type positive resist composition comprising a nitrogen containing compound of the formula (VIa) or (VIb); resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; and an acid generator of the formula (I)Type: GrantFiled: September 9, 2003Date of Patent: May 22, 2007Assignee: Sumitomo Chemical Company, LimitedInventors: Yoshiyuki Takata, Isao Yoshida, Hirotoshi Nakanishi
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Publication number: 20070100096Abstract: The present invention provides a salt of the formula (I): wherein X represents divalent or trivalent residue of acyclic hydrocarbon having 1 to 30 carbon atoms or divalent or trivalent residue of hydrocarbon having 3 to 30 carbon atoms which contains monocyclic or bicyclic ring, wherein —CH2— in the hydrocarbon may be substituted with —O— and one or more hydrogen atom in X is optionally substituted with alkoxy group having 1 to 6 carbon atoms, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q1 and Q2each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; Y represents hydroxyl group, cyano group or methoxy group; and n shows 1 or 2. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).Type: ApplicationFiled: September 7, 2006Publication date: May 3, 2007Inventors: Yukako Harada, Isao Yoshida, Yoshiyuki Takata
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Patent number: 7175963Abstract: A resin which comprises (1) at least one structural unit selected from the group consisting of a structural unit derived from 3-hydroxy-1-adamantyl (meth)acrylate, a structural unit derived from 3,5-dihydroxy-1-adamantyl (meth)acrylate, a structural unit derived from (meth)acryloyloxy-?-butyrolactone having a lactone ring optionally substituted by alkyl, a structural unit of the formula (Ia) and a structural unit of the formula and (2) a structural unit of the formula (II) and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; and also provides a chemical amplification type positive resist composition comprising a resin defined above and an acid generator.Type: GrantFiled: September 30, 2004Date of Patent: February 13, 2007Assignee: Sumitomo Chemical Company, LimitedInventors: Yusuke Fuji, Yoshiyuki Takata, Isao Yoshida
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Patent number: 7132218Abstract: The present invention provide a chemically amplified positive resist composition comprising a resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution and becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator; and a compound of the formula (C-1) wherein R1 and R2 each independently represents a hydrogen or an alkyl having 1 to 4 carbon atoms, R3, R4 and R5 each independently represents a hydrogen or a hydroxyl.Type: GrantFiled: March 18, 2005Date of Patent: November 7, 2006Assignee: Sumitomo Chemical Company, LimitedInventors: Kouji Toishi, Yoshiyuki Takata, Satoshi Yamaguchi