Patents by Inventor Yosuke Kishikawa
Yosuke Kishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20260337776Abstract: A raw material complex for forming a thin metal film, having a central metal and a ligand coordinated to the central metal, wherein the central metal has an atomic polarizability of 45 to 51 and the complex satisfies the following conditions: a polarizability volume?200 and a relative dielectric constant?2.20.Type: ApplicationFiled: February 24, 2026Publication date: October 29, 2026Applicants: DAIKIN INDUSTRIES, LTD., The University of TokyoInventors: Akiyoshi YAMAUCHI, Yosuke Kishikawa, Shigehito Sagisaka, Hisataka Hayashi, Shingo Nakamura, Kazunori Horiguchi, Naoyuki Hoshiya, Yukihiro Shimogaki, Jun Yamaguchi, Takeshi Momose, Noboru Sato
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Patent number: 12774352Abstract: A method for producing a fluoropolymer which includes polymerizing a fluoromonomer in an aqueous medium in the presence of a surfactant to provide a fluoropolymer, the surfactant being represented by the general formula (1): CR1R2R4—CR3R5—X-A, wherein R1 to R5 are each H or a monovalent substituent, with the proviso that at least one of R1 and R3 represents a group represented by the general formula: —Y—R6 and at least one of R2 and R3 represents a group represented by the general formula: —X-A or a group represented by the general formula: —Y—R6; and A is the same or different at each occurrence and is —COOM, —SO3M, or —OSO3M. Also disclosed is a surfactant for polymerization represented by the general formula (1), a method for producing a fluoropolymer using the surfactant, a composition including a fluoropolymer and the surfactant and a molded body including the composition.Type: GrantFiled: March 9, 2023Date of Patent: October 27, 2026Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Taketo Kato, Satoru Yoneda, Masahiro Higashi, Akiyoshi Yamauchi, Sumi Ishihara, Yosuke Kishikawa, Moe Hosokawa, Marina Nakano, Hirotoshi Yoshida, Yoshinori Nanba, Kengo Ito, Chiaki Okui, Kenji Ichikawa, Yohei Fujimoto, Hirokazu Aoyama, Masamichi Sukegawa, Taku Yamanaka, Hiroyuki Sato
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Patent number: 12760139Abstract: An object of the present disclosure is to provide an encapsulation resin in which the occurrence of cracks is suppressed when the resin is used for encapsulation of ultraviolet light-emitting elements. Another object of the present disclosure is to provide an encapsulation resin composition for supplying the encapsulation resin. The present disclosure relates to an encapsulation resin for light-emitting elements, comprising a fluoropolymer, wherein the fluoropolymer comprises, as a main component, a monomer unit represented by formula (1): wherein R1 to R4 are each independently a fluorine atom, a fluoroalkyl group, or a fluoroalkoxy group.Type: GrantFiled: July 6, 2022Date of Patent: October 13, 2026Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Yoshito Tanaka, Makoto Matsuura, Yuuki Suzuki, Akitoshi Ogata, Yosuke Kishikawa
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Patent number: 12753320Abstract: An object of the present disclosure is to provide a coating composition containing a dissolved, specific fluoropolymer at a high concentration that is usable in fluoropolymer coating. The present disclosure relates to a coating composition containing a fluoropolymer and an aprotic solvent, and the fluoropolymer contains, as a main component, a monomer unit represented by formula (1): wherein R1 to R4 are each independently a fluorine atom, a fluoroalkyl group, or a fluoroalkoxy group; and the concentration of the fluoropolymer is 20 mass % or more based on the total mass of the coating composition.Type: GrantFiled: July 6, 2022Date of Patent: October 6, 2026Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Yoshito Tanaka, Makoto Matsuura, Yuuki Suzuki, Akitoshi Ogata, Yosuke Kishikawa
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Publication number: 20260275010Abstract: A fluorine-containing cyclic olefin (co)polymer containing a structural unit represented by general formula (1) shown below and a structural unit derived from an ?-olefin having 2 to 10 carbon atoms, wherein the amount of the structural unit represented by general formula (1) exceeds 40 mol %, and the amount of the structural unit derived from an ?-olefin having 2 to 10 carbon atoms is at least 0 mol % but less than 60 mol %. [In general formula (1), R1 to R8 each represent a hydrogen atom, a halogen atom, or a hydrocarbon group, R9 to R12 each represent a hydrogen atom, a fluorine atom, a substituted or unsubstituted alkyl group, or an alkyl group having a fluorine atom, or the like, and at least one fluorine atom is included in R9 to R12. Further, m represents 0 or a positive integer.Type: ApplicationFiled: March 6, 2024Publication date: September 17, 2026Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Tomoyuki TADA, Yu MIYAGI, Shingo OKUNO, Shinya HANDA, Akiyoshi YAMAUCHI, Yosuke KISHIKAWA
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Publication number: 20260265160Abstract: A method for producing a metal carbide, including preparing a molten salt containing ions of a first metal and oxide ions derived from an oxide of the first metal; adding carbon dioxide to the molten salt; and, applying a voltage to the molten salt containing carbonate ions formed by ionizing the carbon dioxide, to obtain precipitates containing a carbide of the first metal, where the molten salt contains, as the ions of the first metal, at least one alkali metal ion or alkaline earth metal ion. A metal carbide composition including: a carbide of a first metal as a main component; and a halide of a second metal other than the first metal, the first metal contains an alkali metal or alkaline earth metal, the second metal contains an alkali metal or alkaline earth metal, and a content of the carbide of the first metal is 80-99 mass % or less.Type: ApplicationFiled: April 27, 2026Publication date: September 10, 2026Applicants: THE DOSHISHA, DAIKIN INDUSTRIES, LTD.Inventors: Takuya GOTO, Takashi Watanabe, Yuta Suzuki, Haruka Fukuda, Atsuya Yamada, Tomohiro Isogai, Yosuke Kishikawa, Akiyoshi Yamauchi
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Publication number: 20260258167Abstract: Provided is a fluoropolymer represented by the formula Af-CRP, where Af is a fluoropolymer segment containing more than 80 mol % of a polymerized unit based on tetrafluoroethylene; and CRP is any of the formulas (CRP1) to (CRP5); the formula (CRP1) being —SC(S)Zc11 (where Zc11 is an alkyl group or an aryl group), the formula (CRP2) being —SC(S)Zc12 (where Zc12 is an alkyl group or an aryl group), the formula (CRP3) being —SC(S)SRc11 (where Rc11 is a monovalent organic group), the formula (CRP4) being —SC(S)NZc132 (where Zc13s are (i) each independently an alkyl group, an aryl group, or a 4-pyridyl group or (ii) groups bonded to each other to form a heterocycle together with a N atom in the formula), and the formula (CRP5) being —SC(S)OZc14 (where Zc14 is an alkyl group or an aryl group).Type: ApplicationFiled: April 22, 2026Publication date: September 3, 2026Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Marina NAKANO, Masahiro HIGASHI, Sumi ISHIHARA, Yosuke KISHIKAWA
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Publication number: 20260234413Abstract: A composition including a hydrophobic compound (A) formed from a hydrophobic compound (A1) and a hydrophobic compound (A2) different from the hydrophobic compound (A1), where the endothermic peak of the hydrophobic compound (A1) in differential scanning calorimetry is shifted by 0.5° C. to 80° C. to the lower temperature side in differential scanning calorimetry of the hydrophobic compound (A), and the composition can impart liquid repellency to a base material.Type: ApplicationFiled: April 13, 2026Publication date: August 13, 2026Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Ryo AKUTA, Masahiro HIGASHI, Akane MATSUMOTO, Tatsunori SAKAMAKI, Yuki SHIMAOKA, Yukinori TOGO, Yosuke KISHIKAWA, Takane TSUCHII
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Publication number: 20260234871Abstract: A composition including a hydrophobic compound (A) formed from a hydrophobic compound (A1) and a hydrophobic compound (A2) different from the hydrophobic compound (A1), where the Shore A hardness [PEAK] of the hydrophobic compound (A) is 10-100 smaller than the Shore A hardness [PEAK] of the hydrophobic compound (A1), and the composition can impart liquid repellency to a base material.Type: ApplicationFiled: April 13, 2026Publication date: August 13, 2026Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Ryo AKUTA, Masahiro HIGASHI, Akane MATSUMOTO, Tatsunori SAKAMAKI, Yuki SHIMAOKA, Yukinori TOGO, Yosuke KISHIKAWA, Takane TSUCHII
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Publication number: 20260209501Abstract: A composition that suppresses water absorption and moisture absorption, particularly a composition for providing a sheet with suppressed increase in dielectric loss tangent due to moisture absorption, and a sheet and metal-clad laminate using the same. A composition including a fluororesin, an inorganic particle, and an organosiloxane. A sheet and a metal-clad laminate using the composition.Type: ApplicationFiled: March 19, 2026Publication date: July 23, 2026Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Moe HOSOKAWA, Shingo OKUNO, Kyohei SAWAKI, Yoshito TANAKA, Akiyoshi YAMAUCHI, Yosuke KISHIKAWA
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Publication number: 20260209960Abstract: A method for manufacturing carbon monoxide or an organic compound, which includes electrolytically reducing carbon dioxide to obtain carbon monoxide or an organic compound in an electrolytic reduction apparatus having an anode, a cathode, and an electrolytic solution containing carbon dioxide. Carbon dioxide is selectively reduced into carbon monoxide or a specific organic compound by a potential to be applied to between the anode and the cathode.Type: ApplicationFiled: March 16, 2026Publication date: July 23, 2026Applicants: THE DOSHISHA, DAIKIN INDUSTRIES, LTD.Inventors: Takuya GOTO, Jinichi Koue, Yuta Suzuki, Kentaro Kozasa, Saya Nozaki, Shoma Tchorap-Yamamoto, Tomohiro Isogai, Yosuke Kishikawa, Akiyoshi Yamauchi
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Publication number: 20260210051Abstract: Provided is a composition comprising a hydrophobic compound (A) that comprises a hydrophobic compound (A1) and a hydrophobic compound (A2) which differs from the hydrophobic compound (A1), wherein the hydrophobic compound (A1) is a compound selected from the group consisting of modified amine, modified polycarboxylic acid, paraffin wax, and microcrystalline wax, and the hydrophobic compound (A2) is a liquid or solid oil that is not a compound selected from the group consisting of modified amine, modified polycarboxylic acid, paraffin wax, and microcrystalline wax. Thus, provided is a novel composition that makes it possible to impart liquid repellency to a base material.Type: ApplicationFiled: April 10, 2026Publication date: July 23, 2026Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Ryo AKUTA, Masahiro HIGASHI, Akane MATSUMOTO, Tatsunori SAKAMAKI, Yuki SHIMAOKA, Yukinori TOGO, Yosuke KISHIKAWA, Takane TSUCHII
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Publication number: 20260193443Abstract: A method for decomposing a fluorine-containing polymer that can decompose a fluorine-containing polymer while suppressing generation of impurities after the decomposition reaction. A method for decomposing a fluorine-containing polymer, including a decomposition step including reacting a fluorine-containing polymer in subcritical water that is at a temperature of 180° C. or higher and lower than 250° C. and that contains at least one basic compound selected from the group consisting of alkali metal hydroxides and alkaline earth metal hydroxides at a concentration of 0.5 M or lower.Type: ApplicationFiled: February 27, 2026Publication date: July 9, 2026Applicants: DAIKIN INDUSTRIES, LTD., KANAGAWA UNIVERSITY OFInventors: Ayane NAKAUE, Hirofumi Mukae, Yosuke Kishikawa, Hisao Hori, Jin Hamaura
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Publication number: 20260185227Abstract: A method for manufacturing a thin film, which includes a deposition process for depositing a raw material compound on a substrate material by atomic layer deposition using the raw material compound; and a film forming process for forming a thin film by reducing a deposited product with a reducing gas at a pressure of 4.5 Torr or more after the deposition process.Type: ApplicationFiled: February 19, 2026Publication date: July 2, 2026Inventors: Akiyoshi YAMAUCHI, Yosuke KISHIKAWA, Shigehito SAGISAKA, Hisataka HAYASHI, Shingo NAKAMURA, Kazunori HORIGUCHI, Yukihiro SHIMOGAKI, Jun YAMAGUCHI, Takeshi MOMOSE, Noboru SATO
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Publication number: 20260184881Abstract: A basic subcritical water composition and a water-containing composition each capable of decomposing, for example, polymers while preventing or reducing corrosion of the reaction device, and a device and a container therefor. A basic subcritical water composition having a pH of 13.7 or lower and a potential of 400 mV or higher at a current density exceeding 10 mA/cm2 in an anodic polarization curve obtained using a steel material as a working electrode.Type: ApplicationFiled: February 27, 2026Publication date: July 2, 2026Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Ayane NAKAUE, Hirofumi MUKAE, Yosuke KISHIKAWA
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Publication number: 20260159493Abstract: A method for producing a compound of formula (1): wherein two R1 are the same and each is a fluorine atom or a fluoroalkyl group, comprising: step A of reacting a compound of formula (2): wherein R1 is as defined above, with a compound (3) of formula (3-1) or the like: wherein R31, R32, and R33 are the same or different and each is a hydrogen atom or a C1-10 alkyl group, or two of them are optionally linked to each other to form a ring optionally having one or more substituents, in the presence of a fluorine compound (4) of formula (4-1) or the like: wherein M is a metal atom, n is 0 or 1, and the sum of the valence number of M and n is m, and an organic solvent, provided that the compound of formula (3) is excluded from the organic solvent.Type: ApplicationFiled: April 16, 2025Publication date: June 11, 2026Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Moe HOSOKAWA, Koutarou Hayashi, Yoshihiro Yamamoto, Akiyoshi Yamauchi, Yosuke Kishikawa, Yuuki Suzuki, Akitoshi Ogata, Makoto Matsuura
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Publication number: 20260159494Abstract: A method for producing a compound of formula (5): wherein R1 is a fluorine atom or a fluoroalkyl group, comprising: a step of producing a compound of formula (1) by step A of reacting a compound of formula (2), with at least one compound (3) in the presence of a fluorine compound (4) or hydrofluoric acid or a salt thereof, and an organic solvent, or producing a compound of formula (1) by step A, and further comprising step B of performing liquid separation; step C of heating the compound of formula (1) in the presence of a fluorine compound (4) or hydrofluoric acid or a salt thereof, to produce a compound of formula (6); step D of reacting the compound of formula (6) with a base to produce a compound of formula (8); and step E of heating the compound of formula (8) to produce the compound of formula (5).Type: ApplicationFiled: April 16, 2025Publication date: June 11, 2026Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Moe HOSOKAWA, Koutarou HAYASHI, Yoshihiro YAMAMOTO, Akiyoshi YAMAUCHI, Yosuke KISHIKAWA, Yuuki SUZUKI, Akitoshi OGATA, Makoto MATSUURA
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Publication number: 20260159667Abstract: An object of the present disclosure is to provide a composite having excellent heat resistance and/or hydrophobicity and allowing easy introduction of a functional group thereinto. A composite comprising: a polymer; and one or more cyclic compounds that include the polymer, where the cyclic compound comprises a compound represented by the following formula (I): where A independently represents a divalent C4-50 organic group comprising one or more selected from —OR and —CO—, R independently represents an organic group optionally comprising one or more fluorine atoms, or a hydrogen atom, and n represents an integer of 4 to 20, and one of the polymer and the cyclic compound comprises one or more selected from —CO—, a nitrogen atom, and a halogen atom, and the other has a group comprising a hydrogen atom capable of interacting with —CO—, the nitrogen atom, or the halogen atom.Type: ApplicationFiled: April 11, 2025Publication date: June 11, 2026Applicants: Daikin Industries, Ltd., Kyoto UniversityInventors: Yoshito Tanaka, Shuhei Yamaguchi, Masaji Komori, Akiyoshi Yamauchi, Yosuke Kishikawa, Tomoki Ogoshi, Yuta Kurakake, Tatsuki Sobue, Katsuto Onishi, Kenichi Kato, Shunsuke Ohtani
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Patent number: 12644193Abstract: An energy utilization system includes a circulation circuit. The circulation circuit includes a pump, a heating section, an electrolytic reduction apparatus, and a thermal energy recovery section. The pump receives a heating medium and outputs the heating medium. The heating section heats the heating medium by using renewable energy or energy obtained from waste heat. The electrolytic reduction apparatus heats an electrolytic solution with heat from the heating medium. The circulation circuit circulates the heating medium. A method for producing a carbon-containing material includes heating a heating medium circulating in a circulation circuit by using renewable energy or energy obtained from waste heat, and performing electrolytic reduction by heating an electrolytic solution with heat from the heating medium that has been heated.Type: GrantFiled: March 22, 2024Date of Patent: June 2, 2026Assignees: THE DOSHISHA, DAIKIN INDUSTRIES, LTD.Inventors: Takuya Goto, Masamichi Ishikawa, Takashi Watanabe, Masanobu Kawazoe, Nobuaki Takeda, Yosuke Kishikawa, Akiyoshi Yamauchi, Tomohiro Isogai
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Patent number: 12643838Abstract: A method for producing a hydrocarbon, including: preparing a molten salt containing an oxide of a first metal; adding carbon dioxide to the molten salt; obtaining precipitates containing a first metal carbide by applying a voltage to the molten salt containing carbon dioxide; and obtaining a gas containing a hydrocarbon and a hydroxide of the first metal by hydrolyzing the first metal carbide.Type: GrantFiled: March 28, 2024Date of Patent: June 2, 2026Assignees: THE DOSHISHA, DAIKIN INDUSTRIES, LTD.Inventors: Takuya Goto, Takashi Watanabe, Yuta Suzuki, Haruka Fukuda, Atsuya Yamada, Tomohiro Isogai, Yosuke Kishikawa, Akiyoshi Yamauchi