Patents by Inventor Yosuke Okamoto

Yosuke Okamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10599056
    Abstract: According to one embodiment, in a position measuring method, alignment measurement in a light exposure process is executed by irradiating a first mark with light having a wavelength of ?1, with respect to a processing object that includes a first layer and a second layer stacked above a substrate and a resist applied on the second layer. The first mark is provided in the first layer and includes a plurality of segments arranged at a pitch smaller than a resolution limit given by light having the wavelength of ?1. Then, overlay measurement is executed by irradiating the first mark and a second mark with light having a wavelength of ?2 shorter than the wavelength of ?1. The second mark has been formed by performing a light exposure and development process to the resist, and includes a plurality of segments arranged at the pitch.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: March 24, 2020
    Assignee: Toshiba Memory Corporation
    Inventors: Miki Toshima, Osamu Yamane, Yosuke Okamoto
  • Publication number: 20200081357
    Abstract: According to one embodiment, in a position measuring method, alignment measurement in a light exposure process is executed by irradiating a first mark with light having a wavelength of ?1, with respect to a processing object that includes a first layer and a second layer stacked above a substrate and a resist applied on the second layer. The first mark is provided in the first layer and includes a plurality of segments arranged at a pitch smaller than a resolution limit given by light having the wavelength of ?1. Then, overlay measurement is executed by irradiating the first mark and a second mark with light having a wavelength of ?2 shorter than the wavelength of ?1. The second mark has been formed by performing a light exposure and development process to the resist, and includes a plurality of segments arranged at the pitch.
    Type: Application
    Filed: January 31, 2019
    Publication date: March 12, 2020
    Applicant: Toshiba Memory Corporation
    Inventors: Miki Toshima, Osamu Yamane, Yosuke Okamoto
  • Patent number: 9952505
    Abstract: According to one embodiment, an imprint device includes a holding unit, a mounting unit, a moving unit, a curing unit, a pressing portion, and a detecting portion. The holding unit holds template having a pattern portion pressed onto a transfer portion provided on a substrate. The mounting unit mounts the substrate. The moving unit is provided on at least either the holding unit or the mounting unit. The moving unit moves the holding unit and the mounting unit in directions approaching each other or directions away from each other. The curing unit cures the transfer portion onto which the pattern portion of the template is pressed. The pressing portion pushes the template pressed onto the transfer portion in a direction intersecting a pressing direction of the template. The detecting portion detects a position of the template pushed by the pressing portion.
    Type: Grant
    Filed: September 9, 2014
    Date of Patent: April 24, 2018
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Yosuke Okamoto, Nobuhiro Komine, Kazuhiro Segawa, Manabu Takakuwa, Kentaro Kasa
  • Patent number: 9941177
    Abstract: A pattern accuracy detecting apparatus includes a stage for supporting a substrate, an optical warpage detecting unit that measures a shape of a substrate disposed on the stage, an optical pattern detection unit that detects a position of a pattern on the substrate, and a processing unit that corrects the detected pattern position based on the measured shape of the substrate.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: April 10, 2018
    Assignee: Toshiba Memory Corporation
    Inventors: Kentaro Kasa, Kazuya Fukuhara, Kazutaka Ishigo, Manabu Takakuwa, Yoshinori Hagio, Kazuhiro Segawa, Yuki Murasaka, Tetsuya Kugimiya, Yuu Yamayose, Yosuke Okamoto
  • Patent number: 9784573
    Abstract: According to one embodiment, an adjusting unit adjusts a refracting angle of incident light with respect to a substrate, a detector detects reflected light from the substrate, and a calculating unit calculates positional deviation of the pattern based on patterns respectively reflected in reflected lights obtained from the incident light generating N number of refracting angles with respect to the substrate, where N is an integer of two or greater.
    Type: Grant
    Filed: June 11, 2015
    Date of Patent: October 10, 2017
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Hidenori Sato, Yosuke Okamoto, Nobuhiro Komine, Manabu Takakuwa
  • Publication number: 20170271214
    Abstract: A pattern accuracy detecting apparatus includes a stage for supporting a substrate, an optical warpage detecting unit that measures a shape of a substrate disposed on the stage, an optical pattern detection unit that detects a position of a pattern on the substrate, and a processing unit that corrects the detected pattern position based on the measured shape of the substrate.
    Type: Application
    Filed: August 31, 2016
    Publication date: September 21, 2017
    Inventors: Kentaro KASA, Kazuya FUKUHARA, Kazutaka ISHIGO, Manabu TAKAKUWA, Yoshinori HAGIO, Kazuhiro SEGAWA, Yuki MURASAKA, Tetsuya KUGIMIYA, Yuu YAMAYOSE, Yosuke OKAMOTO
  • Publication number: 20160330815
    Abstract: An illuminating method for illuminating a specific region S and peripheral regions Ca, Cb thereof by a plurality of light sources 10a, 10b, wherein the light sources 10a, 10b have mutually different flicker frequencies, and their irradiation areas Ia, Ib overlap each other in the specific region S, thus causing an observer to perceive in the specific region S a flicker stimulation having a frequency different from the flicker frequencies of light perceived by the observer in the peripheral regions Ca, Cb where the irradiation areas do not overlap each other.
    Type: Application
    Filed: September 2, 2014
    Publication date: November 10, 2016
    Inventors: Seiji NAKAGAWA, Yosuke OKAMOTO
  • Publication number: 20160245645
    Abstract: According to one embodiment, an adjusting unit adjusts a refracting angle of incident light with respect to a substrate, a detector detects reflected light from the substrate, and a calculating unit calculates positional deviation of the pattern based on patterns respectively reflected in reflected lights obtained from the incident light generating N number of refracting angles with respect to the substrate, where N is an integer of two or greater.
    Type: Application
    Filed: June 11, 2015
    Publication date: August 25, 2016
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Hidenori SATO, Yosuke OKAMOTO, Nobuhiro KOMINE, Manabu TAKAKUWA
  • Patent number: 9244365
    Abstract: According to one embodiment, a method for measuring pattern misalignment, includes: a first step obtaining image data; a second step specifying a measurement region; a third step calculating a first shift amount (x1, y1); a fourth step determining, after calculating the first shift amount, a first distribution; a fifth step executing a plurality of times the second step, the third step, and the fourth step; a seventh step calculating a second shift amount (x2, y2); an eighth step determining, after calculating the second shift amount, a second distribution; a ninth step executing a plurality of times the sixth step, the seventh step, and the eighth step; and a tenth step calculating a difference (x2?x1, y2?y1) between the second pattern misalignment and the first pattern misalignment.
    Type: Grant
    Filed: July 29, 2013
    Date of Patent: January 26, 2016
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yosuke Okamoto, Yoshinori Hagio
  • Patent number: 9146458
    Abstract: An EUV exposure apparatus according to embodiments includes a reticle stage which suctions a rear surface side of an EUV mask to retain the EUV mask. In addition, the EUV exposure apparatus includes a detection unit which detects a position of a measurement mark formed on the rear surface of the EUV mask in the state where the EUV mask is suctioned on the reticle stage. In addition, the EUV exposure apparatus includes a control unit which calculates a distortion amount of the EUV mask based on the position of the measurement mark and performs exposure control on a wafer while correcting the distortion amount.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: September 29, 2015
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yoshinori Hagio, Yosuke Okamoto
  • Publication number: 20150251350
    Abstract: According to one embodiment, an imprint device includes a holding unit, a mounting unit, a moving unit, a curing unit, a pressing portion, and a detecting portion. The holding unit holds template having a pattern portion pressed onto a transfer portion provided on a substrate. The mounting unit mounts the substrate. The moving unit is provided on at least either the holding unit or the mounting unit. The moving unit moves the holding unit and the mounting unit in directions approaching each other or directions away from each other. The curing unit cures the transfer portion onto which the pattern portion of the template is pressed. The pressing portion pushes the template pressed onto the transfer portion in a direction intersecting a pressing direction of the template. The detecting portion detects a position of the template pushed by the pressing portion.
    Type: Application
    Filed: September 9, 2014
    Publication date: September 10, 2015
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yosuke OKAMOTO, Nobuhiro KOMINE, Kazuhiro SEGAWA, Manabu TAKAKUWA, Kentaro KASA
  • Patent number: 8976356
    Abstract: According to one embodiment, a measurement mark includes: a first line pattern, first lines extending in a first direction, the first lines arranged in a second direction in the first line pattern, the first line pattern capable of forming a first moire pattern by overlapping with an arrangement pattern including a pattern, and a first polymer and a second polymer being alternately arranged in the pattern; a second line pattern, second lines extending in the first direction, the second lines being arranged in the second direction in the second line pattern, the second line pattern capable of forming a second moire pattern by overlapping with the arrangement pattern; and a reference pattern with a reference position configured to assess a first shift amount from the reference position of the first moire pattern and a second shift amount from the reference position of the second moire pattern.
    Type: Grant
    Filed: July 17, 2013
    Date of Patent: March 10, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Nobuhiro Komine, Yosuke Okamoto
  • Patent number: 8953163
    Abstract: An exposure apparatus according to an embodiment controls the positioning between layers using an alignment correction value calculated on the basis of lower layer position information of a lower-layer-side pattern and upper layer position information of an upper-layer-side pattern. The lower layer position information includes alignment data, a focus map, and a correction value which is set on the basis of the previous substrate. The upper layer position information includes alignment data, a focus map, and a correction value which is a correction value for the positioning and is used when the upper-layer-side pattern is transferred.
    Type: Grant
    Filed: February 27, 2013
    Date of Patent: February 10, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kentaro Kasa, Manabu Takakuwa, Yosuke Okamoto, Masamichi Kishimoto
  • Publication number: 20150009488
    Abstract: According to one embodiment, a mask distortion measuring apparatus is provided, including a light source, a mask holding unit, a projection optical system, an imaging unit, and a distortion calculating unit. The mask holding unit holds masks overlaid with each other. The projection optical system forms a projection image of patterns provided on the masks by irradiating light from the light source to the masks. The imaging unit images the projection image. The distortion calculating unit calculates misalignment of another mask with respect to a mask to be a reference in the masks using the projection image imaged at the imaging unit.
    Type: Application
    Filed: February 21, 2014
    Publication date: January 8, 2015
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yosuke OKAMOTO, Nobuhiro Komine
  • Patent number: 8914766
    Abstract: According to one embodiment, generating virtual data by mirroring data based on a dimension measurement result in a measurement region on an inner side of a shot region to a non-shot region on an outer side of a shot edge, and calculating dose data of the measurement region and a non-measurement region based on data in the measurement region and the virtual data are included.
    Type: Grant
    Filed: July 1, 2013
    Date of Patent: December 16, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yosuke Okamoto, Takashi Koike
  • Publication number: 20140349219
    Abstract: According to embodiments, an exposure method is provided. In the exposure method, a transmittance of a pellicle is adjusted every position of a mask pattern included in a reflection type mask. And when adjusting the transmittance of the pellicle, a film thickness of the pellicle is adjusted on the basis of a transmittance correction amount. Thereafter, exposure is conducted onto a substrate by using the reflection type mask with the pellicle stuck thereon.
    Type: Application
    Filed: November 25, 2013
    Publication date: November 27, 2014
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Hiroyuki MIZUNO, Yosuke Okamoto, Takeshi Koshiba, Satoshi Nagai
  • Patent number: 8859167
    Abstract: According to one embodiment, a positional deviation measuring method includes measuring a positional deviation of a device pattern formed in a lower layer portion using an alignment mark of the lower layer portion as a reference; measuring a positional deviation of a device pattern formed in an upper layer portion above the lower layer portion using an alignment mark of the upper layer portion as a reference; measuring a positional deviation between the alignment mark of the lower layer portion and the alignment mark of the upper layer portion; and calculating a positional deviation between the device patterns based on the positional deviation between the alignment marks.
    Type: Grant
    Filed: December 21, 2012
    Date of Patent: October 14, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshinori Hagio, Yosuke Okamoto
  • Publication number: 20140285787
    Abstract: According to one embodiment, an exposure system includes: a supporting stage; a plurality of masks provided on an upper side of the supporting stage; and a light source being capable of irradiating a substrate with light through the plurality of masks, the plurality of masks including: a first mask, and a light shielding film being patterned in the first mask; and a second mask provided on an upper side or a lower side of the first mask, the second mask including a second region facing a first region of the first mask, the light shielding film not being present in the first region, and a light shielding film not being patterned in the second region or the light shielding film being patterned in at least a part of the second region, and a plurality of laser-irradiated marks being provided in at least the second region of the second mask.
    Type: Application
    Filed: August 29, 2013
    Publication date: September 25, 2014
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Eiji YONEDA, Nobuhiro Komine, Satomi Higashibata, Kazutaka Ishigo, Yosuke Okamoto
  • Publication number: 20140285652
    Abstract: According to one embodiment, a method for measuring pattern misalignment, includes: a first step obtaining image data; a second step specifying a measurement region; a third step calculating a first shift amount (x1, y1); a fourth step determining, after calculating the first shift amount, a first distribution; a fifth step executing a plurality of times the second step, the third step, and the fourth step; a seventh step calculating a second shift amount (x2, y2); an eighth step determining, after calculating the second shift amount, a second distribution; a ninth step executing a plurality of times the sixth step, the seventh step, and the eighth step; and a tenth step calculating a difference (x2?x1, y2?y1) between the second pattern misalignment and the first pattern misalignment.
    Type: Application
    Filed: July 29, 2013
    Publication date: September 25, 2014
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yosuke OKAMOTO, Yoshinori Hagio
  • Patent number: 8832607
    Abstract: According to one embodiment, a method for making a correction map of a dose amount of EUV light used when exposing with the EUV light, includes estimating an exposure result based on an initial correction map of the dose amount and flare of the EUV light, determining a goodness of the exposure result, and correcting the initial correction map in the case where the exposure result is unacceptable. And, the correcting of the initial correction map, the estimating of the exposure result, and the determining of the goodness are repeated until the exposure result is good.
    Type: Grant
    Filed: August 30, 2012
    Date of Patent: September 9, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takashi Koike, Hiroyuki Mizuno, Yosuke Okamoto