Patents by Inventor Yotaro Hatamura
Yotaro Hatamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7115354Abstract: An optical imprinting apparatus, and a method for producing a two-dimensional pattern, have line widths less than the wavelength of an exposure light. The evanescent (proximity) field effect is adopted to realize the apparatus and method. An optical imprinting apparatus comprises a container in which light is enclosed, an exposure-mask having a proximity field exposure pattern firmly fixed to a section of the container for exposing the exposure pattern on a photo-sensitive material through an evanescent field by the light enclosed therein; and a light source for supplying the light in the container.Type: GrantFiled: November 4, 2003Date of Patent: October 3, 2006Assignees: Ebara CorporationInventors: Masahiro Hatakeyama, Katsunori Ichiki, Tohru Satake, Yotaro Hatamura, Masayuki Nakao
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Patent number: 6835317Abstract: A slider prevent the phenomenon of sticking and reduce entrapping of foreign particles between sliding surfaces. A method for making micro-protrusions or micro-cavities on a surface of a substrate comprises placing the substrate in a process chamber, supporting a mask member having a micro shielding surface independent of and in front of the substrate, and irradiating fast atomic beams onto the surface of the substrate through the mask member.Type: GrantFiled: August 30, 2001Date of Patent: December 28, 2004Assignees: Ebara CorporationInventors: Yotaro Hatamura, Masayuki Nakao
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Publication number: 20040090610Abstract: The object of the present invention IS to provide an optical imprinting apparatus and method for producing a two-dimensional pattern, having line widths less than the wavelength of an exposure light. The evarnescent (proximity) field effect is adopted to realize the apparatus and method. An optical imprinting apparatus comprises: a container in which light is enclosed therein; an exposure-mask having a proximity field exposure pattern firmly fixed to a section of said container for exposing said exposure pattern on a photo-sensitive material through an evanescent field by said light enclosed therein; and a light source for supplying said light in said container.Type: ApplicationFiled: November 4, 2003Publication date: May 13, 2004Inventors: Masahiro Hatakeyama, Katsunori Ichiki, Tohru Satake, Yotaro Hatamura, Masayuki Nakao
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Patent number: 6671034Abstract: The object of the present invention IS to provide an optical imprinting apparatus and method for producing a two-dimensional pattern, having line widths less than the wavelength of an exposure light. The evarnescent (proximity) field effect is adopted to realize the apparatus and method. An optical imprinting apparatus comprises: a container in which light is enclosed therein; an exposure-mask having a proximity field exposure pattern firmly fixed to a section of said container for exposing said exposure pattern on a photo-sensitive material through an evanescent field by said light enclosed therein; and a light source for supplying said light in said container.Type: GrantFiled: April 29, 1999Date of Patent: December 30, 2003Assignees: Ebara CorporationInventors: Masahiro Hatakeyama, Katsunori Ichiki, Tohru Satake, Yotaro Hatamura, Masayuki Nakao
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Patent number: 6554799Abstract: The present invention provides a suction and injection pump capable of transferring a sufficient amount of viscous liquid even with a very thin suction and injection pipe, thereby enabling suction or injection of a viscous liquid while minimizing invasion into a human body. A pump according to the present invention effectively sucks or injects a viscous liquid by housing a very thin rotor in a cylindrical needle and positively transferring the liquid based on the mechanical configuration of the rotor. The configuration of the present invention reduces the diameter of a pipe while minimizing invasion into a human body.Type: GrantFiled: March 14, 2000Date of Patent: April 29, 2003Assignee: Center for Advanced Science and Technology Incubation, Ltd.Inventors: Yotaro Hatamura, Masayuki Nakao, Takenori Okusa
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Publication number: 20020008078Abstract: The slider according to the invention can prevent the phenomenon of sticking and reduce entrapping of foreign particles between the sliding surfaces. The method for making micro-protrusions or micro-cavities on a surface of a substrate comprises the steps of: placing the substrate in a process chamber; supporting a mask member, having a micro shielding surface, independent of and in front of the substrate; and irradiating fast atomic beams onto the surface of the substrate through the mask member.Type: ApplicationFiled: August 30, 2001Publication date: January 24, 2002Inventors: Yotaro Hatamura, Masayuki Nakao
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Patent number: 6048671Abstract: An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basis technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. Applications of devices having the fine structures produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.Type: GrantFiled: November 18, 1998Date of Patent: April 11, 2000Assignees: Ebara Corporation, Yotaro HatamuraInventors: Masahiro Hatakeyama, Katsunori Ichiki, Yotaro Hatamura
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Patent number: 6015976Abstract: Three-dimensional ultra-fine micro-fabricated structures of the order of .mu.m and less are produced for use in advanced optical communication systems and quantum effect devices. Basic components are an energy beam source, a mask member and a specimen stage. The mask member is an independent component, and various combinations of relative movements of the mask member with respect to the beam axis and/or workpiece can be made with high precision to produce curved or slanted surfaces on a workpiece, thereby producing multiple lines or arrays of convex or concave micro-lenses. Other examples of fine-structures include deposition of thin films in a multiple line pattern or in an array pattern. Because of flexibility of fabrication and material, labyrinth seals having curved surfaces with grooved structures can be used as friction reduction devices for bearing components. Fine groove dimensions of the order of nm are possible.Type: GrantFiled: November 18, 1998Date of Patent: January 18, 2000Assignees: Ebara Corporation, Yotaro HatamuraInventors: Masahiro Hatakeyama, Katsunori Ichiki, Takao Kato, Yotaro Hatamura, Masayuki Nakao
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Patent number: 6010831Abstract: An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basis technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. Applications of devices having the fine structures produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.Type: GrantFiled: March 23, 1999Date of Patent: January 4, 2000Assignees: Ebara Corporation, Yotaro HatamuraInventors: Masahiro Hatakeyama, Katsunori Ichiki, Yotaro Hatamura
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Patent number: 6007969Abstract: An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basis technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. Applications of devices having the fine structures produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.Type: GrantFiled: March 4, 1996Date of Patent: December 28, 1999Assignees: Ebara Corporation, Yotaro HatamuraInventors: Masahiro Hatakeyama, Katsunori Ichiki, Yotaro Hatamura
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Patent number: 5998097Abstract: An energy beam source is used in micro-fabrication tasks, such as fabrication of specific patterns, in-situ bonding, repair, connection and disconnection of electrical paths, applicable to semiconductor devices and other micro-sized circuits in integrated circuits. The beam source is made compact so that several sources can be located inside a vacuum vessel and in conjunction with micro-manipulators or micro-movement stages operated under light or an electron microscope. The beam source is provided with at least three electrodes, and by applying a selected voltage, i.e., high frequency voltage, direct current voltage and ground voltage, on each the three electrodes in association with film-forming substance(s), virtually any type of deposit can be formed at any location of a workpiece.Type: GrantFiled: April 28, 1999Date of Patent: December 7, 1999Assignees: Ebara Corporation, Yotaro HatamuraInventors: Masahiro Hatakeyama, Katsunori Ichiki, Tadasuke Kobata, Yotaro Hatamura, Masayuki Nakao
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Patent number: 5989779Abstract: An energy beam source is used in micro-fabrication tasks, such as fabrication of specific patterns, in-situ bonding, repair, connection and disconnection of electrical paths, applicable to semiconductor devices and other micro-sized circuits in integrated circuits. The beam source is made compact so that several sources can be located inside a vacuum vessel and in conjunction with micro-manipulators or micro-movement stages operated under light or an electron microscope. The beam source is provided with at least three electrodes, and by applying a selected voltage, i.e., high frequency voltage, direct current voltage and ground voltage, on each the three electrodes in association with film-forming substance(s), virtually any type of deposit can be formed at any location of a workpiece.Type: GrantFiled: October 17, 1995Date of Patent: November 23, 1999Assignees: Ebara Corporation, Yotaro HatamuraInventors: Masahiro Hatakeyama, Katsunori Ichiki, Tadasuke Kobata, Yotaro Hatamura, Masayuki Nakao
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Patent number: 5894058Abstract: An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basic technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. The microfabrication method include radiating a Fast Atomic beam through a patterned photoresist Film to fabricate a pattern of 0.1 to 100 nm in a target object.Type: GrantFiled: June 6, 1997Date of Patent: April 13, 1999Assignees: Ebara Corporation, Yotaro HatamuraInventors: Masahiro Hatakeyama, Katsunori Ichiki, Yotaro Hatamura
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Patent number: 5868952Abstract: Three-dimensional ultra-fine micro-fabricated structures of the order of .mu.m and less are produced for use in advanced optical communication systems and quantum effect devices. The basic components are an energy beam source, a mask member and a specimen stage. Because the mask member is an independent component, various combinations of relative movements of the mask member with respect to the beam axis and/or workpiece can be made with high precision to produce curved or slanted surfaces on a workpiece, thereby producing a multiple lines or arrays of convex or concave micro-lenses. Other examples of fine-structures include deposition of thin films in a multiple line pattern or in an array pattern. Because of the flexibility of fabrication method and material of fabrication, labyrinth seals having curved surfaces with grooved structures can be used as friction reduction means for bearing components. Fine groove dimensions of the order of nm are possible.Type: GrantFiled: March 18, 1996Date of Patent: February 9, 1999Assignees: Ebara Corporation, Yotaro HatamuraInventors: Masahiro Hatakeyama, Katsunori Ichiki, Takao Kato, Yotaro Hatamura, Masayuki Nakao
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Patent number: 5852298Abstract: A micro-working apparatus performs fabrication and assembly tasks for micron/nanometer sized objects while progress of operations is observed in real-time by at least a pair of optical or electron microscopes to provide simultaneous views from at least two directions. This offers spatial visual information regarding the working space which is particularly critical in micro-working. Micro-working is further facilitated by the use of a micro-pallet device specially designed for use in the apparatus, but also offering other application possibilities. Rotational and parallel translation movements provided by the micro-pallet combined with the micro-working capability of the apparatus are utilized to enable production of micron-sized parts for use in advanced applications of optical and electronic devices.Type: GrantFiled: March 26, 1996Date of Patent: December 22, 1998Assignees: Ebara Corporation, Yotaro HatamuraInventors: Masahiro Hatakeyama, Katsunori Ichiki, Takao Kato, Masaaki Kajiyama, Takashi Tsuzuki, Yotaro Hatamura, Masayuki Nakao
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Patent number: 5770123Abstract: An energy beam is irradiated to a workpiece through a beam transmission hole defined in a mask. At that time, a relative position between an energy beam source and the mask or the mask and the workpiece is changed, so that machining depth of the workpiece is varied depending on machining portions of the workpiece, which correspond to amounts of irradiation of the energy beam. With this method, a machined product having locally different depths very easily can be made and further the product can be machined to desired depths with high accuracy by a single machining operation in a short time.Type: GrantFiled: September 21, 1995Date of Patent: June 23, 1998Assignees: Ebara Corporation, Yotaro HatamuraInventors: Masahiro Hatakeyama, Katsunori Ichiki, Tadasuke Kobata, Masayuki Nakao, Yotaro Hatamura
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Patent number: 5644951Abstract: A feed screw apparatus comprises a fixed member, a feed screw shaft rotatably supported to the fixed member, a nut mounted to the feed screw shaft and a movable member attached to the nut, wherein a force is transferred from the fixed member through the feed screw shaft and the nut, and the device comprises an elastic member elastically deformable in the axial direction and provided with a portion through which a force is transferred. A force can be detected by an elastically deformed amount of the elastic member. Further, an axially expandable and contractable portion is formed by arranging a displacement generator in parallel with the elastic member, and by elastically deforming the elastic member, the precise and fine displacement can be generated. Furthermore, a preload to be applied to balls of the nut is made adjustable by utilizing the axially expandable and contractable portion.Type: GrantFiled: December 28, 1994Date of Patent: July 8, 1997Inventor: Yotaro Hatamura
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Patent number: 5142424Abstract: An information-reading head having a structure comprising a floatable information-reading head, and a suspension comprising a load arm for supporting the information-reading head via a gimbal. The gimbal having a frame structure in a reversed trapezoidal shape constituted by an upper horizontal portion fixed to the load arm, a lower horizontal portion to which the information-reading head is fixed, and a front portion and a rear portion. At least one of the front and the rear portion being inclined, whereby the information-reading head is substantially prevented from pitching forward when coming into contact with a surface of an information-bearing mechanism. The suspension supports the information reading head such that a center of gravity of the information reading head is positioned between a center of support of the information-reading head by the suspension and a rear of the information-reading head.Type: GrantFiled: June 20, 1990Date of Patent: August 25, 1992Inventor: Yotaro Hatamura
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Patent number: 4874032Abstract: A method of controlling die casting in which at least one of a pressure sensor which directly measures the internal pressure of a cavity continuously throughout the casting cycle and a temperature sensor which directly measures the temperature and heat flux of the cavity surface continuously throughout the casting cycle is mounted in a die and a measured value obtained through the direct measurement by the sensor mounted in the die is compared with a reference value, then casting conditions are controlled on the basis of the result of the comparison, the measured value compared with the reference value being a peak value thereof, a gradient of a certain time, a peak value generation time, a period of holding a value above a certain threshold level, or an integrated value up to a certain time, or it being the difference and/or the sum of peak values, gradients of a certain time, peak value generation times, time periods of holding a value above a certain threshold level, or integrated values up to a certain tiType: GrantFiled: March 27, 1989Date of Patent: October 17, 1989Inventor: Yotaro Hatamura
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Patent number: 4772161Abstract: A profile working machine includes a support portion, a working portion, and a drive and control system.Type: GrantFiled: February 27, 1987Date of Patent: September 20, 1988Assignees: Takaaki Nagao, Yotaro Hatamura, Hitachi Construction Machinery Co., Ltd.Inventors: Takaaki Nagao, Yotaro Hatamura, Kozo Ono