Patents by Inventor Young-Joo Choi

Young-Joo Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240130232
    Abstract: The present specification relates to a heterocyclic compound, an organic light emitting device, and a composition for an organic material layer of an organic light emitting device.
    Type: Application
    Filed: July 25, 2023
    Publication date: April 18, 2024
    Applicant: LT MATERIALS CO., LTD.
    Inventors: Hyun-Joo LEE, Geon-Yu PARK, Young-Seok NO, Dong-Jun KIM, Dae-Hyuk CHOI
  • Patent number: 11953273
    Abstract: Proposed is a heat dissipating device using turbulent flow. In the heat dissipating device, a plurality of block flow paths are formed in parallel inside a block body, a first cap and a second cap are mounted on side surfaces of the respective ends of the block body so as to connect the block flow paths, a working fluid flows into the block flow paths, and the working fluid which has passed through the block flow paths is transferred to the outside. Turbulence generators are mounted inside the block flow paths, and finishing end portions on the respective ends of the turbulence generators are supported by the first cap and the second cap and are positioned inside the block flow paths.
    Type: Grant
    Filed: January 28, 2021
    Date of Patent: April 9, 2024
    Assignee: HYOSUNG HEAVY INDUSTRIES CORPORATION
    Inventors: Chang Woo Han, Young Joo Kim, Kang Min Choi, Seung Boong Jeong
  • Publication number: 20240103247
    Abstract: A lens assembly includes a lens barrel, a plurality of lenses arranged inside the lens barrel along an optical axis, and a cover member fixed to an end of the lens barrel on a subject side and fixing a last lens of the plurality of lenses on the subject side, wherein outer diameters of the plurality of lenses decrease from the subject side to an image side, and an outer diameter of the lens barrel is constant or smaller from the subject side to the image side.
    Type: Application
    Filed: July 20, 2023
    Publication date: March 28, 2024
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Seong Jin CHOI, Young Suk KANG, Yong Joo JO
  • Publication number: 20240104464
    Abstract: A system selecting a process key factor in a commercial chemical process, includes: a data extraction unit that extracts tag data in units of a set period; an outlier discrimination unit that discriminates and aggregates outliers by tag by using an outlier extraction reference master; an outlier processing unit that generates an input mart draft excluding the outliers; a derived variable generation unit that generates derived variables for each tag, and generates an advanced input mart having the derived variable added thereto; a yield calculation unit that backs up the result of calculation of a yield by realizing a target value via exclusion and correction of the outliers; and a key factor extraction unit that extracts a yield key factor by calculating importance of each tag, and backs up importance data for each tag.
    Type: Application
    Filed: April 27, 2022
    Publication date: March 28, 2024
    Applicant: SK GAS CO., LTD.
    Inventors: Ung Gi HONG, Sung Joo YEO, Seung Hwan KONG, Min Ho KIM, Hae Bin SHIN, Hee Dong CHOI, Young Gook KYE
  • Publication number: 20240095548
    Abstract: A system for predicting process changes by using key factors in a commercial chemical process, includes: a key factor extraction and individual tag importance backup unit that extracts yield key factors by calculating the importance of each tag, and backs up importance data for each tag; and a yield prediction model training and yield prediction performing unit that performs yield prediction model training by using the importance of each tag accumulated in the key factor extraction and individual tag importance backup unit, and performs yield prediction so as to output a yield prediction result, evaluates performance, and selects an optimal prediction model.
    Type: Application
    Filed: April 27, 2022
    Publication date: March 21, 2024
    Applicant: SK GAS CO., LTD.
    Inventors: Ung Gi HONG, Sung Joo YEO, Seung Hwan KONG, Min Ho KIM, Hae Bin SHIN, Hee Dong CHOI, Young Gook KYE
  • Publication number: 20240090328
    Abstract: The present invention relates to a multi-component host material and an organic electroluminescent device comprising the same. By comprising a specific combination of the multi-component host compounds, the organic electroluminescent device according to the present invention can provide high luminous efficiency and excellent lifespan characteristics.
    Type: Application
    Filed: October 26, 2023
    Publication date: March 14, 2024
    Inventors: Hee-Choon AHN, Young-Kwang KIM, Su-Hyun LEE, Ji-Song JUN, Seon-Woo LEE, Chi-Sik KIM, Kyoung-Jin PARK, Nam-Kyun KIM, Kyung-Hoon CHOI, Jae-Hoon SHIM, Young-Jun CHO, Kyung-Joo LEE
  • Publication number: 20240082387
    Abstract: The present invention relates to a fusion protein comprising a SARS-CoV-2-derived receptor-binding domain and a nucleocapsid protein, and the use thereof. The fusion protein comprising a coronavirus-derived receptor-binding domain and a nucleocapsid protein is highly applicable to a multivalent vaccine composition having greatly improved in-vivo half-life and remarkably superior efficacy compared to an immunogenic composition comprising only a receptor-binding domain. In particular, the fusion protein can greatly improve the titer of the coronavirus-specific antibody formation and T-cell immune response, and is thus useful for the prevention and treatment of coronaviruses comprising SARS-CoV-2.
    Type: Application
    Filed: January 29, 2021
    Publication date: March 14, 2024
    Inventors: Myoung Ho JANG, Jae Chan PARK, Young Joo CHOI, Young Hyun PARK, Gil-Jung KIM, Seung Mi JEONG, Su Bin LEE
  • Publication number: 20230355745
    Abstract: Disclosed are a novel coronavirus-derived receptor-binding domain variant having reduced ACE2-binding affinity, a fusion protein comprising the same, and the use thereof. It is possible to overcome the drawbacks of conventional vaccines using the coronavirus spike protein or receptor-binding domain thereof, wherein the reduced ACE2 expression due to binding to ACE2 and negative feedback may lead to side effects of the lungs or heart, and in particular, may be fatal to patients suffering from underlying diseases of the lungs or heart. In particular, the fusion protein constructed by fusing the coronavirus receptor-binding domain with the Fc domain is imparted with a greatly improved in-vivo half-life, and has superior efficacy by further combining N protein, M protein, ORF protein, or the like of SARS-CoV-2 therewith through additional modification and thus is highly applicable to a multivalent immunogenic composition.
    Type: Application
    Filed: January 29, 2021
    Publication date: November 9, 2023
    Inventors: Myoung Ho JANG, Jae Chan PARK, Young Joo CHOI, Young Hyun PARK, Gil-Jung KIM, Seung Mi JEONG, Yeon Soo PARK, Su Bin LEE
  • Publication number: 20230223611
    Abstract: A method for recycling a positive electrode material. the method includes obtaining positive electrode material particles from a positive electrode. The method further includes mixing the positive electrode material particles with a solution or powder containing sodium ions and heat-treating the mixture including the positive electrode material particles and the solution or power containing sodium ions. The method further includes rinsing the heat-treated positive electrode material particles with water.
    Type: Application
    Filed: September 9, 2021
    Publication date: July 13, 2023
    Inventors: Jeong Bae LEE, Young Joo CHOI, Jeong Kyu KIM
  • Publication number: 20230032354
    Abstract: A method for forming photoresist patterns and a semiconductor device on which a photoresist pattern manufactured according to the method is formed are disclosed. The method includes forming a preliminary photoresist pattern on a substrate; coating an organic topcoat composition including an acrylic polymer, the acrylic polymer including a structural unit containing a hydroxy group and a fluorine, and an acid compound on the preliminary photoresist pattern; drying and heating the substrate on which the organic topcoat composition is coated to coat it with a topcoat; and spraying a rinse solution including an acetate-based compound on the substrate coated with the topcoat to remove the topcoat.
    Type: Application
    Filed: June 23, 2022
    Publication date: February 2, 2023
    Inventors: Ran NAMGUNG, Minsoo KIM, Hyeon PARK, Daeseok SONG, Minki CHON, Jun Soo KIM, Hyun-Woo KIM, Hyun-Ji SONG, Young Joo CHOI, Suk-Koo HONG
  • Publication number: 20230021469
    Abstract: A resist topcoat composition and a method of forming patterns using the resist topcoat composition.
    Type: Application
    Filed: May 11, 2022
    Publication date: January 26, 2023
    Inventors: Ran NAMGUNG, Hyeon PARK, Shinhyo BAE, Daeseok SONG, Minki CHON, Jun Soo KIM, Hyun-Woo KIM, Hyun-Ji SONG, Young Joo CHOI, Suk-Koo HONG
  • Publication number: 20230026579
    Abstract: A method of forming a photoresist pattern and a semiconductor device on which a photoresist pattern manufactured according to the same is formed. The method includes forming a photoresist pattern on a substrate; coating an organic topcoat composition including an acrylic polymer including a structural unit containing a hydroxy group and a fluorine and an acidic compound on the photoresist pattern; drying and heating the substrate on which the organic topcoat composition is coated to coat it with a topcoat; and spraying a rinse solution including an ether-based compound on the substrate coated with the topcoat to remove the topcoat.
    Type: Application
    Filed: April 29, 2022
    Publication date: January 26, 2023
    Inventors: Ran NAMGUNG, Shinhyo BAE, Hyeon PARK, Daeseok SONG, Minki CHON, Jun Soo KIM, Hyun-Woo KIM, Hyun-Ji SONG, Young Joo CHOI, Suk-Koo HONG
  • Publication number: 20230026721
    Abstract: A resist topcoat composition and a method of forming patterns utilizing the resist topcoat composition are disclosed. The resist topcoat composition includes an acrylic polymer comprising a structural unit comprising a hydroxy group and a fluorine; a mixture comprising a first acid compound comprising at least one fluorine; and a second acid compound different from the first acid compound and comprising at least one fluorine, the first acid compound and the second acid compound are each independently selected from a sulfonic acid compound and a sulfonimide compound, the first acid compound and the second acid compound being in a weight ratio of about 1:0.1 to about 1:50; and a solvent.
    Type: Application
    Filed: May 2, 2022
    Publication date: January 26, 2023
    Inventors: Ran NAMGUNG, Hyeon PARK, Minsoo KIM, Daeseok SONG, Minki CHON, Jun Soo KIM, Hyun-Woo KIM, Hyun-Ji SONG, Young Joo CHOI, Suk-Koo HONG
  • Publication number: 20230024422
    Abstract: A resist topcoat composition includes an acrylic polymer including a structural unit containing a hydroxy group and a fluorine; a mixture including a sulfonic acid compound containing at least one fluorine and a carboxylic acid compound containing at least one fluorine in a weight ratio of about 1:0.1 to about 1:50; and a solvent. A method of forming patterns uses the resist topcoat composition to form a topcoat over a patterned substrate.
    Type: Application
    Filed: May 17, 2022
    Publication date: January 26, 2023
    Inventors: Ran NAMGUNG, Hyeon PARK, Minsoo KIM, Daeseok SONG, Minki CHON, Jun Soo KIM, Hyun-Woo KIM, Hyun-Ji SONG, Young Joo CHOI, Suk-Koo HONG
  • Publication number: 20230028244
    Abstract: A resist topcoat composition and a method of forming patterns using the resist topcoat composition are provided. The resist topcoat resist topcoat composition includes an acrylic polymer including a structural unit containing a hydroxy group and a fluorine; at least one acid compound selected from a sulfonic acid compound containing at least one fluorine, a sulfonimide compound containing at least one fluorine, and a carboxylic acid compound containing at least one fluorine; and a solvent.
    Type: Application
    Filed: May 20, 2022
    Publication date: January 26, 2023
    Inventors: Ran NAMGUNG, Daeseok SONG, Minsoo KIM, Hyeon PARK, Minki CHON, Jun Soo KIM, Hyun-Woo KIM, Hyun-Ji SONG, Young Joo CHOI, Suk-Koo HONG
  • Publication number: 20230014358
    Abstract: Provided is an anticancer agent, comprising, as active ingredients, NK cells and a fusion protein which comprises an IL-2 protein and CD80 protein. In one specific embodiment, a fusion protein comprising a CD80 fragment, an immunoglobulin Fc and an IL-2 variant can activate immunocytes such as natural killer cells. In addition, since cancer can be effectively inhibited when co-administering with natural killer cells, the pharmaceutical composition increases the immune activity in the body so as to be effectively usable for cancer, there by having high industrial applicability.
    Type: Application
    Filed: November 26, 2020
    Publication date: January 19, 2023
    Inventors: Myoung Ho JANG, Chun-Pyo HONG, Zung Yoon YANG, Young Jun KOH, June Sub LEE, Young Joo CHOI
  • Publication number: 20230015408
    Abstract: The present invention relates to a composition for proliferating a T cells, containing a fusion protein dimer comprising IL-2 protein or a variant thereof and CD80 protein or a fragment thereof, and to a method for culturing T cells using same. The T cells cultured according to the present invention increase the proliferation and activity of T cells even without using CD3/CD28 antibody-bound magnetic beads and proliferate T cells by culturing a patient's own peripheral blood mononuclear cells and are not likely to cause side effects in the human body, and thus will be widely used as a novel T cell therapeutic agent. Furthermore, in the case of CD8+ T cells cultured as described above, the activity thereof increases, and thus, the CD8+ T cells can be used as a more effective therapeutic agent.
    Type: Application
    Filed: November 19, 2020
    Publication date: January 19, 2023
    Inventors: Myoung Ho JANG, Chun-Pyo HONG, Young Joo CHOI, June Sub LEE
  • Patent number: 10352964
    Abstract: A method of forming a micropattern, a substrate surface inspection apparatus, a cantilever set for an atomic force microscope, and a method of analyzing a surface of a semiconductor substrate, and a probe tip the method including forming pinning patterns on a semiconductor substrate; forming a neutral pattern layer in spaces between the pinning patterns; and inspecting a surface of a guide layer that includes the pinning patterns and the neutral pattern layer by using an atomic force microscope (AFM).
    Type: Grant
    Filed: January 25, 2017
    Date of Patent: July 16, 2019
    Assignees: SAMSUNG ELECTRONICS CO., LTD., KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Kyeong-mi Lee, Jeong-ju Park, Shi-yong Yi, Eun-sung Kim, Seung-chul Kwon, Sang-ouk Kim, Young-joo Choi
  • Patent number: 9871061
    Abstract: A display substrate and its fabricating method have been disclosed. In a horizontal-field-mode liquid crystal display device, while maintaining five mask processes, additional direct contact has been formed to implement a narrow bezel.
    Type: Grant
    Filed: June 4, 2015
    Date of Patent: January 16, 2018
    Assignee: Samsung Display Co., Ltd.
    Inventor: Young-Joo Choi
  • Publication number: 20170212145
    Abstract: A method of forming a micropattern, a substrate surface inspection apparatus, a cantilever set for an atomic force microscope, and a method of analyzing a surface of a semiconductor substrate, and a probe tip the method including forming pinning patterns on a semiconductor substrate; forming a neutral pattern layer in spaces between the pinning patterns; and inspecting a surface of a guide layer that includes the pinning patterns and the neutral pattern layer by using an atomic force microscope (AFM).
    Type: Application
    Filed: January 25, 2017
    Publication date: July 27, 2017
    Applicant: Korea Advanced Institute of Science and Technology
    Inventors: Kyeong-mi LEE, Jeong-ju PARK, Shi-yong YI, Eun-sung KIM, Seung-chul KWON, Sang-ouk KIM, Young-joo CHOI