Abstract: The present invention provides an array substrate, a display panel and a display device, which can be used for solving the problem of an existing array substrate that ESD occurs between a data line and a repair line to cause short-circuiting of the data line and the repair line so as to pull down the voltage of the data line. The array substrate includes a plurality of main signal lines, at least one main repair line arranged to be crossed with and insulated from the main signal lines at the peripheral area of the array substrate, and a redundant repair line, and the redundant repair line is arranged to be insulated from the main repair line; wherein the redundant repair line includes at least one redundant repair part, and the resistance of each redundant repair part is smaller than the resistance of each main repair line.

Abstract: The present disclosure provides an array substrate and a method of manufacturing the same, and a display device comprising the array substrate. The array substrate comprises: a substrate; gate lines and data lines arranged to intersect one another on the substrate; a gate line connection conducting wire layer provided between the gate lines and the substrate and below the gate lines; and /or, a data line connection conducting wire layer provided in regions of the array substrate corresponding to the data lines; wherein the gate line connection conducting wire layer is electrically isolated from the data line connection conducting wire layer.

Abstract: A housing (100, 300, 600, 700) for storing and protecting items comprises a photoreactive material (106) that selectively and irreversibly changes colors upon exposure to activating radiation (124, 324); and an ultraviolet attenuation coating (102, 702) disposed over the photoreactive material (106). Radiation (124, 324) is selectively applied to the photoreactive material (106) to irreversibly change the color of the photoreactive material (106) and therefore the housing (100, 300, 600, 700). An optional patterned layer (332) may be disposed between the photoreactive material (106) and the selective application of radiation (124, 324), and a background color (108) may be included, to affect the visual presentation of the housing (100, 300, 600, 700).

Abstract: An apparatus and method are provided for forming one dimensional nanostructures. The method comprises ink jet printing (52) a plurality of catalyst particles (36) on a substrate (32). A gas (20) is applied (54) to the catalyst particles (36) while simultaneously applying (56) microwave radiation (38).

Abstract: A housing (100, 300, 600, 700) for storing and protecting items comprises a photoreactive material (106) that selectively and irreversibly changes colors upon exposure to activating radiation (124, 324); and an ultraviolet attenuation coating (102, 702) disposed over the photoreactive material (106). Radiation (124, 324) is selectively applied to the photoreactive material (106) to irreversibly change the color of the photoreactive material (106) and therefore the housing (100, 300, 600, 700). An optional patterned layer (332) may be disposed between the photoreactive material (106) and the selective application of radiation (124, 324), and a background color (108) may be included, to affect the visual presentation of the housing (100, 300, 600, 700).

Abstract: A method of fabricating a nanotube structure which includes providing a substrate, providing a mask region positioned on the substrate, patterning and etching through the mask region to form at least one trench, depositing a conductive material layer within the at least one trench, depositing a solvent based nanoparticle catalyst onto the conductive material layer within the at least one trench, removing the mask region and subsequent layers grown thereon using a lift-off process, and forming at least one nanotube electrically connected to the conductive material layer using chemical vapor deposition with a methane precursor.

Abstract: A method of fabricating a nanotube structure which includes providing a substrate, providing a mask region positioned on the substrate, patterning and etching through the mask region to form at least one trench, depositing a conductive material layer within the at least one trench, depositing a solvent based nanoparticle catalyst onto the conductive material layer within the at least one trench, removing the mask region and subsequent layers grown thereon using a lift-off process, and forming at least one nanotube electrically connected to the conductive material layer using chemical vapor deposition with a methane precursor.

Abstract: A method of fabricating a nanotube structure which includes providing a substrate, depositing a supporting layer and an active catalyst film layer onto the substrate, and forming at least one nanotube on the surface of the substrate using a reaction chamber having a growth temperature of less than 850° C.

Abstract: A method of fabricating a nanotube structure which includes providing a substrate, providing a mask region positioned on the substrate, patterning and etching through the mask region to form at least one trench, depositing a conductive material layer within the at least one trench, depositing a solvent based nanoparticle catalyst onto the conductive material layer within the at least one trench, removing the mask region and subsequent layers grown thereon using a lift-off process, and forming at least one nanotube electrically connected to the conductive material layer using chemical vapor deposition with a methane precursor.

Abstract: A method of fabricating a nanotube structure which includes providing a substrate, providing a mask region positioned on the substrate, patterning and etching through the mask region to form at least one trench, depositing a conductive material layer within the at least one trench, depositing a solvent based nanoparticle catalyst onto the conductive material layer within the at least one trench, removing the mask region and subsequent layers grown thereon using a lift-off process, and forming at least one nanotube electrically connected to the conductive material layer using chemical vapor deposition with a methane precursor.

Abstract: A wavefront sensor is provided to determine characteristics of an incoming distorted energy beam. The sensor includes a plurality of multi-lens array and a beam detector, such as a CCD camera. The multi-lens array focuses the energy beam to a multiple focal spots forming a diffraction pattern on the CCD camera. The invention teaches a method to eliminate or substantially reduce a cross talk or interference in measuring the intensity of the focal spots. The beam detector or CCD detects the resulted focal spots and determines the characteristics of the incoming energy beam. The method and wavefront sensor according to this invention can be used in combination with an exposure apparatus in a semiconductor wafer manufacturing process.

Abstract: A wavefront sensor is provided to determine characteristics of an incoming distorted energy beam, such as a tilt angle and/or a degree of focus. The sensor includes a multi-lens array, a screen, and a beam detector. The multi-lens array focuses the energy beam to a multiple focal points. The screen, positioned adjacent to the multi-lens array, has at least one aperture to allow a portion of the energy beam to pass, while blocking the remainder of the energy beam from arriving at the multi-lens array. Each aperture is aligned with a lens of the multi-lens array. The beam detector detects the resulted focal point(s) of the energy beam passing through the corresponding aperture(s) and determines the characteristics of the passing energy beam. The screen may include a central aperture to measure a local tilt angle of a segment of incoming wavefront entering a lens of the lens array.