Abstract: A housing (100, 300, 600, 700) for storing and protecting items comprises a photoreactive material (106) that selectively and irreversibly changes colors upon exposure to activating radiation (124, 324); and an ultraviolet attenuation coating (102, 702) disposed over the photoreactive material (106). Radiation (124, 324) is selectively applied to the photoreactive material (106) to irreversibly change the color of the photoreactive material (106) and therefore the housing (100, 300, 600, 700). An optional patterned layer (332) may be disposed between the photoreactive material (106) and the selective application of radiation (124, 324), and a background color (108) may be included, to affect the visual presentation of the housing (100, 300, 600, 700).

Abstract: A method of fabricating a nanotube structure which includes providing a substrate, providing a mask region positioned on the substrate, patterning and etching through the mask region to form at least one trench, depositing a conductive material layer within the at least one trench, depositing a solvent based nanoparticle catalyst onto the conductive material layer within the at least one trench, removing the mask region and subsequent layers grown thereon using a lift-off process, and forming at least one nanotube electrically connected to the conductive material layer using chemical vapor deposition with a methane precursor.

Abstract: A method of fabricating a nanotube structure which includes providing a substrate, providing a mask region positioned on the substrate, patterning and etching through the mask region to form at least one trench, depositing a conductive material layer within the at least one trench, depositing a solvent based nanoparticle catalyst onto the conductive material layer within the at least one trench, removing the mask region and subsequent layers grown thereon using a lift-off process, and forming at least one nanotube electrically connected to the conductive material layer using chemical vapor deposition with a methane precursor.

Abstract: A method of fabricating a nanotube structure which includes providing a substrate, depositing a supporting layer and an active catalyst film layer onto the substrate, and forming at least one nanotube on the surface of the substrate using a reaction chamber having a growth temperature of less than 850° C.

Abstract: A method of fabricating a nanotube structure which includes providing a substrate, providing a mask region positioned on the substrate, patterning and etching through the mask region to form at least one trench, depositing a conductive material layer within the at least one trench, depositing a solvent based nanoparticle catalyst onto the conductive material layer within the at least one trench, removing the mask region and subsequent layers grown thereon using a lift-off process, and forming at least one nanotube electrically connected to the conductive material layer using chemical vapor deposition with a methane precursor.

Abstract: A method of fabricating a nanotube structure which includes providing a substrate, providing a mask region positioned on the substrate, patterning and etching through the mask region to form at least one trench, depositing a conductive material layer within the at least one trench, depositing a solvent based nanoparticle catalyst onto the conductive material layer within the at least one trench, removing the mask region and subsequent layers grown thereon using a lift-off process, and forming at least one nanotube electrically connected to the conductive material layer using chemical vapor deposition with a methane precursor.

Abstract: A wavefront sensor is provided to determine characteristics of an incoming distorted energy beam. The sensor includes a plurality of multi-lens array and a beam detector, such as a CCD camera. The multi-lens array focuses the energy beam to a multiple focal spots forming a diffraction pattern on the CCD camera. The invention teaches a method to eliminate or substantially reduce a cross talk or interference in measuring the intensity of the focal spots. The beam detector or CCD detects the resulted focal spots and determines the characteristics of the incoming energy beam. The method and wavefront sensor according to this invention can be used in combination with an exposure apparatus in a semiconductor wafer manufacturing process.

Abstract: A wavefront sensor is provided to determine characteristics of an incoming distorted energy beam, such as a tilt angle and/or a degree of focus. The sensor includes a multi-lens array, a screen, and a beam detector. The multi-lens array focuses the energy beam to a multiple focal points. The screen, positioned adjacent to the multi-lens array, has at least one aperture to allow a portion of the energy beam to pass, while blocking the remainder of the energy beam from arriving at the multi-lens array. Each aperture is aligned with a lens of the multi-lens array. The beam detector detects the resulted focal point(s) of the energy beam passing through the corresponding aperture(s) and determines the characteristics of the passing energy beam. The screen may include a central aperture to measure a local tilt angle of a segment of incoming wavefront entering a lens of the lens array.