Abstract: A chip package structure is provided. The chip package structure includes a substrate. The chip package structure includes a buffer structure penetrating into the substrate. A first Young's modulus of the buffer structure is less than a second Young's modulus of the substrate. The chip package structure includes a first wiring structure over the buffer structure and the substrate. The first wiring structure includes a first dielectric structure and a first wiring layer in the first dielectric structure. The chip package structure includes a chip package bonded to the first wiring structure. The chip package has an interposer substrate and a chip structure over the interposer substrate, and a first corner of the interposer substrate and a second corner of the chip structure overlap the buffer structure in a top view of the chip package and the buffer structure.

Abstract: An optical module includes a housing, a circuit board assembly, an optical assembly, and an optical receptacle. The housing includes first and second housings and an optical fiber adapter. The circuit board assembly includes a rigid circuit board. The optical assembly is fixed on the first housing and includes an optical processing assembly and photoelectric chips. The optical processing assembly includes a wavelength division multiplexer, a lens group located between the wavelength division multiplexer and the photoelectric ship, and a lens group located between the wavelength division multiplexer and the optical receptacle. The photoelectric chips are close to the rigid circuit board and are electrically connected to the rigid circuit board. The optical fiber adapter is arranged at an optical interface of the housing and is integrally formed with the optical interface.

Abstract: A gated ferroelectric memory cell includes a dielectric material layer disposed over a substrate, a metallic bottom electrode, a ferroelectric dielectric layer contacting a top surface of the bottom electrode, a pillar semiconductor channel overlying the ferroelectric dielectric layer and capacitively coupled to the metallic bottom electrode through the ferroelectric dielectric layer, a gate dielectric layer including a horizontal gate dielectric portion overlying the ferroelectric dielectric layer and a tubular gate dielectric portion laterally surrounding the pillar semiconductor channel, a gate electrode strip overlying the horizontal gate dielectric portion and laterally surrounding the tubular gate dielectric portion and a metallic top electrode contacting a top surface of the pillar semiconductor channel.

Abstract: A light-emitting device includes: a substrate having a top surface, wherein the top surface comprises a first portion and a second portion; a first semiconductor stack on the first portion, comprising a first upper surface and a first side wall; and a second semiconductor stack on the first upper surface, comprising a second upper surface and a second side wall, and wherein the second side wall connects the first upper surface; wherein the first semiconductor stack comprises a dislocation stop layer; wherein the dislocation stop layer comprises AlGaN; and wherein the first side wall and the second portion of the top surface form an acute angle ? between thereof.

Abstract: The present disclosure, in some embodiments, relates to a memory device. In some embodiments, the memory device has a substrate and a lower interconnect metal line disposed over the substrate. The memory device also has a selector channel disposed over the lower interconnect metal line and a selector gate electrode wrapping around a sidewall of the selector channel and separating from the selector channel by a selector gate dielectric. The memory device also has a memory cell disposed over and electrically connected to the selector channel and an upper interconnect metal line disposed over the memory cell. By placing the selector within the back-end interconnect structure, front-end space is saved, and more integration flexibility is provided.

Abstract: An image recognition method includes the steps of: receiving a captured image; acquiring a focusing zone image from a portion of the captured image; processing the captured image and/or the focusing zone image and then making the two images into a batch of image information; and executing an image analysis procedure on the batch of image information to generate an analysis result.

Abstract: A memory array device includes a stack of transistors over a semiconductor substrate, a first transistor of the stack being disposed over a second transistor of the stack. The first transistor includes a first memory film along a first word line and a first channel region along a source line and a bit line, the first memory film being disposed between the first channel region and the first word line. The second transistor includes a second memory film along a second word line and a second channel region along the source line and the bit line, the second memory film being disposed between the second channel region and the second word line. The memory array device includes a first via electrically connected to the first word line and a second via electrically connected to the second word line, the second staircase via and the first staircase via having different widths.

Abstract: An image processing circuit performs super-resolution (SR) operations. The image processing circuit includes memory to store multiple parameter sets of multiple artificial intelligence (AI) models. The image processing circuit further includes an image guidance module, a parameter decision module, and an SR engine. The image guidance module operates to detect a representative feature in an image sequence including a current frame and past frames within a time window. The parameter decision module operates to adjust parameters of one or more AI models based on a measurement of the representative feature. The SR engine operates to process the current frame using the one or more AI models with the adjusted parameters to thereby generate a high-resolution image for display.

Abstract: A memory device includes a first stacking structure, a second stacking structure, a plurality of first isolation structures, gate dielectric layers, channel layers and channel layers. The first stacking structure includes a plurality of first gate layers, and a second stacking structure includes a plurality of second gate layers, where the first stacking structure and the second stacking structure are located on a substrate and separated from each other through a trench. The first isolation structures are located in the trench, where a plurality of cell regions are respectively confined between two adjacent first isolation structures of the first isolation structures in the trench, where the first isolation structures each includes a first main layer and a first liner surrounding the first main layer, where the first liner separates the first main layer from the first stacking structure and the second stacking structure.

Abstract: A method of forming a ferroelectric random access memory (FeRAM) device includes: forming a first layer stack and a second layer stack successively over a substrate, where the first layer stack and the second layer stack have a same layered structure that includes a layer of a first electrically conductive material over a layer of a first dielectric material, where the first layer stack extends beyond lateral extents of the second layer stack; forming a trench that extends through the first layer stack and the second layer stack; lining sidewalls and a bottom of the trench with a ferroelectric material; conformally forming a channel material in the trench over the ferroelectric material; filling the trench with a second dielectric material; forming a first opening and a second opening in the second dielectric material; and filling the first opening and the second opening with a second electrically conductive material.

Abstract: A memory device includes a first stacking structure, a second stacking structure, a plurality of first isolation structures, gate dielectric layers, channel layers and conductive pillars. The first stacking structure includes a plurality of first gate layers, and a second stacking structure includes a plurality of second gate layers, where the first stacking structure and the second stacking structure are located on a substrate and separated from each other through a trench. The first isolation structures are located in the trench, where a plurality of cell regions are respectively confined between two adjacent first isolation structures of the first isolation structures in the trench, where the first isolation structures each includes a first main layer and a first liner surrounding the first main layer, where the first liner separates the first main layer from the first stacking structure and the second stacking structure.

Abstract: 3D memory arrays including dummy conductive lines and methods of forming the same are disclosed. In an embodiment, a memory array includes a ferroelectric (FE) material over a semiconductor substrate, the FE material including vertical sidewalls in contact with a word line; an oxide semiconductor (OS) layer over the FE material, the OS layer contacting a source line and a bit line, the FE material being between the OS layer and the word line; a transistor including a portion of the FE material, a portion of the word line, a portion of the OS layer, a portion of the source line, and a portion of the bit line; and a first dummy word line between the transistor and the semiconductor substrate, the FE material further including first tapered sidewalls in contact with the first dummy word line.

Abstract: The present disclosure, in some embodiments, relates to a method of forming an integrated chip. The method includes forming a test line letter structure having one or more sidewalls continuously extending along a path that defines a shape of an alpha-numeric character from a top-view. The test line letter structure is formed by forming a first polysilicon structure over a substrate and forming a second polysilicon structure over the substrate at a location laterally separated from first polysilicon structure by a dielectric layer.

Abstract: A memory device comprises a memory array with I/O path and security circuitry coupled to the I/O path of the memory array. The memory device comprises control circuitry, responsive to configuration data, to invoke the security circuitry. The memory device comprises a configuration store, storing the configuration data accessible by the control circuitry to specify location and size of a security memory region in the memory array. Responsive to an external command and the configuration data, the control circuitry can be configured to invoke the security circuitry on an operation specified in the external command in response to accesses into the security memory region, or to not invoke the security circuitry in response to accesses to outside the security memory region.

Abstract: A method for in-line measurement of the quality of a microarray are disclosed and the method includes the following steps. A solid substrate is provided, and the solid substrate includes a plurality of areas in an array. At least one biomarker is in-situ synthesized on at least one of the plurality of areas by a plurality of synthesis steps. After performing at least one of the plurality of synthesis step, a check step is immediately performed on a semi-product of the at least one biomarker by an atomic force microscope to obtain an in-line measurement result. The quality of the semi-product of the at least one biomarker is determined based on the in-line measurement result.

Abstract: A memory device comprises a memory array with I/O path and security circuitry coupled to the I/O path of the memory array. The memory device comprises control circuitry, responsive to configuration data, to invoke the security circuitry. The memory device comprises a configuration store, storing the configuration data accessible by the control circuitry to specify location and size of a security memory region in the memory array. Responsive to an external command and the configuration data, the control circuitry can be configured to invoke the security circuitry on an operation specified in the external command in response to accesses into the security memory region, or to not invoke the security circuitry in response to accesses to outside the security memory region.

Abstract: A security memory device coupled to a host includes: a normal region for storing normal data; a security region for storing security data; and a memory controller, coupled to the normal region and to the security region. In response to a first command which is issued from the host and indicates the security memory device to enter a security field, the memory controller allows the host to access the security region. In the security field, the memory controller performs at least one security command set on the security region. In response to a second command which is issued from the host and indicates the security memory device to exit the security field, the memory controller prohibits the host from accessing the security region.

Abstract: An electronic device includes a processor coupled to a memory device, through a data bus to receive and transmit bits on the data bus. The processor is configured to transmit a message including a first bit indicative of controlling the data bus, address bits indicative of an address identifying the memory device, and a second bit indicative of whether the processor intends to read data from or write data to the memory device; and transmit a third bit indicative of a mode of operation of the memory device.

Abstract: The present disclosure, in some embodiments, relates to a method of forming an integrated chip. The method includes forming a test line letter structure having one or more sidewalls continuously extending along a path that defines a shape of an alpha-numeric character from a top-view. The test line letter structure is formed by forming a first polysilicon structure over a substrate and forming a second polysilicon structure over the substrate at a location laterally separated from first polysilicon structure by a dielectric layer.

Abstract: The present disclosure relates to a substrate having test line letters that are used to identify a test line on an integrated chip, while avoiding contamination of high-k metal gate processes, and a method of formation. In some embodiments, the substrate has a semiconductor substrate. A test line letter structure is arranged over the semiconductor substrate and has one or more trenches vertically extending between an upper surface of the test letter structure and a lower surface of the test line letter structure. The one or more trenches are arranged within the test line letter structure to form an opening in the upper surface of the test line structure that has a shape of an alpha-numeric character.