Abstract: A cholesteric liquid crystal display device is disclosed. The cholesteric liquid crystal display device includes a substrate, a light absorbing layer, and a cholesteric liquid crystal layer. The cholesteric liquid crystal layer includes plural rows of left-handed cholesteric liquid crystals and plural rows of right-handed cholesteric liquid crystals which are arranged alternately. The left-handed cholesteric liquid crystals and the right-handed cholesteric liquid crystals respectively reflect left-handed light and right-handed light in the cholesteric liquid crystal display device of the present invention, whereby both eyes of an observer can see different images and thus a 3D effect is formed.

Abstract: A method for driving a cholesteric liquid crystal display device is disclosed. The cholesteric liquid crystal display device includes a plurality of pixels. The method includes steps below. In a first duration, a first square wave is provided for the pixels. The first square wave has an amplitude of a first value. In a second duration, a second square wave is provided for each one of the pixels according to a required gray level of each one of the pixels. The second square wave has an amplitude of a second value. The second value is different from the first value. The first square wave and the second square wave are continuously provided. The method for driving the cholesteric liquid crystal display device according to the present invention is capable of displaying a motion picture and decreasing driving voltages.

Abstract: A light emitting diode and a fabricating method thereof are provided. The method including the steps of sequentially forming a first-type semiconductor layer, a light emitting layer and a second-type semiconductor layer with a first region and a second region on a substrate. Next, an ion implantation process is performed to make the resistance of the first region be larger than of the second region. Afterward, a first electrode is formed above the first region of the second-type semiconductor layer. Since the method uses the ion implantation process to make the inner resistance of the second-type semiconductor layer various, the light emitting intensity and efficiency may both be increased.

Abstract: An ambit light sensor with a function of IR sensing and a method of fabricating the same are provided. The ambit light sensor includes a substrate, an ambit light sensing structure, an infrared ray (IR) sensing structure, and a dielectric layer. The ambit light sensing structure is located over the substrate for sensing and filtering visible light. The IR sensing structure is located in the substrate under the ambit light sensing structure for sensing IR. The dielectric layer is located between the ambit light sensing structure and the IR sensing structure.

Abstract: A method of fabricating a color filter is provided. First, a substrate having a light shielding layer formed thereon is provided, wherein the light shielding layer is adopted for defining a plurality of sub-pixel regions on the substrate. Next, a hydrophobic layer is formed on the light shielding layer by stencil printing, or a surface silylation treatment is carried out to clean the light shielding layer by inkjet printing. Next, a color filter layer is formed in the sub-pixel regions. Thus, fabrication method of the present invention is capable of reducing the possibility of intermixing the color ink between adjacent sub-pixel regions.

Abstract: A method of an anti-glare surface treatment including following steps is provided. First, a resin layer is formed on a substrate. Next, the substrate is placed in a chamber that is filled with a water steam. A number of micro cavities are formed on a surface of the resin layer on the substrate by means of collision of the water steam. The resin layer on the substrate is then cured. The above-mentioned method of the anti-glare surface treatment is easy in process, low in cost and good in quality control.

Abstract: A method of fabricating a color filter is provided. First, a substrate having a light shielding layer formed thereon is provided, wherein the light shielding layer is adopted for defining a plurality of sub-pixel regions on the substrate. Next, a hydrophobic layer is formed on the light shielding layer by stencil printing, or a surface silylation treatment is carried out to clean the light shielding layer by inkjet printing. Next, a color filter layer is formed in the sub-pixel regions. Thus, fabrication method of the present invention is capable of reducing the possibility of intermixing the color ink between adjacent sub-pixel regions.

Abstract: A method of fabricating a color filter is provided. First, a substrate having a light shielding layer formed thereon is provided, wherein the light shielding layer is adopted for defining a plurality of sub-pixel regions on the substrate. Next, a hydrophobic layer is formed on the light shielding layer by stencil printing, or a surface silylation treatment is carried out to clean the light shielding layer by inkjet printing. Next, a color filter layer is formed in the sub-pixel regions. Thus, fabrication method of the present invention is capable of reducing the possibility of intermixing the color ink between adjacent sub-pixel regions.

Abstract: A method for fabricating an image sensor structure is provided. The method of fabricating an image sensor structure includes providing a substrate. An image sensor interconnect structure is formed on the substrate. A patterned stop layer is formed on the image sensor interconnect structure. An electrode layer, a first doped amorphous silicon layer and a first undoped amorphous silicon layer are conformably formed on the patterned stop layer and the image sensor interconnect structure not covered by the patterned stop layer in sequence. The first undoped amorphous silicon layer, the first doped amorphous silicon layer and the electrode layer are partially removed until the patterned stop layer is exposed by a planarization process, and each of a remaining electrode layer, a remaining first doped amorphous silicon layer and a remaining first undoped amorphous silicon layer are separated by the patterned stop layer.

Abstract: A method of repeatedly using a control wafer to monitor treatments is described. The method includes (a) forming a patterned mask layer with at least one opening therein on a control wafer, wherein the opening is located at a position of the control wafer; (b) performing a treatment to the control wafer through the opening; (c) performing a measurement at the position of the control wafer; (d) removing the patterned mask layer; and (e) repeating steps (a) to (d) for multiple cycles, wherein the opening is formed at a different position in each cycle.

Abstract: A bonding structure of panel and back-plate is made by coarsening the surface of the rear plane of silicon die, and then the LCoS panel may bond with the back-plate module more tightly. The coarse structure increases contact surface when bonding the back-plate module with the LCoS panel, as a result of increasing stickiness on both and reducing manufacturing process defects caused by position shifting between the back-plate module and LCoS panel, and solving the position problem before the bonding of the LCoS panel with the back-plate module.

Abstract: A method of fabricating a liquid crystal display panel is provided. The method includes the following steps. First, a first substrate and a second substrate are provided, and an alignment film is respectively formed on the first and second substrate. Then, a sealant and a liquid crystal layer are formed between the first substrate and the second substrate, and the liquid crystal layer disposed between the first and second substrates is enclosed by the sealant. Wherein, the total ion concentration of the sealant is lower than 30 ppm with the concentration of Na+ lower than 10 ppm, the concentration of K+ lower than 5 ppm, the concentration of Mg+2 lower than 5 ppm and the concentration of Ca+2 lower than 5 ppm. Furthermore, a liquid crystal display panel and the sealant of a liquid crystal display panel are provided.

Abstract: A method of fabricating a color filter is provided. First, a substrate having a light shielding layer formed thereon is provided, wherein the light shielding layer is adopted for defining a plurality of sub-pixel regions on the substrate. Next, a hydrophobic layer is formed on the light shielding layer by stencil printing, or a surface silylation treatment is carried out to clean the light shielding layer by inkjet printing. Next, a color filter layer is formed in the sub-pixel regions. Thus, fabrication method of the present invention is capable of reducing the possibility of intermixing the color ink between adjacent sub-pixel regions.

Abstract: A mouse for receiving in the portable computer is provided. The mouse includes a main body and a button portion. The body has a first side and a second side. The first side can be installed in a plugging slot of the portable computer. The button portion is electrically connected to the main body.

Abstract: Earphones are provided. An earphone includes a first speaker, a second speaker, and an extendable winding structure. The first speaker can hang on one ear of a person. The second speaker is detachably fixed on the first speaker. The extendable winding structure is disposed in the first speaker and connected with the second speaker. The second speaker can be moved to the other ear of the person by extending the extendable winding structure.