Patents by Inventor Yu-Wei Liu

Yu-Wei Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080003527
    Abstract: The wiring line structure comprises a transparent substrate, a barrier layer, a metal layer, and a photosensitive protecting layer. The barrier layer and a metal layer are successively disposed on the transparent substrate. The photosensitive protecting layer is formed on the barrier layer and both sides of the metal layer. A method for fabricating the wiring line structure is also disclosed.
    Type: Application
    Filed: September 10, 2007
    Publication date: January 3, 2008
    Applicant: AU OPTRONICS CORP.
    Inventors: Tzeng-Guang Tsai, Kuo-Yu Huang, Hui-Fen Lin, Yu-Wei Liu
  • Publication number: 20070262312
    Abstract: A thin film transistor array substrate structure. The array substrate structure includes a thin film transistor array substrate, an organic material layer formed thereon, and a plurality of black matrices and color filter patterns disposed on the organic material layer. The invention also provides a method of fabricating the thin film transistor array substrate.
    Type: Application
    Filed: July 31, 2006
    Publication date: November 15, 2007
    Applicant: AU OPTRONICS CORP.
    Inventors: Yu-Wei Liu, Feng-Yuan Gan, Shu-Chin Lee, Yen-Heng Huang
  • Publication number: 20070148563
    Abstract: A color filter and a method for fabricating the same. At least one conductive film is provided above a light shielding layer between R/G/B color filter units. The conductive film is electrically connected to an electrode layer, thereby reducing the resistance thereof.
    Type: Application
    Filed: June 26, 2006
    Publication date: June 28, 2007
    Applicant: AU OPTRONICS CORP.
    Inventors: Yen-Heng Huang, Yu-Wei Liu, Yu-Hsin Ting, Kuo-Yu Huang
  • Publication number: 20070098488
    Abstract: A first end of an elongated hole of a first element is coupled with a second element, and then the first element is moved via the elongated hole so that a second end of the elongated hole can be positioned at the second element. Finally, the material protruding through the elongated hole is melted to bond the second element and the first element at the second end of the elongated hole.
    Type: Application
    Filed: December 15, 2005
    Publication date: May 3, 2007
    Inventor: Yu-Wei Liu
  • Publication number: 20060246713
    Abstract: The wiring line structure comprises a transparent substrate, a barrier layer, a metal layer, and a photosensitive protecting layer. The barrier layer and a metal layer are successively disposed on the transparent substrate. The photosensitive protecting layer is formed on the barrier layer and both sides of the metal layer. A method for fabricating the wiring line structure is also disclosed.
    Type: Application
    Filed: August 18, 2005
    Publication date: November 2, 2006
    Inventors: Tzeng-Guang Tsai, Kuo-Yu Huang, Hui-Fen Lin, Yu-Wei Liu
  • Publication number: 20060141686
    Abstract: A copper gate electrode, applied in a thin-film-transistor liquid crystal display (TFT-LCD) device, at least comprises an adhesive layer formed on a glass substrate, and a patterned copper layer formed on the adhesive layer. The adhesive layer at least comprises one of nitrogen and phosphorus (for example, polysilazane) for enhancing the electric characteristics of the LCD device.
    Type: Application
    Filed: July 12, 2005
    Publication date: June 29, 2006
    Applicant: AU OPTRONICS CORP.
    Inventors: Yu-Wei Liu, Wen-Ching Tsai, Kou-Yu Huang, Hui-Fen Lin
  • Publication number: 20060138659
    Abstract: A copper gate electrode, applied in a thin-film-transistor liquid crystal display (LCD) device, at least comprises a patterned copper layer formed on a glass substrate, and a barrier layer formed on the patterned copper layer. The barrier layer comprises at least one of nitrogen and phosphorus, or comprises an alloy formularized as M1M2R wherein M1 is cobalt (Co) or molybdenum (Mo), M2 is tungsten (W), molybdenum (Mo), rhenium (Re) or vanadium (V), and R is boron (B) or phosphorus (P).
    Type: Application
    Filed: July 12, 2005
    Publication date: June 29, 2006
    Applicant: AU OPTRONICS CORP.
    Inventors: Yu-Wei Liu, Wen-Ching Tsai, Kuo-Yu Huang, Hui-Fen Lin