Abstract: A front light module configured to be disposed on a display panel to illuminate the display panel is provided. The front light module includes a light source and a light guide plate. The light guide plate has a first surface facing away from the display panel, a second surface facing the display panel, and a light incident surface facing the light source. The light incident surface connects the first surface and the second surface. The first surface has multiple sets of optical micro-structures. Each of the sets of the optical micro-structures includes multiple optical micro-structures disposed or distributed asymmetrically.

Abstract: A two-electrode continuous plasma processing system includes a processing chamber having a clamping device, a moving device, a first and a second electrodes, and a first and a second radio frequency power sources. When an object moves into a processing space of the processing chamber, the moving device controls the second electrode to drive the object to move toward the first electrode, and actuates the second electrode and the clamping device to clamp and fix the object. The first radio frequency power source provides the first electrode with a first radio frequency energy to control the density of plasma. The second radio frequency power source provides the second electrode with a second radio frequency energy to control the ion energy of the plasma. Therefore, the plasma is efficiently stabilized, lowering the probability of object damage.

Abstract: A continuous plasma processing system with adjustable electrode includes a frame shape carrier plate for holding a to-be-processed object, a loading chamber for inputting the to-be-processed object, a processing chamber, and an unloading chamber for outputting the finished object. The processing chamber has a first electrode, a second electrode, and a moving device controlling the second electrode to move between an electrically disconnected position and an electrically conducted position. When the second electrode is away from the first electrode and does not contact the to-be-processed object, the second electrode is at the electrically disconnected position. When the second electrode moves toward the first electrode to push the to-be-processed object to leave the frame shape carrier plate, the second electrode is at the electrically conducted position. The plasma electric field is prevented from being affected by particles on the carrier plate.

Abstract: A light module includes a light guide plate, a first light source and a second light source. The light guide plate has an inner light emitting surface, an outer light emitting surface opposite to the inner light emitting surface, and a light incident surface connecting the inner light emitting surface and the outer light emitting surface. The first light source is disposed on the light incident surface and located between the inner light emitting surface and the outer light emitting surface, and the first light source emits light of a first color temperature. The second light source is disposed on the light incident surface and located between the first light source and the inner light emitting surface, and the second light source emits light of a second color temperature, and the difference between the first color temperature and the second color temperature is greater than 2000K.

Abstract: A three-dimensional reflective display device includes a reflective display panel, a lens array disposed on the reflective display panel, and a front light module disposed on the lens array. The reflective display panel includes pixel structures, and each pixel structure includes a left-eye pixel and a right-eye pixel. The lens array includes lenticular lenses extending in a first direction and arranged in a second direction perpendicular to the first direction. The lenticular lenses are respectively corresponding to the pixel structures. The front light module includes two front light components. The two front light components both include a light guide plate and a light source disposed on a light incident surface of the light guide plate, where the light incident surfaces face to each other in the second direction.

Abstract: A continuous processing mechanism for dual effect plasma etching used for performing a plasma etching process on a substrate includes a high-speed etching vacuum chamber and a low-speed etching vacuum chamber. The high-speed etching vacuum chamber includes a first radio frequency plasma module to carry out a high-speed plasma etching on the substrate. The low-speed etching vacuum chamber includes a first buffer area, a linear plasma area, and a second buffer area that are in communication with each other. The linear plasma area has a first linear plasma module. The substrate moves between the first buffer area, the linear plasma area, and the second buffer area, allowing the first linear plasma module to carry out a low-speed plasma etching thereon. Therefore, the present invention fulfills the requirements of the etching efficiency of the continuous processing mechanism and the fineness of the substrate surface.

Abstract: The invention provides a method for coating top anti-reflective coating (TARC), which comprises the following steps: providing a turntable, placing a substrate above the turntable with a photoresist layer on the substrate, spraying deionized water on the photoresist layer, spraying a top anti-reflective coating liquid on the deionized water to mix the top anti-reflective coating liquid with the deionized water to form a mixed liquid, and performing a spin coating step to spin-coat and disperse the mixed liquid to form a top anti-reflective coating film on the photoresist layer.

Abstract: A reticle thermal expansion calibration method includes exposing a group of wafers and generating a sub-recipe, performing data mining and data parsing to generate a plurality of overlay parameters, extracting a plurality of predetermined parameters from the plurality of overlay parameters, performing a linear regression on each of the predetermined parameters, and generating a coefficient of determination for each of the predetermined parameters.

Abstract: A lithography film stack applied to an immersion lithography process includes a photoresist, a wavelength adjusting layer and a top coating layer. The photoresist is disposed on a substrate. The wavelength adjusting layer is disposed on the photoresist. The top coating layer is disposed on the wavelength adjusting layer. A refractive index of the wavelength adjusting layer is greater than a refractive index of the top coating layer and a refractive index of an immersion fluid of the immersion lithography process.

Abstract: A display device includes a reflective display panel, a light guide plate, a light source, and a first optical adhesive layer. The light guide plate is located on the reflective display device. The light guide plate has a top surface, a bottom surface and a light incident surface connecting the top surface and the bottom surface. The light guide plate further includes multiple microstructures located on the top surface and multiple lenticular structures located on the bottom surface. The light source faces the light incident surface of the light guide plate. The first optical adhesive layer is located below the light guide plate and in contact with the lenticular structure. A refractive index of the first optical adhesive layer is lower than a refractive index of the light guide plate.

Abstract: A product and methodology is contemplated for monitoring a multivariate process. The product has a computer readable storage medium with program instructions embodied therewith. The program instructions are executable by a computer processor to cause the device to: segment data obtained from the multivariate process into a time series of snapshot intervals, each snapshot interval further segmented into a predetermined plurality of zone intervals; compute a contrastive metric from the segmented data for each variable during each zone interval; compare the computed contrastive metrics to one or more predetermined threshold values to define representationally relevant zone intervals for each variable; apply representation learning to derive zone-based feature vectors for each variable during the corresponding relevant zone intervals; and concatenate the zone-based feature vectors into a representation vector for the multivariate process during the time series of snapshots.

Abstract: Disclosed are non-transitory computer-readable media, systems, and computer-implemented methods that describe obtaining hot spot (HS) location information with respect to a printed pattern; obtaining LFP search criteria for searching the printed pattern to determine a local focus point (LFP) for an imaging device; selecting a HS area in the printed pattern that contains a HS; and determining the LFP proximate to the HS area based on the LFP search criteria, the LFP not containing the HS.

Abstract: A reticle thermal expansion calibration method includes exposing a first group of wafers and generating a first sub-recipe, performing data mining and data parsing to generate a plurality of overlay parameters, performing a linear regression on each of the overlay parameters, and generating a first coefficient of determination for each of the overlay parameters.

Abstract: The present application discloses a method, an apparatus, and a device for testing a traffic flow monitoring system, which relates to intelligent traffic, vehicle-road collaboration, and cloud platform technologies in a field of data processing. The specific implementation is: obtaining real obstacle data collected in a real traffic scene; generating simulated obstacle data according to the real obstacle data, where the simulated obstacle data is used to simulate an obstacle in the real traffic scene and a movement state of the obstacle; and sending the simulated obstacle data to a first traffic flow monitoring system to be tested to test the first traffic flow monitoring system.

Abstract: The invention provides a photoresist coating method, which comprises the following steps: providing a wafer with a pattern on the wafer, placing the wafer on a spinner, injecting a photoresist on a central region of the wafer from a nozzle, and carrying out a spin coating step, the spin coating step comprises: turning on the spinner to rotate the spinner to a first rotation speed, and raising the first rotation speed to a second rotation speed, and performing a plurality of brakes during the process of maintaining the second rotation speed, so that the second rotation speed instantly drops to a third rotation speed, and then rises to the second rotation speed again.

Abstract: A lithography film stack applied to an immersion lithography process includes a photoresist, a wavelength adjusting layer and a top coating layer. The photoresist is disposed on a substrate. The wavelength adjusting layer is disposed on the photoresist. The top coating layer is disposed on the wavelength adjusting layer. A refractive index of the wavelength adjusting layer is greater than a refractive index of the top coating layer and a refractive index of an immersion fluid of the immersion lithography process.

Abstract: A method of detecting wafer defects based on singularly valuable decomposition is provided in the present invention, including steps of input a wafer image, performing a preprocess to the wafer image through histogram equalization to obtain a preprocessed image, performing singularly valuable decomposition to the preprocessed image, performing defect magnification to the decomposed wafer image, reconstruct the magnified wafer image to obtain a defect saliency image, denoising the defect saliency image, and detecting defects in the denoised wafer image.

Abstract: The invention provides a photoresist coating method, which comprises the following steps: providing a wafer with a pattern on the wafer, placing the wafer on a spinner, injecting a photoresist on a central region of the wafer from a nozzle, and carrying out a spin coating step, the spin coating step comprises: turning on the spinner to rotate the spinner to a first rotation speed, and raising the first rotation speed to a second rotation speed, and performing a plurality of brakes during the process of maintaining the second rotation speed, so that the second rotation speed instantly drops to a third rotation speed, and then rises to the second rotation speed again.

Abstract: A cable-gland system provides a sealing function to openings in an electronic chassis that receive cables. The cable-gland system comprises a plurality of individual cable glands. Each of the plurality of individual cable glands includes an exterior end to be positioned adjacent an exterior of the chassis, and an interior end for positioning within the chassis. Each of the plurality of individual cable glands includes a through-hole extending between the exterior and interior ends for receiving one of the cables, and an outer surface between the exterior and interior ends. Each of the plurality of individual cable glands has a male projection on one side of the outer surface and a female recess on an opposing side of the outer surface. The cable glands are connectable to form the cable-gland system by mating the male projection on one cable gland with the female recess of an adjacent cable gland.