Patents by Inventor Yuan-Tung Dai

Yuan-Tung Dai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030063231
    Abstract: A color LCD panel in which a plurality of OLED are formed on the upper surface of the lower panel of the color LCD panel to be the back light source of the color LCD panel is disclosed in the invention. Each individual OLED corresponds to a pixel of the LCD panel in order to be the independent self-emitting light source of the pixel. Each OLED is always on and ready to emit one of the three primary colors, red, green, or blue. Thus, every pixel of the color LCD panel has its independent self-emitting light source. Therefore, the back light module and color filter in conventional color LCD panels are not needed.
    Type: Application
    Filed: September 28, 2001
    Publication date: April 3, 2003
    Inventors: Yuan-Tung Dai, Tsung-Neng Liao
  • Publication number: 20030030371
    Abstract: An organic backlight device for liquid crystal display application is provided. The organic backlight device has organic light emitting layers, which are arranged in such as linear arrangement and controlled by a driving circuit, to emit light at least three different bandwidths by turns, for example, in red, green and blue bandwidths. By emitting light with a high frequency by turns, persistence of color vision is produced to a viewer. A thin and light backlight source with high brightness and uniformity is therefore obtained.
    Type: Application
    Filed: August 13, 2001
    Publication date: February 13, 2003
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Tsung-Neng Liao, Yuan-Tung Dai, Chu-Jung Shih
  • Publication number: 20030030080
    Abstract: A polysilicon thin film transistor with a self-aligned LDD structure has a polysilicon layer formed on a transparent insulating substrate. The polysilicon layer consists of a channel region, an LDD structure on two sides of the channel region, and a source/drain region on two sides of the LDD structure. A gate insulating layer is formed on the polysilicon layer, a first metal layer is patterned on the gate insulating layer to cover the channel region, and a second metal layer is patterned on the first metal layer to cover the channel region.
    Type: Application
    Filed: November 30, 2001
    Publication date: February 13, 2003
    Inventors: Yuan-Tung Dai, Tsung-Neng Liao, Chih-Chiang Chen
  • Publication number: 20020187572
    Abstract: A method for manufacturing thin film transistor panels in order to obviate the lowstability of conventional laser annealing processes, and the resultant low quality of the produced polycrystal silicon thin film. According to the method of the invention, form a transparent insulator on the front surface of a silicon substrate. Form a thin film transistor structure and transparent electrode on the upper surface of the transparent insulator. Bond a transparent substrate onto the front surface of the silicon substrate. After that, remove a portion of the silicon substrate by polishing or etching the back of the silicon substrate to obtained a transparent thin film transistor panel. The transparent electrode can also be formed on the bottom surface of the transparent insulator. Also, the transparent substrate can be bonded onto the back of the silicon substrate. Then reduce the thickness of the silicon substrate to generate a crystal silicon thin film.
    Type: Application
    Filed: August 1, 2001
    Publication date: December 12, 2002
    Inventors: Yuan-Tung Dai, Chi-Shen Lee, Jiun-Jye Chang
  • Patent number: 6475835
    Abstract: A method for forming a thin film transistor (TFT) is disclosed. The invention uses metal electroless plating or chemical displacement processes to form metal clusters adjacent the sidewall of amorphous silicon active region pattern so as to crystallize the amorphous silicon amid the subsequently performed metal induced lateral crystallization (MILC) process. The amorphous silicon is crystallized to form polysilicon having parallel grains. Since the amorphous silicon will crystallize with a specific angle which is measured between the grain orientation and the side wall of the amorphous silicon, a tilt channel connecting the source and drain region of the TFT is utilized to upgrade the electron mobility across the tilt channel, wherein the grain orientation of polysilicon in the tilt channel perpendicular to a gate electrode which is subsequently formed above the tilt channel.
    Type: Grant
    Filed: February 28, 2002
    Date of Patent: November 5, 2002
    Assignee: Industrial Technology Research Institute
    Inventors: Guo-Ren Hu, Ying-Chia Chen, Chi-Wei Chao, Yew-Chung Wu, Yao-Lun Hsu, Yuan-Tung Dai, Wen-Tung Wang
  • Publication number: 20020079834
    Abstract: A full-color LED display includes red, green and blue LED elements. A first substrate is used to form red and green LED elements which are then covered by a first passivation layer. A second substrate is bonded to the passviation layer and polished as a thin substrate layer. A blue LED element is fabricated on the thin substrate layer. The three LED elements are then covered by a second passivation layer to construct a full-color LED device. A full-color, high resolution and high brightness LED display is formed by a plurality of full-color LED devices arranged in rows and columns in a matrix form.
    Type: Application
    Filed: December 26, 2000
    Publication date: June 27, 2002
    Inventors: Yuan-Tung Dai, Yuan-Ching Peng, Chien-Chih Chen