Patents by Inventor Yuchen Deng
Yuchen Deng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240132120Abstract: A power decentralized electric locomotive apparatus includes an electric locomotive and a plurality of muck trucks. The electric locomotive and the plurality of muck trucks are connected in sequence, and a mater drive motor is fixedly mounted on the electric locomotive. A slave drive motor is fixedly mounted on at least one of the muck trucks; a torque of the slave drive motor is smaller than a torque of the mater drive motor; and the slave drive motor cooperates with the mater drive motor, to enable the muck truck to travel on rails and reduce drive power and self-weight of the electric locomotive.Type: ApplicationFiled: November 12, 2021Publication date: April 25, 2024Applicant: China Railway Engineering Services Co., Ltd.Inventors: Yuanshun Zhuang, Yang Deng, Caihong Li, Yuanyuan Mei, Wenju Chen, Longguan Zhang, Kaifu Li, Rui Han, Heng Li, Chuan Li, Jun Zheng, Yang Qian, Tao Du, Xudong Gao, Yuchen Wang, Chuanying Jiang, Jie Li
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Publication number: 20240128050Abstract: A method of automated data acquisition for a transmission electron microscope, the method comprising: obtaining a reference image of a sample at a first magnification; for each of a first plurality of target locations identified in the reference image: steering an electron beam of the transmission electron microscope to the target location, obtaining a calibration image of the sample at a second magnification greater than the first magnification, and using image processing techniques to identify an apparent shift between an expected position of the target location in the calibration image and an observed position of the target location in the calibration image, training a non-linear model using the first plurality of target locations and the corresponding apparent shifts; based on the non-linear model, calculating a calibrated target location for a next target location; steering the electron beam to the calibrated target location and obtaining an image at a third magnification greater than the first magnificaType: ApplicationFiled: September 28, 2023Publication date: April 18, 2024Applicant: FEI CompanyInventors: Yuchen DENG, Holger KOHR, Bart VAN KNIPPENBERG, Peter TIEMEIJER, Lingbo YU
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Publication number: 20240071051Abstract: Disclosed herein are CPM support systems, as well as related methods, computing devices, and computer-readable media. For example, in some embodiments, a method may comprise determining, based on selection data indicating selections of areas of microscopy imaging data, training data for a machine-learning model. The method may comprise training, based on the training data, the machine-learning model to automatically determine one or more areas of microscopy imaging data for performing at least one operation, such as high resolution data acquisition and data analysis. The method may comprise causing a computing device to be configured to use the machine-learning model to automatically determine areas of microscopy imaging data for the at least one operation.Type: ApplicationFiled: August 31, 2022Publication date: February 29, 2024Inventors: John Francis Flanagan, IV, Holger Kohr, Yuchen Deng, Fanis Grollios
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Patent number: 11906450Abstract: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.Type: GrantFiled: August 31, 2022Date of Patent: February 20, 2024Assignee: FEI CompanyInventors: Alexander Henstra, Yuchen Deng, Holger Kohr
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Patent number: 11887809Abstract: Computer-implemented methods for controlling a charged particle microscopy system include estimating a drift of a stage of the charged particle microscopy system based on an image sequence, and automatically adjusting a stage settling wait duration based on the drift estimate. Charged particle microscopy systems include an imaging system, a movement stage, and a processor and memory configured with computer-executable instructions that, when executed, cause the processor to estimate a stage settling duration of the movement stage based on an image sequence obtained with the imaging system, and automatically adjust a stage settling wait duration for the movement stage based on the stage settling duration.Type: GrantFiled: January 24, 2022Date of Patent: January 30, 2024Assignee: FEI CompanyInventors: Yuchen Deng, Erik Franken, Bart van Knippenberg, Holger Kohr
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Patent number: 11799486Abstract: Methods and systems for quantum computing based sample analysis include computing cross-correlations of two images using a quantum processing system, and computing less noisy image based of two or more images using a quantum processing system. Specifically, the disclosure includes methods and systems for utilizing a quantum computing system to compute and store cross correlation values for two sets of data, which was previously believed to be physically impossible. Additionally, the disclosure also includes methods and systems for utilizing a quantum computing system to generate less noisy data sets using a quantum expectation maximization maximum likelihood (EMML). Specifically, the disclosed systems and methods allow for the generation of less noisy data sets by utilizing the special traits of quantum computers, the systems and methods disclosed herein represent a drastic improvement in efficiency over current systems and methods that rely on traditional computing systems.Type: GrantFiled: October 13, 2022Date of Patent: October 24, 2023Assignee: FEI CompanyInventors: Valentina Caprara Vivoli, Yuchen Deng, Erik Michiel Franken
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Publication number: 20230245291Abstract: Various approaches are provided for automatically focusing particle beams for SPA. In one example, a method includes determining a focus adjustment for a region of a sample to achieve a targeted defocus based on at least one defocus measurement from at least one neighboring region of the sample, and causing an acquisition of an image of the sample at the region with the focus adjustment. In this way, a targeted defocus may be achieved across regions of a sample with reduced auxiliary imaging, thereby providing increased and uniform image quality while reducing the time and thus increasing the throughput of processing.Type: ApplicationFiled: January 28, 2022Publication date: August 3, 2023Applicant: FEI CompanyInventors: Yuchen Deng, Erik Franken, Bart van Knippenberg, Holger Kohr
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Patent number: 11715618Abstract: Systems and methods for reducing the buildup of charge during the investigation of samples using charged particle beams, according to the present disclosure include irradiating a first portion of a sample during a first time period, wherein the irradiating the first portion of the sample causes a gradual accumulation of net charge in the first portion of the sample, generating imaging data based on emissions resultant from irradiating the first portion of the sample, and then irradiating a second portion of a sample holder for a second time period. The methods may further includes iteratively repeating the irradiation of the first portion and the second portion during imaging of the sample region. When more than one region of interest on the sample is to be investigated, the method may also include continuing to image additional portions of the sample by iteratively irradiating a region of interest on the sample and a corresponding portion of the sample holder.Type: GrantFiled: August 3, 2021Date of Patent: August 1, 2023Inventors: Yuchen Deng, Alexander Henstra, Peter Tiemeijer
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Publication number: 20230238207Abstract: Computer-implemented methods for controlling a charged particle microscopy system include estimating a drift of a stage of the charged particle microscopy system based on an image sequence, and automatically adjusting a stage settling wait duration based on the drift estimate. Charged particle microscopy systems include an imaging system, a movement stage, and a processor and memory configured with computer-executable instructions that, when executed, cause the processor to estimate a stage settling duration of the movement stage based on an image sequence obtained with the imaging system, and automatically adjust a stage settling wait duration for the movement stage based on the stage settling duration.Type: ApplicationFiled: January 24, 2022Publication date: July 27, 2023Applicant: FEI CompanyInventors: Yuchen Deng, Erik Franken, Bart van Knippenberg, Holger Kohr
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Publication number: 20230170910Abstract: Methods and systems for quantum computing based sample analysis include computing cross-correlations of two images using a quantum processing system, and computing less noisy image based of two or more images using a quantum processing system. Specifically, the disclosure includes methods and systems for utilizing a quantum computing system to compute and store cross correlation values for two sets of data, which was previously believed to be physically impossible. Additionally, the disclosure also includes methods and systems for utilizing a quantum computing system to generate less noisy data sets using a quantum expectation maximization maximum likelihood (EMML). Specifically, the disclosed systems and methods allow for the generation of less noisy data sets by utilizing the special traits of quantum computers, the systems and methods disclosed herein represent a drastic improvement in efficiency over current systems and methods that rely on traditional computing systems.Type: ApplicationFiled: October 13, 2022Publication date: June 1, 2023Applicant: FEI CompanyInventors: Valentina Caprara Vivoli, Yuchen Deng, Erik Michiel Franken
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Publication number: 20230040558Abstract: Systems and methods for reducing the buildup of charge during the investigation of samples using charged particle beams, according to the present disclosure include irradiating a first portion of a sample during a first time period, wherein the irradiating the first portion of the sample causes a gradual accumulation of net charge in the first portion of the sample, generating imaging data based on emissions resultant from irradiating the first portion of the sample, and then irradiating a second portion of a sample holder for a second time period. The methods may further includes iteratively repeating the irradiation of the first portion and the second portion during imaging of the sample region. When more than one region of interest on the sample is to be investigated, the method may also include continuing to image additional portions of the sample by iteratively irradiating a region of interest on the sample and a corresponding portion of the sample holder.Type: ApplicationFiled: August 3, 2021Publication date: February 9, 2023Applicant: FEI CompanyInventors: Yuchen Deng, Alexander Henstra, Peter Tiemeijer
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Publication number: 20230003672Abstract: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.Type: ApplicationFiled: August 31, 2022Publication date: January 5, 2023Applicant: FEI CompanyInventors: Alexander Henstra, Yuchen Deng, Holger Kohr
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Publication number: 20220414855Abstract: Disclosed herein are apparatuses, systems, methods, and computer-readable media relating to area selection in charged particle microscope (CPM) imaging. For example, in some embodiments, a CPM support apparatus may include: first logic to generate a first data set associated with an area of a specimen by processing data from a first imaging round of the area by a CPM; second logic to generate predicted parameters of the area; and third logic to determine whether a second imaging round of the area is to be performed by the CPM based on the predicted parameters of the area; wherein the first logic is to, in response to a determination by the third logic that a second imaging round of the area is to be performed, generate a second data set, including measured parameters, associated with the area by processing data from a second imaging round of the area by the CPM.Type: ApplicationFiled: June 25, 2021Publication date: December 29, 2022Applicant: FEI CompanyInventors: Yuchen DENG, Holger KOHR, Maurice PEEMEN
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Patent number: 11501197Abstract: Methods and systems for quantum computing based sample analysis include computing cross-correlations of two images using a quantum processing system, and computing less noisy image based of two or more images using a quantum processing system. Specifically, the disclosure includes methods and systems for utilizing a quantum computing system to compute and store cross correlation values for two sets of data, which was previously believed to be physically impossible. Additionally, the disclosure also includes methods and systems for utilizing a quantum computing system to generate less noisy data sets using a quantum expectation maximization maximum likelihood (EMML). Specifically, the disclosed systems and methods allow for the generation of less noisy data sets by utilizing the special traits of quantum computers, the systems and methods disclosed herein represent a drastic improvement in efficiency over current systems and methods that rely on traditional computing systems.Type: GrantFiled: August 15, 2019Date of Patent: November 15, 2022Assignee: FEI CompanyInventors: Valentina Caprara Vivoli, Yuchen Deng, Erik Michiel Franken
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Patent number: 11460419Abstract: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.Type: GrantFiled: March 30, 2020Date of Patent: October 4, 2022Assignee: FEI CompanyInventors: Alexander Henstra, Yuchen Deng, Holger Kohr
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Patent number: 11456149Abstract: Diffraction patterns of a sample at various tilt angles are acquired by irradiating a region of interest using a first charged particle beam. Sample images are acquired by irradiating the region of interest using a second charged particle beam. The first and second charged particle beams are formed by splitting charged particles generated by a charged particle source.Type: GrantFiled: March 30, 2020Date of Patent: September 27, 2022Assignee: FEI CompanyInventors: Bart Buijsse, Alexander Henstra, Yuchen Deng
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Patent number: 11404241Abstract: Methods for using a single electron microscope system for investigating a sample with TEM and STEM techniques include the steps of emitting electrons toward the sample, forming the electrons into a two beams, and then modifying the focal properties of at least one of the two beams such that they have different focal planes. Once the two beams have different focal planes, the first electron beam is focused such that it acts as a STEM beam that is focused at the sample, and the second electron beam is focused so that it acts as a TEM beam that is parallel beam when incident on the sample. Emissions resultant from the STEM beam and the TEM beam being incident on the sample can then be detected by a single detector or detector array and used to generate a TEM image and a STEM image.Type: GrantFiled: March 30, 2020Date of Patent: August 2, 2022Assignee: FEI CompanyInventors: Alexander Henstra, Yuchen Deng, Holger Kohr
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Publication number: 20210391145Abstract: Methods for using a dual beam microscope system to simultaneously process a sample and image the processed portions of the sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, splitting the plurality of electrons into two electron beams, and then modifying the focal properties of at least one of the electron beams such that the two electron beams have different focal planes. Once the two beams have different focal planes, the first electron beam is focused such that it acts as a STEM beam. The STEM beam is then used to process a region of the sample to induce a physical change (e.g., perform milling, deposition, charge adjustment, phase change, etc.).Type: ApplicationFiled: June 12, 2020Publication date: December 16, 2021Applicant: FEI CompanyInventors: Yuchen Deng, Petrus Hubertus Franciscus Trompenaars, Bart Buijsse, Alexander Henstra
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Patent number: 11183364Abstract: Methods for using a dual beam microscope system to simultaneously process a sample and image the processed portions of the sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, splitting the plurality of electrons into two electron beams, and then modifying the focal properties of at least one of the electron beams such that the two electron beams have different focal planes. Once the two beams have different focal planes, the first electron beam is focused such that it acts as a STEM beam. The STEM beam is then used to process a region of the sample to induce a physical change (e.g., perform milling, deposition, charge adjustment, phase change, etc.). The second electron beam is focused to act as a TEM beam to perform imaging of the region of the sample being processed.Type: GrantFiled: June 12, 2020Date of Patent: November 23, 2021Assignee: FEI CompanyInventors: Yuchen Deng, Petrus Hubertus Franciscus Trompenaars, Bart Buijsse, Alexander Henstra
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Publication number: 20210305010Abstract: Diffraction patterns of a sample at various tilt angles are acquired by irradiating a region of interest using a first charged particle beam. Sample images are acquired by irradiating the region of interest using a second charged particle beam. The first and second charged particle beams are formed by splitting charged particles generated by a charged particle source.Type: ApplicationFiled: March 30, 2020Publication date: September 30, 2021Applicant: FEI CompanyInventors: Bart Buijsse, Alexander Henstra, Yuchen Deng