Patents by Inventor Yuchen Deng

Yuchen Deng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210302333
    Abstract: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.
    Type: Application
    Filed: March 30, 2020
    Publication date: September 30, 2021
    Applicant: FEI Company
    Inventors: Alexander Henstra, Yuchen Deng, Holger Kohr
  • Publication number: 20210305012
    Abstract: Methods for using a single electron microscope system for investigating a sample with TEM and STEM techniques include the steps of emitting electrons toward the sample, forming the electrons into a two beams, and then modifying the focal properties of at least one of the two beams such that they have different focal planes. Once the two beams have different focal planes, the first electron beam is focused such that it acts as a STEM beam that is focused at the sample, and the second electron beam is focused so that it acts as a TEM beam that is parallel beam when incident on the sample. Emissions resultant from the STEM beam and the TEM beam being incident on the sample can then be detected by a single detector or detector array and used to generate a TEM image and a STEM image.
    Type: Application
    Filed: March 30, 2020
    Publication date: September 30, 2021
    Applicant: FEI Company
    Inventors: Alexander Henstra, Yuchen Deng, Holger Kohr
  • Publication number: 20210305007
    Abstract: Methods and systems for investigating a sample using a dual beam bifocal charged particle microscope, according to the present disclosure include emitting a plurality of charged particles toward the sample, forming the plurality of charged particles into a first charged particle beam and a second charged particle beam, and modifying the focal properties of at least one of the first charged particle beam and the second charged particle beam. The focal properties of at least one of the first charged particle beam and the second charged particle beam is modified such that the corresponding focal planes of the first charged particle beam and the second charged particle beam are different.
    Type: Application
    Filed: March 30, 2020
    Publication date: September 30, 2021
    Applicant: FEI Company
    Inventors: Alexander Henstra, Yuchen Deng, Holger Kohr, Ali Mohammadi-Gheidari
  • Patent number: 10937625
    Abstract: The invention relates to a method of imaging a sample, said sample mounted on a sample holder in an electron microscope, the electron microscope comprising an electron source for generating a beam of energetic electrons along an optical axis and optical elements for focusing and deflecting the beam so as to irradiate the sample with a beam of electrons. The sample holder is capable of positioning and tilting the sample with respect to the electron beam. The method comprises the step of acquiring a tilt series of images by irradiating the sample with the beam of electrons, and concurrently changing a position of the sample during acquisition of the images, so that each image is acquired at an associated unique tilt angle and an associated unique position.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: March 2, 2021
    Assignee: FEI Company
    Inventors: Erik Michiel Franken, Remco Schoenmakers, Bart Jozef Janssen, Martin Verheijen, Holger Kohr, Yuchen Deng, Andreas Voigt
  • Publication number: 20210049493
    Abstract: Methods and systems for quantum computing based sample analysis include computing cross-correlations of two images using a quantum processing system, and computing less noisy image based of two or more images using a quantum processing system. Specifically, the disclosure includes methods and systems for utilizing a quantum computing system to compute and store cross correlation values for two sets of data, which was previously believed to be physically impossible. Additionally, the disclosure also includes methods and systems for utilizing a quantum computing system to generate less noisy data sets using a quantum expectation maximization maximum likelihood (EMML). Specifically, the disclosed systems and methods allow for the generation of less noisy data sets by utilizing the special traits of quantum computers, the systems and methods disclosed herein represent a drastic improvement in efficiency over current systems and methods that rely on traditional computing systems.
    Type: Application
    Filed: August 15, 2019
    Publication date: February 18, 2021
    Applicant: FEI Company
    Inventors: Valentina Caprara Vivoli, Yuchen Deng, Erik Michiel Franken
  • Patent number: 10923308
    Abstract: Various methods and systems are provided for generating an energy resolved chroma image of a sample. Upon irradiated by a charged particle beam, scattered charged particles from the sample are directed to form a first image before entering a spectrometer. The scattered charged particles are then dispersed based on their energy when passing through the spectrometer. The dispersed particles form a second image on a detector. The scattered particles at each location of the first image is spread along a corresponding energy spread vector in the second image.
    Type: Grant
    Filed: November 7, 2019
    Date of Patent: February 16, 2021
    Assignee: FEI Company
    Inventors: Yuchen Deng, Peter Christiaan Tiemeijer, Holger Kohr, Jaydeep Sanjay Belapure
  • Publication number: 20200168433
    Abstract: The invention relates to a method of imaging a sample, said sample mounted on a sample holder in an electron microscope, the electron microscope comprising an electron source for generating a beam of energetic electrons along an optical axis and optical elements for focusing and deflecting the beam so as to irradiate the sample with a beam of electrons. The sample holder is capable of positioning and tilting the sample with respect to the electron beam. The method comprises the step of acquiring a tilt series of images by irradiating the sample with the beam of electrons, and concurrently changing a position of the sample during acquisition of the images, so that each image is acquired at an associated unique tilt angle and an associated unique position.
    Type: Application
    Filed: November 21, 2019
    Publication date: May 28, 2020
    Applicant: FEI Company
    Inventors: Erik Michiel Franken, Remco Schoenmakers, Bart Jozef Janssen, Martin Verheijen, Holger Kohr, Yuchen Deng, Andreas Voigt