Abstract: The present invention provides a liquid crystal display apparatus with high reliability in which accuracy of a width of a comb-shaped electrode is improved in the plane, particularly, at a boundary of divisional exposure, display unevenness of the boundary portion of divisional exposure is reduced in a lateral direction electric field method, and provides a manufacturing method thereof. In the method of manufacturing the liquid crystal display apparatus of the present invention wherein the liquid crystal display apparatus is manufactured so that a counter electrode opposite to a pixel electrode is provided and an electric field whose direction is horizontal to the surface of a substrate is applied between the pixel electrode and the counter electrode and thus liquid crystal is driven, when a pixel section is exposed, the exposure is carried out repeatedly by using one mask so that the pattern is formed.

Abstract: An active-matrix liquid crystal display integrally formed with a driver circuit including: a pair of substrates disposed in opposing relation to each other; and a liquid crystal material sandwiched between the pair of substrates,wherein the pair of substrates includes:a TFT substrate including at least an insulative substrate, source interconnection line and gate interconnection line which are formed in a matrix pattern on the insulative substrate, a thin film transistor provided to each pixel portion for use as a switching element for applying a voltage to a portion of the liquid crystal material which lies at a location where the source interconnection line and the gate interconnection line intersect each other, a pixel electrode connected to a drain electrode of the thin film transistor for supplying a voltage to the liquid crystal material, and a CMOS driver circuit having a CMOS which comprises thin film transistors for supplying an electric signal to the thin film transistor of the pixel portion through

Abstract: A TFT-array including a substrate, a gate electrode, a first and second electrode provided on the substrate simultaneously with the gate electrode, an insulating film formed on the gate electrode, the first and the second electrode, a semiconductor layer formed on the gate electrode in such a manner that the insulating film is interposed between the semiconductor layer and the gate electrode, a pair of electrodes, either of which is connected with the first electrode or the second electrode, said pair of electrodes defining a semiconductor element together with the semiconductor layer.

Abstract: An active-matrix liquid crystal display integrally formed with a driver circuit including: a pair of substrates disposed in opposing relation to each other; and a liquid crystal material sandwiched between the pair of substrates, wherein the pair of substrates includes: a TFT substrate including at least an insulative substrate, source interconnection line and gate interconnection line which are formed in a matrix pattern on the insulative substrate, a thin film transistor provided to each pixel portion for use as a switching element for applying a voltage to a portion of the liquid crystal material which lies at a location where the source interconnection line and the gate interconnection line intersect each other, a pixel electrode connected to a drain electrode of the thin film transistor for supplying a voltage to the liquid crystal material, and a CMOS driver circuit having a CMOS which comprises thin film transistors for supplying an electric signal to the thin film transistor of the pixel portion throu

Abstract: An Si thin film (2) for a channel is formed on an insulating substrate (1), and then a gate insulating film (3) made principally of SiO.sub.2 is formed thereon. On the gate insulating film (3) is formed a gate electrode (4) composed of a Si thin film doped with impurities. The gate electrode (4) is patterned by isotropic etching using a photoresist (11) as a mask, and the gate insulating film (3) is patterned by anisotropic etching using the photoresist (11) as a mask into a configuration wider than the gate electrode (4) to be removed from source/drain regions position. The Si thin film (2) is ion implanted with impurities to form source/drain regions of an offset structure. A thin film transistor having an offset or LDD structure and capable of reducing an off-state drain current is fabricated without the need for increased number of masks and for an accurate photolithography technique, such as in alignment accuracy between masks.