Patents by Inventor Yuichi Ogawa

Yuichi Ogawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190362404
    Abstract: In this disclosure, a server includes a reception module configured to receive a commodity code that can identify a commodity; a first extraction module configured to extract material information in which raw materials contained in the commodity specified by the commodity code received by the reception module are registered; a second extraction module configured to extract avoidance information in which avoidance material indicating a raw material that a customer avoids is registered; a third extraction module configured to extract commodity information of a commodity that does not contain the avoidance material on the condition that the material information extracted by the first extraction module includes the avoidance material registered in the avoidance information extracted by the second extraction module; and a first transmission module configured to transmit the commodity information extracted by the third extraction module.
    Type: Application
    Filed: May 24, 2019
    Publication date: November 28, 2019
    Applicant: TOSHIBA TEC KABUSHIKI KAISHA
    Inventor: Yuichi OGAWA
  • Publication number: 20190186106
    Abstract: A work machine including: a hydraulic cylinder 20 configured to drive a work implement 3; a control valve 22 configured to connect a delivery line of a hydraulic pump 21 switchingly to a bottom fluid chamber and a rod fluid chamber of the hydraulic cylinder 20 and a tank; a pilot pump 23 configured to output a pilot pressure to drive the control valve 22; an engine 24 configured to drive the hydraulic pump 21 and the pilot pump 23; and an accumulator 26 configured to accumulate a return hydraulic fluid from the hydraulic cylinder 20 is provided with: a bypass line 41 configured to connect the bottom fluid chamber of the hydraulic cylinder 20 and a delivery line 21a of the hydraulic pump 21 by bypassing the control valve 22 and be provided with the accumulator 26 thereon; a pressure-accumulation control valve 27 provided between the bottom fluid chamber of the hydraulic cylinder 20 and the accumulator 26; a release control valve 28 provided between the accumulator 26 and the delivery line 21a; and a hydraulic
    Type: Application
    Filed: March 29, 2017
    Publication date: June 20, 2019
    Inventors: Yuichi OGAWA, Seiji HIJIKATA, Masatoshi HOSHINO, Kiwamu TAKAHASHI, Kouji ISHIKAWA
  • Publication number: 20190073147
    Abstract: A control device includes a nonvolatile memory, a first processor, a first volatile memory coupled to the first processor, a second processor, and a second volatile memory coupled to the second processor, wherein the first processor is configured to transmit first data stored in the first volatile memory to the second processor by using electric power supplied from a backup power supply, the second processor is configured to store the first data in the second volatile memory, after storing the first data in the second volatile memory, the backup power supply stops supplying the electric power to at least one of the first volatile memory and the first processor, and the second processor is configured to store, in the nonvolatile memory, the first data stored in the second volatile memory.
    Type: Application
    Filed: August 30, 2018
    Publication date: March 7, 2019
    Applicant: FUJITSU LIMITED
    Inventors: Yuichi Ogawa, Tomoyuki Kanayama, Yuzo KORI, Tomoharu Muro
  • Patent number: 10032623
    Abstract: A cleaning method including a persulphuric acid producing step of causing a cleaning sulfuric acid solution to travel into an electrolyzing section and to circulate therethrough to produce persulphuric acid having a predetermined concentration by electrolysis in the electrolyzing section, a solution mixing step of mixing the sulfuric acid solution containing the persulphuric acid produced in the persulphuric acid producing step with a halide solution containing one or more types of halide ion without causing the solutions to travel into the electrolyzing section to produce a mixed solution having a post-mixture concentration of oxidant including the persulphuric acid that ranges from 0.001 to 2 mol/L, a heating step of heating the mixed solution, and a cleaning step of cleaning a semiconductor substrate by transporting the heated mixed solution to cause the heated mixed solution to come into contact with the semiconductor substrate.
    Type: Grant
    Filed: August 19, 2013
    Date of Patent: July 24, 2018
    Assignee: KURITA WATER INDUSTRIES LTD.
    Inventors: Yuichi Ogawa, Haruyoshi Yamakawa
  • Patent number: 10026628
    Abstract: The present invention relates to a method and a system for cleaning a semiconductor substrate wherein Al is at last partially exposed on a silicon substrate and silicided with a metallic substance without damaging the Al and a silicide layer. A cleaning portion cleans the aforementioned semiconductor substrate. A delivery portion, disposed on the cleaning portion, delivers a solution to the semiconductor substrate. A sulfuric acid solution transfer path connected onto the delivery portion transfers a sulfuric acid solution and an adsorptive inhibitor solution transfer path connected to the delivery path transfers an adsorptive inhibitor having any one or more of N-based, S-based, and P-based polar groups to the delivery portion. The sulfuric acid solution and the adsorptive inhibitor may be mixed or separately transferred to come into contact with the semiconductor substrate.
    Type: Grant
    Filed: September 30, 2013
    Date of Patent: July 17, 2018
    Assignee: KURITA WATER INDUSTRIES LTD.
    Inventors: Yuichi Ogawa, Haruyoshi Yamakawa
  • Publication number: 20180088263
    Abstract: Described herein are improved thermoformed liquid crystal polarized wafers and methods of creating, and more specifically the utilization of an improved printed polarized crystal technology and wafer adhesion technology which enables the production of a polarized wafer capable of being thermoformed without a loss of alignment precision.
    Type: Application
    Filed: August 28, 2017
    Publication date: March 29, 2018
    Inventors: Murray Kendall Wilson, Yuichi Ogawa
  • Publication number: 20170365392
    Abstract: An Fe—Si—B—C-based amorphous alloy ribbon as thick as 20-30 ?m having a composition comprising 80.0-80.7 atomic % of Fe, 6.1-7.99 atomic % of Si, and 11.5-13.2 atomic % of B, the total amount of Fe, Si and B being 100 atomic %, and further comprising 0.2-0.45 atomic % of C per 100 atomic % of the total amount of Fe, Si and B, except for inevitable impurities has a stress relief degree of 92% or more.
    Type: Application
    Filed: December 8, 2015
    Publication date: December 21, 2017
    Applicants: METGLAS, INC., HITACHI METALS, LTD.
    Inventors: Eric THEISEN, Yuichi OGAWA, Daichi AZUMA
  • Publication number: 20170356891
    Abstract: To measure the concentration of an oxidant in an oxidative cleaning liquid used in a process of cleaning an electronic material in a simple, easy, consistent, and accurate manner without being affected by impurities included in the cleaning liquid, such as metals. A method for measuring the concentration of an oxidant in a sample liquid used as a cleaning liquid in a process of cleaning an electronic material includes decomposing at least part of an oxidant included in the sample liquid by heating or the like; measuring the amount of oxygen gas generated by decomposition of the oxidant; and determining the concentration of the oxidant in the sample liquid on the basis of the amount of the oxygen gas.
    Type: Application
    Filed: January 6, 2016
    Publication date: December 14, 2017
    Inventors: Hiroshi MORITA, Yuichi OGAWA, Yuya SASAKI
  • Publication number: 20170206178
    Abstract: An information processing apparatus includes a first memory, a data transfer circuit, and a processor, wherein the first memory is configured to store a first read instruction to read second data stored in a second memory, the processor is configured to generate a first write instruction to write first data stored in the first memory into the second memory and a second read instruction to read the first read instruction stored in the first memory, and the data transfer circuit is configured to write the first data into the second memory based on the first write instruction, read, after the first data is written, the second data from the second memory by executing the first read instruction stored in the first memory based on the second read instruction, and transmit, after the second data is read, to the processor a notification indicating that the second data has been read.
    Type: Application
    Filed: November 23, 2016
    Publication date: July 20, 2017
    Applicant: FUJITSU LIMITED
    Inventor: Yuichi Ogawa
  • Publication number: 20170186059
    Abstract: A register system includes an optical code reader, a data storage, a wireless communication interface through which the register system communicates wirelessly with a user computing device, a display, and a processor. The processor queries a master record stored in the data storage to determine whether or not a product corresponding to a product code read by the code reader is an confirmation-required product, and responsive to determining that the product is an confirmation-required product, controls the wireless communication interface to transmit a pull request for a user attribute stored in the user computing device. The processor further determines whether or not product registration processing for the confirmation-required product should continue with or without special processing based on the user attribute received by the wireless communication interface from the user computing device responsive to the pull request.
    Type: Application
    Filed: December 6, 2016
    Publication date: June 29, 2017
    Inventor: Yuichi OGAWA
  • Patent number: 9679189
    Abstract: An elapsed-time determination apparatus includes: a storage unit that stores correlation information indicating a correlation between a state of a melanophore of a fish and an amount of time elapsed since the death of the fish; an acquisition unit that acquires an image of a fish; an analysis unit that detects a state of a melanophore of a fish by analyzing an image acquired by the acquisition unit; and a determination unit that determines the amount of time elapsed since the death of the fish in accordance with the state of the melanophore of the fish detected by the analysis unit, based on the correlation information, and outputs determination results.
    Type: Grant
    Filed: September 18, 2015
    Date of Patent: June 13, 2017
    Assignee: PANASONIC CORPORATION
    Inventors: Yumiko Kato, Yumi Wakita, Jun Ozawa, Naoshi Kondo, Yuichi Ogawa, Tetsuhito Suzuki
  • Publication number: 20160299359
    Abstract: An interchangeable lens system is provided where a first eyewear frame is configured with a snap-in engagement with any one of a plurality of sub-frames having lenses therein. The sub-frames can be engaged through a snap-in engagement with recesses in lens apertures of the first frame or with a slot formed or positioned on the bridge of the first frame. The bridge engaged sub-frame can be rotated out of view through the lens apertures.
    Type: Application
    Filed: November 12, 2014
    Publication date: October 13, 2016
    Inventors: Yuichi Ogawa, Huy Dang, Donn K. Harms
  • Patent number: 9431960
    Abstract: There is provided solution testing equipment which can detect an output variation of a THz oscillation device using a THz wave (h?) by contacting a liquid or cells on an RTD oscillation device, and can reduce the size and weight thereof. The solution testing equipment includes: a THz oscillation device configured to radiate the THz wave Is; a THz detection device configured to receive the THz wave Is; and a solution as a test object disposed on the THz oscillation device, in which the solution is tested on the basis of output characteristics of the terahertz wave varying in response to a relative permittivity of the solution.
    Type: Grant
    Filed: November 20, 2013
    Date of Patent: August 30, 2016
    Assignees: ROHM CO., LTD., KYOTO UNIVERSITY
    Inventors: Toshikazu Mukai, Yuichi Ogawa
  • Publication number: 20160172087
    Abstract: An Fe—Si—B—C-based amorphous alloy ribbon as thick as 20-30 ?m having a composition comprising 80.0-80.7 atomic % of Fe, 6.1-7.99 atomic % of Si, and 11.5-13.2 atomic % of B, the total amount of Fe, Si and B being 100 atomic %, and further comprising 0.2-0.45 atomic % of C per 100 atomic % of the total amount of Fe, Si and B, except for inevitable impurities has a stress relief degree of 92% or more.
    Type: Application
    Filed: December 11, 2014
    Publication date: June 16, 2016
    Applicants: METGLAS, INC., HITACHI METALS, LTD.
    Inventors: Eric THEISEN, Yuichi OGAWA, Daichi AZUMA
  • Patent number: 9366620
    Abstract: The characteristics of a specimen are measured by holding the specimen on an aperture array structure having apertures, applying an electromagnetic wave to the aperture array structure, and detecting frequency characteristics of the electromagnetic wave reflected by the aperture array structure. A liquid is directly or indirectly attached to at least a part of a first principal surface. The electromagnetic wave is applied from side including a second principal surface. The apertures of the aperture array structure have a size which does not allow the liquid to leak from the first principal surface side to the second principal surface side, and the liquid is attached to the first principal surface of the aperture array structure in a state open to an atmosphere under air pressure.
    Type: Grant
    Filed: December 2, 2013
    Date of Patent: June 14, 2016
    Assignee: MURATA MANUFACTURING CO., LTD.
    Inventors: Takashi Kondo, Seiji Kamba, Yuichi Ogawa, Sakura Tomita
  • Patent number: 9341561
    Abstract: An aperture array structure used in a method of measuring characteristics of a specimen by applying an electromagnetic wave to an aperture array structure on which the specimen is held, and detecting frequency characteristics of the electromagnetic wave scattered by the aperture array structure. The aperture array structure includes a first principal surface, a second principal surface opposed to the first principal surface, and a plurality of apertures extending through the aperture array structure in a direction perpendicular to the first principal surface and the second principal surface. An opening area of each aperture at the first principal surface is smaller than an opening area of each aperture at the second principal surface.
    Type: Grant
    Filed: January 26, 2015
    Date of Patent: May 17, 2016
    Assignee: MURATA MANUFACTURING CO., LTD.
    Inventors: Takashi Kondo, Seiji Kamba, Yuichi Ogawa
  • Publication number: 20160092723
    Abstract: An elapsed-time determination apparatus includes: a storage unit that stores correlation information indicating a correlation between a state of a melanophore of a fish and an amount of time elapsed since the death of the fish; an acquisition unit that acquires an image of a fish; an analysis unit that detects a state of a melanophore of a fish by analyzing an image acquired by the acquisition unit; and a determination unit that determines the amount of time elapsed since the death of the fish in accordance with the state of the melanophore of the fish detected by the analysis unit, based on the correlation information, and outputs determination results.
    Type: Application
    Filed: September 18, 2015
    Publication date: March 31, 2016
    Inventors: YUMIKO KATO, YUMI WAKITA, JUN OZAWA, NAOSHI KONDO, YUICHI OGAWA, TETSUHITO SUZUKI
  • Publication number: 20160013047
    Abstract: There is provided a method for cleaning a semiconductor substrate to remove platinum and/or a platinum alloy from the semiconductor substrate having a layer having Si as its constituting component, and the method enables Al, a silicide film, a Si-based insulating film, a Si-based substrate and the like to be effectively cleaned without being damaged. The method for cleaning a semiconductor substrate to remove platinum and/or a platinum alloy from the semiconductor substrate having a layer having Si as its constituting component comprises a first cleaning step of bringing the semiconductor substrate into contact with a first solution containing nitric acid and/or hydrogen peroxide as main solutes to thereby clean the semiconductor substrate, and a second cleaning step of bringing the semiconductor substrate having undergone the first cleaning step into contact with a second solution containing an oxidizing agent-containing sulfuric acid solution and a halide and having a temperature of 25 to 100° C.
    Type: Application
    Filed: February 28, 2014
    Publication date: January 14, 2016
    Applicant: Kurita Water Industries Ltd.
    Inventor: Yuichi OGAWA
  • Patent number: 9177706
    Abstract: This method of producing an amorphous transformer for electric power supply comprises forming and shaping an iron core by laminating amorphous alloy thin bands and forming a winding, subjecting the iron core, after forming and shaping, to an annealing treatment in which a temperature of a center portion of the iron core during annealing is 300 to 340° C. and a holding time is not less than 0.5 hr, and applying a magnetic field having a strength of not less than 800 A/m to the iron core while subjecting the iron core, after forming and shaping, to the annealing treatment.
    Type: Grant
    Filed: May 5, 2011
    Date of Patent: November 3, 2015
    Assignee: HITACHI INDUSTRIAL EQUIPMENT SYSTEMS CO., LTD.
    Inventors: Kazuyuki Fukui, Koji Yamashita, Yuichi Ogawa, Masamu Naoe, Yoshihito Yoshizawa
  • Publication number: 20150279703
    Abstract: A method and system for cleaning a semiconductor substrate in which Al is at least partially exposed on a silicon substrate and which is silicided with a metallic substance, without damaging Al and a silicide layer, comprising a cleaning portion (2) for cleaning a semiconductor substrate 100 in which Al is at least partially exposed on a silicon substrate and which is silicided with a metallic substance; a delivery portion (30) disposed in the cleaning portion for delivering a cleaning solution to the semiconductor substrate in the cleaning portion to bring the cleaning solution into contact with the semiconductor substrate; a sulfuric acid solution transfer path (5) connected to the delivery portion for transferring a sulfuric acid solution comprising an oxidant to the delivery portion; and an adsorptive inhibitor solution transfer path (11) connected to the delivery portion for transferring a solution comprising an adsorptive inhibitor having any one or more of N-based, S-based, and P-based polar groups to
    Type: Application
    Filed: September 30, 2013
    Publication date: October 1, 2015
    Applicant: Kurita Water Industries Ltd.
    Inventors: Yuichi Ogawa, Haruyoshi Yamakawa